公开(公告)号：US06365505B1

公开(公告)日：2002-04-02

申请号：US09780531

申请日：2001-02-21

Applicant: Fei Wang ,  Lynne A. Okada ,  Ramkumar Subramanian ,  Calvin T. Gabriel

Inventor： Fei Wang ,  Lynne A. Okada ,  Ramkumar Subramanian ,  Calvin T. Gabriel

IPC: H01L214763

CPC classification number: H01L21/76835 ,  H01L21/76808

Abstract: A method of forming an interconnect structure in which an inorganic low k dielectric material is deposited over a conductive layer to form a first dielectric layer. An etch stop layer is formed on the first dielectric layer. The etch stop layer and the first dielectric layer are etched to form a slot via in the first dielectric layer. The slot via is longer than the width of a subsequently formed trench. An organic low k dielectric material is deposited within the slot via and over the etch stop layer to form a second dielectric layer over the slot via and the etch stop layer. The re-filled slot via is simultaneously etched with the second dielectric layer in which a trench is formed. The entire width of the trench is directly over the via. The re-opened via and the trench are filled with a conductive material.

Abstract translation: 一种形成互连结构的方法，其中无机低k电介质材料沉积在导电层上以形成第一介电层。 在第一电介质层上形成蚀刻停止层。 蚀刻停止层和第一介电层被蚀刻以在第一介电层中形成槽通孔。 狭缝通孔比随后形成的沟槽的宽度长。 有机低k电介质材料通过蚀刻停止层上方和上方沉积在槽内，以在缝隙通孔和蚀刻停止层上形成第二电介质层。 再填充的槽通孔与其中形成沟槽的第二电介质层同时蚀刻。 沟槽的整个宽度直接在通孔上方。 重新打开的通孔和沟槽填充有导电材料。

公开(公告)号：US06270929B1

公开(公告)日：2001-08-07

申请号：US09619789

申请日：2000-07-20

Applicant: Christopher F. Lyons ,  Ramkumar Subramanian ,  Bhanwar Singh ,  Marina Plat

Inventor： Christopher F. Lyons ,  Ramkumar Subramanian ,  Bhanwar Singh ,  Marina Plat

IPC: H01L21302

CPC classification number: H01L21/28114 ,  H01L21/0273 ,  H01L21/0338 ,  H01L21/31144 ,  H01L21/76802 ,  H01L29/42376

Abstract: A method for fabricating a T-gate structure is provided. A structure is provided that has a silicon layer having a gate oxide layer, a polysilicon layer over the gate oxide layer and an insulating layer over the gate oxide layer. A photoresist layer is formed over the insulating layer. An opening is the formed extending through the photoresist layer and partially into the insulating layer. The opening in the insulating layer extends from a top surface of the insulating layer to a first depth. The photoresist layer is swelled to reduce the size of the opening in the photoresist layer. The opening is then extended in the insulating layer from the first depth to a second depth. The opening is wider from the top surface of the insulating layer to the first depth than the opening is from the first depth to the second depth. The opening is then filled with a conductive material to form a T-gate structure.

Abstract translation: 提供了一种制造T型栅结构的方法。 提供一种结构，其具有硅层，该硅层具有栅极氧化物层，栅极氧化物层上的多晶硅层和栅极氧化物层上的绝缘层。 在绝缘层上形成光致抗蚀剂层。 开口形成为延伸穿过光致抗蚀剂层并部分地进入绝缘层。 绝缘层中的开口从绝缘层的顶表面延伸到第一深度。 光致抗蚀剂层被膨胀以减小光致抗蚀剂层中的开口的尺寸。 然后将开口在绝缘层中从第一深度延伸到第二深度。 开口从绝缘层的顶表面到比第一深度从第一深度到第二深度的第一深度更宽。 然后用导电材料填充开口以形成T形栅结构。

公开(公告)号：US06248175B1

公开(公告)日：2001-06-19

申请号：US09430001

申请日：1999-10-29

Applicant: Ramkumar Subramanian ,  Khoi A. Phan ,  Bharath Rangarajan ,  Bhanwar Singh ,  Michael K. Templeton ,  Sanjay K. Yedur

Inventor： Ramkumar Subramanian ,  Khoi A. Phan ,  Bharath Rangarajan ,  Bhanwar Singh ,  Michael K. Templeton ,  Sanjay K. Yedur

IPC: B05C1100

CPC classification number: H01L21/6715 ,  G03F7/3021

Abstract: A system and method is provided that facilitates the application of a uniform layer of developer material on a photoresist material layer. The system includes a nozzle adapted to apply a predetermined volume of developer material on a photoresist material layer along a linear path having a length approximately equal to the diameter of the photoresist material layer. A movement system moves the nozzle to a first position offset from a central region of the photoresist material layer for applying a first predetermined volume of developer material to the photoresist material layer while the developer material is spin coated. The movement system also moves the nozzle to a second position offset from the central region for applying a second predetermined volume of developer material to the photoresist material layer while the developer is spin coated. The first position is located on an opposite side of the central region with respect to the second position. A method of adjusting the offset position and/or volume of developer material applied at the first and second position is also provided. The method utilizes developed photoresist material layer thickness data provided by a measurement system to adjust the offset position and/or volume of the developer.

Abstract translation: 提供了一种有助于在光致抗蚀剂材料层上施加均匀的显影剂材料层的系统和方法。 该系统包括适于沿着具有大致等于光致抗蚀剂材料层的直径的直线路径的光致抗蚀剂材料层上施加预定体积的显影剂材料的喷嘴。 移动系统将喷嘴移动到偏离光致抗蚀剂材料层的中心区域的第一位置，以在旋转涂覆显影剂材料的同时将第一预定体积的显影剂材料施加到光致抗蚀剂材料层。 移动系统还将喷嘴移动到偏离中心区域的第二位置，以在显影剂被旋涂时施加第二预定体积的显影剂材料到光致抗蚀剂材料层。 第一位置相对于第二位置位于中心区域的相反侧。 还提供了一种调节在第一和第二位置施加的显影剂材料的偏移位置和/或体积的方法。 该方法利用由测量系统提供的显影的光致抗蚀剂材料层厚度数据来调节显影剂的偏移位置和/或体积。

公开(公告)号：US08547521B1

公开(公告)日：2013-10-01

申请号：US11000653

申请日：2004-12-01

Applicant: Srikanteswara Dakshina-Murthy ,  Bhanwar Singh ,  Ramkumar Subramanian

Inventor： Srikanteswara Dakshina-Murthy ,  Bhanwar Singh ,  Ramkumar Subramanian

IPC: G03B27/42 ,  G03B27/52 ,  G03B27/54

CPC classification number: G03F7/70891 ,  G03F7/70341

Abstract: The subject invention provides systems and methods that monitor and/or control turbulence of an immersion medium. The systems and methods relate to computer controlled techniques that reduce effects of immersion medium flow due to a liquid temperature gradient. According to an aspect of the subject invention, a number of temperature measurements of the immersion medium are obtained, and the temperature measurements are utilized to generate a gradient map of the immersion medium. By way of illustration, the temperature measurements can be made via wireless temperature sensors. The gradient map can be utilized to understand the stability of the immersion medium. According to an aspect of the subject invention, instability identified with the gradient map can be mitigated.

Abstract translation: 本发明提供了监测和/或控制浸没介质的湍流的系统和方法。 这些系统和方法涉及由于液体温度梯度而降低浸没介质流动影响的计算机控制技术。 根据本发明的一个方面，获得浸渍介质的多个温度测量值，并利用温度测量值来产生浸渍介质的梯度图。 作为说明，可以通过无线温度传感器进行温度测量。 梯度图可用于了解浸没介质的稳定性。 根据本发明的一个方面，可以减轻用梯度图识别的不稳定性。

公开(公告)号：US08423280B2

公开(公告)日：2013-04-16

申请号：US13572279

申请日：2012-08-10

Applicant: David Edwards ,  David Robert Pavlik ,  Ramkumar Subramanian ,  Robert Martin Coats

Inventor： David Edwards ,  David Robert Pavlik ,  Ramkumar Subramanian ,  Robert Martin Coats

IPC: G06F17/10 ,  B60Q1/00 ,  G01S13/00

CPC classification number: G01S13/931 ,  G01S7/062 ,  G01S13/862 ,  G01S13/865 ,  G01S13/867 ,  G01S13/87 ,  G01S17/023 ,  G01S2013/9332 ,  G01S2013/9353 ,  G01S2013/9364 ,  G01S2013/9367 ,  G01S2013/9389 ,  G08G1/16 ,  G08G1/166 ,  G08G1/167

Abstract: A method for collision avoidance for a machine is disclosed. The method includes detecting an obstacle with an obstacle detection system and generating a corresponding signal. The obstacle detection system includes an operator input device. The method also includes providing an obstacle detection warning in response to the signal. The method further includes determining with a controller whether the operator input device has been activated in response to the obstacle detection warning.

Abstract translation: 公开了一种用于机器的防碰撞的方法。 该方法包括利用障碍物检测系统检测障碍物并产生相应的信号。 障碍物检测系统包括操作员输入装置。 该方法还包括响应于该信号提供障碍物检测警告。 该方法还包括利用控制器确定操作员输入装置是否已经响应于障碍物检测警告被激活。

公开(公告)号：US20130027559A1

公开(公告)日：2013-01-31

申请号：US13572279

申请日：2012-08-10

Applicant: David EDWARDS ,  David Robert Pavlik ,  Ramkumar Subramanian ,  Robert Martin Coats

Inventor： David EDWARDS ,  David Robert Pavlik ,  Ramkumar Subramanian ,  Robert Martin Coats

IPC: G06F17/00 ,  H04N7/18 ,  B60Q1/00

CPC classification number: G01S13/931 ,  G01S7/062 ,  G01S13/862 ,  G01S13/865 ,  G01S13/867 ,  G01S13/87 ,  G01S17/023 ,  G01S2013/9332 ,  G01S2013/9353 ,  G01S2013/9364 ,  G01S2013/9367 ,  G01S2013/9389 ,  G08G1/16 ,  G08G1/166 ,  G08G1/167

Abstract: A method for collision avoidance for a machine is disclosed. The method includes detecting an obstacle with an obstacle detection system and generating a corresponding signal. The obstacle detection system includes an operator input device. The method also includes providing an obstacle detection warning in response to the signal. The method further includes determining with a controller whether the operator input device has been activated in response to the obstacle detection warning.

Abstract translation: 公开了一种用于机器的防碰撞的方法。 该方法包括利用障碍物检测系统检测障碍物并产生相应的信号。 障碍物检测系统包括操作员输入装置。 该方法还包括响应于该信号提供障碍物检测警告。 该方法还包括利用控制器确定操作员输入装置是否已经响应于障碍物检测警告被激活。

公开(公告)号：US20110043535A1

公开(公告)日：2011-02-24

申请号：US12543064

申请日：2009-08-18

Applicant: Paul J. Kwiatkowski ,  Ramkumar Subramanian ,  Robert A. Goins ,  Jeremy S. Knudsen ,  Lincoln K. Uyeda ,  Gary S. Henderson ,  Peter S. Ponomarev

Inventor： Paul J. Kwiatkowski ,  Ramkumar Subramanian ,  Robert A. Goins ,  Jeremy S. Knudsen ,  Lincoln K. Uyeda ,  Gary S. Henderson ,  Peter S. Ponomarev

IPC: G09G5/02

CPC classification number: G06T11/001

Abstract: A bitmap may be transformed from one color scheme to another. In one example, the bitmap is used as part of a user interface (UI), and the colorization is performed to reflect a user's (or some other entity's) choice of color scheme. To perform the colorization, a bitmap may be converted from the red-green-blue (RGB) color space to the hue-saturation-lightness (HSL) color space. The hue may then be rotated toward the selected color scheme. Lightness and alpha (opacity) may be gamma-adjusted toward the selected color scheme. Saturation may be linearly adjusted upward or downward in the direction of the selected color scheme. The transformed HSL representation of the image may then be converted from the HSL space back to the RGB space. The new RGB bitmap may then be used to render one or more UI elements.

Abstract translation: 位图可以从一种颜色方案转换到另一种颜色方案。 在一个示例中，位图被用作用户界面（UI）的一部分，并且执行着色以反映用户（或某个其他实体）的配色方案的选择。 为了执行着色，位图可以从红 - 绿 - 蓝（RGB）颜色空间转换为色相饱和度（HSL）颜色空间。 然后可以将色调向所选择的配色方案旋转。 亮度和alpha（不透明度）可以朝着选定的配色方案进行伽马调整。 饱和度可以在所选配色方案的方向上向上或向下线性调节。 然后可以将图像的变换的HSL表示从HSL空间转换回RGB空间。 然后可以使用新的RGB位图来呈现一个或多个UI元素。

公开(公告)号：US20100010703A1

公开(公告)日：2010-01-14

申请号：US12216582

申请日：2008-07-08

Applicant: Robert M. Coats ,  Michael Sean McDaniel ,  David J. Edwards ,  Ramkumar Subramanian ,  Kenneth L. Stratton

Inventor： Robert M. Coats ,  Michael Sean McDaniel ,  David J. Edwards ,  Ramkumar Subramanian ,  Kenneth L. Stratton

IPC: G06F19/00

CPC classification number: G05D1/0278 ,  G05D1/024 ,  G05D1/0255 ,  G05D1/0257 ,  G05D1/027 ,  G05D1/0272 ,  G05D1/0274 ,  G05D2201/0202

Abstract: A guidance system for a mobile machine is disclosed. The guidance system may have a scanning device configured to generate a signal indicative of a lateral distance from the machine to a roadway marker, a locating device configured to determine a geographical location of the machine, and a controller in communication with the scanning device and the locating device. The controller may be configured to receive a desired lateral distance from the machine to the roadway marker, and to compare the desired lateral distance to the actual lateral distance. The controller may further be configured to implement a response to the comparison based on the geographical location.

Abstract translation: 公开了一种移动机的引导系统。 引导系统可以具有被配置为产生指示从机器到道路标记的横向距离的信号的扫描设备，被配置为确定机器的地理位置的定位设备，以及与扫描设备和 定位装置。 控制器可以被配置为接收从机器到道路标记的期望的横向距离，并且将期望的横向距离与实际横向距离进行比较。 控制器还可以被配置为基于地理位置来实现对比较的响应。

公开(公告)号：US07591902B2

公开(公告)日：2009-09-22

申请号：US11615080

申请日：2006-12-22

Applicant: Bharath Rangarajan ,  Ramkumar Subramanian ,  Khoi A. Phan ,  Ursula Q. Quinto ,  Michael T. Templeton

Inventor： Bharath Rangarajan ,  Ramkumar Subramanian ,  Khoi A. Phan ,  Ursula Q. Quinto ,  Michael T. Templeton

IPC: B05B1/28 ,  B05B15/04 ,  B05B3/00 ,  B05C11/00

CPC classification number: H01L21/6715 ,  B05B15/50 ,  B05C11/08

Abstract: The present invention provides a system and methodology for dummy-dispensing resist though a dispense head while mitigating waste associated with the dummy-dispense process. The dummy dispensed resist is returned to a reservoir from which it was taken. Between substrate applications, the dispense head can be positioned to dispense resist into a return line. The flow of resist from the dispense head keeps resist from drying at the dispense head. By funneling the dummy-dispensed resist into a return line with low volume, for example, waste from the dummy-dispensing process can be mitigated.

Abstract translation: 本发明提供了一种用于分配头的虚拟分配抗蚀剂的系统和方法，同时减轻与虚拟分配过程相关的废物。 虚拟分配的抗蚀剂返回到被采集的储存器。 在基板应用之间，分配头可以被定位成将抗蚀剂分配到返回线中。 来自分配头的抗蚀剂的流动在分配头保持抗干燥。 通过将虚拟分配的抗蚀剂漏出到具有低体积的返回管线中，例如，可以减轻来自虚拟分配过程的废物。

公开(公告)号：US07554522B2

公开(公告)日：2009-06-30

申请号：US11021415

申请日：2004-12-23

Applicant: Robert E. Sinclair, II ,  Gilma Annuska Perkins ,  Michael Edward Dulac Winser ,  Ramkumar Subramanian ,  Paul Reid

Inventor： Robert E. Sinclair, II ,  Gilma Annuska Perkins ,  Michael Edward Dulac Winser ,  Ramkumar Subramanian ,  Paul Reid

IPC: G06F3/00

CPC classification number: G06F3/0481 ,  G06F2203/04801

Abstract: A computing environment can dynamically respond to user preferences and personal abilities by enabling computer users to configure their computing experience by implicitly gathering information about the users' needs. The system can detect users' issues during the natural course of interaction with the system and offer to make adjustments to make their tasks simpler and more enjoyable. The system can allow for the configuration of settings that can impact users' abilities to receive important information from the system or provide input to the system.

Abstract translation: 计算环境可以通过使计算机用户通过隐含地收集有关用户需求的信息来配置他们的计算体验来动态地响应用户偏好和个人能力。 该系统可以在与系统交互的自然过程中检测用户的问题，并提出调整，使其任务更简单，更愉快。 该系统可以配置可能影响用户从系统接收重要信息或向系统提供输入的能力的设置。