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公开(公告)号：KR1020040067323A
公开(公告)日：2004-07-30
申请号：KR1020030004367
申请日：2003-01-22
Applicant: 전자부품연구원
IPC: G03F1/22
Abstract: PURPOSE: Provided is an X-ray mask, which uses a BN sheet as a substrate to remarkably increase an area having the function as a window and thus is suitable for an X-ray electrophotographic etching process requiring a large window area. CONSTITUTION: The X-ray mask is manufactured by the method comprising the steps of: (a) depositing a plating base layer(21) on the top surface of a BN sheet(20); (b) applying a photoresist on the top surface of the plating base layer deposited in step (a) and patterning the photoresist layer so that the plating base layer is partially exposed; (c) forming an X-ray absorbent(23) on the top surface of the plating base layer(21) exposed in step (b); (d) removing the patterned photoresist to expose the plating base layer(21) disposed under the removed photoresist; and (e) removing the plating base layer(21) exposed in step (d).
Abstract translation: 目的：提供一种使用BN片作为基板的X射线掩模，显着增加具有窗口功能的区域，因此适合于需要大的窗口面积的X射线电子照相蚀刻工艺。 构成：通过包括以下步骤的方法制造X射线掩模：（a）在BN片材（20）的顶表面上沉积镀覆层（21）; （b）在步骤（a）中沉积的镀覆基底层的顶表面上施加光致抗蚀剂，并对光致抗蚀剂层进行图案化以使电镀底层部分露出; （c）在步骤（b）中暴露的电镀底层（21）的顶表面上形成X射线吸收剂（23）; （d）去除图案化的光致抗蚀剂以暴露设置在去除的光致抗蚀剂下面的电镀基层（21）; 和（e）去除步骤（d）中暴露的电镀底层（21）。
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公开(公告)号：KR1020040047417A
公开(公告)日：2004-06-05
申请号：KR1020020075635
申请日：2002-11-30
IPC: H01L21/027
Abstract: PURPOSE: A method for fabricating an X-ray mask is provided to pattern a sharp and clear V-groove on a specimen such that the edge and angle of the V-groove is not warped or sagged by fabricating an X-ray mask in which an X-ray absorber for absorbing the X-ray radiated from the outside is of a trapezoid type. CONSTITUTION: A plating base layer and the first photoresist layer are sequentially formed on a substrate. The first photoresist layer is patterned to expose a part of the plating base layer. The first X-ray absorber is formed on the exposed plating base layer. The second photoresist layer is formed on the residual first photoresist layer and the first X-ray absorber. The second X-ray absorber is formed on the first X-ray absorber exposed by patterning the second photoresist layer wherein the upper part of both side surfaces of the second X-ray absorber is slightly tilted. The residual first photoresist layer and the second photoresist layer left after patterning the second photoresist layer are eliminated to expose a part of the plating base layer and eliminate the exposed plating base layer.
Abstract translation: 目的：提供一种用于制造X射线掩模的方法，以在样品上图形清晰的V形槽，使得V形槽的边缘和角度通过制造X射线掩模不会翘曲或下垂，其中 用于吸收从外部辐射的X射线的X射线吸收体是梯形的。 构成：在基板上依次形成电镀基层和第一光致抗蚀剂层。 图案化第一光致抗蚀剂层以暴露电镀基层的一部分。 第一X射线吸收体形成在暴露的电镀基底层上。 第二光致抗蚀剂层形成在残留的第一光致抗蚀剂层和第一X射线吸收体上。 第二X射线吸收体形成在通过图案化第二光致抗蚀剂层而露出的第一X射线吸收体上，其中第二X射线吸收体的两侧表面的上部稍微倾斜。 消除了在图案化第二光致抗蚀剂层之后留下的残留的第一光致抗蚀剂层和第二光致抗蚀剂层，以暴露出一部分电镀底层，并且消除了暴露的电镀基底层。
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公开(公告)号：KR1020040042491A
公开(公告)日：2004-05-20
申请号：KR1020020070800
申请日：2002-11-14
IPC: H01L21/027
Abstract: PURPOSE: An X-ray mask and its manufacturing method are provided to considerably increase the predetermined surface area for operating as a window at the X-ray mask by using a polyimide film. CONSTITUTION: One surface of a double-sided adhesive film(21) is attached on a substrate(20) and a polymer film(22) is attached on the other surface of the double-sided adhesive film as a mask base layer. A plating base layer(23) is formed on the polymer film. A photoresist layer is coated on the plating base layer. The plating base layer is partially exposed by selectively patterning the photoresist layer. An X-ray absorbing part(25) is formed on the exposed plating base layer. Then, the patterned photoresist layer is removed from the resultant structure for exposing the other portion of the plating base layer. Then, the exposed portion of the plating base layer is removed. The double-sided adhesive film of the mask base layer is separated from the polymer film. Preferably, a polyimide film is used as the polymer film.
Abstract translation: 目的：提供一种X射线掩模及其制造方法，以通过使用聚酰亚胺膜显着增加用于在X射线掩模处作为窗口操作的预定表面积。 构成：双面粘合膜（21）的一个表面附着在基板（20）上，聚合物膜（22）附着在作为掩模基层的双面粘合膜的另一个表面上。 在聚合物膜上形成电镀底层（23）。 在电镀基层上涂覆光致抗蚀剂层。 通过选择性地图案化光致抗蚀剂层，部分地暴露电镀底层。 在露出的电镀基底层上形成有X射线吸收部（25）。 然后，从所得结构中去除图案化的光致抗蚀剂层，以暴露电镀基层的其它部分。 然后，去除电镀底层的露出部分。 掩模基层的双面粘合膜与聚合物膜分离。 优选使用聚酰亚胺膜作为聚合物膜。
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公开(公告)号：KR100349610B1
公开(公告)日：2002-08-21
申请号：KR1019990025994
申请日：1999-06-30
Applicant: 전자부품연구원
Abstract: 이발명은플라즈마디스플레이패널의격벽을제조한다. 흡수체패턴이형성되어있는 X-선용마스크를제1 기판에부착시키지않고감광막의전면에정렬시킨후 X-선을조사시킨다. 패턴이형성된제1 기판을현상액에침전시켜현상하며, 이에따라 X-선이조사되지않은부분만남게되어감광막패턴이형성된다. 다음에전기도금공정을통하여제1 기판의감광막이제거되어있는부분에금속물질을성장시켜채우고남겨진감광막을제거한다. 따라서격벽제조를위한금속구조물이형성된다. 다음에 PDP 제조를위한제2 기판상의격벽용재료를이 금속구조물로눌러서제2 기판상에격벽을형성한다. 따라서, X-선에의하여격벽면이매우매끄럽고모양이정밀한격벽이형성되어격벽내의발광효율이향상된다. 또한, 격벽간의피치를매우정밀하게조절할수 있으므로플라즈마디스플레이패널의해상도가향상된다.
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公开(公告)号：KR100314117B1
公开(公告)日：2001-11-15
申请号：KR1019990048844
申请日：1999-11-05
Applicant: 전자부품연구원
IPC: H01L21/027
Abstract: 본발명의개선된 LIGA 공정은 X선노광으로인한도전층의 2차전자의영향을없애기위한버퍼층을사용하지않고먼저 PMMA를 X선으로노광한후 그위에도전층을형성한다. 그리고, 형성된도전체중 선택된곳만부도체로봉함한후 PMMA를현상하여 PMMA 구조물을형성하고, 이 PMMA 구조물로정밀한금속구조물을형성한다. 이렇게함으로써종래의 LIGA 공정을대면적기판에적용할경우버퍼층및 PMMA 부착층형성시면적이넓어질수록층이불균일하게형성되는것을해결할수 있을뿐만아니라 PMMA 부착면이증가에따른부착결함의발생을방지할수 있다.
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Patent Agency Ranking
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公开(公告)号：KR101861235B1
公开(公告)日：2018-05-29
申请号：KR1020160054509
申请日：2016-05-03
Applicant: 전자부품연구원
Abstract: 본발명은은나노와이어를포함하는전도막, 발열체및 그의제조방법에관한것으로, 고온환경에서도전기전도성과헤이즈특성을유지하면서우수한발열특성을구현하기위한것이다. 본발명에따른은나노와이어전도막은베이스기판위에은나노와이어들이서로접촉되어네트워크구조를형성하는은나노와이어층을포함한다. 은나노와이어층의은나노와이어들의표면은금속산화물로코팅되어보호된다.
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公开(公告)号：KR101826708B1
公开(公告)日：2018-02-08
申请号：KR1020160084030
申请日：2016-07-04
Applicant: 전자부품연구원
IPC: H01M10/657 , H01M10/615 , H01M10/63 , H01M10/625 , H01M10/667 , H01M10/48 , H05B3/34
Abstract: 본발명은배터리히터, 그를포함하는배터리시스템및 그의제조방법에관한것으로, 저전압에서대면적으로높은발열량을순간적으로필요로하는리튬배터리의히팅에사용하기위한것이다. 본발명은절연성을갖는베이스기판과, 베이스기판의양면에형성된전극배선패턴과, 베이스기판의양면에형성되며전극배선패턴사이를메우는절연층, 및베이스기판의양면에발열체조성물을인쇄하여전극배선패턴에전기적으로연결되게형성된복수의면상발열체를구비하며, 복수의면상발열체는베이스기판의양면전체에균일하게형성된면상발열체어레이를포함하는배터리히터를제공한다.
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公开(公告)号：KR1020180004461A
公开(公告)日：2018-01-12
申请号：KR1020160084030
申请日：2016-07-04
Applicant: 전자부품연구원
IPC: H01M10/657 , H01M10/615 , H01M10/63 , H01M10/625 , H01M10/667 , H01M10/48 , H05B3/34
CPC classification number: H01M10/657 , H01M10/486 , H01M10/615 , H01M10/625 , H01M10/63 , H01M10/667 , H01M2220/20 , H05B3/34 , H05B2203/01 , H05B2203/013 , Y02E60/122
Abstract: 본발명은배터리히터, 그를포함하는배터리시스템및 그의제조방법에관한것으로, 저전압에서대면적으로높은발열량을순간적으로필요로하는리튬배터리의히팅에사용하기위한것이다. 본발명은절연성을갖는베이스기판과, 베이스기판의양면에형성된전극배선패턴과, 베이스기판의양면에형성되며전극배선패턴사이를메우는절연층, 및베이스기판의양면에발열체조성물을인쇄하여전극배선패턴에전기적으로연결되게형성된복수의면상발열체를구비하며, 복수의면상발열체는베이스기판의양면전체에균일하게형성된면상발열체어레이를포함하는배터리히터를제공한다.
Abstract translation: 本发明涉及一种生产所述电池系统包括电池的加热器的方法，他的，是使用需要在低电压下在短时间内在大面积上产生的高热量的锂电池的加热。 本发明是一种绝缘层，以及通过印刷在基底基板电极布线和形成在基底基板的两个表面上的电极布线图案的两个表面上的发热元件的组合物，具有绝缘性的基底基板，形成在底部基板的两个表面上的电极布线图案之间桥接 包括形成有多个平面加热元件的，以电连接到图案中，多个平面加热元件提供了一个加热电池，其包括在基板的两个表面上均匀地形成的平面加热元件阵列。
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