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公开(公告)号：US20040263059A1
公开(公告)日：2004-12-30
申请号：US10878126
申请日：2004-06-29
Inventor： Chao Chin Wu , Meng-Chieh Liao , Jiun-Haw Lee
IPC: H05B033/08 , H05B033/00
CPC classification number: H01L27/3279 , G02F1/1345 , H01J1/02 , H01L27/329 , H01L51/5212 , Y10S428/917
Abstract: An electrode substrate of a flat panel display at least comprises a substrate, an electrode layer, a first barrier layer, a second barrier layer and a conductive layer. The electrode layer is disposed above the substrate. The first barrier layer is disposed above the electrode layer. The second barrier layer is disposed above the first barrier layer. The conductive layer is disposed between the first barrier layer and the second barrier layer.
Abstract translation: 平板显示器的电极基板至少包括基板，电极层，第一阻挡层，第二阻挡层和导电层。 电极层设置在基板上。 第一阻挡层设置在电极层的上方。 第二阻挡层设置在第一阻挡层之上。 导电层设置在第一阻挡层和第二阻挡层之间。
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公开(公告)号：US5592053A
公开(公告)日：1997-01-07
申请号：US349794
申请日：1994-12-06
Applicant: Bradley A. Fox , Jeffrey T. Glass , David L. Driefus , Luka Lojk
Inventor： Bradley A. Fox , Jeffrey T. Glass , David L. Driefus , Luka Lojk
CPC classification number: H03F3/54 , H01J1/02 , H01J19/32 , H01J21/105 , H01J3/022
Abstract: An electron beam device includes a diamond layer positioned downstream from and in the path of an electron beam. This diamond layer has a conductance that is responsive to the electron beam. Two electrical contacts on the diamond layer provide connections to a power source and a load. When the electron beam is on, the diamond layer becomes conductive allowing electrical power to flow from the power source through the diamond layer to the load. Accordingly, the electron beam device can act as a switch, or the electron beam can be modulated to provide an amplifier. The diamond layer is capable of high temperature operation, resists crystal damage, resists corrosion, and provides a high breakdown voltage. At least one of the electrical contacts on the diamond layer preferably comprises a degeneratively doped diamond surface portion. The degeneratively doped diamond surface portion is relatively transparent to the electron beam, has a coefficient of thermal expansion that is matched with the diamond layer, and resists damage caused by the electron beam.
Abstract translation: 电子束装置包括位于电子束的下游和路径中的金刚石层。 该金刚石层具有响应于电子束的电导。 金刚石层上的两个电触点提供与电源和负载的连接。 当电子束打开时，金刚石层变得导电，允许电力从电源通过金刚石层流到负载。 因此，电子束装置可以用作开关，或者可以调制电子束以提供放大器。 金刚石层能够进行高温操作，抵抗晶体损伤，抵抗腐蚀，并提供高击穿电压。 金刚石层上的至少一个电触点优选地包括退化掺杂的金刚石表面部分。 退化掺杂的金刚石表面部分对于电子束是相对透明的，具有与金刚石层匹配的热膨胀系数，并且抵抗由电子束引起的损伤。
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公开(公告)号：US4158790A
公开(公告)日：1979-06-19
申请号：US804475
申请日：1977-06-07
Applicant: John V. Sullivan
Inventor： John V. Sullivan
Abstract: A high intensity atomic spectral lamp having a first set of electrodes including a primary cathode consisting of or comprising a selected element adapted to produce a primary electric discharge which gives rise to an atomic vapor of said element by cathodic sputtering from the primary cathode; a second set of electrodes adapted to produce a secondary electric discharge which passes through the said atomic vapor, to excite the atoms in the vapor to emit radiation characteristic of said element; a window to allow the passage of said radiation out of the lamp, said window being placed in front of the operative surface of the primary cathode; means to pass a stream of inert gas through the lamp close to and across the operative surface of the primary cathode and between the primary cathode and the window in such manner as to sweep away from the vicinity of the primary cathode surface atomic species formed by said primary discharge.The preferred form of the lamp includes demountable cathode support means to permit ready removal and replacement of the primary cathode.This invention is concerned with an improved form of high intensity atomic spectral lamp.The principal type of atomic spectral lamp at present in use is the hollow cathode discharge lamp, in which the cathode is shaped in the form of a hollow cylinder and is made of a material which consists wholly or partly of the elements of which the atomic spectrum is to be obtained. This type of lamp suffers from the principal disadvantage that the electrical discharge between the anode and cathode serves to generate or produce an atomic vapour by sputtering from the cathode, and also to supply the excitation, which is necessary for the production of atomic spectra, to at least some of the atoms in the vapour. These two functions of the discharge cannot be separately controlled, and a variation in one parameter of the discharge, e.g. current or pressure, will affect both functions. The amount of atomic vapour produced must be limited to relatively small quantities if the widths of the spectral lines are not to be increased by self-absorption and resonance broadening. Thus the discharge current that can be used, and therefore the degree of excitation that can be imparted to the atomic vapour, are similarly limited. Consequently the intensities of the spectra emitted by such discharge lamps are limited if sharp lines are required.Our prior Australian Pat. Nos. 260,726 and 289,307 described forms of high intensity atomic spectral lamp in which the atomic vapour of an element was generated by a first electrical discharge giving rise to cathodic sputtering and this vapour was then excited by a means of a second independent discharge to thereby increase the radiation emitted by the lamp, in comparison with ordinary cathode sputtering lamps, without incurring significant line broadening. A further modification of this type of lamp is described in our Australian Pat. No. 295,985, the lamp described therein producing atomic vapour by thermal means rather than by cathodic sputtering. Such prior art high intensity lamps have found significant applications in the field of atomic adsorption spectroscopy although they still share with ordinary hollow cathode lamps the disadvantage that one lamp is required for each element to be determined.Most prior art lamps, whether of the normal or high intensity type generally conform to one basic configuration in which the lamp envelope is of elongated tubular shape, with a flat optical window at one end, the hollow cathode being situated at or near the other end of the tube and facing the window. In the high intensity type of lamp the second set of electrodes which provide the exciting discharge are usually arranged to be diametrically opposed across the long axis of the lamp and close to the mouth of the hollow cathode. Other arrangements are, of course, possible but the principal criterion of any such lamp is that the window must be fairly remote from the hollow cathode in order to minimise the amount of cathode material which is deposited on the window as a result of cathodic sputtering. Even so, after a long period of operation, windows of most lamps, particularly those used for producing the spectra of fairly volatile elements become coated with a sputtered film of the element and lose their usefulness. In lamps of the sealed off type, which are the most common, another problem is that clean-up of the filler gas inevitably occurs thereby limiting the useful lifetime of the lamp.Another difficulty which is encountered with our earlier high intensity lamps, e.g. of the type described in Australian Pat. Nos. 260,728 and 289,307, is that there is substantial interaction between the primary discharge, which produces the atomic vapour, and the secondary (exciting) discharge. It is found, in fact, that if the secondary discharge current exceeds about 80 to 100 mA the light output of the lamp actually falls off, due to effective lowering of the voltage across the primary discharge electrodes.While the prior art high intensity lamps have been used with some success for atomic fluorescence spectroscopy, they are by no means ideal for this purpose. Because of the configuration of the lamps as described above, they essentially have a small numerical aperture. This coupled with the fact that they cannot be run at their maximum light output reduces the useful intensity of radiation which they provide to the point where it may not be sufficient to enable satisfactory use of atomic fluorescence techniques.The principal objects of the present invention can therefore be stated as the provision of a high intensity atomic spectral lamp having at least one and preferably all of the following features:1. Low or minimal interaction between the primary and secondary discharges.2. Provision for interchangeable cathodes.3. The capability of working at optimum filler gas pressure for maximum light output, without compromising service life.4. High numerical aperture.Barnes Engineering Company of Stamford, Conn., U.S.A., have produced a demountable, hollow cathode, atomic spectral lamp which includes a gas flow-through system but the design of the lamp is essentially conventional, having an elongate tubular body with a window at one end and the hollow cathode at the other.In the Barnes lamp, the flow direction of the gas is from the cathode towards the window, which inevitably will lead to deposition of the sputtered cathode material on to the window.The use of gas flow through systems is also described in our Australian Pat. No. 414,987, and patent application No. 59106/73 which are concerned with a type of apparatus (now known as a "sputtering chamber") in which an atomic vapour is produced by a sputtering discharge from a replaceable cathode comprising a solid sample in a chamber through which a constant flow of gas is passing. This arrangement allows contaminants, introduced by the opening of the chamber to exchange cathodes, to be removed from the chamber and also avoids "clean-up" problems. Particularly in the system described in our patent application No. 59106/73, the cathode has a comparatively large area and this necessitates the use of a rather complicated "arrester" to control both the discharge characteristics and the gas flow which is directed essentially from and perpendicularly away from the face of the cathode. Gas pressure and flow-rate are also critical in this system and must be carefully controlled.It should be noted that in the sputtering chamber the cathode is the sample under test and the object is to ensure the production of an atomic vapour from the sample which is properly representative in composition of the sample.A sputtering chamber is not designed or intended to produce emitted radiation. A high intensity spectral lamp on the other hand is essentially a spectral source, for which it is often desirable that the cathode be as pure as possible, for example in atomic fluorescence work. This therefore implies the use of a cathode of relatively small area.The present invention is concerned with a high intensity lamp of an entirely new configuration which utilizes both the flow-through principle and a demountable cathode system and, which, by virtue of its design, maximises the advantages to be obtained from these features.According to the present invention there is provided a high intensity atomic spectral lamp having a first set of electrodes including a primary cathode consisting of or comprising a selected element adapted to produce a primary electric discharge which gives rise to an atomic vapour of said element by cathodic sputtering from the primary cathode; a second set of electrodes adapted to produce a secondary electric discharge which passes through the said atomic vapour, to excite the atoms in the vapour to emit radiation characteristic of said element; a window to allow the passage of said radiation out of the lamp, said window being placed in front of the operative surface of the primary cathode; means to pass a stream of inert gas through the lamp close to and across the operative surface of the primary cathode and between the primary cathode and the window in such manner as to sweep away from the vicinity of the primary cathode surface atomic species formed by said primary discharge.Preferably the window is substantially parallel to the operative surface of the primary cathode and the gas stream also passes substantially parallel to that surface.It is further preferred that the lamp includes demountable cathode support means to permit ready removal and replacement of the primary cathode.A principal feature of the lamp of the invention is thus the use of a gas flow to sweep atomic vapour sputtered from the primary cathode away from the area between the cathode and the window in a direction substantially parallel to the window. This arrangement permits the window to be relatively close to the front surface of the primary cathode and thus subtend a relatively large angle at the cathode surface. This enables the provision of high numerical aperture with a window of relatively small diameter, while still minimizing deposition of sputtered material on the window.In one preferred embodiment the high intensity lamp of the present invention comprises an elongate, generally tubular body portion with the primary cathode mounted in the wall of the body portion; the secondary cathode and common anode being mounted within the body portion and arranged to direct the second discharge across and through a region in front of the primary cathode; and gas inlet and outlet means arranged to pass a stream of gas through said region in a generally axial direction with respect to the body portion and in the direction of the secondary discharge.More specifically, the preferred lamp of the invention comprises:a generally tubular body portion having gas inlet and outlet means to allow a flow of gas through the body portion in a generally axial direction;a cathode compartment located in the wall of the body portion;primary cathode means located in said compartment and comprising a primary cathode and demountable primary cathode support means adapted to allow the first cathode to be readily removed from and replaced in said compartment;window means attached to the wall of the body portion, said window means comprising a chamber in open communication with an aperture in the wall of the body portion diametrically opposite the cathode compartment and an optical window at the end of the chamber remote from the aperture;a secondary cathode located within the body portion and spaced away from the cathode compartment;a common anode located within the body portion and spaced away from the cathode compartment in the opposite direction to the secondary cathode.The body portion is preferably of reduced diameter in at least part of those portions of the body which lie between the cathode compartment and the secondary cathode and anode respectively. This arrangement helps to increase the current density of the secondary discharge and therefore the degree of excitation of the atomic vapour.Preferably the optical window is of substantially larger diameter than the said aperture or the primary cathode, thereby to provide a high numerical aperture.Preferably also, the primary cathode has a substantially flat front face and the arrangement of the cathode compartment and supporting means is such that in use the flat face of cathode is substantially flush with the inside wall of the body portion adjacent the cathode compartment. The use of the flat-faced cathode permits higher operating voltages for the primary discharge (up to about 550V) as compared with a hollow cathode (about 200V). This further contributes to minimising interaction between the discharges.It is further preferred that the secondary cathode is of the electrically heated (filament) type and/or is coated with a thermionically emissive material. The preferred coating material is lanthanum hexaboride which is stable to repeated exposure to air. To facilitate replacement of the secondary cathode, when necessary, it is preferred that the secondary cathode is supported on supporting means which can be removed from and replaced in the body portion.
Abstract translation: 一种高强度原子光谱灯，具有第一组电极，其包括由适于产生初级放电组成或包含选定元件的一次阴极，该主要电极通过阴极溅射从初级阴极产生所述元件的原子蒸气; 第二组电极，其适于产生通过所述原子蒸气的次级放电，以激发蒸汽中的原子以发射所述元件的辐射特性; 允许所述辐射通过所述灯的窗口，所述窗口被放置在所述主阴极的操作表面的前面; 用于使惰性气体流穿过主灯阴极表面和第一阴极与窗口之间的靠近并跨越初级阴极和窗口的操作表面的惰性气体流，以便从所述主阴极表面原子物质的附近扫除由所述 初次放电。
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94.发明公开公开(公告)号：US20240347306A1
公开(公告)日：2024-10-17
申请号：US18294251
申请日：2022-06-23
Inventor： Hiromitsu CHATANI , Daisuke ISHIKAWA , Jie TANG , Tadakatsu OHKUBO , Shuai TANG , Jun UZUHASHI , Kazuhiro HONO
Abstract: A manufacturing method for an electron source according to the present disclosure includes steps of: (A) cutting out a chip from a block of an electron emission material, (B) fixing a first end portion of the chip to a distal end of a support needle, and (C) sharpening a second end portion of the chip. The step (A) includes forming first and second grooves which constitute first and second surfaces of the chip in the block by irradiating a surface of the block with an ion beam. The first end portion of the chip includes the first surface and the second surface with the surfaces forming an angle α of 10 to 90°. The step (B) includes forming a joint between the distal end of the support needle and the first end portion of the chip.
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公开(公告)号：US11915920B2
公开(公告)日：2024-02-27
申请号：US17768017
申请日：2020-10-20
Applicant: NATIONAL INSTITUTE FOR MATERIALS SCIENCE
Inventor： Jie Tang , Shuai Tang , Ta-Wei Chiu , Tadakatsu Ohkubo , Jun Uzuhashi , Kazuhiro Hono , Luchang Qin
Abstract: The present invention provides a simpler method for sharpening a tip of an emitter. In addition, the present invention provides an emitter including a nanoneedle made of a single crystal material, an emitter including a nanowire made of a single crystal material such as hafnium carbide (HfC), both of which stably emit electrons with high efficiency, and an electron gun and an electronic device using any one of these emitters. A method for manufacturing the emitter according to an embodiment of the present invention comprises processing a single crystal material in a vacuum using a focused ion beam to form an end of the single crystal material, through which electrons are to be emitted, into a tapered shape, wherein the processing is performed in an environment in which a periphery of the single crystal material fixed to a support is opened.
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Patent Agency Ranking
公开(公告)号：US09685295B2
公开(公告)日：2017-06-20
申请号：US14235380
申请日：2012-07-26
Applicant: William P. King , Lane W. Martin , Patrick C. Fletcher
Inventor： William P. King , Lane W. Martin , Patrick C. Fletcher
Abstract: Provided herein are electron emission devices and device components for optical, electronic and optoelectronic devices, including cantilever-based MEMS and NEMS instrumentation. Devices of certain aspects of the invention integrate a dielectric, pyroelectric, piezoelectric or ferroelectric film on the receiving surface of a substrate having an integrated actuator, such as a temperature controller or mechanical actuator, optionally in the form of a cantilever device having an integrated heater-thermometer. Also provided are methods of making and using electron emission devices for a range of applications including sensing and imaging technology.
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公开(公告)号：US09153363B2
公开(公告)日：2015-10-06
申请号：US14173868
申请日：2014-02-06
Applicant: Kabushiki Kaisha Toshiba
Inventor： Eishi Tsutsumi , Tsutomu Nakanishi , Akira Fujimoto , Koji Asakawa
CPC classification number: H01B13/0036 , H01J1/02 , H01J9/02 , H01J17/04 , H01J63/02 , H01J2217/49207
Abstract: The present invention provides a light-transmitting metal electrode including a substrate and a metal electrode layer having plural openings. The metal electrode layer also has such a continuous metal part that any pair of point-positions in the part is continuously connected without breaks. The openings in the metal electrode layer are periodically arranged to form plural microdomains. The plural microdomains are so placed that the in-plane arranging directions thereof are oriented independently of each other. The thickness of the metal electrode layer is in the range of 10 to 200 nm.
Abstract translation: 本发明提供一种透光性金属电极，其具有基板和具有多个开口部的金属电极层。 金属电极层还具有这样的连续的金属部分，即零件中的任何一个点位置连续连接而不断裂。 周期性地布置金属电极层中的开口以形成多个微区域。 多个微区被放置成使得其面内排列方向彼此独立地取向。 金属电极层的厚度在10〜200nm的范围内。
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98.发明申请公开(公告)号：US20150137677A1
公开(公告)日：2015-05-21
申请号：US14414517
申请日：2013-06-27
Applicant: SP TECH CO., LTD.
Inventor： Hee Sik Sohn
CPC classification number: H01J1/88 , A61L2/14 , A61L9/22 , H01J1/02 , H01T19/04 , H01T23/00 , H05H1/2406 , H05H2001/2412 , H05H2001/2437
Abstract: Provided is a dielectric barrier discharge-type electrode structure for generating plasma. The electrode structure, according to the present invention, comprises: an upper conductive body electrode and a lower conductive body electrode; at least one conductive body electrode protrusion portion, which is formed on at least one surface of the upper conductive body electrode and/or the lower conductive body electrode; a dielectric layer which is formed on at least one of the inner surfaces of the upper conductive body electrode and the lower conductive body electrode that face each other, so as to have a substantially uniform thickness; and a specific gap (d) which is formed between the upper and lower conductive body electrodes and the dielectric layer, or between dielectric layers, due to the protruding effect of the conductive body electrode protrusion portion when the upper conductive body electrode and the lower conductive body electrodes come into close contact, wherein the plasma is generated by applying a pulse power or an alternating power to the upper conductive body electrode and the lower conductive body electrode.
Abstract translation: 提供一种用于产生等离子体的电介质阻挡放电型电极结构。 根据本发明的电极结构包括：上导电体电极和下导电体电极; 形成在上导电体电极和/或下导电体电极的至少一个表面上的至少一个导电体电极突出部分; 形成在所述上导电体电极和所述下导电体电极的至少一个内表面上彼此面对的电介质层，以具有基本均匀的厚度; 以及由上导电体电极和下导电体的导电体电极突出部的突出效果而在上下导电体电极与电介质层之间或电介质层之间形成的特定间隙（d） 体电极紧密接触，其中通过向上导电体电极和下导电体电极施加脉冲功率或交流电力来产生等离子体。
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公开(公告)号：US08749178B2
公开(公告)日：2014-06-10
申请号：US13503394
申请日：2010-09-29
Applicant: Christof Metzmacher , Jeroen Jonkers , Rolf Theo Anton Apetz
Inventor： Christof Metzmacher , Jeroen Jonkers , Rolf Theo Anton Apetz
IPC: H01B5/00
Abstract: The present invention relates to an electrode system, in particular of a gas discharge device for generating EUV radiation and/or soft X-rays. The electrode system comprises at least two electrodes (1, 2) formed of an electrode material which contains Mo or W or an alloy of Mo or W as a main component. The electrode material has a fine grained structure with fine grains having a mean size of
Abstract translation: 本发明涉及一种电极系统，特别涉及用于产生EUV辐射和/或软X射线的气体放电装置。 电极系统包括由含有Mo或W的电极材料形成的至少两个电极（1,2）或以Mo或W为主要成分的合金。 电极材料具有细颗粒结构，其具有平均尺寸小于500nm的细晶粒。 利用所提出的电极系统，实现了电极的高热机械和耐热化学性。 因此，电极系统可以在使用液体Sn的已知的EUV光源中使用并且在高温下操作。
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公开(公告)号：US20140151326A1
公开(公告)日：2014-06-05
申请号：US14173868
申请日：2014-02-06
Applicant: Kabushiki Kaisha Toshiba
Inventor： Eishi Tsutsumi , Tsutomu Nakanishi , Akira Fujimoto , Koji Asakawa
IPC: H01B13/00
CPC classification number: H01B13/0036 , H01J1/02 , H01J9/02 , H01J17/04 , H01J63/02 , H01J2217/49207
Abstract: The present invention provides a light-transmitting metal electrode including a substrate and a metal electrode layer having plural openings. The metal electrode layer also has such a continuous metal part that any pair of point-positions in the part is continuously connected without breaks. The openings in the metal electrode layer are periodically arranged to form plural microdomains. The plural microdomains are so placed that the in-plane arranging directions thereof are oriented independently of each other. The thickness of the metal electrode layer is in the range of 10 to 200 nm.
Abstract translation: 本发明提供一种透光性金属电极，其具有基板和具有多个开口部的金属电极层。 金属电极层还具有这样的连续的金属部分，即零件中的任何一个点位置连续连接而不断裂。 周期性地布置金属电极层中的开口以形成多个微区域。 多个微区被放置成使得其面内排列方向彼此独立地取向。 金属电极层的厚度在10〜200nm的范围内。
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