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    Floating conveying system
    101.
    发明专利
    Floating conveying system 审中-公开
    浮动输送系统

    公开(公告)号：JP2008290815A

    公开(公告)日：2008-12-04

    申请号：JP2007135979

    申请日：2007-05-22

    Applicant: Watanabe Shoko:Kk ,  株式会社渡辺商行

    Inventor： UEHARA AKIRA ,  TSUDA MASAYUKI ,  UMEDA MASARU

    IPC: B65G51/03

    CPC classification number: B65G51/03 ,  B65G2201/022

    Abstract: PROBLEM TO BE SOLVED: To provide a floating conveying system capable of ensuring a long conveying path of a workpiece, and easily designing the conveying path and easily ensuring an arrangement space of a workpiece processing stage.
    SOLUTION: A plurality of workpiece floating conveying units 200 having a plurality of upper and lower floating conveying stages 202, 203 for float-conveying a plate workpiece W by jetting compressed gas in the predetermined direction are installed adjacent to each other to form a predetermined conveying path. Workpiece processing stages 300, 400, 500, and a workpiece elevating/lowering stage 600 for relaying the vertical conveyance of the workpiece W are provided adjacent to the plurality of workpiece floating conveying units 200.
    COPYRIGHT: (C)2009,JPO&INPIT

    Abstract translation: 要解决的问题：提供一种能够确保工件的长输送路径的浮动输送系统，并且容易地设计输送路径并且容易地确保工件处理台的布置空间。 解决方案：具有多个上下浮动输送台202,203的多个工件浮动输送单元200，用于通过沿预定方向喷射压缩气体来浮动输送板工件W，以彼此相邻地安装 预定的输送路径。 工件加工台300,400,500以及用于中继工件W的垂直输送的工件升降台600设置成与多个工件浮动输送单元200相邻。版权所有（C）2009，JPO＆INPIT

    Vaporizer, and various apparatus and vaporizing method using the same
    102.
    发明专利
    Vaporizer, and various apparatus and vaporizing method using the same 审中-公开
    蒸发器，以及各种装置和使用其的蒸发方法

    公开(公告)号：JP2008205506A

    公开(公告)日：2008-09-04

    申请号：JP2008125312

    申请日：2008-05-12

    Applicant: Watanabe Shoko:Kk ,  株式会社渡辺商行

    Inventor： YAMOTO HISAYOSHI ,  FUKAGAWA MITSURU ,  TSUDA MASAYUKI

    IPC: H01L21/316 ,  C23C16/448 ,  H01L21/31

    Abstract: PROBLEM TO BE SOLVED: To provide a vaporizer which can be used for a long term without producing cloggings or the like and can stably supply raw materials to a reaction portion.
    SOLUTION: The vaporizer includes: a dispersion portion 8 including a gas passage 2 formed within a dispersion portion main body 1, a gas introduction opening 4 introducing a pressurized carrier gas 3 to the gas passage 2, a means 6 for supplying a raw material solution 5 to the carrier gas passing the gas passage 2, a gas outlet 7 for supplying the carrier gas containing the dispersed raw material solution 5 to a vaporization portion 22, and a means 18 for cooling the carrier gas flowing within the gas passage 2; and a vaporization portion 22 including a vaporization tube 20 connected to a reaction portion of the apparatus and the gas outlet 7 of the dispersion portion 8, and a heater 21 for heating the vaporization tube 20, and heating and vaporizing the carrier gas in which the raw material solution is dispersed. A pressure of the reaction portion is set lower than that of the vaporizing tube.
    COPYRIGHT: (C)2008,JPO&INPIT

    Abstract translation: 要解决的问题：提供长期使用的蒸发器，而不会产生堵塞等，并且可以稳定地将原料供应到反应部分。 蒸发器包括：分散部分8，其包括形成在分散部分主体1内的气体通道2，气体引入开口4，其将加压载气3引入气体通道2;装置6， 原料溶液5通过气体通道2的载气，用于将含有分散原料溶液5的载气供应到汽化部分22的气体出口7和用于冷却在气体通道内流动的载气的装置18 2; 以及蒸发部分22，其包括连接到装置的反应部分和分散部分8的气体出口7的蒸发管20和用于加热汽化管20的加热器21，以及加热和汽化载气， 原料溶液分散。 将反应部的压力设定为低于蒸发管的压力。 版权所有（C）2008，JPO＆INPIT

    Evaporator and evaporation method
    103.
    发明专利
    Evaporator and evaporation method 有权
    蒸发器和蒸发方法

    公开(公告)号：JP2008001994A

    公开(公告)日：2008-01-10

    申请号：JP2007211175

    申请日：2007-08-13

    Applicant: Masayuki Tsuda ,  Watanabe Shoko:Kk ,  株式会社渡辺商行 ,  昌之 都田

    Inventor： TSUDA MASAYUKI ,  KUSUHARA MASAKI ,  UMEDA MASARU ,  FUKAGAWA MITSURU

    IPC: C23C16/448 ,  H01L21/31

    Abstract: PROBLEM TO BE SOLVED: To provide an evaporator which can be used for a long time without suffering from clogging and can stably feed a raw material into a reaction section.
    SOLUTION: The evaporator is equipped with a dispersion section 8 having a gas passage 2 formed inside the main body 1 of the dispersion section 8, a gas inlet 4 which introduces a pressurized carrier gas 3 into the gas passage 2, a means 6 for feeding a raw material solution 5 into the carrier gas passing through the gas passage 2, a gas outlet 7 for sending the carrier gas in which the dispersed raw material solution 5 is dispersed to an evaporation section 22, and a means 18 for cooling the inside of the gas passage 2; and radiation-preventing section 102 having an evaporation tube 20 connected between the reaction section of the apparatus and the gas outlet 7 of the dispersion section 8, a heater 21 that heats the evaporation tube 20 and the evaporation section 22 for heating and evaporating the carrier gas in which the raw material solution is dispersed, and pores 101 formed on the outside of the gas outlet 7.
    COPYRIGHT: (C)2008,JPO&INPIT

    Abstract translation: 要解决的问题：提供可长期使用而不会堵塞的蒸发器，并且可以将原料稳定地供给到反应部分中。 解决方案：蒸发器配备有分散部分8，其具有形成在分散部分8的主体1内的气体通道2，将加压载气3引入气体通道2的气体入口4， 6用于将原料溶液5供给到通过气体通道2的载气中;气体出口7，用于将分散的原料溶液5分散在其中的载气送到蒸发部分22;以及冷却装置18 气体通道2的内部; 和具有连接在设备的反应部分和分散部分8的气体出口7之间的蒸发管20的辐射防止部分102，加热器21，其加热蒸发管20和蒸发部分22，用于加热和蒸发载体 原料溶液分散的气体和形成在气体出口7的外部的孔101.版权所有（C）2008，JPO＆INPIT

    Substrate surface processing apparatus
    106.
    发明专利
    Substrate surface processing apparatus 审中-公开
    基板表面加工设备

    公开(公告)号：JP2006179770A

    公开(公告)日：2006-07-06

    申请号：JP2004373099

    申请日：2004-12-24

    Applicant: Watanabe Shoko:Kk ,  株式会社渡辺商行

    Inventor： UMEDA MASARU

    IPC: H01L21/205 ,  B08B3/10 ,  C23C16/44 ,  H01L21/304 ,  H01L21/31

    CPC classification number: C23C16/4557 ,  C23C16/45565 ,  H01L21/67109

    Abstract: PROBLEM TO BE SOLVED: To provide a substrate surface processing apparatus which can achieve a high temperature carrier gas and can realize higher homogeneity processing.
    SOLUTION: An upper flow ring is connected to a heating medium entrance for supplying a predetermined heating medium, a lower flow ring is connected to a heating medium outlet for discharging the heating medium, a plurality of heat transmission passages are connected between the upper and lower flow rings so that the directions of the heating medium of the adjacent passages flowing from the upper flow ring to the lower flow ring are opposed to each other, and a gas is used as the heating medium.
    COPYRIGHT: (C)2006,JPO&NCIPI

    Abstract translation: 要解决的问题：提供一种能够实现高温载气并可实现更高均匀性处理的基板表面处理装置。 解决方案：上流通环连接到用于供应预定加热介质的加热介质入口，下流动环连接到用于排出加热介质的加热介质出口，多个传热通道连接在 上流动环和下流动环，使得从上流动环到下流动环流动的相邻通道的加热介质的方向彼此相对，并且使用气体作为加热介质。 版权所有（C）2006，JPO＆NCIPI

    Organometal chemical vapor deposition apparatus
    107.
    发明专利
    Organometal chemical vapor deposition apparatus 审中-公开
    有机化学蒸气沉积装置

    公开(公告)号：JP2005133157A

    公开(公告)日：2005-05-26

    申请号：JP2003370746

    申请日：2003-10-30

    Applicant: Watanabe Shoko:Kk ,  株式会社渡辺商行

    Inventor： KUSUHARA MASAKI

    IPC: C23C16/44 ,  H01L21/31

    CPC classification number: C23C16/44

    Abstract: PROBLEM TO BE SOLVED: To provide an organometal chemical vapor deposition apparatus for forming a film having a desired composition.
    SOLUTION: In the organometal chemical vapor deposition apparatus 3 for depositing a film on a substrate 2 by evaporating raw materials 1a and 1b of an organometallic complex, all or one part of the portion contacting with the raw materials 1a and 1b of the organometallic complex or the vaporized raw materials of the organometallic complex are formed of a insulating material 4.
    COPYRIGHT: (C)2005,JPO&NCIPI

    Abstract translation: 待解决的问题：提供一种用于形成具有所需组成的膜的有机金属化学气相沉积设备。 解决方案：在通过蒸发有机金属配合物的原料1a和1b将基板2上的膜沉积的有机金属化学气相沉积装置3中，与原料1a和1b的全部或一部分接触的部分 有机金属络合物或有机金属络合物的汽化原料由绝缘材料4形成。版权所有（C）2005，JPO＆NCIPI

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