公开(公告)号：JP2007072173A

公开(公告)日：2007-03-22

申请号：JP2005259162

申请日：2005-09-07

Applicant: Advanced Mask Inspection Technology Kk ,  アドバンスド・マスク・インスペクション・テクノロジー株式会社

Inventor： HARABE NOBUYUKI

IPC: G01N21/956 ,  G03F1/84

CPC classification number: G06T7/001 ,  G06T2207/30148

Abstract: PROBLEM TO BE SOLVED: To appropriately inspect a pattern by selecting pattern comparison according to the characteristics of the pattern as an inspection object. SOLUTION: The pattern inspection apparatus is equipped with: an optical image acquiring unit 10 acquiring an optical image 100 of the inspection object; a plurality of kinds of characteristics comparing units 31 comprising the same patterns 100 in different positions on the inspection object based on characteristics data 202 representing characteristics of the pattern of the inspection object; and a selecting unit 4 selecting a kind of characteristics comparing unit 31 from the characteristics data of the pattern of the inspection object in comparing the same patterns of the optical image 100. COPYRIGHT: (C)2007,JPO&INPIT

Abstract translation: 要解决的问题：通过根据作为检查对象的图案的特性选择图案比较来适当地检查图案。 解决方案：图案检查装置配备有：光学图像获取单元10，其获取检查对象的光学图像100; 基于表示检查对象的图案的特性的特征数据202，在检查对象上具有不同位置的相同图案100的多种特征比较单元31; 以及选择单元4，在比较光学图像100的相同图案时，根据检查对象的图案的特性数据，选择特性比较单元31的种类。（C）2007，JPO＆INPIT

公开(公告)号：JP2007071630A

公开(公告)日：2007-03-22

申请号：JP2005257606

申请日：2005-09-06

Applicant: Advanced Mask Inspection Technology Kk ,  アドバンスド・マスク・インスペクション・テクノロジー株式会社

Inventor： YAMASHITA KYOJI

IPC: G01N21/956 ,  G03F1/84 ,  H01L21/027

CPC classification number: G06T7/001 ,  G01N21/95607 ,  G03F1/84 ,  G06K9/6203 ,  G06T7/32 ,  G06T2207/30148

Abstract: PROBLEM TO BE SOLVED: To provide a method and device for highly accurately aligning a reference image with an optical image.
SOLUTION: This specimen inspection device 100 is characterized by being equipped with: a sub-pixel basis SSD calculation circuit 320 for calculating the amount of displacement from a provisional alignment position of an optical image of a photomask 101 with a reference image to a position where the sum of squares of residuals is minimized; a least-squares method displacement calculation circuit 322 for calculating the amount of displacement from the provisional alignment position owing to the least-squares method; a residual square sum calculation circuit 324 for calculating the sum of squares of residuals at a position to which displacement is made by the amount of displacement calculated by the calculation circuit 322; a determination circuit 340 for determining which is smaller of the minimum sum of squares of residuals obtained by the calculation circuit 320 and the sum of squares of residuals obtained by the calculation circuit 324; and a position correction circuit 350 for correcting an alignment position to a position where the smaller sum of squares of residuals is obtained.
COPYRIGHT: (C)2007,JPO&INPIT

Abstract translation: 要解决的问题：提供一种用于使参考图像与光学图像高度准确对准的方法和装置。 解决方案：该样本检查装置100的特征在于，具备：子像素基SSD计算电路320，用于从具有参照图像的光掩模101的光学图像的临时对准位置算出位移量， 残差平方和最小化的位置; 最小二乘法位移计算电路322，用于根据最小二乘法计算临时对准位置的位移量; 剩余平方和计算电路324，用于计算通过计算电路322计算出的位移量所在的位置处的残差的平方和; 确定电路340，用于确定由计算电路320获得的残差的最小平方和小于计算电路324获得的残差的平方和; 以及用于将对准位置校正到获得残差平方和的和的位置的位置校正电路350。 版权所有（C）2007，JPO＆INPIT

公开(公告)号：JP2006284617A

公开(公告)日：2006-10-19

申请号：JP2005100403

申请日：2005-03-31

Applicant: Advanced Mask Inspection Technology Kk ,  アドバンスド・マスク・インスペクション・テクノロジー株式会社

Inventor： NAKATANI YUICHI

IPC: G01B11/30 ,  G01N21/956 ,  G03F1/84 ,  G06T1/00

Abstract: PROBLEM TO BE SOLVED: To provide a defect inspection method with high sensitivity while suppressing influences by fluctuation in an optical system. SOLUTION: The defect detection method in a pattern such as an exposure mask includes: a variation similarity calculating step of calculating similarity in variation between an optical image in other pixels than inspection target pixels and a reference image based on the variation between an optical image in the inspection target pixels and the reference image; a priority determining step of calculating the priority as comparing members based on the variation similarity; and a mutual comparing step of mutually comparing patterns in an identical design present in the optical image to detect a defect. COPYRIGHT: (C)2007,JPO&INPIT

Abstract translation: 要解决的问题：提供具有高灵敏度的缺陷检查方法，同时抑制光学系统中的波动的影响。 解决方案：诸如曝光掩模的图案中的缺陷检测方法包括：变化相似度计算步骤，用于计算与检查对象像素相比的其他像素中的光学图像之间的变化的相似度，以及基于图像之间的变化的参考图像 检查目标像素和参考图像中的光学图像; 优先级确定步骤，基于所述变化相似性，将所述优先级计算为比较成员; 以及相互比较步骤，相互比较在光学图像中存在的相同设计中的图案以检测缺陷。 版权所有（C）2007，JPO＆INPIT

公开(公告)号：JP2006276454A

公开(公告)日：2006-10-12

申请号：JP2005095464

申请日：2005-03-29

Applicant: Advanced Mask Inspection Technology Kk ,  アドバンスド・マスク・インスペクション・テクノロジー株式会社

Inventor： SUGIHARA SHINJI ,  OOAKI JIYUNJI

IPC: G01B11/30 ,  G01N21/956 ,  G03F1/72 ,  G03F1/84 ,  G06T1/00 ,  G06T7/60 ,  H01L21/027

CPC classification number: G03F1/84 ,  G06T7/001 ,  G06T7/70 ,  G06T2207/30148

Abstract: PROBLEM TO BE SOLVED: To provide a method of making high-precision position corrections of imaging data of a mask pattern in an easy method, and to provide a high-reliability pattern defect inspecting method. SOLUTION: The image correcting method used for a pattern inspecting method of irradiating a sample where a pattern is formed with light and comparing and inspecting a pattern image to be inspected obtained by picking up its optical image and an inspection reference pattern image corresponding to the pattern image to be inspected includes a simultaneous equations generating step of generating simultaneous equations wherein input/output relation using a two-dimensional linear prediction model is described for the pattern image to be inspected and inspection reference pattern image, a simultaneous equation solving step of estimating the simultaneous equations wherein the input/output relation is described by a least-squares method to find parameters of the simultaneous equations, a step of finding the position of the center of gravity of the parameters, and a step of generating a corrected image by performing linear combination interpolation processing using the value of the position of the center of gravity. COPYRIGHT: (C)2007,JPO&INPIT

Abstract translation: 要解决的问题：提供一种以简单的方法对掩模图案的成像数据进行高精度位置校正的方法，并且提供高可靠性图案缺陷检查方法。 ＆lt;解决方案＆gt;解决方案：用于对形成图案的样品进行照射的图案检查方法的图像校正方法，并且比较和检查通过拾取其光学图像获得的待检查的图案图像和对应的检查参考图案图像 对于要检查的图案图像包括产生联立方程的联立方程式生成步骤，其中描述了使用二维线性预测模型的输入/输出关系用于待检查的图案图像和检查参考图案图像，联立方程求解步骤 估计联立方程式，其中通过最小二乘法描述输入/输出关系以找到联立方程的参数，找到参数的重心位置的步骤和产生校正图像的步骤 通过使用位置o的值进行线性组合插值处理 f重心。 版权所有（C）2007，JPO＆INPIT

公开(公告)号：JP2006266860A

公开(公告)日：2006-10-05

申请号：JP2005085214

申请日：2005-03-24

Applicant: Advanced Mask Inspection Technology Kk ,  アドバンスド・マスク・インスペクション・テクノロジー株式会社

Inventor： OOAKI JIYUNJI ,  SUGIHARA SHINJI ,  NAKATANI YUICHI

IPC: G01N21/956 ,  G01B11/30 ,  G03F1/84 ,  G06T1/00 ,  H01L21/66

CPC classification number: G06K9/748 ,  G06K9/03

Abstract: PROBLEM TO BE SOLVED: To provide an image correcting method with a reduction in setting parameter which represents the unification of the shift (alignment) in a sub-pixel unit and image correction. SOLUTION: In the image correcting method, the relation of an inspection reference pattern image with a pattern image to be inspected is identified to construct a numerical formula model absorbing (fitting) the pixel shift or expansion and contraction, undulation noise and sensing noise of an image and an estimate model image is formed by the simulation of the numerical formula model. COPYRIGHT: (C)2007,JPO&INPIT

Abstract translation: 要解决的问题：提供一种图像校正方法，其具有缩小表示子像素单元中的移位（对齐）的统一的设置参数和图像校正。 解决方案：在图像校正方法中，识别检查参考图案图像与待检查图案图像的关系，以构建吸收（拟合）像素移位或扩张和收缩，波动噪声和感测的数值公式模型 通过模拟数学公式模型形成图像的噪声和估计模型图像。 版权所有（C）2007，JPO＆INPIT