Sensor device with circuit for detecting single or multiple events and generating corresponding interrupt signal
    101.
    发明专利
    Sensor device with circuit for detecting single or multiple events and generating corresponding interrupt signal 有权
    具有用于检测单个或多个事件和产生相应中断信号的电路的传感器设备

    公开(公告)号:JP2008217760A

    公开(公告)日:2008-09-18

    申请号:JP2007312878

    申请日:2007-12-03

    Abstract: PROBLEM TO BE SOLVED: To avoid a fall of performance and degradation of agility in event identification.
    SOLUTION: This sensor device is provided with a sensing mechanism for generating a first detection signal A
    x , and a dedicated integrated circuit 6 connected to the sensing mechanism to detect a first event related to an electronic device according to the first detection signal A
    x and generating a first interrupt signal when detecting the first event. The dedicated integrated circuit 6 detects the first event as a function of a temporal evolution of the first detection signal A
    x , and in particular as a function of values assumed by the first detection signal A
    x within one or more successive time windows T
    S1 -T
    S3 and of a relationship between these values.
    COPYRIGHT: (C)2008,JPO&INPIT

    Abstract translation: 要解决的问题:避免事件识别中的性能下降和敏捷性下降。

    解决方案:该传感器装置设置有用于产生第一检测信号A x 的感测机构和连接到感测机构的专用集成电路6,以检测与电子 设备根据第一检测信号A x ,并且当检测到第一事件时产生第一中断信号。 专用集成电路6根据第一检测信号A x 的时间演变来检测第一事件,特别是根据第一检测信号A x 在一个或多个连续时间窗口T S1 S3 中的这些值之间的关系。 版权所有(C)2008,JPO&INPIT

    Mos device resistant to ionizing radiation
    102.
    发明专利
    Mos device resistant to ionizing radiation 审中-公开
    MOS器件抵抗放电辐射

    公开(公告)号:JP2008182191A

    公开(公告)日:2008-08-07

    申请号:JP2007285476

    申请日:2007-11-01

    CPC classification number: H01L29/42368 H01L29/0878 H01L29/66712 H01L29/7802

    Abstract: PROBLEM TO BE SOLVED: To provide a MOS device resistant to ionizing radiation.
    SOLUTION: A MOS device resistant to ionizing-radiation has a surface semiconductor layer 3 having a first type of conductivity, a gate structure 8 formed above the surface semiconductor layer 3 and constituted by a dielectric gate region 9 and a gate electrode region 11 located on the dielectric gate region 9, and a plurality of body regions 6 which is formed laterally and partially under the gate structure 8 within the surface semiconductor layer 3, and each of which has a second type of conductivity. In particular, the dielectric gate region 9 has a central region 9b having a first thickness, and a plurality of side regions 9a having a second thickness thinner than the first thickness. The central region 9b is located on an intercell region 10 of the surface semiconductor layer 3 arranged between the plurality of body regions 6.
    COPYRIGHT: (C)2008,JPO&INPIT

    Abstract translation: 要解决的问题:提供耐电离辐射的MOS器件。 解决方案:耐电离辐射的MOS器件具有具有第一类导电性的表面半导体层3,形成在表面半导体层3上方并由电介质栅极区9和栅电极区域构成的栅极结构8 11,以及形成在表面半导体层3内的栅极结构8的横向且部分地形成的多个体区6,并且各自具有第二导电性。 特别地,电介质栅极区9具有具有第一厚度的中心区域9b和具有比第一厚度薄的第二厚度的多个侧面区域9a。 中心区域9b位于布置在多个主体区域6之间的表面半导体层3的单元间区域10.版权所有(C)2008,JPO&INPIT

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