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公开(公告)号:DK362488D0
公开(公告)日:1988-06-30
申请号:DK362488
申请日:1988-06-30
Applicant: BASF AG
Inventor: SCHWALM REINHOLD , BOETTCHER ANDREAS , BINDER HORST
Abstract: A radiation-sensitive mixture consists of a polymeric binder which is insoluble in water but soluble in aqueous alkaline solutions, and of an organic compound whose solubility in an aqueous alkaline developer is increased by the action of an acid and which contains both one or more acid-cleavable groups and a group which forms a strong acid under the action of radiation. The radiation-sensitive mixture is suitable for use in photosensitive coating materials for the production of relief patterns and relief images.
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公开(公告)号:DE3642184A1
公开(公告)日:1988-06-23
申请号:DE3642184
申请日:1986-12-10
Applicant: BASF AG
Inventor: SCHWALM REINHOLD , BINDER HORST
IPC: C08F12/00 , C08F20/34 , C08F22/32 , C08F212/14 , C08F220/36 , C08F222/00 , C08F222/22 , C08F222/32 , G03F7/00 , G03F7/004 , G03F7/039 , C08F220/34 , C08F224/00 , C08F226/06 , G03C1/72 , G03F7/10
Abstract: Copolymers containing from 5 to 50 mol % of monomers having o-nitrocarbinol ester groups, from 95 to 50 mol % of O-substituted p-hydroxystyrene and from 0 to 30 mol % of other copolymerizable monomers are useful for producing positive-working photoresists and light-sensitive coating materials.
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