PRODUCTION OF POLYURETHANE FOAM
    2.
    发明专利

    公开(公告)号:JP2002069148A

    公开(公告)日:2002-03-08

    申请号:JP2001218450

    申请日:2001-07-18

    Applicant: BASF AG

    Abstract: PROBLEM TO BE SOLVED: To provide a light stable polyurethane foam which can be produced by using a common use starting material in the polyurethane chemistry, excellent in mechanical properties, especially in elongation and high tensile strength. SOLUTION: The polyurethane foam is produced by reacting a polyisocyanate a) and the compound b) having at least two hydrogen atoms which reacts with an isocyanato group, and a polyisocyanate a) is composed of an aliphatic di- or polyisocyanate, and the compound b) having at least two hydrogen atoms which reacts with an isocyanate group is produced by the method having at least one kind of acrylate polyol.

    7.
    发明专利
    未知

    公开(公告)号:AT278719T

    公开(公告)日:2004-10-15

    申请号:AT01969427

    申请日:2001-07-18

    Applicant: BASF AG

    Abstract: The present invention relates to partially branched polymers having a number-average molecular weight Mn in the range from 500 to 20 000 daltons and synthesized from ethylenically unsaturated monomers including:i) from 80 to 99.9% by weight of monoethylenically unsaturated monomers A, andii) from 0.1 to 20% by weight of monomers B containing at least two nonconjugated ethylenically unsaturated double bonds,the weight fraction of the monomers A and B being based on the total amount of the ethylenically unsaturated monomers that constitute the polymer.

    9.
    发明专利
    未知

    公开(公告)号:DE59209708D1

    公开(公告)日:1999-07-15

    申请号:DE59209708

    申请日:1992-10-24

    Applicant: BASF AG

    Abstract: The invention relates to a positive UV-radiation sensitive composition comprising (a1) an organic binder containing acid-labile ether, ester or carbonate groups, or (a2) a water-insoluble polymeric binder soluble in aqueous alkaline solutions and (a2.1) an organic compound whose solubility in an aqueous alkaline developer is increased by the influence of acid, or (a2.2) an organic compound whose solubility in an aqueous alkaline developer is increased by the influence of acid and which contains at least one group cleavable by acid and additionally a group which forms an acid under the influence of radiation, or a mixture of the organic compounds (a2.1) and (a2.2) and b) an arylsulphonic acid ester. This radiation-sensitive composition is suitable for forming relief patterns.

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