PLANTS HAVING INCREASED TOLERANCE TO HERBICIDES

    公开(公告)号:ZA201403939B

    公开(公告)日:2015-12-23

    申请号:ZA201403939

    申请日:2014-05-29

    Applicant: BASF SE

    Abstract: The present invention refers to a method for controlling undesired vegetation at a plant cultivation site, the method comprising the steps of providing, at said site, a plant that comprises at least one nucleic acid comprising a nucleotide sequence encoding a wild-type hydroxyphenyl pyruvate dioxygenase or a mutated hydroxyphenyl pyruvate dioxygenase (mut-HPPD) which is resistant or tolerant to a coumarone-derivative herbicide and/or a nucleotide sequence encoding a wild-type homogentisate solanesyl transferase or a mutated homogentisate solanesyl transferase (mut-HST) which is resistant or tolerant to a coumarone-derivative herbicide, and applying to said site an effective amount of said herbicide. The invention further refers to plants comprising mut-HPPD, and methods of obtaining such plants.

    SUBSTITUTED 1 2 5 OXADIAZOLE COMPOUNDS AND THEIR USE AS HERBICIDES

    公开(公告)号:IN3268CHN2014A

    公开(公告)日:2015-07-03

    申请号:IN3268CHN2014

    申请日:2014-04-30

    Applicant: BASF SE

    Abstract: 1637371 4162626262614141414anbcdefgh1 11828281818141114141414114142626161414114141k1b1123 222216282823102310182182182141421414228228218228228214142142k2b22c22d22e2f22g2h2a2a4 14145 14144 5 The present invention relates to substituted 1 2 5 oxadiazole compounds of the formula I and the N oxidesand salts thereof and to compositions comprising the same. The invention also relates to the use of the 1 2 5 oxadiazole compounds or of the compositions comprising such compounds for controlling unwanted vegetation. Furthermore the invention relates to methods of applying such compounds. In formula I the variables have the following meanigns R is e.g. hydrogen cyano nitro halogen C C alkyl C C cycloalkyl C C cycloalkyl CC alkyl C C haloalkyl C C alkenyl C C haloalkenyl C C alkynyl C C haloalkynyl C C alkoxy C C alkyl C C haloalkoxy C C alkyl O R Z S(O) R Z C(=O) R Z C(=O) OR Z C(=O) NRR Z NRR Z phenyl and Z heterocyclyl etc; Rise.g. Z cyano halogen nitro C C alkyl C C alkenyl C C alkynyl C C haloalkyl C C alkoxy C C alkoxy C C4 alkyl Z C C alkoxy C C alkoxy C C alkylthio C C alkyl Z C C alkylthio C C alkylthio C C alkenyloxy C C alkynyloxy C C haloalkoxy C C haloalkoxy C C alkyl Z C C haloalkoxy C C alkoxy Z S(O) R Z phenoxy and Z heterocyclyloxy;R Rare identical or different and e.g. hydrogen halogen Z OH Z NO Z cyano C C alkyl C C alkenyl C C alkynyl Z C C cycloalkyl Z C C cycloalkoxy C C haloalkyl Z C C alkoxy Z C C haloalkoxy Z C C alkoxy C C alkoxy Z C C alkylthio C C alkylthio Z C C alkenyloxy Z C C alkynyloxy Z C C haloalkoxy Z C C haloalkenyloxy Z C C haloalkynyloxy Z C C haloalkoxy C C alkoxy Z (tri C C alkyl)silyl Z S(O) R Z C(=O) R Z C(=O) OR Z C(=O) NRR Z NRR Z phenyl and Z heterocyclyl; Ris selected from the group consisting of hydrogen halogen cyano nitro C C alkyl and C C haloalkyl; Ris selected from the group consisting of hydrogen halogen C C alkyl and C C haloalkyl; provided that at least one of the radicals Rand Ris different from hydrogen; n is 0 1 or 2; k is 0 1 or 2.

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