公开(公告)号：US06672107B2

公开(公告)日：2004-01-06

申请号：US09913632

申请日：2001-08-16

Applicant: Waltraud Werdecker ,  Johann Leist

Inventor： Waltraud Werdecker ,  Johann Leist

IPC: C03B1906

CPC classification number: C03C3/06 ,  C03B19/09 ,  C03B19/095 ,  C03B2201/04 ,  C03C2201/02 ,  C03C2201/23 ,  C03C2201/80 ,  C30B15/10 ,  C30B35/002 ,  Y10S65/04 ,  Y10T428/131

Abstract: In order to provide a quartz glass crucible distinguished by high purity, high opacity and/or low transmissibility in the IR spectrum, it is proposed on the basis of a known quartz glass crucible of opaque quartz glass with a crucible body symmetrical in relation to a rotational axis, an outer zone (3) of opaque quartz glass transitioning radially toward the inside into an inner zone (2) of transparent quartz glass and with a density of at least 2.15 g/cm3, that according to the invention, the crucible body (1) be made of a synthetic SiO2 granulate with a specific BET surface ranging from 0.5 m2/g to 40 m2/g, a tamped volume of at least 0.8 g/cm3 and produced from at least partially porous agglomerates of SiO2 primary particles. A process for producing a quartz glass crucible of this kind is distinguished according to the invention in that for the production of the crucible a SiO2 granulate is used which was formed from at least partially porous agglomerates of synthetically manufactured SiO2 primary particles and that it has a specific BET surface ranging from 0.5 m2/g to 40 m2/g and a tamped volume of at least 0.8 g/cm3, the heating effected in such a way that a vitrification front advances from the inside outward while an inner zone (4) of transparent quartz glass is being formed.

Abstract translation: 为了提供在IR光谱中具有高纯度，高不透明性和/或低透射率的石英玻璃坩埚，提出了在已知的不透明石英玻璃的石英玻璃坩埚的基础上，坩埚体相对于 旋转轴线，不透明石英玻璃的外部区域（3），径向朝向内部转变成透明石英玻璃的内部区域（2），密度为至少2.15g / cm 3，根据本发明， 坩埚体（1）由合成SiO 2颗粒制成，比表面积为0.5m 2 / g至40m 2 / g，捣实体积至少为0.8g / cm 3， 由SiO 2一次颗粒的至少部分多孔的附聚物制成。 根据本发明，制造这种石英玻璃坩埚的方法的不同之处在于，对于坩埚的制造，使用由至少部分多孔的合成SiO 2原生颗粒的聚集体形成的SiO 2颗粒，并且其具有 比表面积为0.5m 2 / g至40m 2 / g，捣实体积为至少0.8g / cm 3，加热使玻璃化前沿从内部进入 外部形成透明石英玻璃的内部区域（4）。

公开(公告)号：US06473226B1

公开(公告)日：2002-10-29

申请号：US09597093

申请日：2000-06-20

Applicant: Hiroki Jinbo ,  Seishi Fujiwara

Inventor： Hiroki Jinbo ,  Seishi Fujiwara

IPC: G02B1314

CPC classification number: G03F7/70058 ,  C03B19/1407 ,  C03B19/1423 ,  C03B19/1484 ,  C03B2201/12 ,  C03B2201/23 ,  C03B2207/30 ,  C03B2207/32 ,  C03B2207/36 ,  C03B2207/66 ,  C03C3/06 ,  C03C2201/02 ,  C03C2201/23 ,  C03C2203/40 ,  G03F7/70216 ,  G03F7/70958

Abstract: A silica glass member is provided for use in an optical system using light of a wavelength equal to or less than about 400 nm as a light source. The silica glass member has striae in a direction different from an optical axis of the optical system. The strength of the striae is equal to or less than about 2×10−6 in terms of refractive index differential.

Abstract translation: 提供一种二氧化硅玻璃构件，用于使用波长等于或小于约400nm的光作为光源的光学系统。 石英玻璃构件在与光学系统的光轴不同的方向上具有条纹。 条纹的强度以折射率差别计等于或小于约2×10-6。

公开(公告)号：US06295841B1

公开(公告)日：2001-10-02

申请号：US09254113

申请日：1999-02-25

Applicant: Douglas C. Allan ,  William R. Powell ,  Nicholas F. Borrelli ,  Thomas P. Seward, III ,  Charlene M. Smith

Inventor： Douglas C. Allan ,  William R. Powell ,  Nicholas F. Borrelli ,  Thomas P. Seward, III ,  Charlene M. Smith

IPC: C03B1900

CPC classification number: G03F7/70958 ,  C03B19/06 ,  C03B19/066 ,  C03B19/1065 ,  C03B19/1453 ,  C03B20/00 ,  C03B2207/32 ,  C03C1/006 ,  C03C3/06 ,  C03C23/0025 ,  C03C2201/02 ,  C03C2203/50 ,  G03F7/70058 ,  G03F7/70216 ,  Y10S65/13

Abstract: A fused silica glass which exhibits low compaction when exposed to high intensity excimer radiation, also exhibits low optical path distortion after exposure to a high intensity radiation dose. Also disclosed is a method for improving the select ratio of fused silica glass for photolithography, by predicting the optical path distortion of the glass under use by determining the intrinsic densification of the glass at a given number of pulses and fluence per pulse. Mathematical modeling methods are also disclosed for use in producing a fused silica stepper lens having low compaction under high intensity excimer radiation; and for determining optical path distortion caused by high energy radiation in fused silica glass.

Abstract translation: 当暴露于高强度准分子辐射时表现出低压实性的熔融石英玻璃在暴露于高强度辐射剂量之后也表现出低光程失真。 还公开了一种通过在给定数量的脉冲和每脉冲能量密度下确定玻璃的固有致密化，通过预测使用中的玻璃的光路畸变来提高用于光刻的熔融石英玻璃的选择比的方法。 还公开了数学建模方法用于生产在高强度准分子辐射下具有低压实性的熔融二氧化硅步进透镜; 并且用于确定由熔融石英玻璃中的高能量辐射引起的光路失真。

公开(公告)号：US6127295A

公开(公告)日：2000-10-03

申请号：US165357

申请日：1998-10-02

Applicant: Young-sik Yoon ,  Young-min Baik

Inventor： Young-sik Yoon ,  Young-min Baik

IPC: C03C3/04 ,  C01B33/18 ,  C03B8/02 ,  C03B20/00 ,  C03C3/06 ,  C03C6/00 ,  C03C13/04

CPC classification number: C03C3/06 ,  C03C13/045 ,  C03C2201/02 ,  C03C2203/22 ,  C03C2203/34

Abstract: A silica glass composition and a method for manufacturing silica glass using the silica glass composition are provided. The silica glass composition includes: pyrogenetic silica having an average particle diameter of 5.times.10.sup.-3 to 1.times.10.sup.-1 .mu.m and a specific surface area of 50 to 400 m.sup.2 /g; and heat-treated silica, as an agglomerate of the pyrogenetic silica, having an average diameter of 2 to 15 .mu.m and a specific surface area less than that of the pyrogenetic silica. A high purity silica glass tube, in which cracking after drying rarely occurs and the shrinking ratio is remarkably decreased, can be obtained by using the silica glass composition according to the present invention. Also, a large silica glass tube can be manufactured by using the composition.

Abstract translation: 提供二氧化硅玻璃组合物和使用二氧化硅玻璃组合物制造石英玻璃的方法。 二氧化硅玻璃组合物包括：平均粒径为5×10 -3〜1×10 -1μm，比表面积为50〜400m 2 / g的热解法二氧化硅; 和作为热解二氧化硅的附聚物的热处理二氧化硅，其平均直径为2至15μm，比表面积小于热解二氧化硅的比表面积。 通过使用本发明的二氧化硅玻璃组合物，可以得到高纯度的二氧化硅玻璃管，其中干燥后的裂纹很少发生，收缩率显着降低。 此外，可以通过使用该组合物制造大的石英玻璃管。

公开(公告)号：US6071838A

公开(公告)日：2000-06-06

申请号：US860716

申请日：1997-11-04

Applicant: Hozumi Endo ,  Yoshio Katsuro ,  Akira Utsunomiya ,  Masaru Shimoyama

Inventor： Hozumi Endo ,  Yoshio Katsuro ,  Akira Utsunomiya ,  Masaru Shimoyama

IPC: C03B8/02 ,  C03B19/09 ,  C03B19/10 ,  C03C3/06 ,  C03B19/06 ,  C03B20/00

CPC classification number: C03C3/06 ,  C03B19/09 ,  C03B19/1065 ,  C03C2201/02 ,  C03C2203/20

Abstract: A synthetic quartz glass powder obtained by sol-gel method, wherein the number of black spot particles is at most 5 particles per 50 g, provides a high quality quartz glass shaped product with low bubble content when fused.

Abstract translation: PCT No.PCT / JP96 / 00043 Sec。 371日期1997年11月4日 102（e）日期1997年11月4日PCT 1996年1月12日PCT PCT。 出版物WO96 / 21617 日期1996年7月18日通过溶胶 - 凝胶法得到的合成石英玻璃粉末，其中黑点颗粒数量为每50克最多5个颗粒，当熔化时提供具有低气泡含量的高品质石英玻璃形产品。

公开(公告)号：US5968259A

公开(公告)日：1999-10-19

申请号：US917933

申请日：1997-08-27

Applicant: Katsuhiko Kemmochi ,  Hiroyuki Miyazawa ,  Hiroyuki Watanabe ,  Kiyotaka Maekawa ,  Chuzaemon Tsuji ,  Manabu Saitou

Inventor： Katsuhiko Kemmochi ,  Hiroyuki Miyazawa ,  Hiroyuki Watanabe ,  Kiyotaka Maekawa ,  Chuzaemon Tsuji ,  Manabu Saitou

IPC: C03C1/00 ,  C03C3/06 ,  C30B15/10 ,  C30B35/00 ,  C30B29/18

CPC classification number: C03C3/06 ,  C03C1/006 ,  C30B15/10 ,  C30B35/002 ,  C03C2201/02 ,  C03C2203/10 ,  Y10T29/40

Abstract: Provided are high-purity quartz glass having a high purity, in particular, with little zirconium (Zr) and manufactured at low costs from natural quartz as the starting material and a method for the preparation thereof. High-purity quartz glass is manufactured, in a method for the preparation of natural quartz glass which is prepared by subjecting crystalline natural quartz to fusion by heating, in conducting refining of the starting material of the crystalline natural quartz by successively practicing a combination of at least one unit refining procedure, in a procedure in which a portion of the starting quartz after practicing the specified unit refining procedure is taken by sampling for analysis, the same is decomposed with hydrofluoric acid or an acid mixture of hydrofluoric acid and another inorganic acid, the decomposition solution is subjected to evaporation to dryness either as such or after addition of another inorganic acid, the residue is melted by heating with admixture of a salt or hydroxide of an alkali metal, the salt or hydroxide of the alkali metal is then dissolved in an aqueous solution of an inorganic acid or in pure water, the solution is subjected to quantitative analysis for the impurities therein to determine the contents of impurities in the crystalline natural quartz and the refined crystalline natural quartz, of which the content of impurities has been found to be lower than a specified value, is subjected to fusion by heating as a starting material to prepare high-purity quartz glass.

Abstract translation: 提供了具有高纯度的高纯度石英玻璃，特别是少量锆（Zr），并以天然石英作为起始原料以低成本制造，以及其制备方法。 制造高纯度石英玻璃的方法中，天然石英玻璃的制备方法是将结晶天然石英通过加热进行熔融制备，在通过连续地实施在 至少一个单元精制程序，在通过取样进行分析之后，通过取样进行一部分实施了规定的单元精炼处理后的起始石英的一部分，同时用氢氟酸或氢氟酸与其它无机酸的酸混合物分解， 将分解溶液按照本身或加入另一种无机酸进行蒸发干燥后，通过用碱金属的盐或氢氧化物的混合物加热将残余物熔化，然后将碱金属的盐或氢氧化物溶于 无机酸的水溶液或纯水中，对该溶液进行定量分析 e杂质以确定结晶天然石英中的杂质含量和发现杂质含量低于规定值的精制结晶天然石英通过加热作为原料进行熔融以制备 高纯石英玻璃。

公开(公告)号：US5879649A

公开(公告)日：1999-03-09

申请号：US926254

申请日：1997-09-05

Applicant: Danny L. Henderson ,  Dale R. Powers

Inventor： Danny L. Henderson ,  Dale R. Powers

IPC: C03B19/14 ,  C03B37/014 ,  C03C3/06 ,  C07F7/20 ,  C07F7/21 ,  C01B33/12

CPC classification number: C03B37/01413 ,  C03B19/1415 ,  C03C3/06 ,  C07F7/20 ,  C07F7/21 ,  C03B2201/02 ,  C03B2207/32 ,  C03B2207/81 ,  C03B2207/87 ,  C03B2207/88 ,  C03B2207/89 ,  C03B2207/90 ,  C03C2201/02 ,  C03C2203/27

Abstract: The present invention is directed to a purified polyalkylsiloxane composition having a boiling point, under atmospheric conditions, of less than about 250.degree. C. and containing high boiling impurities, including siloxanes and silanol-terminated siloxanes, that have boiling points, under atmospheric conditions, of greater than about 250.degree. C. in a total concentration of less than 14 ppm. The present invention is further directed to a method of producing a purified polyalkylsiloxane composition, having a boiling point, under atmospheric conditions, of less than about 250.degree. C., by distilling a polyalkylsiloxane starting material containing high boiling impurities having boiling points, under atmospheric conditions, of greater than about 250.degree. C. in a total concentration of at least 14 ppm, under conditions effective to produce a purified polyalkylsiloxane composition having a boiling point under atmospheric conditions of less than about 250.degree. C., and containing high boiling impurities, having boiling points, under atmospheric conditions, of greater than about 250.degree. C., in a total concentration of less than 14 ppm. In preferred embodiments, low boiling components (including silanols and preferably also hexamethylcyclotrisiloxane) are reduced to less than about 100 ppm. The present invention is further directed to a method of producing fused silica glass by conversion of the purified polyalkylsiloxane composition.

Abstract translation: 本发明涉及一种纯化的聚烷基硅氧烷组合物，其在大气条件下沸点低于约250℃，并且在大气条件下含有沸点高的沸点杂质，包括硅氧烷和硅烷醇封端的硅氧烷， 大于约250℃，总浓度小于14ppm。 本发明还涉及通过在大气压下蒸馏含有沸点高沸点杂质的聚烷基硅氧烷起始材料，在大气条件下制备小于约250℃沸点的纯化聚烷基硅氧烷组合物的方法 条件，大于约250℃，总浓度为至少14ppm，在有效产生在大气条件下沸点小于约250℃的纯化聚烷基硅氧烷组合物的条件下，并含有高沸点杂质 在大气条件下具有大于约250℃的沸点，总浓度小于14ppm。 在优选的实施方案中，低沸点组分（包括硅烷醇，优选六甲基环三硅氧烷）降低至小于约100ppm。 本发明还涉及通过纯化的聚烷基硅氧烷组合物的转化生产熔融石英玻璃的方法。

公开(公告)号：US5703191A

公开(公告)日：1997-12-30

申请号：US574961

申请日：1995-12-19

Applicant: Danny L. Henderson ,  Dale R. Powers

Inventor： Danny L. Henderson ,  Dale R. Powers

IPC: G02B6/00 ,  C03B8/04 ,  C03B19/06 ,  C03B19/14 ,  C03B20/00 ,  C03B37/014 ,  C03B37/018 ,  C03C1/02 ,  C03C3/06 ,  C03C13/04 ,  C07F7/20 ,  C07F7/21 ,  C08G77/04 ,  C08L83/04 ,  C08G77/12

CPC classification number: C03B37/01413 ,  C03B19/1415 ,  C03C3/06 ,  C07F7/20 ,  C07F7/21 ,  C03B2201/02 ,  C03B2207/32 ,  C03B2207/85 ,  C03C2201/02 ,  C03C2203/27

Abstract: The present invention is directed to a purified polyalkylsiloxane composition having a boiling point, under atmospheric conditions, of less than about 250.degree. C. and containing high boiling impurities, including siloxanes and silanol-terminated siloxanes, that have boiling points, under atmospheric conditions, of greater than about 250.degree. C. in a total concentration of less than 14 ppm. The present invention is further directed to a method of producing a purified polyalkylsiloxane composition, having a boiling point, under atmospheric conditions, of less than about 250.degree. C., by distilling a polyalkylsiloxane starting material containing high boiling impurities having boiling points, under atmospheric conditions, of greater than about 250.degree. C. in a total concentration of at least 14 ppm, under conditions effective to produce a purified polyalkylsiloxane composition having a boiling point under atmospheric conditions of less than about 250.degree. C., and containing high boiling impurities, having boiling points, under atmospheric conditions, of greater than about 250.degree. C., in a total concentration of less than 14 ppm. In preferred embodiments, low boiling components (including silanols and preferably also hexamethylcyclotrisiloxane) are reduced to less than about 100 ppm. The present invention is further directed to a method of producing fused silica glass by conversion of the purified polyalkylsiloxane composition.

Abstract translation: 本发明涉及一种纯化的聚烷基硅氧烷组合物，其在大气条件下沸点低于约250℃，并且在大气条件下含有沸点高的沸点杂质，包括硅氧烷和硅烷醇封端的硅氧烷， 大于约250℃，总浓度小于14ppm。 本发明进一步涉及通过在大气压下蒸馏含有沸点高沸点杂质的聚烷基硅氧烷原料，制备在大气条件下沸点低于约250℃的纯化聚烷基硅氧烷组合物的方法 条件，大于约250℃，总浓度为至少14ppm，在有效产生在大气条件下沸点小于约250℃的纯化聚烷基硅氧烷组合物的条件下，并含有高沸点杂质 在大气条件下具有大于约250℃的沸点，总浓度小于14ppm。 在优选的实施方案中，低沸点组分（包括硅烷醇，优选六甲基环三硅氧烷）降低至小于约100ppm。 本发明还涉及通过纯化的聚烷基硅氧烷组合物的转化生产熔融石英玻璃的方法。

公开(公告)号：US5674792A

公开(公告)日：1997-10-07

申请号：US636889

申请日：1996-04-24

Applicant: Stephan Moritz ,  Wolfgang Englisch

Inventor： Stephan Moritz ,  Wolfgang Englisch

IPC: B22C9/12 ,  C03B19/06 ,  C03C3/06 ,  C03C11/00 ,  C30B35/00 ,  C04B35/14

CPC classification number: C30B35/002 ,  B22C9/12 ,  C03B19/06 ,  C03B19/066 ,  C03B20/00 ,  C03C11/00 ,  C03C3/06 ,  C04B35/14 ,  C04B35/62204 ,  C04B35/6261 ,  C04B35/6263 ,  C03B2201/23 ,  C03C2201/02 ,  C03C2201/80 ,  C03C2203/10 ,  C03C2203/52 ,  C04B2235/3418 ,  C04B2235/36 ,  C04B2235/5427 ,  C04B2235/5436 ,  C04B2235/5463 ,  C04B2235/6027 ,  C04B2235/606 ,  C04B2235/656 ,  C04B2235/6562 ,  C04B2235/6565 ,  C04B2235/6567 ,  C04B2235/661 ,  C04B2235/72 ,  C04B2235/77 ,  C04B2235/95 ,  C04B2235/96 ,  C04B2235/9653

Abstract: A shaped body of amorphous silicon dioxide, which has a chemical purity of at least 99.9% and a cristobalite content of at most 1% and which is impermeable to gas, is known. To provide shaped bodies of amorphous silicon dioxide which have a high precision, which can be small or large in size and of simple to complicated shape, which have a chemical purity of at least 99.9%, are impermeable to gas above wall thicknesses of 1 mm, which have a high cold flexural strength, low thermal conductivity and low radiation of heat, which are thermal shock resistant and can be exposed repeatedly or also long-term to temperatures in the range from 1000.degree. to 1300.degree. C. and which can be welded in a sharply delineated manner without spreading joins and which have a low spectral transmission from the ultraviolet to the middle infrared spectral region, the shaped body is opaque, contains pores, at a wall thickness of 1 mm has a direct spectral transmission which is virtually constant in the wavelength range from .lambda.=190 nm to .lambda.=2650 nm and is below 10%, and it has a density which is at least 2.15 g/cm.sup.3. A process for producing such shaped bodies is also provided.

Abstract translation: 已知一种无定形二氧化硅的成形体，其化学纯度为99.9％以上，方石方含量为1％以下且不透气。 为了提供具有至少99.9％的化学纯度的具有高精度的成形体的非晶形二氧化硅，其尺寸可以是小的或大的，并且具有简单到复杂的形状，对于壁厚为1mm的气体是不可渗透的 ，具有高的抗弯强度，低导热性和低辐射热，耐热冲击，可以反复暴露或长时间暴露于1000℃至1300℃的温度，并且可以是 焊接成锐利的方式而不扩散接头，并且具有从紫外线到中红外光谱区域的低光谱透射率，成形体是不透明的，包含孔，在1mm厚的壁处具有直接光谱透射，其实际上 在λ= 190nm至λ= 2650nm的波长范围内恒定，并且低于10％，并且其密度为至少2.15g / cm 3。 还提供了一种用于生产这种成形体的方法。

公开(公告)号：US5585173A

公开(公告)日：1996-12-17

申请号：US319570

申请日：1994-10-07

Applicant: Kenji Kamo ,  Kouichi Ono ,  Koji Tsukuma ,  Hiroya Nagata ,  Emiko Abe ,  Yoshikazu Kikuchi ,  Yushiharu Funakoshi

Inventor： Kenji Kamo ,  Kouichi Ono ,  Koji Tsukuma ,  Hiroya Nagata ,  Emiko Abe ,  Yoshikazu Kikuchi ,  Yushiharu Funakoshi

IPC: C03B19/06 ,  C03C3/06 ,  C03B19/08

CPC classification number: C03C3/06 ,  C03B19/06 ,  C03B19/066 ,  C03B20/00 ,  C03B2201/03 ,  C03C2201/02 ,  C03C2201/80 ,  C03C2203/50 ,  Y10S65/08 ,  Y10S65/09 ,  Y10T428/24661 ,  Y10T428/249953 ,  Y10T428/249969 ,  Y10T428/2975

Abstract: The high-purity, opaque quartz glass containing 3.times.10.sup.6 -9.times.10.sup.6 of closed cells having an average size of 20-40 .mu.m per 1 cm.sup.3, a ratio of closed cells having sizes of 100 .mu.m or more to the whole of cells being 1% or less, thereby showing 5% or less of linear transmittance for near infrared rays (.lambda.=900 nm) at a thickness of 1 mm is produced by compacting amorphous silica powder having an average particle size of 0.5-10 .mu.m, in which each of impurities selected from Li, Na, K, Fe, Ti and Al is 1 ppm or less, if any, and sintering the resultant green body at 1730.degree.-1850.degree. C.

Abstract translation: 含有3×10 6-9×10 6个细胞的高纯度不透明石英玻璃，平均粒径为每1cm 320-40μm，具有100μm以上的细胞与整个细胞的比例为1％ 通过压制平均粒径为0.5〜10μm的无定形二氧化硅粉末，制造厚度为1mm的近红外线（λ= 900nm）的线性透射率的5％以下， 从Li，Na，K，Fe，Ti和Al中选出的杂质为1ppm以下，在1730〜-1850℃下烧成生坯。