公开(公告)号：WO2013007922A1

公开(公告)日：2013-01-17

申请号：PCT/FR2012/051559

申请日：2012-07-04

Applicant: PHOTOMECA FRANCE ,  BERTRAND, Denis

Inventor： BERTRAND, Denis

IPC: G03F7/20 ,  B05D3/06

CPC classification number: G21K5/00 ,  G03F7/2004 ,  G03F7/201 ,  G03F7/2012

Abstract: La présente invention concerne un dispositif d'émission de lumière ultraviolette configuré pour insoler une plaque (3) en photopolymère, en particulier pour l'impression flexographique, comprenant une rangée principale (7) de lampes (6) sous forme de tubes équidistants de lumière ultraviolette, séparés l'un de l'autre par un espace. Il comporte une source (8) de lumière ultraviolette complémentaire située en dehors du plan de ladite rangée principale (7) de lampes (6), ladite source (8) de lumière ultraviolette complémentaire étant configurée pour envoyer des faisceaux (10, 11) de lumière ultraviolette à travers lesdits espaces (9) entre les lampes (6) de ladite rangée principale (7). La présente invention concerne également une installation (1) d'insolation comprenant un dispositif selon l'invention, ainsi qu'une méthode d'insolation d'une plaque (3) en photopolymère utilisant un dispositif selon l'invention.

Abstract translation: 本发明涉及一种用于发射紫外光的装置，其特征在于用于曝光光聚合物板（3），特别是用于柔性版印刷，包括等距离的紫外光管形式的灯（6）的主排（7） 通过空间彼此分开。 本发明包括一个额外的紫外线源（8），其位于所述主排（7）的灯的外面，所述紫外线的附加源（8）被配置为发射光束（10,11 ）穿过所述主排（7）的灯（6）之间的所述空间（9）。 本发明还涉及包括根据本发明的装置的曝光设备（1）以及使用根据本发明的装置曝光光聚合物板（3）的方法。

公开(公告)号：WO2005001573A3

公开(公告)日：2005-05-26

申请号：PCT/US2004015641

申请日：2004-05-19

Applicant: DOW CORNING ,  GARDNER GEOFFREY ,  LEE YEONG JOO

Inventor： GARDNER GEOFFREY ,  LEE YEONG JOO

IPC: G03F1/00 ,  G03F7/075 ,  G03F7/20 ,  G03F7/40 ,  H01L21/58 ,  H01L21/98

CPC classification number: H01L24/32 ,  G03F7/0757 ,  G03F7/201 ,  G03F7/40 ,  G03F7/405 ,  H01L23/3128 ,  H01L24/29 ,  H01L24/73 ,  H01L24/83 ,  H01L25/0657 ,  H01L25/50 ,  H01L2224/29 ,  H01L2224/29101 ,  H01L2224/2919 ,  H01L2224/29198 ,  H01L2224/2929 ,  H01L2224/29339 ,  H01L2224/29344 ,  H01L2224/29347 ,  H01L2224/29355 ,  H01L2224/29386 ,  H01L2224/29393 ,  H01L2224/32014 ,  H01L2224/32145 ,  H01L2224/32225 ,  H01L2224/48091 ,  H01L2224/48227 ,  H01L2224/73265 ,  H01L2224/8301 ,  H01L2224/83192 ,  H01L2224/83194 ,  H01L2224/8385 ,  H01L2225/0651 ,  H01L2225/06575 ,  H01L2924/00013 ,  H01L2924/01004 ,  H01L2924/01005 ,  H01L2924/01006 ,  H01L2924/0101 ,  H01L2924/01011 ,  H01L2924/01012 ,  H01L2924/01013 ,  H01L2924/01015 ,  H01L2924/01018 ,  H01L2924/01019 ,  H01L2924/01024 ,  H01L2924/01027 ,  H01L2924/01029 ,  H01L2924/0103 ,  H01L2924/0104 ,  H01L2924/01041 ,  H01L2924/01043 ,  H01L2924/01044 ,  H01L2924/01045 ,  H01L2924/01046 ,  H01L2924/01047 ,  H01L2924/0105 ,  H01L2924/01054 ,  H01L2924/01056 ,  H01L2924/01058 ,  H01L2924/01068 ,  H01L2924/01074 ,  H01L2924/01076 ,  H01L2924/01077 ,  H01L2924/01078 ,  H01L2924/01079 ,  H01L2924/01082 ,  H01L2924/014 ,  H01L2924/0665 ,  H01L2924/07802 ,  H01L2924/10253 ,  H01L2924/10329 ,  H01L2924/14 ,  H01L2924/1461 ,  H01L2924/15311 ,  H01L2924/00014 ,  H01L2924/00 ,  H01L2924/00012 ,  H01L2924/04642 ,  H01L2924/04563 ,  H01L2924/0542 ,  H01L2924/05432 ,  H01L2924/05032 ,  H01L2924/0532 ,  H01L2924/0503 ,  H01L2224/29099 ,  H01L2224/29199 ,  H01L2224/29299

Abstract: A method for adhering substrates using gray-scale photolithography includes: (a) applying a photopatternable composition to a surface of a substrate to form a film; (b) exposing a portion of the film to radiation having a wavelength of from 150 to 800 nm through a gray-scale photomask to produce an exposed film having non-exposed regions covering at least a portion of the surface; (c) heating the exposed film for an amount of time such that the exposed regions are substantially insoluble in a developing solvent and the non­exposed regions are soluble in the developing solvent; (d) removing the non-exposed regions of the heated film with the developing solvent to form a patterned film; (e) heating the patterned film for an amount of time sufficient to form a cured patterned film having a surface; (f) activating the surface of the cured patterned film and a surface of an adherend; (g) contacting the activated. surface of the cured patterned film with the activated surface of the adherend. The photopatternable composition includes: (A) an organopolysiloxane containing an average of at least two silicon-bonded unsaturated organic groups per molecule, (B) an organosilicon compound containing an average of at least two silicon-bonded hydrogen atoms per molecule in a concentration sufficient to cure the composition, and (C) a catalytic amount of a photoactivated hydrosilylation catalyst.

Abstract translation: 一种使用灰度光刻法来粘合基板的方法包括：（a）将可光构图的组合物施加到基板的表面以形成膜; （b）通过灰色光掩模将部分所述膜暴露于波长为150-800nm的辐射，以产生具有覆盖所述表面的至少一部分的未曝光区域的曝光膜; （c）将暴露的膜加热一段时间，使得暴露的区域基本上不溶于展开溶剂中，并且非曝光区域可溶于展开溶剂中; （d）用显影溶剂去除加热膜的未曝光区域以形成图案化膜; （e）加热所述图案化薄膜足够长的时间以形成具有表面的固化图案化薄膜; （f）激活固化的图案化膜的表面和被粘物的表面; （g）接触活化的。 固化的图案化膜的表面与被粘物的活化表面接触。 所述可光构图的组合物包含：（A）每分子含有平均至少两个与硅键合的不饱和有机基团的有机聚硅氧烷，（B）每分子平均含有至少两个与硅键合的氢原子的有机硅化合物， 以固化所述组合物，和（C）催化量的光活化的氢化硅烷化催化剂。

公开(公告)号：WO2005001573A2

公开(公告)日：2005-01-06

申请号：PCT/US2004/015641

申请日：2004-05-19

Applicant: DOW CORNING CORPORATION ,  GARDNER, Geoffrey ,  LEE, Yeong, Joo

Inventor： GARDNER, Geoffrey ,  LEE, Yeong, Joo

IPC: G03F7/00

CPC classification number: H01L24/32 ,  G03F7/0757 ,  G03F7/201 ,  G03F7/40 ,  G03F7/405 ,  H01L23/3128 ,  H01L24/29 ,  H01L24/73 ,  H01L24/83 ,  H01L25/0657 ,  H01L25/50 ,  H01L2224/29 ,  H01L2224/29101 ,  H01L2224/2919 ,  H01L2224/29198 ,  H01L2224/2929 ,  H01L2224/29339 ,  H01L2224/29344 ,  H01L2224/29347 ,  H01L2224/29355 ,  H01L2224/29386 ,  H01L2224/29393 ,  H01L2224/32014 ,  H01L2224/32145 ,  H01L2224/32225 ,  H01L2224/48091 ,  H01L2224/48227 ,  H01L2224/73265 ,  H01L2224/8301 ,  H01L2224/83192 ,  H01L2224/83194 ,  H01L2224/8385 ,  H01L2225/0651 ,  H01L2225/06575 ,  H01L2924/00013 ,  H01L2924/01004 ,  H01L2924/01005 ,  H01L2924/01006 ,  H01L2924/0101 ,  H01L2924/01011 ,  H01L2924/01012 ,  H01L2924/01013 ,  H01L2924/01015 ,  H01L2924/01018 ,  H01L2924/01019 ,  H01L2924/01024 ,  H01L2924/01027 ,  H01L2924/01029 ,  H01L2924/0103 ,  H01L2924/0104 ,  H01L2924/01041 ,  H01L2924/01043 ,  H01L2924/01044 ,  H01L2924/01045 ,  H01L2924/01046 ,  H01L2924/01047 ,  H01L2924/0105 ,  H01L2924/01054 ,  H01L2924/01056 ,  H01L2924/01058 ,  H01L2924/01068 ,  H01L2924/01074 ,  H01L2924/01076 ,  H01L2924/01077 ,  H01L2924/01078 ,  H01L2924/01079 ,  H01L2924/01082 ,  H01L2924/014 ,  H01L2924/0665 ,  H01L2924/07802 ,  H01L2924/10253 ,  H01L2924/10329 ,  H01L2924/14 ,  H01L2924/1461 ,  H01L2924/15311 ,  H01L2924/00014 ,  H01L2924/00 ,  H01L2924/00012 ,  H01L2924/04642 ,  H01L2924/04563 ,  H01L2924/0542 ,  H01L2924/05432 ,  H01L2924/05032 ,  H01L2924/0532 ,  H01L2924/0503 ,  H01L2224/29099 ,  H01L2224/29199 ,  H01L2224/29299

Abstract: A method for adhering substrates using gray-scale photolithography includes: (a) applying a photopatternable composition to a surface of a substrate to form a film; (b) exposing a portion of the film to radiation having a wavelength of from 150 to 800 nm through a gray-scale photomask to produce an exposed film having non-exposed regions covering at least a portion of the surface; (c) heating the exposed film for an amount of time such that the exposed regions are substantially insoluble in a developing solvent and the non­exposed regions are soluble in the developing solvent; (d) removing the non-exposed regions of the heated film with the developing solvent to form a patterned film; (e) heating the patterned film for an amount of time sufficient to form a cured patterned film having a surface; (f) activating the surface of the cured patterned film and a surface of an adherend; (g) contacting the activated. surface of the cured patterned film with the activated surface of the adherend. The photopatternable composition includes: (A) an organopolysiloxane containing an average of at least two silicon-bonded unsaturated organic groups per molecule, (B) an organosilicon compound containing an average of at least two silicon-bonded hydrogen atoms per molecule in a concentration sufficient to cure the composition, and (C) a catalytic amount of a photoactivated hydrosilylation catalyst.

Abstract translation: 使用灰度光刻法粘合基板的方法包括：（a）将光可图案组合物施加到基板的表面以形成膜; （b）通过灰度光掩模将一部分薄膜暴露于具有150至800nm波长的辐射，以产生具有覆盖表面的至少一部分的未曝光区域的曝光膜; （c）将暴露的膜加热一段时间，使得暴露区域基本上不溶于显影溶剂，并且非曝光区域可溶于显影溶剂中; （d）用显影溶剂去除加热膜的未曝光区域以形成图案化膜; （e）加热所述图案化膜足以形成具有表面的固化的图案化膜的时间; （f）活化固化的图案化膜的表面和被粘物的表面; （g）使活化的。 固化的图案化膜的表面具有被粘物的活化表面。 光致图案组合物包括：（A）每分子平均含有至少两个与硅键合的不饱和有机基团的有机聚硅氧烷，（B）每分子平均含有至少两个与硅键合的氢原子的有机硅化合物，其浓度足够 固化组合物，和（C）催化量的光活化氢化硅烷化催化剂。

公开(公告)号：WO2004095138A2

公开(公告)日：2004-11-04

申请号：PCT/EP2004/050610

申请日：2004-04-26

Applicant: FONDATION CAFI ,  JACCARD, Samuel ,  MIKHAILOV, Serguei ,  MUNNIK, Frans

Inventor： JACCARD, Samuel ,  MIKHAILOV, Serguei ,  MUNNIK, Frans

IPC: G03F7/20

CPC classification number: B81C1/00492 ,  B81C2201/032 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/201 ,  H01J37/3174 ,  H01J2237/31735 ,  H01J2237/31755 ,  H01J2237/31774 ,  H01J2237/31796 ,  Y10S430/143

Abstract: Ion beam lithography technique wherein a higher amount of radiation energy is deposited to predetermined regions in the bulk if a suitable substrate. By selecting the radiation nature, its energy and the irradiation parameters a structure can be created in the bulk of the material leaving the surface essentially untouched.

Abstract translation: 离子束光刻技术，其中如果合适的衬底，较高量的辐射能量沉积到本体中的预定区域。 通过选择辐射性质，其能量和照射参数，可以在离开表面基本上不变的材料的主体中产生结构。

公开(公告)号：WO0250613A9

公开(公告)日：2003-08-07

申请号：PCT/US0149105

申请日：2001-12-18

Applicant: UNIV VERMONT

Inventor： ESSER BRIAN ,  HUSTON DRYVER R ,  PELCZARSKI NOEL V ,  SAUTER WOLFGANG

IPC: C08F2/46 ,  C08F2/48 ,  G02B27/56 ,  G03F7/20 ,  C08J7/18 ,  B05C3/18 ,  B05D5/06

CPC classification number: B82Y10/00 ,  G02B27/56 ,  G03F7/201 ,  G03F7/2022 ,  G03F7/70383

Abstract: A method of curing a photosensitive material (10) having a critical electrical field amplitude (Ic) at which photoinitiation occurs. The method includes contacting the photosensitive material, e.g., a photoinitiator/monomer resin system, with a substrate (18) having surface (22), such as an optical element, so as to form an interface (20) between the photosensitive material and the substrate surface. A light beam (12) from source (14) is directed into the substrate, such that the light beam is totally internally reflected from the interface within the substrate, so that an evanescent wave is created in the photosensitive material with amplitude (I). In order for curing to occur in photoinitiation region (16) to depth (I), the electric field amplitude (Io) of the evanescent wave at the interface must be least equal to the critical electric field amplitude of the photosensitive material.

Abstract translation: 一种固化具有发生光引发的临界电场幅度（Ic）的感光材料（10）的方法。 该方法包括将感光材料（例如光引发剂/单体树脂体系）与具有表面（22）的基底（如光学元件）接触，以便在感光材料和感光材料之间形成界面 基材表面。 来自源极（14）的光束（12）被引导到衬底中，使得光束从衬底内的界面全部内部反射，使得在感光材料中以幅度（I）产生ev逝波。 为了在光引发区域（16）至深度（I）处发生固化，界面处的消逝波的电场振幅（Io）必须至少等于感光材料的临界电场振幅。

公开(公告)号：WO00067303A1

公开(公告)日：2000-11-09

申请号：PCT/JP2000/002761

申请日：2000-04-27

IPC: G03F7/20 ,  H01L21/027

CPC classification number: G03F7/70058 ,  G03F7/201 ,  G03F7/70075 ,  G03F7/70566

Abstract: An exposure method for conducting exposure with high, uniform illuminance by illuminating light (IL) for exposure even when the illuminating light (IL) is a laser beam having a wavelength in the vacuum ultraviolet region. The illuminating light (IL) which is a linearly-polarized F2 laser beam emitted from a laser light source (1) passes through a prism (3), an oscillating mirror (4), bly-eye lenses (5A, 5B), and a condenser lens (9) and illuminates a reticle (R). The pattern on the reticle (R) is transferred onto a wafer (W) through a projection optical system (PL). The prism (3) is made of a crystal of magnesium fluoride (MgF2) which is a birefringent glass material transparent to the F2 laser beam. The prism (3) has a thickness gradually varying in the direction perpendicular to the optical axis of the illuminating light (IL) and is so disposed that it exhibits birefringence with respect to the illuminating light (IL). The polarized state of the illuminating light (IL) is continuously changed in a predetermined direction in a plane perpendicular to the optical axis.

Abstract translation: 一种曝光方法，即使当照明光（IL）是具有真空紫外区域中的波长的激光束时，也可以通过照射用于曝光的光（IL）进行高均匀照度的曝光。 从激光光源（1）发射的线偏振的F2激光束的照明光（IL）通过棱镜（3），振动反射镜（4），双眼透镜（5A，5B）和 聚光透镜（9）并照亮掩模版（R）。 掩模版（R）上的图案通过投影光学系统（PL）转印到晶片（W）上。 棱镜（3）由对F2激光束透明的双折射玻璃材料的氟化镁（MgF 2）晶体构成。 棱镜（3）具有在垂直于照明光（IL）的光轴的方向上逐渐变化的厚度，并且被布置成相对于照明光（IL）呈现双折射。 照明光（IL）的极化状态在垂直于光轴的平面中在预定方向上连续变化。

公开(公告)号：EP3362855A1

公开(公告)日：2018-08-22

申请号：EP16854644.8

申请日：2016-10-13

Applicant: Micro Tau IP Pty Ltd

Inventor： BILINSKY, Henry Claudius

IPC: G03F7/00 ,  B05D5/00 ,  C09D133/00 ,  C09D175/04 ,  G03F7/038 ,  G03F7/039 ,  G03F7/26 ,  G03F1/00

CPC classification number: G03F7/038 ,  B64G1/22 ,  C09D133/00 ,  G03F7/201 ,  G03F7/24 ,  G03F7/30

Abstract: In one aspect, there is provided a method of creating a microstructure pattern on an exterior surface of an aircraft, boat, automobile or other vehicle is disclosed. A layer of photopolymer (44) is applied to the top coat or substrate (43) by nozzles (45). The photopolymer is selectively irradiated to activate its photoinitiator and the unirradiated polymer is removed. The irradiation can be via a mask (49) which does not come into contact with the polymer, or via a beam splitting arrangement (63, 64) or a diffraction grating (71). The pattern can be formed by either leaving the exposed photopolymer in situ, or using the exposed photopolymer to mask the substrate, etching the substrate, and then removing the exposed photopolymer. In another aspect, there is provided a method 1100 comprising the step 1102 of applying a layer of photocurable material to the exterior surface, the step 1104 of irradiating the photocurable material with radiation including a predetermined irradiation intensity profile, and the step 1106 of removing uncured photocurable material to form the microstructure pattern. The radiation initiates curing of the irradiated photocurable material, causing a curing depth profile across the layer of the photocurable material corresponding to the selected intensity pro file.

公开(公告)号：EP3101477A4

公开(公告)日：2017-08-09

申请号：EP14880796

申请日：2014-10-16

Applicant: PRISMLAB CHINA LTD

Inventor： HOU FENG

IPC: G03F7/20 ,  B29C67/00 ,  G03F7/00

CPC classification number: G03F7/702 ,  B29C64/129 ,  B29C64/20 ,  B33Y30/00 ,  G03F7/0037 ,  G03F7/201 ,  G03F7/70416

Abstract: An image exposure system of a 3D printing device comprises: a spatial light modulator (206), a light source (201), a projection lens (208), a micro-displacement driving mechanism and a controller. The spatial light modulator (206) is provided with a plurality of micromirrors (311) for adjusting the reflective direction of light illuminating the micromirrors according to a control signal, wherein each micro mirror (311) is a concave mirror for converging the light illuminating the micromirror to create a micro light spot of which the size is smaller than a pixel size corresponding to the micromirror (311); the light source (201) generates a light beam illuminating the spatial light modulator (206); the projection lens (208) is aligned with a first direction of the spatial light modulator (206) so that a micro light spot array formed through the micromirror (311) by the light source (201) is projected onto the surface of a light-sensitive material; the micro-displacement driving mechanism is connected with the spatial light modulator (206), and can drive the spatial light modulator to move in third and fourth directions that are perpendicular to each other, in order to finely adjust the position on the surface of the light-sensitive material onto which the micro light spot array is projected; and the controller is used for instructing the light source to perform multiple exposures, and also instructing the micro-displacement driving mechanism to move upon every exposure, in order to project the micro light spot arrays of the various exposures onto different positions on the surface of the light-sensitive material.

Abstract translation: 一种3D打印装置的图像曝光系统，包括：空间光调制器（206），光源（201），投影透镜（208），微位移驱动机构和控制器。 空间光调制器（206）具有用于根据控制信号调节照射微镜的光的反射方向的多个微镜（311），其中每个微镜（311）是用于会聚照射 微镜以产生尺寸小于对应于微镜（311）的像素尺寸的微光斑; 光源（201）产生照射空间光调制器（206）的光束; 投影透镜（208）与空间光调制器（206）的第一方向对齐，使得通过光源（201）形成的通过微镜（311）形成的微光斑阵列被投影到发光元件的表面上， 敏感材料; 微位移驱动机构与空间光调制器（206）连接，并且可以驱动空间光调制器在相互垂直的第三和第四方向上移动，以便精确地调整 所述微光斑阵列投射到其上的光敏材料; 控制器用于指示光源进行多次曝光，并且还指示微位移驱动机构在每次曝光时移动，以便将各种曝光的微光斑阵列投影到表面上的不同位置 光敏材料。

公开(公告)号：EP3101477A1

公开(公告)日：2016-12-07

申请号：EP14880796.9

申请日：2014-10-16

Applicant: Prismlab China Ltd.

Inventor： HOU, Feng

IPC: G03F7/20

CPC classification number: G03F7/702 ,  B29C64/129 ,  B29C64/20 ,  B33Y30/00 ,  G03F7/0037 ,  G03F7/201 ,  G03F7/70416

Abstract: An image exposure system of a 3D printing device comprises: a spatial light modulator (206), a light source (201), a projection lens (208), a micro-displacement driving mechanism and a controller. The spatial light modulator (206) is provided with a plurality of micromirrors (311) for adjusting the reflective direction of light illuminating the micromirrors according to a control signal, wherein each micro mirror (311) is a concave mirror for converging the light illuminating the micromirror to create a micro light spot of which the size is smaller than a pixel size corresponding to the micromirror (311); the light source (201) generates a light beam illuminating the spatial light modulator (206); the projection lens (208) is aligned with a first direction of the spatial light modulator (206) so that a micro light spot array formed through the micromirror (311) by the light source (201) is projected onto the surface of a light-sensitive material; the micro-displacement driving mechanism is connected with the spatial light modulator (206), and can drive the spatial light modulator to move in third and fourth directions that are perpendicular to each other, in order to finely adjust the position on the surface of the light-sensitive material onto which the micro light spot array is projected; and the controller is used for instructing the light source to perform multiple exposures, and also instructing the micro-displacement driving mechanism to move upon every exposure, in order to project the micro light spot arrays of the various exposures onto different positions on the surface of the light-sensitive material.

Abstract translation: 3D打印装置的图像曝光系统包括：空间光调制器（206），光源（201），投影透镜（208），微位移驱动机构和控制器。 空间光调制器（206）设置有多个微镜（311），用于根据控制信号调节照射微镜的光的反射方向，其中每个微镜（311）是凹面镜，用于会聚照射 微镜以产生尺寸小于对应于微反射镜（311）的像素尺寸的微光斑; 所述光源（201）产生照射所述空间光调制器（206）的光束; 投影透镜（208）与空间光调制器（206）的第一方向对准，使得通过光源（201）穿过微镜（311）形成的微光点阵列被投射到发光体（201）的表面上， 敏感材料; 微位移驱动机构与空间光调制器（206）连接，并且可以驱动空间光调制器在彼此垂直的第三和第四方向上移动，以便微调位移 微光点阵列投射到其上的感光材料; 并且控制器用于指示光源进行多次曝光，并且还指示微位移驱动机构在每次曝光时移动，以便将各种曝光的微光点阵列投影到表面上的不同位置 感光材料。

公开(公告)号：EP3035123A1

公开(公告)日：2016-06-22

申请号：EP14198604.2

申请日：2014-12-17

Applicant: Flint Group Germany GmbH

Inventor： Fronczkiewicz, Peter ,  Wendland, Thorben ,  Beyer, Matthias

IPC: G03F7/20

CPC classification number: G03F7/36 ,  G03F7/027 ,  G03F7/2004 ,  G03F7/201 ,  G03F7/2016 ,  G03F7/202 ,  G03F7/203 ,  G03F7/32 ,  G03F7/325

Abstract: Verfahren zur Herstellung von Flexodruckformen, bei dem man als Ausgangsmaterial ein fotopolymerisierbares Flexodruckelement einsetzt, welches übereinander angeordnet mindestens umfasst
• einen dimensionsstabilen Träger, und
• mindestens eine fotopolymerisierbare reliefbildende Schicht, mindestens umfassend ein elastomeres Bindemittel, eine ethylenisch ungesättigte Verbindung und einen Fotoinitiator,
• eine digital bebilderbare Schicht,
und das Verfahren mindestens die folgenden Schritte umfasst:
(a) Erzeugung einer Maske durch Bebilderung der digital bebilderbaren Schicht,
(b) Belichtung der fotopolymerisierbaren reliefbildenden Schicht durch die Maske hindurch mit aktinischem Licht und Fotopolymerisation der Bildbereiche der Schicht, und
(c) Entwicklung der fotopolymerisierten Schicht durch Auswaschen der nicht fotopolymerisierten Bereiche der reliefbildenden Schicht mit einem organischen Lösungsmittel oder durch thermische Entwicklung, dadurch gekennzeichnet, dass
der Schritt (b) zwei oder mehrere Belichtungszyklen (b-1) bis (b-n) mit aktinischem Licht mit einer Intensität von 100 bis 10 000 mW/cm 2 aus einer Mehrzahl von UV-LEDs umfasst, wobei die pro Belichtungszyklus in die fotopolymerisierbare reliefbildende Schicht eingetragene Energie 0,1 bis 5 J/cm 2 beträgt.

Abstract translation: 一种用于生产柔性版印刷版的方法，其中所用的原料是其中布置一个在另一个之上包括可光聚合的柔性版印刷元件的方法的至少€¢尺寸稳定的基板，并且€¢至少一种可光聚合的凸版形成层，至少包括一个弹性体粘合剂，烯属不饱和化合物和光引发剂， €¢一个数字成像层，并且所述方法包括至少以下步骤：（a）形成由可数字成像层的成像的掩模，（b）可光聚合的凸版形成层的曝光通过掩模的层的图像区域的光化光线和光聚合引发 和（c）显影用有机溶剂或通过热显影洗出在凸版形成层的非光聚合区域中的光聚合层，其特征在于，德 ř步骤（b）两个或更多个暴露循环（B-1）至（BN）与从多个UV-LED的具有从100至10,000毫瓦/ cm 2的强度的光化性光，其中所述凸版形成在每次曝光周期中的光聚合性 能量引入层为0.1〜5J / cm 2以下。