ELECTRONIC APPARATUS HAVING AUXILIARY LIGHTING FOR ILLUMINATION
    115.
    发明申请
    ELECTRONIC APPARATUS HAVING AUXILIARY LIGHTING FOR ILLUMINATION 失效
    具有辅助照明的电子装置用于照明

    公开(公告)号:US20110261522A1

    公开(公告)日:2011-10-27

    申请号:US12815412

    申请日:2010-06-15

    Abstract: An electronic apparatus includes a mainframe with a keyboard embedded therein, a mounting frame pivotally connected with the mainframe, a display screen mounted in the mounting frame, a lighting source disposed on the mounting frame, and an optical element cooperating with the lighting source and slideably mounted on the mounting frame. Light from the lighting source is projected to different predetermined areas by adjusting positions of the optical element relative to the lighting source. In each of the positions of the optical element, the light from the lighting source is modulated by a corresponding portion of the optical element to be projected to a corresponding predetermined area.

    Abstract translation: 一种电子设备,包括嵌入其中的键盘的主机,与主机枢转地连接的安装框架,安装在安装框架中的显示屏,设置在安装框架上的照明源,以及与照明源协作的光学元件,并且可滑动地 安装在安装架上。 通过调整光学元件相对于照明源的位置,将来自照明源的光投射到不同的预定区域。 在光学元件的每个位置,来自光源的光被光学元件的相应部分调制以投影到相应的预定区域。

    SOI Schottky Source/Drain Device Structure to Control Encroachment and Delamination of Silicide
    118.
    发明申请
    SOI Schottky Source/Drain Device Structure to Control Encroachment and Delamination of Silicide 失效
    SOI肖特基源/排水装置结构,以控制硅化物的侵蚀和分层

    公开(公告)号:US20110227156A1

    公开(公告)日:2011-09-22

    申请号:US12726789

    申请日:2010-03-18

    CPC classification number: H01L29/78654 H01L29/7839

    Abstract: A Schottky field effect transistor is provided that includes a substrate having a layer of semiconductor material atop a dielectric layer, wherein the layer of semiconductor material has a thickness of less than 10.0 nm. A gate structure is present on the layer of semiconductor material. Raised source and drain regions comprised of a metal semiconductor alloy are present on the layer of semiconductor material on opposing sides of the gate structure. The raised source and drain regions are Schottky source and drain regions. In one embodiment, a first portion of the Schottky source and drain regions that is adjacent to a channel region of the Schottky field effect transistor contacts the dielectric layer, and a non-reacted semiconductor material is present between a second portion of the Schottky source and drain regions and the dielectric layer.

    Abstract translation: 提供一种肖特基场效应晶体管,其包括在电介质层顶上具有半导体材料层的衬底,其中半导体材料层的厚度小于10.0nm。 栅极结构存在于半导体材料层上。 在栅极结构的相对侧的半导体材料层上存在由金属半导体合金构成的凸起的源极和漏极区域。 凸起的源极和漏极区域是肖特基源极和漏极区域。 在一个实施例中,与肖特基场效应晶体管的沟道区相邻的肖特基源极和漏极区的第一部分接触电介质层,并且未反应的半导体材料存在于肖特基源的第二部分和 漏区和电介质层。

    SHREDDER WITH SLOT GUARD
    119.
    发明申请

    公开(公告)号:US20110210194A1

    公开(公告)日:2011-09-01

    申请号:US12915931

    申请日:2010-10-29

    Abstract: A shredder includes a shredder housing with a top head and a shredder mechanism receptacle. The top head has at least a first slot for receiving articles to be shredded. The shredder mechanism receptacle is connected to the top head for receiving a cutting assembly capable of shredding paper. A safety device is disposed in the shredder housing. The safety device includes a slot guard and gear system for selectively blocking the first slot.

    Abstract translation: 切碎机包括具有顶部头部和粉碎机构容器的切碎机壳体。 顶部头部至少具有用于接收待切割物品的第一槽。 切碎机构插座连接到顶部头部,用于接收能够切碎纸的切割组件。 安全装置设置在粉碎机壳体中。 安全装置包括用于选择性地阻挡第一槽的槽护罩和齿轮系统。

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