公开(公告)号：JPH09199407A

公开(公告)日：1997-07-31

申请号：JP2322596

申请日：1996-01-17

Applicant: CANON KK

Inventor： YOSHII MINORU ,  HASEGAWA MASANORI ,  MIYAZAKI KYOICHI

IPC: G03F7/207 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To detect the change of the light path length reflected the variation of a projecting/exposing optical system by a method wherein a laser interferometer, having a light path, is provided between an original sheet and the material to be exposed, and the length of the light path between the original sheet, reflecting the optical variation in the projecting/exposing system, and the material to be exposed, is detected. SOLUTION: When a reticle 1 is successively exposed to a wafer 3, the length of light path from the reticle 1 to the wafer 3 is extended because the position of the is unchanged. At that time, the signal of a photoelectric detector 10 showing the wafer height is changed from the phase 0 which is measured by a send. ahead process because the light path length between the reticle 1 and the wafer 3 is already measured. A stage 14 is moved to the photoaxial direction of a projection lens by a control system 18 in such a manner that the above- mentioned change is cancelled. As a result, the change of light path length is corrected, and the height of the surface of the wafer 3 can be positioned and exposed at the best focus position at all times.

公开(公告)号：JPH09167737A

公开(公告)日：1997-06-24

申请号：JP34793895

申请日：1995-12-15

Applicant: CANON KK

Inventor： YOSHII MINORU ,  MIYAZAKI KYOICHI ,  HASEGAWA MASANORI

IPC: G03F7/20 ,  G03F9/00 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To position the surface of a wafer to the image forming position of a projection optical system in a highly precise manner by a method wherein the optical axis direction of the wafer surface is aligned utilizing the position detecting part, which detects the position of optical axis direction of the projection optical system of the wafer surface, and a fluctuation detection part which detects the swinging of air. SOLUTION: A projecting and exposing operation is conducted on a reticle 2 and a wafer 4 by scanning at the prescribed speed ratio while they are being synchronized with each other in accordance with the magnification of image formation of a projection optical system 3. A projection part 5a and a detection part 6a constitute an element of a position detecting part. A light source part 5b and a light receiving part 6b constitute an element of a fluctuation detecting part. The information of distance from the prescribed surface of the auxiliary optical member 81, which is provided authogonally with the housing of a projection optical system 2, to the wafer 4 is computed by removing the effect of deflection of air based on the signal sent from a light receiving means 6. At this time, a driving part 8 is driven by a control part 9 using the above-mentioned distance information, and the wafer 4 is controlled to come to the desired position (the best image forming position of the projection optical system).

公开(公告)号：JPH0917718A

公开(公告)日：1997-01-17

申请号：JP16737695

申请日：1995-07-03

Applicant: CANON KK

Inventor： TAKEUCHI SEIJI ,  MIYAZAKI KYOICHI ,  HASEGAWA MASANORI ,  YOSHII MINORU

IPC: G02F1/13 ,  G03F7/20 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To obtain an aligner for inexpensively manufacturing precision device. SOLUTION: An aligner has a transmission liquid crystal display 2 for displaying a circuit pattern, a wafer stage 9 for relatively moving a wafer 4 to be mounted and the display 2, a projection image-forming optical system 3 for projecting a pattern displayed on the display 2 on the wafer 4 to form an image, and a display control device 6 for changing the pattern being displayed on the display 2 in synchronization with the relative move between the display 2 and the wafer 4.

公开(公告)号：JP2556126B2

公开(公告)日：1996-11-20

申请号：JP3674089

申请日：1989-02-16

Applicant: CANON KK

Inventor： OOWADA MITSUTOSHI ,  MATSUGI MASAKAZU ,  SUDA SHIGEYUKI ,  YOSHII MINORU ,  NIWA JUKICHI ,  NOSE TETSUSHI ,  SAITO KENJI

IPC: G01B11/14 ,  G03F9/00 ,  H01L21/027 ,  H01L21/30

公开(公告)号：JP2541924B2

公开(公告)日：1996-10-09

申请号：JP11147285

申请日：1985-05-24

Applicant: CANON KK

Inventor： OGINO YASUO ,  SUDA SHIGEYUKI ,  YOSHII MINORU ,  KAWAKAMI EIGO ,  OOWADA MITSUTOSHI ,  NIWA JUKICHI

IPC: G01S3/78 ,  G01S3/782 ,  G02B7/02 ,  G02B7/08 ,  G03B5/00 ,  G03B17/56 ,  G03B19/18 ,  H04N5/232

公开(公告)号：JP2518038B2

公开(公告)日：1996-07-24

申请号：JP3673989

申请日：1989-02-16

Applicant: CANON KK

Inventor： MATSUGI MASAKAZU ,  SUDA SHIGEYUKI ,  SAITO KENJI ,  ABE NAOTO ,  YOSHII MINORU ,  KURODA AKIRA

IPC: G01B11/00 ,  G03F9/00 ,  H01L21/027 ,  H01L21/30

公开(公告)号：JPH07333827A

公开(公告)日：1995-12-22

申请号：JP14713794

申请日：1994-06-06

Applicant: CANON KK

Inventor： YOSHII MINORU ,  KONO MICHIO ,  MIURA KIYONARI ,  MIYAZAKI KYOICHI ,  TAKEUCHI SEIJI ,  TSUJI TOSHIHIKO

IPC: G01N21/88 ,  G01N21/94 ,  G01N21/956 ,  G03F1/62 ,  G03F1/84 ,  H01L21/027 ,  G03F1/08 ,  G03F1/14

Abstract: PURPOSE:To detect presence or absence of foreign matter with high accuracy by using the result of measurement of transmittance of a pellicle measured by comparing the luminous fluxes past the prescribed positions on the outer side and inner side of a pellicle supporting frame and the signal obtd. by a detecting means for detecting scattered light. CONSTITUTION:The transmittance of the pellicle 6 is measured by utilizing a luminous flux 14 and a photoelectric converter 8 (8a, 8b) and the light intensity of the scattered light is corrected with the transmittance. At this time, the light intensity P1 of the luminous flux 14a transmitted through the prescribed point which is the transparent part on an original plate 4 outside the pellicle supporting plate 5 on a scanning line is compared with the light intensity P2 of the luminous flux 14b transmitted through a prescribed point 12b where the transparent parts of the pellicle 6 and the original plate 4 exist and the transmittance TP of the pellicle 6 is calculated in a processing system 9 by an equation TP=P2/P1. On the other hand, the magnitude of the light intensity of the scattered light from the foreign matter is detected and the size of the foreign matter is judged in the processing system 10. At this time, the influence of the fluctuation in the scattered light by a fluctuation in the transmittance of the pellicle 6 is removed by using the value calculated by the processing system 9, thereby, the grain size of the foreign matter is exactly discriminated.

公开(公告)号：JPH07298121A

公开(公告)日：1995-11-10

申请号：JP28801694

申请日：1994-11-22

Applicant: CANON KK

Inventor： BABA TAKESHI ,  NIWA YUKICHI ,  YOSHII MINORU

IPC: G03B13/36 ,  G02B7/28 ,  H04N5/232

Abstract: PURPOSE:To prevent malfunction of focus detection caused by the deterioration in sharpness due to hand=shake or a movement of an object. CONSTITUTION:An image pickup signal outputted from an image pickup element 1 is fed to a gate circuit 17 to extract only the image pickup signal corresponding to a signal resident in a focal detection area and a high pass filter 18 is used to detect a sharpness signal from the image pickup signal in the focus detection area and a detection circuit 19, an integration capacitor 20 and an A/D converter 21 are used to generate a focus signal and a microprocessor 30 is used to detect focusing. Furthermore, a binarizing circuit 25, a multiplexer 26 and memories 27, 28 and a speed detection circuit 29 are used to detect a motion vector from the image pickup signal and the microprocessor 30 controls the gate circuit 17 so as to move the focus detection area in a direction of motion represented by the motion vector.

公开(公告)号：JPH07270122A

公开(公告)日：1995-10-20

申请号：JP6066294

申请日：1994-03-30

Applicant: CANON KK

Inventor： YOSHII MINORU ,  MIYAZAKI KYOICHI ,  TAKEUCHI SEIJI

IPC: G01B11/00 ,  G03F7/20 ,  G03F9/00 ,  H01L21/027 ,  H01L21/68

Abstract: PURPOSE:To precisely detect a movement amount in the two-dimensional direction without using a laser length-measuring instrument and a two-dimensional diffraction grating. CONSTITUTION:Four heads 21a, 21b, 21c, 21d for a wafer are attached to the lower end part of a tube 2. The length direction of the two heads 21a, 21b for the wafer out of them is parallel to the X-direction, and the length direction of the two remaining heads 21c, 21d for the wafer is parallel to the Y-direction. The individual heads 21a, 21b, 21c, 21d for the wafer are formed in such a way that a plurality of element heads detecting the movement amount of a moving object by using the principle of a diffraction-grating interference are arranged in parallel. Scales 22a, 22b, 22c, 22d, for a wafer, in which one dimensional diffraction gratings have been formed respectively so as to correspond to the individual heads 21a, 21b, 21c, 21d for the wafer are installed on the surface of a wafer chuck 5. By means of the individual heads 21a, 21b, 21c, 21d for the wafer and the individual scales 22a, 22b, 22c, 22d for the wafer, the movement amount on the X-Y plane with reference to the tube 2 of the wafer chuck 5 is detected.

公开(公告)号：JPH07209200A

公开(公告)日：1995-08-11

申请号：JP1489794

申请日：1994-01-13

Applicant: CANON KK

Inventor： SUZUKI MASAYUKI ,  TSUJI TOSHIHIKO ,  MIYAZAKI KYOICHI ,  TAKEUCHI SEIJI ,  NOSE TETSUSHI ,  YOSHII MINORU

IPC: G01N21/88 ,  G01B11/30 ,  G01N21/94 ,  G01N21/956 ,  G03F1/84 ,  H01L21/66

Abstract: PURPOSE:To detect the presence or position of the foreign matter on an inspection surface by providing a scanning system having a refractive power forming spots at distances different with respect to a main scanning direction. CONSTITUTION:A beam expander 2 enlarges the diameter of the laser beam from a light source 1 to emit the laser beam as parallel beam and a scanning lens system 4 condenses the beam flux from a polygon mirror 3 to form spots SP on an inspection surface 6. When foreign matter is present on the inspection surface 6, reflected scattered beam is generated and condensed to a photodetector 8 to be photoelectrically converted. A signal processing means MP uses the output signal of the photodetector 8 to judge the presence of the foreign matter on the inspection surface 6. A lens system 4 has rotary asymmetric refractive power forming respective spots SP at distance different from the lens system 4 in the main scanning direction 5 on the inspection surface 6 and performs beam scanning in the main scanning direction 5 and, by moving the inspection surface 6 in a sub-scanning direction 5a, the presence of foreign matter is inspected on the entire surface of the inspection surface 6.