Hydrogen mixed gas supplying apparatus
    113.
    发明申请
    Hydrogen mixed gas supplying apparatus 审中-公开
    氢混合气体供给装置

    公开(公告)号:US20100104484A1

    公开(公告)日:2010-04-29

    申请号:US12318480

    申请日:2008-12-30

    Applicant: Hsu-Yang Wang

    Inventor: Hsu-Yang Wang

    Abstract: A hydrogen mixed gas supplying apparatus, consists of: a lead flow pipe, an atomizer, a liquid storage tank and a plasma heater; wherein, the lower end of lead flow pipe is linked to the liquid storage tank through a tube such that the methanol mixed liquid stored in the liquid storage tank is lead into the lead flow pipe; at the bottom end of lead flow pipe is the atomizer that atomizes the methanol mixed liquid into mixed liquid micro particles having average diameter not over 2 μm; lead air from one end of the lead flow pipe pushes the mixed liquid micro particles to plasma heater that dissolved the mixed liquid micro particles into hydrogen ions, hydroxide ions and the corresponding free radicals;and finally, the mixed gas of low temperature hydrogen gas, carbon monoxide, methane, carbon dioxide and nitrogen gas is then generated.

    Abstract translation: 一种氢混合气体供给装置,包括:铅流管,雾化器,液体储存罐和等离子体加热器; 其中,引流管的下端通过管连接到液体储罐,使得储存在液体储罐中的甲醇混合液被引入引流管; 引流管底部是将甲醇混合液雾化成平均直径不超过2μm的混合液体微粒的雾化器; 引导流管的一端的引导空气将混合液体微粒推入等离子体加热器,将混合液体微粒溶解成氢离子,氢氧根离子和相应的自由基;最后,低温氢气, 然后产生一氧化碳,甲烷,二氧化碳和氮气。

    Device for actuating a least piston and method for detecting failure in a device
    117.
    发明授权
    Device for actuating a least piston and method for detecting failure in a device 失效
    用于致动至少活塞的装置和用于检测装置中的故障的方法

    公开(公告)号:US06854376B2

    公开(公告)日:2005-02-15

    申请号:US10258021

    申请日:2001-04-23

    Applicant: Bruno Colin

    Inventor: Bruno Colin

    CPC classification number: F16J1/10 B01J4/00 B01L3/021

    Abstract: A device (1) for actuating at least one piston (2) moving axially in the bore (3) of a body (4), the piston (2) being driven by the longitudinal or curved movement (F2) of a control arm (5). Also disclosed is a method for detecting a failure in a device (1) having an intermediary element (6), located between the piston (2) and the control arm (5), this intermediary element (6) being also used as an alarm means should the intermediary element (6) be missing between the piston (2) and the arm (5). The invention is particularly applicable in the field of diagnosis.

    Abstract translation: 一种用于致动在主体(4)的孔(3)中轴向移动的至少一个活塞(2)的装置(1),活塞(2)由控制臂的纵向或弯曲运动(F2)驱动 5)。 还公开了一种用于检测具有位于活塞(2)和控制臂(5)之间的中间元件(6)的装置(1)中的故障的方法,该中间元件(6)也用作报警器 中间元件(6)在活塞(2)和臂(5)之间缺少的装置。 本发明特别适用于诊断领域。

    Process and apparatus for producing phosphine-containing gas
    119.
    发明授权
    Process and apparatus for producing phosphine-containing gas 失效
    用于生产含磷的气体的方法和装置

    公开(公告)号:US6027667A

    公开(公告)日:2000-02-22

    申请号:US659911

    申请日:1996-06-07

    Abstract: A process and apparatus is disclosed for generating a mixture of phosphine and diluent gas(es). A hydrolyzable metal phosphide, preferably magnesium phosphide, is released directly into liquid water under an atmosphere of gas inert to phosphine and in a free-flowing particulate form, composed of loose metal phosphide particles. The generated mixture of phosphine and inert carrier gas, e.g. CO.sub.2, is used as such or is diluted into a gas mixing chamber with air to a concentration below the ignitability limit before being used in fumigation. Using argon as a carrier gas the phosphine mixture is suitable for semiconductor doping.

    Abstract translation: 公开了用于产生磷化氢和稀释气体的混合物的方法和装置。 可水解的金属磷化物,优选磷化镁,在对磷化氢惰性气体和由松散的金属磷化物颗粒组成的自由流动的颗粒形式的气氛中直接释放到液态水中。 生成的膦和惰性载气的混合物,例如 二氧化碳原样使用,或者在用于熏蒸之前用空气稀释至浓度低于可燃极限的气体混合室。 使用氩作为载气,磷化氢混合物适用于半导体掺杂。

    Apparatus for fluid delivery in chemical vapor deposition systems
    120.
    发明授权
    Apparatus for fluid delivery in chemical vapor deposition systems 失效
    用于化学气相沉积系统中流体输送的装置

    公开(公告)号:US5620524A

    公开(公告)日:1997-04-15

    申请号:US395613

    申请日:1995-02-27

    CPC classification number: B01J4/00 C23C16/4481

    Abstract: Described herein is an apparatus and method for delivering fluid components for semiconductor processes such as chemical vapor deposition (CVD) and chemical etch processes. Any prescribed mixture of separate fluid reagents can be delivered with extreme accuracy and precision using the apparatus we describe here. The unique embodiment of a precision fluid pumping system utilizing internal pressure and temperature transducers, capacity volume and restrictive elements that comprise a continuous pulse-free system for use in CVD applications. This system has superior performance characteristics in the areas of: accuracy, precision, repeatability of the fluid mixture delivery and continuous repeatable delivery without intermittent pulsation. We describe a novel fluid pump whose design is integrated using a closed loop feedback system composed of temperature and pressure sensors. This allows the entire system to perform to in either an isobaric-isothermal mode or an isocratic-isothermal mode. The construction of this system is separated into three principle areas (Fluid Pump Hardware), (Fluid phase change hardware) and (Control algorithms), the complete embodiment constitutes a novel invention in the field of chemical delivery as pertaining to the fabrication of semiconductor devices.

    Abstract translation: 本文描述了用于传送用于诸如化学气相沉积(CVD)和化学蚀刻工艺的半导体工艺的流体部件的装置和方法。 使用我们在这里描述的设备,可以以极高的精确度和精确度传送任何规定的单独流体试剂的混合物。 使用内部压力和温度传感器的精密流体泵送系统的独特实施例,容量体积和包含用于CVD应用的连续无脉冲系统的限制元件。 该系统在精度,精度,流体混合物输送的重复性以及连续的可重复输送而无间歇脉动的领域具有卓越的性能特征。 我们描述了一种新型流体泵,其设计使用由温度和压力传感器组成的闭环反馈系统进行集成。 这允许整个系统以等压 - 等温模式或等度 - 等温模式进行。 该系统的结构分为三个主要领域(流体泵硬件),(流体相变硬件)和(控制算法),整个实施例构成了与半导体器件的制造有关的化学传输领域的新颖发明 。

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