公开(公告)号：US20120250133A1

公开(公告)日：2012-10-04

申请号：US13423498

申请日：2012-03-19

Applicant: Richard E. Stewart ,  Stephen P. Vernon ,  Paul T. Steele ,  Mark E. Lowry

Inventor： Richard E. Stewart ,  Stephen P. Vernon ,  Paul T. Steele ,  Mark E. Lowry

IPC: G02B26/00

CPC classification number: G02F1/293 ,  G02B26/001 ,  G02F1/015 ,  G02F2201/30 ,  G02F2202/10 ,  G02F2202/13 ,  G21K4/00 ,  G21K2201/06 ,  H04B10/505

Abstract: A high sensitivity transient grating ultrafast radiation to optical image converter is based on a fixed transmission grating adjacent to a semiconductor substrate. X-rays or optical radiation passing through the fixed transmission grating is thereby modulated and produces a small periodic variation of refractive index or transient grating in the semiconductor through carrier induced refractive index shifts. An optical or infrared probe beam tuned just below the semiconductor band gap is reflected off a high reflectivity mirror on the semiconductor so that it double passes therethrough and interacts with the radiation induced phase grating therein. A small portion of the optical beam is diffracted out of the probe beam by the radiation induced transient grating to become the converted signal that is imaged onto a detector.

Abstract translation: 对光学图像转换器的高灵敏度瞬态光栅超快辐射基于与半导体衬底相邻的固定透射光栅。 因此通过固定透射光栅的X射线或光学辐射被调制，并且通过载流子引起的折射率偏移在半导体中产生折射率或瞬态光栅的小的周期性变化。 调谐在半导体带隙正下方的光学或红外探测光束从半导体上的高反射率镜反射，使得其双重通过，并与其中的辐射诱导相位光栅相互作用。 光束的一小部分被辐射诱导的瞬态光栅衍射出探测光束，成为被成像到检测器上的转换信号。

公开(公告)号：US08258485B2

公开(公告)日：2012-09-04

申请号：US12807165

申请日：2010-08-30

Applicant: Richard A. Levesque ,  Natale M. Ceglio ,  Giovanni Nocerino ,  Fabio Zocchi

Inventor： Richard A. Levesque ,  Natale M. Ceglio ,  Giovanni Nocerino ,  Fabio Zocchi

IPC: H01J37/20

CPC classification number: G21K1/067 ,  G03F7/70033 ,  G03F7/70166 ,  G21K2201/06 ,  G21K2201/064 ,  G21K2201/065 ,  G21K2201/067 ,  H05G2/003 ,  H05G2/006 ,  H05G2/008

Abstract: A source-collector module (SOCOMO) for generating a laser-produced plasma (LPP) that emits EUV radiation, and a grazing-incidence collector (GIC) mirror arranged relative to the LPP and having an input end and an output end. The LPP is formed using an LPP target system having a light source portion and a target portion, wherein a pulsed laser beam from the light source portion irradiates Xenon liquid in the target portion. The GIC mirror is arranged relative to the LPP to receive the EUV radiation at its input end and focus the received EUV radiation at an intermediate focus adjacent the output end. A radiation collection enhancement device having at least one funnel element may be used to increase the amount of EUV radiation provided to the intermediate focus and/or directed to a downstream illuminator. An EUV lithography system that utilizes the SOCOMO is also disclosed.

Abstract translation: 用于产生发射EUV辐射的激光产生等离子体（LPP）的源极集电极模块（SOCOMO）以及相对于LPP布置并具有输入端和输出端的掠入射收集器（GIC）反射镜。 使用具有光源部分和目标部分的LPP靶系统形成LPP，其中来自光源部分的脉冲激光束照射目标部分中的氙液体。 GIC反射镜相对于LPP布置以在其输入端接收EUV辐射，并将接收的EUV辐射聚焦在邻近输出端的中间焦点。 具有至少一个漏斗元件的辐射收集增强装置可以用于增加提供给中间焦点和/或被引导到下游照明器的EUV辐射的量。 还公开了利用SOCOMO的EUV光刻系统。

公开(公告)号：USRE42065E1

公开(公告)日：2011-01-25

申请号：US11981032

申请日：2001-09-28

Applicant: Martin Antoni ,  Wolfgang Singer ,  Johannes Wangler

Inventor： Martin Antoni ,  Wolfgang Singer ,  Johannes Wangler

IPC: G03B27/42 ,  G03B27/54 ,  G21K5/00

CPC classification number: G21K1/06 ,  B82Y10/00 ,  G03F7/70075 ,  G03F7/70083 ,  G03F7/70108 ,  G03F7/70166 ,  G03F7/702 ,  G03F7/70233 ,  G03F7/70358 ,  G03F7/70891 ,  G21K1/067 ,  G21K2201/06 ,  G21K2201/064

Abstract: There is provided an illumination system for microlithography with wavelengths ≦193 nm. The illumination system includes a primary light source, a first optical component, a second optical component, an image plane, and an exit pupil. The first optical component transforms the primary light source into a plurality of secondary light sources that are imaged by the second optical component in the exit pupil. The first optical component includes a first optical element having a plurality of first raster elements that are imaged into the image plane, producing a plurality of images being superimposed at least partially on a field in the image plane. The second optical component comprises a first optical system that includes at least a third field mirror with positive optical power and a second optical system that includes at least a second field mirror with positive optical power. The first optical system images the plurality of secondary light sources in a plane between the first optical system and the second optical system, forming a plurality of tertiary light sources, and the second optical system images the plurality of tertiary light sources in the exit pupil.

Abstract translation: 提供了一种用于具有波长＆nlE; 193nm的微光刻的照明系统。 照明系统包括主光源，第一光学部件，第二光学部件，图像平面和出射光瞳。 第一光学部件将初级光源转换成由出射光瞳中的第二光学部件成像的多个次级光源。 第一光学部件包括具有成像到图像平面中的多个第一光栅元件的第一光学元件，产生至少部分地叠加在像平面中的场上的多个图像。 第二光学部件包括第一光学系统，其包括具有正光焦度的至少第三场反射镜和包括至少具有正光焦度的第二场反射镜的第二光学系统。 第一光学系统在第一光学系统和第二光学系统之间的平面内成像多个次级光源，形成多个第三光源，并且第二光学系统在出射光瞳中成像多个第三光源。

公开(公告)号：US07817777B2

公开(公告)日：2010-10-19

申请号：US12159486

申请日：2006-12-06

Applicant: Joachim Baumann ,  Christian David ,  Martin Engelhardt ,  Jörg Freudenberger ,  Eckhard Hempel ,  Martin Hoheisel ,  Thomas Mertelmeier ,  Franz Pfeiffer ,  Stefan Popescu ,  Manfred Schuster

Inventor： Joachim Baumann ,  Christian David ,  Martin Engelhardt ,  Jörg Freudenberger ,  Eckhard Hempel ,  Martin Hoheisel ,  Thomas Mertelmeier ,  Franz Pfeiffer ,  Stefan Popescu ,  Manfred Schuster

IPC: G01N23/04

CPC classification number: A61B6/00 ,  A61B6/032 ,  A61B6/4028 ,  A61B6/4291 ,  A61B6/4441 ,  A61B6/484 ,  G21K2201/06 ,  G21K2207/005 ,  H01J2235/086

Abstract: In a focus detector arrangement and method for an x-ray apparatus for generating projection or tomographic phase-contrast images of an examination subject, a beam of coherent x-rays is generated by an anode that has areas of different radiation emission characteristics arranged in bands thereon, that proceed parallel to grid lines of a phase grid that is used to generate the phase-contrast images.

Abstract translation: 在用于产生检查对象的投影或断层相位图像的x射线装置的焦点检测器装置和方法中，由具有布置在带中的不同辐射特性的区域的阳极产生相干X射线束 其平行于用于生成相位对比图像的相位网格的网格线。

公开(公告)号：USRE41667E1

公开(公告)日：2010-09-14

申请号：US11981033

申请日：2001-09-28

Applicant: Martin Antoni ,  Wolfgang Singer ,  Johannes Wangler

Inventor： Martin Antoni ,  Wolfgang Singer ,  Johannes Wangler

IPC: G03F7/20 ,  G21K5/04 ,  G21K1/06

CPC classification number: G21K1/06 ,  B82Y10/00 ,  G02B27/0905 ,  G02B27/0961 ,  G02B27/0983 ,  G03F7/70075 ,  G03F7/70083 ,  G03F7/70108 ,  G03F7/70166 ,  G03F7/702 ,  G03F7/70233 ,  G03F7/70358 ,  G03F7/708 ,  G03F7/70891 ,  G21K1/067 ,  G21K2201/06 ,  G21K2201/064

Abstract: There is provided an illumination system for microlithography with wavelengths≦193 nm that includes a primary light source, a first optical component, a second optical component, an image plane, and an exit pupil. The first optical component transforms the primary light source into a plurality of secondary light sources that are imaged by the second optical component in the exit pupil. The first optical element and the second optical element are reflective. The first optical component includes a first optical element having a plurality of first raster elements that are imaged into the image plane, producing a plurality of images being superimposed, at least partially, on a field in the image plane. The first optical component includes a collector unit and a second optical element having a plurality of second raster elements. The illumination system also includes a first optical axis between the collector unit and the first optical element, a second optical axis between the first optical element and the second optical element, and a third optical axis between the second optical element and the second optical component. A directional vector of the first optical axis and a directional vector of the second optical axis define a plane and wherein the first and second optical elements are tilted to cause a crossing of the projection of the third optical axis in to the plane and the first optical axis.

Abstract translation: 提供了一种用于微波光刻的照明系统，其具有包括初级光源，第一光学部件，第二光学部件，图像平面和出射光瞳的波长＆amp; 193nm。 第一光学部件将初级光源转换成由出射光瞳中的第二光学部件成像的多个次级光源。 第一光学元件和第二光学元件是反射性的。 第一光学部件包括具有成像到图像平面中的多个第一光栅元件的第一光学元件，至少部分地叠加在图像平面中的场上产生多个图像。 第一光学部件包括收集器单元和具有多个第二光栅元件的第二光学元件。 所述照明系统还包括在所述收集单元与所述第一光学元件之间的第一光轴，所述第一光学元件和所述第二光学元件之间的第二光轴以及所述第二光学元件和所述第二光学元件之间的第三光轴。 第一光轴的方向矢量和第二光轴的方向矢量限定一个平面，并且其中第一和第二光学元件被倾斜以使第三光轴的投影与平面交叉，并且第一光学 轴。

公开(公告)号：US07522708B2

公开(公告)日：2009-04-21

申请号：US11700152

申请日：2007-01-31

Applicant: Björn Heismann ,  Eckhard Hempel ,  Stefan Popescu

Inventor： Björn Heismann ,  Eckhard Hempel ,  Stefan Popescu

IPC: G21K1/00

CPC classification number: A61B6/06 ,  A61B6/00 ,  A61B6/032 ,  A61B6/4014 ,  A61B6/4092 ,  A61B6/4233 ,  A61B6/4266 ,  A61B6/4291 ,  A61B6/4441 ,  A61B6/484 ,  G03B42/02 ,  G21K2201/06 ,  G21K2207/005

Abstract: A focus/detector system of an X-ray apparatus is disclosed for generating projective or tomographic phase contrast recordings. In at least one embodiment, the system includes a beam source, including a focus and a focus-side source grating, arranged in the beam path to generate a field of ray-wise coherent X-rays; and a grating/detector arrangement having a phase grating with grating lines arranged parallel to the source grating for generating an interference pattern and a detector having a multiplicity of detector elements arranged flat for measuring the radiation intensity behind the phase grating. Further, the detector elements are formed by a multiplicity of elongate detection strips, which are aligned parallel to the grating lines of the phase grating. Furthermore, at least one embodiment also relates to the use of this focus/detector system in an X-ray system for generating projective recordings or in C-arc equipment or a CT system, and/or to a method for generating projective and tomographic X-ray recordings of a subject.

Abstract translation: 公开了用于产生投影或层析相位对比记录的X射线装置的焦点/检测器系统。 在至少一个实施例中，系统包括布置在光束路径中以产生射线相干X射线场的束源，包括焦点和焦点侧源光栅; 以及具有相位光栅的光栅/检测器装置，其具有平行于源光栅排列的光栅线，用于产生干涉图案;以及检测器，具有平坦布置的多个检测器元件，用于测量相位光栅后面的辐射强度。 此外，检测器元件由多个细长的检测条形成，其平行于相位光栅的光栅线排列。 此外，至少一个实施例还涉及在X射线系统中用于产生投影记录或在C弧设备或CT系统中使用该焦点/检测器系统和/或用于产生投影和断层X的方法 录音的主题。

公开(公告)号：US07514186B2

公开(公告)日：2009-04-07

申请号：US11167560

申请日：2005-06-28

Applicant: Hendricus Johannes Maria Meijer ,  Uwe Mickan ,  Marco Le Kluse

Inventor： Hendricus Johannes Maria Meijer ,  Uwe Mickan ,  Marco Le Kluse

IPC: G03F1/00

CPC classification number: G03F7/70941 ,  B82Y10/00 ,  B82Y40/00 ,  G03F1/24 ,  G03F1/38 ,  G03F1/40 ,  G03F7/707 ,  G03F7/70708 ,  G21K2201/06

Abstract: A reticle includes an area provided with a conductive metal-based compound coating for electrically grounding the reticle. The reticle is suitable for use with a lithography apparatus whereby the reticle pattern is imaged using extreme ultra violet radiation. One or more conducting pins, held at zero potential, may be pressed against the conductive coating for electrically grounding the reticle either during patterning the reticle by electron beam writing or during use in the lithographic apparatus. The areas coated with the metal-based compounds are wear resistant which reduces the occurrence of particles due to damage caused by mechanical contact between the conducting pins and the conductive coating.

Abstract translation: 掩模版包括设置有用于将掩模版电接地的导电金属基复合涂层的区域。 掩模版适用于光刻设备，由此使用极紫外辐射对掩模版图案进行成像。 保持在零电位的一个或多个导电引脚可以被压靠在导电涂层上，以在通过电子束写入或在光刻设备中的使用期间在掩模版图案化期间将掩模版电接地。 涂覆有金属基化合物的区域是耐磨的，其减少由于导电引脚和导电涂层之间的机械接触而引起的损伤的发生。

公开(公告)号：US07405871B2

公开(公告)日：2008-07-29

申请号：US11054040

申请日：2005-02-08

Applicant: Jose Sasian

Inventor： Jose Sasian

IPC: G02B5/08

CPC classification number: G03F7/702 ,  G02B17/0605 ,  G02B17/0615 ,  G02B27/0043 ,  G03F7/70175 ,  G21K2201/06

Abstract: A collector that includes a laser produced plasma (LPP) extreme ultra violet (EUV) light source and a first optical path from the source to a mirror. The mirror is the first mirror that light emitted from the source and traveling along the first optical path impinges upon. The collector also includes a second optical path from the source to another mirror. The other mirror is the first mirror that light emitted from the source and raveling along the second path impinges upon. The mirror and the other mirror are oriented relative to the source such that light from the source traveling along the first optical path travels in a direction opposite to light traveling from the source along the second optical path. A collector having a discharge extreme ultra violet (EUV) light source.

Abstract translation: 包括激光产生的等离子体（LPP）极紫外（EUV）光源和从光源到镜子的第一条光路的收集器。 镜子是从光源发射并沿着第一光路行进的光照射的第一个反射镜。 收集器还包括从源到另一个反射镜的第二光路。 另一个镜子是从源头发出的光并沿着第二条路径射出的第一个反射镜。 反射镜和另一个反射镜相对于光源定向，使得沿着第一光路行进的光的光沿与第二光路从光源行进的光相反的方向行进。 具有放电极紫外（EUV）光源的集电极。

公开(公告)号：US07257193B2

公开(公告)日：2007-08-14

申请号：US11347668

申请日：2006-02-03

Applicant: Ian Radley ,  Michael D. Moore ,  Mark Fitzgerald

Inventor： Ian Radley ,  Michael D. Moore ,  Mark Fitzgerald

IPC: H05G1/26

CPC classification number: H05G1/36 ,  G21K2201/06 ,  H01J2235/1291 ,  H05G1/025

Abstract: An x-ray source assembly includes an anode having a spot upon which electrons impinge based on power level supplied to the assembly, and an optic coupled to receive divergent x-rays generated at the spot and transmit output x-rays from the assembly. A control system is provided for maintaining intensity of the output x-rays dynamically during operation of the x-ray source assembly, notwithstanding a change in at least one operating condition of the x-ray source assembly, by changing the power level supplied to the assembly. The control system may include at least one actuator for effecting the change in the power level supplied to the assembly, by, e.g., controlling a power supply associated with the assembly. The control system may also change the temperature and/or the position of the anode to maintain the output intensity.

Abstract translation: x射线源组件包括阳极，阳极基于提供给组件的功率电平而撞击电子的点，以及光耦合以接收在该点处产生的发散的x射线，并从组件传输输出x射线。 提供了一种控制系统，用于在x射线源组件的操作期间动态地保持输出x射线的强度，尽管通过改变提供给X射线源组件的功率电平，尽管x射线源组件的至少一个操作状态发生变化 部件。 控制系统可以包括至少一个致动器，用于通过例如控制与组件相关联的电源来实现提供给组件的功率水平的变化。 控制系统还可以改变阳极的温度和/或位置以维持输出强度。

公开(公告)号：US20070029512A1

公开(公告)日：2007-02-08

申请号：US11512821

申请日：2006-08-30

Applicant: Norbert Bowering ,  Bjorn Hansson

Inventor： Norbert Bowering ,  Bjorn Hansson

IPC: G01J3/10

CPC classification number: G03F7/70925 ,  B82Y10/00 ,  G03F7/70033 ,  G03F7/70166 ,  G03F7/70916 ,  G21K2201/06 ,  H05G2/001

Abstract: Systems and methods are disclosed for protecting an EUV light source plasma production chamber optical element surface from debris generated by plasma formation. In one aspect of an embodiment of the present invention, a shield is disclosed which comprises at least one hollow tube positioned between the optical element and a plasma formation site. The tube is oriented to capture debris while allowing light to pass through the tube's lumen via reflection at relatively small angles of grazing incidence. In another aspect of an embodiment of the present invention, a shield is disclosed which is heated to a temperature sufficient to remove one or more species of debris material that has deposited on the shield. In yet another aspect of an embodiment of the present invention, a system is disclosed which a shield is moved from a light source plasma chamber to a cleaning chamber where the shield is cleaned.

Abstract translation: 公开了用于保护EUV光源等离子体生产室光学元件表面免受等离子体形成产生的碎片的系统和方法。 在本发明的实施例的一个方面，公开了一种屏蔽件，其包括位于光学元件和等离子体形成部位之间的至少一个中空管。 管被定向以捕获碎片，同时允许光以相对较小的掠入射角度的反射通过管的内腔。 在本发明的一个实施例的另一方面，公开了一种屏蔽件，其被加热到足以去除沉积在屏蔽上的一种或多种碎屑材料的温度。 在本发明的一个实施例的另一方面，公开了一种系统，其将屏蔽件从光源等离子体室移动到清洁室，其中屏蔽件被清洁。