Abstract:
A high sensitivity transient grating ultrafast radiation to optical image converter is based on a fixed transmission grating adjacent to a semiconductor substrate. X-rays or optical radiation passing through the fixed transmission grating is thereby modulated and produces a small periodic variation of refractive index or transient grating in the semiconductor through carrier induced refractive index shifts. An optical or infrared probe beam tuned just below the semiconductor band gap is reflected off a high reflectivity mirror on the semiconductor so that it double passes therethrough and interacts with the radiation induced phase grating therein. A small portion of the optical beam is diffracted out of the probe beam by the radiation induced transient grating to become the converted signal that is imaged onto a detector.
Abstract:
A source-collector module (SOCOMO) for generating a laser-produced plasma (LPP) that emits EUV radiation, and a grazing-incidence collector (GIC) mirror arranged relative to the LPP and having an input end and an output end. The LPP is formed using an LPP target system having a light source portion and a target portion, wherein a pulsed laser beam from the light source portion irradiates Xenon liquid in the target portion. The GIC mirror is arranged relative to the LPP to receive the EUV radiation at its input end and focus the received EUV radiation at an intermediate focus adjacent the output end. A radiation collection enhancement device having at least one funnel element may be used to increase the amount of EUV radiation provided to the intermediate focus and/or directed to a downstream illuminator. An EUV lithography system that utilizes the SOCOMO is also disclosed.
Abstract:
There is provided an illumination system for microlithography with wavelengths ≦193 nm. The illumination system includes a primary light source, a first optical component, a second optical component, an image plane, and an exit pupil. The first optical component transforms the primary light source into a plurality of secondary light sources that are imaged by the second optical component in the exit pupil. The first optical component includes a first optical element having a plurality of first raster elements that are imaged into the image plane, producing a plurality of images being superimposed at least partially on a field in the image plane. The second optical component comprises a first optical system that includes at least a third field mirror with positive optical power and a second optical system that includes at least a second field mirror with positive optical power. The first optical system images the plurality of secondary light sources in a plane between the first optical system and the second optical system, forming a plurality of tertiary light sources, and the second optical system images the plurality of tertiary light sources in the exit pupil.
Abstract:
In a focus detector arrangement and method for an x-ray apparatus for generating projection or tomographic phase-contrast images of an examination subject, a beam of coherent x-rays is generated by an anode that has areas of different radiation emission characteristics arranged in bands thereon, that proceed parallel to grid lines of a phase grid that is used to generate the phase-contrast images.
Abstract:
There is provided an illumination system for microlithography with wavelengths≦193 nm that includes a primary light source, a first optical component, a second optical component, an image plane, and an exit pupil. The first optical component transforms the primary light source into a plurality of secondary light sources that are imaged by the second optical component in the exit pupil. The first optical element and the second optical element are reflective. The first optical component includes a first optical element having a plurality of first raster elements that are imaged into the image plane, producing a plurality of images being superimposed, at least partially, on a field in the image plane. The first optical component includes a collector unit and a second optical element having a plurality of second raster elements. The illumination system also includes a first optical axis between the collector unit and the first optical element, a second optical axis between the first optical element and the second optical element, and a third optical axis between the second optical element and the second optical component. A directional vector of the first optical axis and a directional vector of the second optical axis define a plane and wherein the first and second optical elements are tilted to cause a crossing of the projection of the third optical axis in to the plane and the first optical axis.
Abstract:
A focus/detector system of an X-ray apparatus is disclosed for generating projective or tomographic phase contrast recordings. In at least one embodiment, the system includes a beam source, including a focus and a focus-side source grating, arranged in the beam path to generate a field of ray-wise coherent X-rays; and a grating/detector arrangement having a phase grating with grating lines arranged parallel to the source grating for generating an interference pattern and a detector having a multiplicity of detector elements arranged flat for measuring the radiation intensity behind the phase grating. Further, the detector elements are formed by a multiplicity of elongate detection strips, which are aligned parallel to the grating lines of the phase grating. Furthermore, at least one embodiment also relates to the use of this focus/detector system in an X-ray system for generating projective recordings or in C-arc equipment or a CT system, and/or to a method for generating projective and tomographic X-ray recordings of a subject.
Abstract:
A reticle includes an area provided with a conductive metal-based compound coating for electrically grounding the reticle. The reticle is suitable for use with a lithography apparatus whereby the reticle pattern is imaged using extreme ultra violet radiation. One or more conducting pins, held at zero potential, may be pressed against the conductive coating for electrically grounding the reticle either during patterning the reticle by electron beam writing or during use in the lithographic apparatus. The areas coated with the metal-based compounds are wear resistant which reduces the occurrence of particles due to damage caused by mechanical contact between the conducting pins and the conductive coating.
Abstract:
A collector that includes a laser produced plasma (LPP) extreme ultra violet (EUV) light source and a first optical path from the source to a mirror. The mirror is the first mirror that light emitted from the source and traveling along the first optical path impinges upon. The collector also includes a second optical path from the source to another mirror. The other mirror is the first mirror that light emitted from the source and raveling along the second path impinges upon. The mirror and the other mirror are oriented relative to the source such that light from the source traveling along the first optical path travels in a direction opposite to light traveling from the source along the second optical path. A collector having a discharge extreme ultra violet (EUV) light source.
Abstract:
An x-ray source assembly includes an anode having a spot upon which electrons impinge based on power level supplied to the assembly, and an optic coupled to receive divergent x-rays generated at the spot and transmit output x-rays from the assembly. A control system is provided for maintaining intensity of the output x-rays dynamically during operation of the x-ray source assembly, notwithstanding a change in at least one operating condition of the x-ray source assembly, by changing the power level supplied to the assembly. The control system may include at least one actuator for effecting the change in the power level supplied to the assembly, by, e.g., controlling a power supply associated with the assembly. The control system may also change the temperature and/or the position of the anode to maintain the output intensity.
Abstract:
Systems and methods are disclosed for protecting an EUV light source plasma production chamber optical element surface from debris generated by plasma formation. In one aspect of an embodiment of the present invention, a shield is disclosed which comprises at least one hollow tube positioned between the optical element and a plasma formation site. The tube is oriented to capture debris while allowing light to pass through the tube's lumen via reflection at relatively small angles of grazing incidence. In another aspect of an embodiment of the present invention, a shield is disclosed which is heated to a temperature sufficient to remove one or more species of debris material that has deposited on the shield. In yet another aspect of an embodiment of the present invention, a system is disclosed which a shield is moved from a light source plasma chamber to a cleaning chamber where the shield is cleaned.