公开(公告)号：US20160069825A1

公开(公告)日：2016-03-10

申请号：US14651813

申请日：2013-12-10

Applicant: inter-University Research Institute Corporation High Energy Accelerator Research Organization

Inventor： Tadashi Matsushita ,  Wolfgang Voegeli ,  Tetsuro Shirasawa ,  Toshio Takahashi ,  Etsuo Arakawa

IPC: G01N23/20

CPC classification number: G01N23/20008 ,  G01N23/20 ,  G21K2201/062 ,  G21K2201/064

Abstract: It is an object of the present invention to provide a method and an apparatus for measuring a scattering intensity distribution capable of measuring a scattering intensity distribution in a reciprocal space in a short time. The method or apparatus for measuring a scattering intensity distribution causes X-rays emitted from an X-ray source (101) to be reflected by an X-ray optical element (102) so as to converge in the vicinity of a surface of a sample (SA), causes monochromatic X-rays condensed after passing through a plurality of optical paths to be incident on the sample at glancing angles (ω) that differ depending on the respective optical paths at a time in a state in which there is a correlation between an angle formed by each optical path of the monochromatic X-rays and a reference plane, and an angle formed by each optical path and a plane including the normal of the reference plane and an optical path located in the center of the respective optical paths, detects scattering intensities of the monochromatic X-rays scattered by the sample using a two-dimensional detector (103) and calculates a scattering intensity distribution in the reciprocal space based on the scattering intensity distribution detected by the two-dimensional detector and the correlation.

Abstract translation: 本发明的目的是提供一种用于测量在短时间内能够测量往复空间中的散射强度分布的散射强度分布的方法和装置。 用于测量散射强度分布的方法或装置使得从X射线源（101）发射的X射线被X射线光学元件（102）反射，以便在样品表面附近会聚 （SA），使得在通过多个光路之后会聚的单色X射线以与扫描角（ω）不同的入射到样品的样品，所述扫描角（ω）在存在相关性的状态下的每个光路上不同 在由单色X射线的每个光路形成的角度和参考平面之间以及由每个光路形成的角度和包括基准平面的法线的平面和位于各个光路的中心的光路之间 使用二维检测器（103）检测由样本散射的单色X射线的散射强度，并且基于散射强度分布d计算往复空间中的散射强度分布 由二维检测器和相关性检测。

公开(公告)号：US09240254B2

公开(公告)日：2016-01-19

申请号：US13246488

申请日：2011-09-27

Applicant: Bruno W. Schueler ,  David A. Reed ,  Jeffrey Thomas Fanton ,  Rodney Smedt

Inventor： Bruno W. Schueler ,  David A. Reed ,  Jeffrey Thomas Fanton ,  Rodney Smedt

IPC: G01N23/223 ,  G21K1/00 ,  G21K1/06 ,  G01N23/227

CPC classification number: G21K1/06 ,  G01N23/223 ,  G01N23/2273 ,  G01N2223/61 ,  G21K2201/062 ,  G21K2201/064

Abstract: Systems and methods for characterizing films by X-ray photoelectron spectroscopy (XPS) are disclosed. For example, a system for characterizing a film may include an X-ray source for generating an X-ray beam having an energy below the k-edge of silicon. A sample holder may be included for positioning a sample in a pathway of the X-ray beam. A first detector may be included for collecting an XPS signal generated by bombarding the sample with the X-ray beam. A second detector may be included for collecting an X-ray fluorescence (XRF) signal generated by bombarding the sample with the X-ray beam. Monitoring/estimation of the primary X-ray flux at the analysis site may be provided by X-ray flux detectors near and at the analysis site. Both XRF and XPS signals may be normalized to the (estimated) primary X-ray flux to enable film thickness or dose measurement without the need to employ signal intensity ratios.

Abstract translation: 公开了通过X射线光电子能谱（XPS）表征膜的系统和方法。 例如，用于表征胶片的系统可以包括用于产生具有低于硅的k边缘的能量的X射线束的X射线源。 可以包括样品保持器以将样品定位在X射线束的通路中。 可以包括第一检测器以收集通过用X射线束轰击样品而产生的XPS信号。 可以包括第二检测器，用于收集通过用X射线束轰击样品而产生的X射线荧光（XRF）信号。 在分析现场的X射线通量探测器附近和分析现场可以提供监测/估计分析现场的主要X射线通量。 XRF和XPS信号都可以归一化为（估计的）初级X射线通量，以实现膜厚度或剂量测量，而不需要使用信号强度比。

公开(公告)号：US09235137B2

公开(公告)日：2016-01-12

申请号：US13370829

申请日：2012-02-10

Applicant: Damian Fiolka ,  Ralf Stuetzle

Inventor： Damian Fiolka ,  Ralf Stuetzle

IPC: G03B27/72 ,  G03F7/20 ,  G02B27/09 ,  G21K1/06 ,  G21K1/16

CPC classification number: G03F7/70233 ,  G02B27/0905 ,  G02B27/0977 ,  G03F7/70075 ,  G03F7/70116 ,  G03F7/70175 ,  G03F7/702 ,  G03F7/70566 ,  G21K1/06 ,  G21K1/16 ,  G21K2201/06 ,  G21K2201/064 ,  G21K2201/067

Abstract: An illumination optical unit includes a collector mirror which produces a polarization distribution that is applied to the first faceted optical element during the operation of the illumination optical unit. There are at least two first facet elements to which radiation having a differing polarization is applied. The first faceted optical element has at least one first state in which the normal vectors of the reflective surfaces of the first facet elements are selected so that a first predetermined polarization distribution results at the location of the object field during the operation of the illumination optical unit.

Abstract translation: 照明光学单元包括集光镜，其在照明光学单元的操作期间产生施加到第一刻面光学元件的偏振分布。 存在施加具有不同极化的辐射的至少两个第一小面元件。 第一刻面光学元件具有至少一个第一状态，其中第一面元件的反射表面的法向矢量被选择为使得在照明光学单元的操作期间在物场的位置处产生第一预定偏振分布 。

公开(公告)号：US09063277B2

公开(公告)日：2015-06-23

申请号：US13332582

申请日：2011-12-21

Applicant: Fumitaro Masaki ,  Akira Miyake

Inventor： Fumitaro Masaki ,  Akira Miyake

IPC: B05D5/06 ,  F21V9/04 ,  G03B27/32 ,  G03B27/54 ,  G02B5/08 ,  G03F7/20 ,  G21K1/06 ,  B82Y10/00

CPC classification number: G02B5/0816 ,  B82Y10/00 ,  G03F7/702 ,  G03F7/70233 ,  G03F7/70316 ,  G03F7/70958 ,  G21K1/062 ,  G21K2201/064 ,  G21K2201/067

Abstract: A method of manufacturing a mirror includes a first step of arranging, on a substrate, a shape adjusting layer having a layer thickness which changes by heat, a second step of arranging, on the shape adjusting layer, a reflection layer including a first layer, a second layer, and a barrier layer which is arranged between the first layer and the second layer, and prevents a diffusion of a material of the first layer and a material of the second layer, and a third step of bringing a shape of the reflection layer close to a target shape by changing a layer thickness profile of the shape adjusting layer after the second step, the third step including a process of partially annealing the shape adjusting layer.

Abstract translation: 一种制造反射镜的方法包括：在基板上布置具有由热变化的层厚度的形状调整层的第一步骤，在形状调整层上布置包括第一层的反射层的第二步骤， 第二层和布置在第一层和第二层之间的阻挡层，并且防止第一层的材料和第二层的材料的扩散，以及使反射形状的第三步骤 通过在第二步骤之后改变形状调整层的层厚度轮廓，接近目标形状的层，第三步骤包括部分退火形状调节层的过程。

公开(公告)号：US09057962B2

公开(公告)日：2015-06-16

申请号：US13691804

申请日：2012-12-02

Applicant: Natale M. Ceglio ,  Giovanni Nocerino ,  Fabio Zocchi

Inventor： Natale M. Ceglio ,  Giovanni Nocerino ,  Fabio Zocchi

IPC: G03F7/20 ,  G21K1/06

CPC classification number: G03F7/70033 ,  G03F7/2004 ,  G21K1/067 ,  G21K2201/064

Abstract: A source-collector module for an extreme ultraviolet (EUV) lithography system, the module including a laser-produced plasma (LPP) that generates EUV radiation and a grazing-incidence collector (GIC) mirror arranged relative thereto and having an input end and an output end. The LPP is formed using an LPP target system wherein a pulsed laser beam travels on-axis through the GIC and is incident upon solid, moveable LPP target. The GIC mirror is arranged relative to the LPP to receive the EUV radiation therefrom at its input end and focus the received EUV radiation at an intermediate focus adjacent the output end. An example GIC mirror design is presented that includes a polynomial surface-figure correction to compensate for GIC shell thickness effects, thereby improve far-field imaging performance.

Abstract translation: 一种用于极紫外（EUV）光刻系统的源极收集器模块，该模块包括产生EUV辐射的激光产生等离子体（LPP）和相对于其放置的放射入射收集器（GIC）反射镜，并且具有输入端和 输出端。 LPP使用LPP目标系统形成，其中脉冲激光束在轴上行进通过GIC并入射到固体，可移动的LPP靶上。 GIC反射镜相对于LPP布置，以在其输入端接收EUV辐射，并将接收的EUV辐射聚焦在邻近输出端的中间焦点。 提出了一个示例GIC镜面设计，其中包括一个多项式曲面图校正，以补偿GIC外壳厚度效应，从而提高远场成像性能。

公开(公告)号：US09029815B2

公开(公告)日：2015-05-12

申请号：US13583471

申请日：2011-03-02

Applicant: Hiroto Sato

Inventor： Hiroto Sato

IPC: G02B5/08 ,  G03F7/20 ,  H05G2/00

CPC classification number: G03F7/70166 ,  G03F7/70891 ,  G03F7/70958 ,  G21K2201/064 ,  H05G2/001

Abstract: A deterioration of the collector performance in an extreme ultraviolet light source device due to a heat deformation of the collector mirror assembly is to be prevented. The collector mirror assembly used in the extreme ultraviolet light source device comprises a plurality of reflective shells 21 with different diameters which are shaped as ellipsoids of revolution or hyperboloids of revolution, wherein the reflective shells 21 are arranged in a nested shape and the ends thereof are held by a holding structure 22. A cooling channel, through which a cooling medium flows is mounted at the reflective shell 21 in the axial direction of the reflective shell on the face being the back side of the reflective surface. This cooling channel acts as a reinforcement material and is able to suppress a heat deformation of the reflective shell 21. By using molybdenum as the material for the reflective shells 21, the heat deformation can be suppressed even further, and by providing cooling channels in the holding structure 22, the collector mirror assembly can be cooled even more efficiently and a heat deformation thereof can be suppressed.

Abstract translation: 防止由于集光镜组件的热变形引起的极紫外光源装置的集电体性能的劣化。 在极紫外光源装置中使用的收集器反射镜组件包括多个具有不同直径的反射壳21，其形状为旋转的椭圆形或旋转双曲面，其中反射壳21以嵌套形状布置，其端部为 由保持结构22保持。冷却介质流过的冷却通道在反射壳体的轴向方向上安装在反射壳体21的作为反射表面的背面的面上。 该冷却通道用作增强材料，并且能够抑制反射壳体21的热变形。通过使用钼作为反射壳体21的材料，可以进一步抑制热变形，并且通过在 可以更有效地冷却收集镜组件，并且可以抑制其热变形。

公开(公告)号：US09008271B2

公开(公告)日：2015-04-14

申请号：US13817562

申请日：2011-08-18

Applicant: Zeev Burshtein ,  Aharon Bar-David ,  Zeev Harel

Inventor： Zeev Burshtein ,  Aharon Bar-David ,  Zeev Harel

IPC: G21K1/06 ,  A61N5/10 ,  G21K5/04

CPC classification number: G21K1/06 ,  A61N5/1042 ,  A61N5/1084 ,  A61N2005/1091 ,  A61N2005/1095 ,  G21K1/046 ,  G21K5/04 ,  G21K2201/062 ,  G21K2201/064 ,  G21K2201/067

Abstract: An X-ray system is arranged for providing X-ray exposure to a target volume. The aforesaid X-ray system comprises an X-ray source and at least one focusing lens. The provided exposure is distributed over a volume of the target in a substantially uniform manner.

Abstract translation: 布置X射线系统以提供对目标体积的X射线曝光。 上述X射线系统包括X射线源和至少一个聚焦透镜。 所提供的曝光以基本均匀的方式分布在目标体积上。

公开(公告)号：US20150008345A1

公开(公告)日：2015-01-08

申请号：US14481620

申请日：2014-09-09

Applicant: GIGAPHOTON INC.

Inventor： Shinji NAGAI ,  Tamotsu ABE ,  Hitoshi NAGANO ,  Osamu WAKABAYASHI

IPC: H05G2/00 ,  G21K1/06

CPC classification number: H05G2/008 ,  B23K10/00 ,  B23K26/12 ,  B23K26/36 ,  G03B27/32 ,  G03F7/70025 ,  G03F7/70033 ,  G21K1/067 ,  G21K5/00 ,  G21K5/02 ,  G21K2201/064 ,  H05G2/005

Abstract: An apparatus for generating extreme ultraviolet light used with a laser apparatus and connected to an external device so as to supply the extreme ultraviolet light thereto includes a chamber provided with at least one inlet through which a laser beam is introduced into the chamber; a target supply unit provided on the chamber configured to supply a target material to a predetermined region inside the chamber; a discharge pump connected to the chamber; at least one optical element provided inside the chamber; an etching gas introduction unit provided on the chamber through which an etching gas passes; and at least one temperature control mechanism for controlling a temperature of the at least one optical element.

Abstract translation: 一种用于产生与激光装置并且连接到外部装置以便提供极紫外光的极紫外光的装置，包括设置有至少一个入口的腔室，激光束通过该入口引入腔室; 设置在所述室上的目标供给单元，其构造成将目标材料供应到所述室内的预定区域; 连接到所述室的排出泵; 设置在所述室内的至少一个光学元件; 设置在所述室上的蚀刻气体导入单元，所述蚀刻气体通过所述室; 以及用于控制所述至少一个光学元件的温度的至少一个温度控制机构。

公开(公告)号：US08872142B2

公开(公告)日：2014-10-28

申请号：US13474100

申请日：2012-05-17

Applicant: Shinji Nagai ,  Tamotsu Abe ,  Hitoshi Nagano ,  Osamu Wakabayashi

Inventor： Shinji Nagai ,  Tamotsu Abe ,  Hitoshi Nagano ,  Osamu Wakabayashi

IPC: G21K5/00 ,  G21K5/02 ,  H05G2/00 ,  G03F7/20

CPC classification number: H05G2/008 ,  B23K10/00 ,  B23K26/12 ,  B23K26/36 ,  G03B27/32 ,  G03F7/70025 ,  G03F7/70033 ,  G21K1/067 ,  G21K5/00 ,  G21K5/02 ,  G21K2201/064 ,  H05G2/005

Abstract: An apparatus for generating extreme ultraviolet light used with a laser apparatus and connected to an external device so as to supply the extreme ultraviolet light thereto includes a chamber provided with at least one inlet through which a laser beam is introduced into the chamber; a target supply unit provided on the chamber configured to supply a target material to a predetermined region inside the chamber; a discharge pump connected to the chamber; at least one optical element provided inside the chamber; an etching gas introduction unit provided on the chamber through which an etching gas passes; and at least one temperature control mechanism for controlling a temperature of the at least one optical element.

Abstract translation: 一种用于产生与激光装置并且连接到外部装置以便提供极紫外光的极紫外光的装置，包括设置有至少一个入口的腔室，激光束通过该入口引入腔室; 设置在所述室上的目标供给单元，其构造成将目标材料供应到所述室内的预定区域; 连接到所述室的排出泵; 设置在所述室内的至少一个光学元件; 蚀刻气体导入单元，设置在所述室上，蚀刻气体通过所述蚀刻气体导入单元; 以及用于控制所述至少一个光学元件的温度的至少一个温度控制机构。

公开(公告)号：US08872137B2

公开(公告)日：2014-10-28

申请号：US13619837

申请日：2012-09-14

Applicant: Doug Childers

Inventor： Doug Childers

IPC: G21K5/00 ,  C03C25/12

CPC classification number: G21K5/00 ,  C03C25/12 ,  F26B3/28 ,  F26B13/00 ,  G21K1/067 ,  G21K2201/064 ,  G21K2201/065

Abstract: A device for UV curing a coating or printed ink on an workpiece such as an optical fiber comprises dual elliptical reflectors arranged to have a co-located focus. The workpiece is centered at the co-located focus such that the dual elliptical reflectors are disposed on opposing sides of the workpiece. Two separate light sources are positioned at a second focus of each elliptical reflector, wherein light irradiated from the light sources is substantially concentrated onto the surface of the workpiece at the co-located focus.

Abstract translation: 用于UV固化诸如光纤的工件上的涂层或印刷油墨的装置包括布置成具有共同定焦点的双椭圆形反射器。 工件在同一焦点处居中，使得双椭圆形反射器设置在工件的相对侧上。 两个单独的光源被定位在每个椭圆形反射器的第二焦点处，其中从光源照射的光在共同定位的焦点处基本集中在工件的表面上。