公开(公告)号：JP2010161364A

公开(公告)日：2010-07-22

申请号：JP2010000046

申请日：2010-01-04

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： LOOPSTRA ERIK ROELOF ,  SWINKELS GERARDUS HUBERTUS PETRUS MARIA ,  BUURMAN ERIK PETRUS

IPC: H01L21/027

CPC classification number: G21K1/025 ,  G03B27/54 ,  G03F7/70033 ,  G03F7/70175 ,  H01S3/2232 ,  H01S3/2316 ,  H05G2/001

Abstract: PROBLEM TO BE SOLVED: To provide a laser device that more facilitates synchronizing the laser device with a droplet stream of a fuel material. SOLUTION: The laser device 65 includes a seed laser 67, one or more amplifiers 79, 81, 83, 85, a detector 87, and one or more optical elements 71, 73, 75, 77 for guiding a radiation emitted by the seed laser 67 towards a plasma generation site 90. The optical elements guide an amplified spontaneous emission radiation which has been emitted by the seed laser 67 and has been reflected from a droplet 93 of a fuel material towards the detector. The detector 87 triggers the generation of a laser radiation pulse by the seed laser 67 when the reflected amplified spontaneous emission radiation is detected. COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：提供一种更有助于使激光装置与燃料材料的液滴流同步的激光装置。 解决方案：激光装置65包括种子激光器67，一个或多个放大器79,81,83,85，检测器87和一个或多个光学元件71,73,75,77，用于引导由 种子激光器67朝向等离子体产生位置90.光学元件引导已经由种子激光器67发射并已从燃料材料的液滴93向检测器反射的放大的自发发射辐射。 当检测到反射的放大的自发发射辐射时，检测器87触发由种子激光器67产生激光辐射脉冲。 版权所有（C）2010，JPO＆INPIT

公开(公告)号：JP2010045357A

公开(公告)日：2010-02-25

申请号：JP2009183972

申请日：2009-08-07

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： LOOPSTRA ERIK ROELOF ,  SCHIMMEL HENDRIKUS GIJSBERTUS

IPC: H01L21/027 ,  H05G2/00

CPC classification number: G03F7/70175 ,  G03F7/70033 ,  G21K1/06 ,  G21K2201/064 ,  G21K2201/067 ,  H05G2/003 ,  H05G2/005 ,  H05G2/006 ,  H05G2/008

Abstract: PROBLEM TO BE SOLVED: To provide a method and/or apparatus for increasing the time taken to allow fuel droplets to pass through a laser beam pulse.
SOLUTION: A radiation source is configured so as to generate radiation. The radiation source includes: a fuel droplet generator, configured so as to generate the flow of fuel droplets to be guided to a plasma generating portion; a laser which is a laser configured to generate a laser beam to be guided to the plasma generating portion and in which an angle between a direction of movement of the flow of droplets and a direction of the laser beam is smaller than 90°C; and a collector configured so as to condense the radiation generated by plasma formed by the plasma forming portion, when the radiation beam collides with the droplets. The collector is configured so as to substantially reflect the radiation along an optical axis of the radiation source. The laser beam is guided to the plasma generating portion through an aperture provided on the collector.
COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：提供一种用于增加允许燃料液滴通过激光束脉冲所花费的时间的方法和/或装置。 解决方案：辐射源被配置为产生辐射。 辐射源包括：燃料液滴发生器，其被配置为产生要被引导到等离子体产生部分的燃料液滴流; 激光器，其被配置为产生要被引导到等离子体产生部分的激光束，并且其中液滴流动方向与激光束的方向之间的角度小于90℃; 以及收集器，其被配置为当辐射束与液滴碰撞时，冷凝由等离子体形成部分形成的等离子体产生的辐射。 收集器被配置为基本上沿辐射源的光轴反射辐射。 激光束通过设置在收集器上的孔被引导到等离子体产生部分。 版权所有（C）2010，JPO＆INPIT

公开(公告)号：JP2010010707A

公开(公告)日：2010-01-14

申请号：JP2009234094

申请日：2009-10-08

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： JACOBS JOHANNES HENRICUS WILHELMUS ,  TEN KATE NICOLAAS ,  LEENDERS MARTINUS HENDRIKUS ANTONIUS ,  LOOPSTRA ERIK ROELOF ,  VERHAGEN MARTINUS CORNELIS MARIA ,  BOOM HERMAN ,  JANSSEN FRANCISCUS JOHANNES JOSEPH ,  BOUCHOMS IGOR PETRUS MARIA ,  KEMPER NICOLAAS R ,  OTTENS JOOST JEROEN ,  KOEK YUECEL ,  VAN ES JOHANNES

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70341 ,  G03F7/70716 ,  G03F7/70875

Abstract: PROBLEM TO BE SOLVED: To provide a system that efficiently and effectively eliminate energy loss in a lithographic apparatus where a related component is locally cooled by evaporation of a supplied liquid and may be deformed and change in quality to possibly cause defocusing and lens aberrations during immersion lithography in which the part between a projection system and a substrate is filled with an immersion liquid so as to increase a numerical aperture. SOLUTION: A schedule table 34 is prepared which contains information regarding time when the supplied liquid 11 is most apt to evaporate, the position, speed, acceleration, etc. of the substrate, and a liquid evaporation controller 30 heats at least part of the substrate W by a heater or sends humidifying air according to the schedule table 34 to prevent local evaporation. COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：提供一种系统，其有效地和有效地消除光刻设备中的能量损失，其中相关部​​件通过供应液体的蒸发局部冷却，并且可能变形并且质量变化以可能引起散焦和透镜 浸渍光刻期间的像差，其中投影系统和衬底之间的部分被浸没液体填充以增加数值孔径。 解决方案：准备一个计划表34，其中包含关于所供应的液体11最易蒸发的时间的信息，基板的位置，速度，加速度等，并且液体蒸发控制器30加热至少部分 或者根据附表表34发送加湿空气以防止局部蒸发。 版权所有（C）2010，JPO＆INPIT

公开(公告)号：JP2009295979A

公开(公告)日：2009-12-17

申请号：JP2009126050

申请日：2009-05-26

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： MONDT EVA ,  GILISSEN NOUD JAN ,  JACOBS HERNES ,  KATE NICOLAAS TEN ,  LOOPSTRA ERIK ROELOF ,  VERMAELEN MARKUS MARTINUS PETR ,  RIEPEN MICHEL

IPC: H01L21/027

CPC classification number: G03F7/70341 ,  G03F7/707

Abstract: PROBLEM TO BE SOLVED: To disclose a table in which measures are taken to seal between the table and an edge of an object, in use, supported on the table.
SOLUTION: In particular, a capillary passage is formed between the object on the table and the table itself. A meniscus pinning feature and/or the presence of an overpressure at the radially inward side of the capillary passage holds the liquid in the passage and helps prevent it from advancing further radially inwardly. The features to perform this function may be associated with or formed in a member surrounding the object. The member may be thermally decoupled from a part of the table.
COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：公开一种表格，其中采用措施来将桌子和使用中的物体的边缘密封在桌子上。 具体而言，在台面上的物体与桌子本身之间形成毛细通道。 在毛细管通道的径向向内的弯液面钉扎特征和/或超压存在使通道中的液体保持在通道中并有助于防止其进一步向内径向前进。 执行该功能的特征可以与围绕对象的构件相关联或形成在其中。 该构件可以与桌子的一部分热分离。 版权所有（C）2010，JPO＆INPIT

公开(公告)号：JP2009267403A

公开(公告)日：2009-11-12

申请号：JP2009098190

申请日：2009-04-14

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： VAN SCHOOT JAN BERNARD PLECHEL ,  LOOPSTRA ERIK ROELOF

IPC: H01L21/027 ,  G02B19/00 ,  G03F7/20

CPC classification number: G03B27/32 ,  G03B27/42 ,  G03F7/70108

Abstract: PROBLEM TO BE SOLVED: To provide an inexpensive constitution of a double facet illumination system in which an illumination mode thereof can be variably controlled, and to provide a method for controlling the illumination mode in such an illumination system. SOLUTION: An illumination system IL of a lithographic apparatus includes a first optical element 100 comprising first raster elements 110 that divide radiation beam into a plurality of radiation channels, and a second optical element 160 to receive the plurality of radiation channels, the second optical element 160 comprising second raster elements 150. For each of the radiation channels, a raster element of the first raster elements is associated with respective raster elements of the second raster elements to provide a continuous beam path from the first optical element to an object plane. A filter SF is provided in a path through which the radiation beam has passed to create a desired spatial intensity distribution in a pupil of the illumination system IL. COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：为了提供可以可变地控制其照明模式的双面照明系统的廉价构造，并且提供一种用于控制这种照明系统中的照明模式的方法。 解决方案：光刻设备的照明系统IL包括第一光学元件100，第一光学元件100包括将辐射束分成多个辐射通道的第一光栅元件110以及用于接收多个辐射通道的第二光学元件160， 第二光学元件160包括第二光栅元件150.对于每个辐射通道，第一光栅元件的光栅元件与第二光栅元件的相应光栅元件相关联，以提供从第一光学元件到对象的连续光束路径 飞机 在辐射束通过的路径中设置滤光器SF，以在照明系统IL的光瞳中产生期望的空间强度分布。 版权所有（C）2010，JPO＆INPIT

公开(公告)号：JP2009111366A

公开(公告)日：2009-05-21

申请号：JP2008258221

申请日：2008-10-03

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： VAN DER WIJST MARC WILHELMUS M ,  LOOPSTRA ERIK ROELOF ,  DE HOON CORNELIUS ADRIANUS LAM

IPC: H01L21/027 ,  F16F15/02 ,  G03F7/20

CPC classification number: G03F7/709 ,  F16F7/1005

Abstract: PROBLEM TO BE SOLVED: To increase the stable operating range of active damping. SOLUTION: A lithographic apparatus comprises an illumination system, configured to condition a radiation beam and a support constructed to support a patterning device. The lithographic apparatus further comprises a substrate table constructed to hold a substrate, and a projection system configured to project the patterned beam onto a target portion of the substrate. An active damping system is provided to dampen a vibration of at least part of the projection system. The active damping system comprises a combination of a sensor to measure the position quantity of the projection system, and an actuator to exert a force on the projection system with the dependence on a signal provided by the sensor. The active damping system is connected to a damping mass, with the damping mass being connected to the projection system. COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：增加主动阻尼的稳定工作范围。 解决方案：光刻设备包括照明系统，其被配置为调节辐射束和构造成支撑图案形成装置的支撑。 光刻设备还包括构造成保持基板的基板台，以及配置成将图案化的光束投影到基板的目标部分上的投影系统。 提供主动阻尼系统以抑制至少部分投影系统的振动。 主动阻尼系统包括用于测量投影系统的位置量的传感器的组合，以及依赖于由传感器提供的信号而在投影系统上施加力的致动器。 主动阻尼系统连接到阻尼块，阻尼块连接到投影系统。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP2009105469A

公开(公告)日：2009-05-14

申请号：JP2009033850

申请日：2009-02-17

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： LUIJTEN CARLO CORNELIS MARIA ,  LAMBERTUS DONDERS SJOERD NICOL ,  KEMPER NICOLAAS R ,  LEENDERS MARTINUS HENDRIKUS AN ,  LOOPSTRA ERIK ROELOF ,  STREEFKERK BOB ,  BECKERS MARCEL ,  BOOM HERMAN ,  MOERMAN RICHARD

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70341

Abstract: PROBLEM TO BE SOLVED: To provide an immersion lithographic apparatus in which the generation of bubbles in immersion liquid is reduced. SOLUTION: The immersion lithographic projection apparatus has a liquid confinement structure configured to at least partly confine liquid to a space between a projection system and a substrate, the confinement structure has a buffer surface, and the buffer surface, when in use, is positioned in close proximity to a plane substantially comprising the upper surface of the substrate and of a substrate table holding the substrate to define a passage having a flow resistance. A recess is provided in the buffer surface, the recess, when in use, is normally full of the immersion liquid to achieve rapid filling of a gap between the substrate and substrate table as the gap moves under the buffer surface. The recess may be annular or radial and a plurality of recesses may be provided. COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：提供一种浸没式光刻设备，其中浸没液体中的气泡产生减少。 浸没式光刻投影装置具有液体限制结构，其被配置为至少部分地将液体限制在投影系统和基板之间的空间中，限制结构具有缓冲表面，并且当使用时，缓冲表面， 被定位在靠近基本上包括衬底的上表面的平面和保持衬底的衬底台上，以限定具有流动阻力的通道。 在缓冲表面设置有凹部，当使用时，凹部通常充满浸没液体，以在间隙在缓冲表面下移动时实现快速填充基板和基板台之间的间隙。 凹部可以是环形的或径向的，并且可以设置多个凹部。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP2009071316A

公开(公告)日：2009-04-02

申请号：JP2008274669

申请日：2008-10-24

Applicant: Asml Netherlands Bv ,  Carl Zeiss Smt Ag ,  エーエスエムエル ネザーランズ ビー.ブイ. ,  カール・ツァイス・エスエムティー・アーゲー

Inventor： MULKENS JOHANNES CATHARINUS HU ,  BASELMANS JOHANNES JACOBUS MAT ,  GRAEUPNER PAUL ,  LOOPSTRA ERIK ROELOF ,  STREEFKERK BOB

IPC: H01L21/027 ,  G02B3/14 ,  G02B21/33 ,  G03F7/20 ,  H01L21/683

CPC classification number: G03F7/70891 ,  G02B3/14 ,  G02B21/33 ,  G03F7/70341

Abstract: PROBLEM TO BE SOLVED: To enable an effective control of optical performance of an immersion lithographic projection system. SOLUTION: An immersion lithographic apparatus includes a lens having optical properties which can be adjusted by an adjusting device formed from an immersion liquid filled up between a final element of the projection system and a substrate. The adjusting device is arranged to adjust the properties of the liquid lens such as the shape, composition, refractive index or absorption index as a function of space or time in order to change the imaging performance of the immersion lithographic apparatus. COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：为了能够有效地控制浸没式光刻投影系统的光学性能。 解决方案：浸没式光刻设备包括具有光学特性的透镜，该透镜可以通过由填充在投影系统的最终元件和基板之间的浸没液体形成的调节装置来调节。 为了改变浸没式光刻设备的成像性能，调整装置被布置为调节液晶透镜的特性，例如形状，成分，折射率或吸收指数作为空间或时间的函数。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP2008112997A

公开(公告)日：2008-05-15

申请号：JP2007274589

申请日：2007-10-23

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： ONVLEE JOHANNES ,  LOOPSTRA ERIK ROELOF

IPC: H01L21/027 ,  G03F7/20 ,  H01L21/68

CPC classification number: G03F7/70775 ,  G03F1/42 ,  G03F1/44 ,  G03F7/707 ,  G03F9/7011

Abstract: PROBLEM TO BE SOLVED: To detect deviation of a patterning device in lithographic equipment. SOLUTION: In the lithographic equipment, a position of a support to a first structure of the lithographic equipment is measured, and a position of the patterning device to a second structure of the lithographic equipment is measured. A correlation between the position of the patterning device and the position of the support is judged from the measured position of the support, the measured position of the patterning device, and mutual positions of the first structure and the second structure. The deviation of the patterning device to the support is obtained from the correlation, by which the deviation of the patterning device to the support is detected, wherein the support is constituted to support the patterning device. The structure may include a projection system to project a radiation beam which is patterned by the patterning device. The projection system can be connected with a frame such as a metrology frame of the lithographic equipment. COPYRIGHT: (C)2008,JPO&INPIT

Abstract translation: 要解决的问题：检测平版印刷设备中的图案形成装置的偏差。 解决方案：在光刻设备中，测量对光刻设备的第一结构的支撑件的位置，并且测量图案形成装置到平版印刷设备的第二结构的位置。 从支撑体的测量位置，图案形成装置的测量位置以及第一结构和第二结构的相互位置判断图案形成装置的位置与支撑件的位置之间的相关性。 从图案形成装置与支撑体的偏差的相关性可以获得图案形成装置与支撑体的偏离，通过该相关性，检测图案形成装置与支撑体的偏差，其中支撑构造为支撑图案形成装置。 该结构可以包括投影系统以投射由图案形成装置构图的辐射束。 投影系统可以与诸如平版印刷设备的计量框架的框架连接。 版权所有（C）2008，JPO＆INPIT

公开(公告)号：JP2008053741A

公开(公告)日：2008-03-06

申请号：JP2007253982

申请日：2007-09-28

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： VAN DE VEN BASTIAAN LAMBERTUS ,  HEERENS GERT-JAN ,  LANSBERGEN ROBERT GABRIEL M ,  LEENDERS MARTINUS HENDRIKUS AN ,  LOOPSTRA ERIK ROELOF

IPC: G03F7/20 ,  H01L21/027 ,  H01L21/00 ,  H01L21/68

CPC classification number: G03F7/709 ,  G03F7/707 ,  G03F7/70716 ,  G03F7/70741 ,  G03F7/70783 ,  G03F7/70825

Abstract: PROBLEM TO BE SOLVED: To provide a lithography system capable of improving precision of an image projected on a substrate and reducing idle time. SOLUTION: A lithography apparatus is equipped with a connection system for positioning a patterning means against a reticle stage 25. This lithography projection apparatus has an operation cycle including: a projection phase where the projection system projects a patterned beam on a target part of a substrate and the reticle stage 25 supports the patterning means 1; and an exchange phase where the patterning means is exchanged and the connection system positions the patterning means against the reticle stage. The lithography apparatus is characterized in that the connection system is separated with a distance from the patterning means during the projection phase, thereby the projection image of higher precision is obtained. COPYRIGHT: (C)2008,JPO&INPIT

Abstract translation: 要解决的问题：提供能够提高投影在基板上的图像的精度并减少空闲时间的光刻系统。 解决方案：光刻设备配备有用于将图案化装置定位在标线片平台25上的连接系统。该光刻投影设备具有操作周期，该操作周期包括：投影阶段，其中投影系统将图案化的光束投影到目标部分 的基板和标线片台25支撑图案形成装置1; 以及交换阶段，其中图案化装置被更换，并且连接系统将图案化装置对准标线片台。 光刻设备的特征在于，在投影阶段期间，连接系统与图案形成装置隔开一段距离，从而获得更高精度的投影图像。 版权所有（C）2008，JPO＆INPIT