Abstract:
1. A PROCESS FOR THE PRODUCTION OF P-NITROPHENOLS WHICH COMPRISES (A) MIXING (1) A NITRILE OF THE FORMULA R.O.NO, IN WHICH R IS AN ALKYL GROUP HAVING 1-6 CARBON ATOMS WITH (2) PHENOLS SELECTED FROM THE GROUP CONSISTING ESSENTIALLY OF PHENOL, M-CRESOL AND A MIXTURE OF MAND P-CRESOL IN AN ACIDIC AQUEOUS MEDIUN WHICH IS AN AQUEOUS SOLUTION OF A STRONG ACID AT TEMPERATURES RANGING FROM -20* TO 20*C TO FORM A PRECURSOR P-NITROSOPHENOL; AND (B) TREATING THE P-NITROSOPHENOL WITH NITRIC ACID IN THE PRESENCE OF AN ALCOHOL OF THE FORMULA R1OH, IN WHICH R1 IS AN ALKYL GROUP HAVING 1-6 CARBON ATOMS, AT TEMPERATURES RANGING FROM ABOUT -10* TO 25*C.; AND (C) RECOVERING A P-NITRO-PHENOL
Abstract:
PURPOSE: A nitration reactive device is provided not to cause side reaction, etc, to conduct nitration effectively in short reaction time at high temperature, and to facilitate the expansion of nitration to industrial magnitude without danger of explosion, use of toxic material, etc. CONSTITUTION: A nitration reactive device comprises a micro mixer(11), and a heat exchanger(12). Mixture of an organic compound and a nitrating agent is formed by putting the organic compound and the nitrating agent into a micro mixer. The heat exchanger is connected to a micro mixer. The mixture formed in the micro mixer is put into the heat exchanger, thereby the nitration of the organic compound in the mixture is conducted.
Abstract:
There is provided a method for producing a nitrobenzene compound that can be implemented by a simple operation under mild conditions without using a special reaction apparatus. [Solution] The present invention provides a method for producing a nitrobenzene compound represented by general formula (2), wherein R 1 and R 5 are the same or different, and each is a halogen atom or another functional group, and R 2 , R 3 , and R 4 are the same or different, and each is a hydrogen atom or another functional group, comprising oxidizing an aniline compound represented by general formula (1), wherein R 1 , R 2 , R 3 , R 4 , and R 5 are the same as described above, with hydrogen peroxide in the presence of a tungsten compound under an acidic condition, followed by oxidation with hydrogen peroxide under a neutral to alkaline condition.