122.
    发明专利
    未知

    公开(公告)号:FR2532112A1

    公开(公告)日:1984-02-24

    申请号:FR8214204

    申请日:1982-08-17

    Abstract: Process and apparatus for varying the deflection of the path of a charged particle beam over a path of length l in a space volume V, where there is a magnetic induction B (x,y,z), wherein a relative displacement of volume V with respect to the beam is produced in such a way as to vary the magnitude INTEGRAL BDl calculated along the path and characterizing the deflection undergone by the beam on passing through volume V. In some of the embodiments rotating magnetic pole pieces are employed to vary the path. Fixed inclined faced pole pieces are also employed.

    TWO MAGNET ASYMMETRIC DOUBLY ACHROMATIC BEAM DEFLECTION SYSTEM

    公开(公告)号:CA1143839A

    公开(公告)日:1983-03-29

    申请号:CA353640

    申请日:1980-06-04

    Abstract: TITLE A TWO MAGNET ASYMMETRIC DOUBLY ACHROMATIC BEAM DEFLECTION SYSTEM INVENTOR Ronald M. Hutcheon The beam deflection system includes two dipole magnets for deflecting a charged particle beam in a deflection plane. The first magnet bends the beam in a path having a radius P1 and a deflection angle .theta.1 greater than 180.degree.. The first magnet has an effective exit edge at an angle (90.degree. - ?1) with respect to the beam path. The second magnet further bends the beam in a path having a radius P2 and a deflection angle .theta.2 where 225.degree. ? (.theta.1 + .theta.2) ? 280.degree.. The effective entry edge of the second magnet is at an angle of (90.degree. - ?2) to the beam path. In the usual practical case the effective interior edges of the two magnets are roughly parallel, that is, ?1 ? -?2 and the doubly achromatic properties are obtained to first order when the angles satisfy the following formula: ?1 ? -?2 2?2 ? .theta.2 -(.theta.1 - 180.degree.), and when the distance D between the effective edges of the two magnets is set so that the dipoles produce equal beam dispersion in the drift distance between them. For the case of 270.degree. total bend with P2 = P1 this occurs at a distance D, given by .

    124.
    发明专利
    未知

    公开(公告)号:FR2413776B1

    公开(公告)日:1980-09-19

    申请号:FR7800049

    申请日:1978-01-03

    Applicant: THOMSON CSF

    Abstract: An electronic optical objective applicable to electrolithographic devices for microlithography in particular in semiconductor and integrated circuits fabrication. The objective comprises an electromagnetic lens formed by two polepieces, one of which is of soft iron and the other of ferrite, spaced from each other by an airgap. It further comprises two deflectors, one of which is placed in a longitudinal zone of weak magnetic field and the other is placed in a longitudinal zone of strong magnetic field. These two deflectors are identical and offset from each other by a certain angle, for example from 215 DEG to 225 DEG .

    126.
    发明专利
    未知

    公开(公告)号:DE1963454C3

    公开(公告)日:1973-12-06

    申请号:DE1963454

    申请日:1969-12-18

    Abstract: Apparatus for deflecting the beam of an electron beam welding device, or similar source of a beam of radiant energy. The apparatus comprises a sine/cosine wave generator and a triangular/rectangular wave generator selectively connectable to the inputs of a bi-channel amplifier whose output is connected, for example, to the deflection coils, or plates, of the electron beam device. Circuitry is provided to obtain either a frequency or amplitude modulation of the deflection currents or voltages supplied to the deflection coils or plates of the device.

    Coil former
    129.
    发明专利

    公开(公告)号:GB2429834C

    公开(公告)日:2011-08-24

    申请号:GB0517859

    申请日:2005-09-02

    Applicant: NANOBEAM LTD

    Inventor: ZHANG TAO

    Abstract: A coil former (1) comprising a plurality of ceramic plates (2) arranged to form a laminate (3) between first and second ends (4, 5), each plate having an opening therein such that when the plates are arranged in the laminate, a passage (7) is defined between the first and second ends.

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