PROCESS FOR PREPARING METAL POWDERS HAVING LOW OXYGEN CONTENT, POWDERS SO-PRODUCED AND USES THEREOF
    131.
    发明申请
    PROCESS FOR PREPARING METAL POWDERS HAVING LOW OXYGEN CONTENT, POWDERS SO-PRODUCED AND USES THEREOF 审中-公开
    用于制备具有低氧含量的金属粉末的方法,其生产的粉末及其用途

    公开(公告)号:WO2008042947A2

    公开(公告)日:2008-04-10

    申请号:PCT/US2007/080282

    申请日:2007-10-03

    Abstract: The present invention is directed to a process for the preparation of a metal powder having a purity at least as high as the starting powder and having an oxygen content of 10 ppm or less comprising heating said metal powder containing oxygen in the form of an oxide, with the total oxygen content being from 50 to 3000 ppmf in an inert atmosphere at a pressure of from 1 bar to 10 -7 to a temperature at which the oxide of the metal powder becomes thermodynamically unstable and removing the resulting oxygen via volatilization. The metal powder is preferably selected from the group consisting of tantalum, niobium, molybdenum, hafnium, zirconium, titanium, vanadium, rhenium and tungsten. The invention also relates to the powders produced by the process and the use of such powders in a cold spray process.

    Abstract translation: 本发明涉及制备纯度至少与起始粉末一样高且氧含量为10ppm以下的金属粉末的方法,包括加热含氧形式的氧的金属粉末, 其总氧含量为50-3000ppmf,在惰性气氛中,压力为1巴-10-7℃至金属粉末的氧化物变为热力学不稳定的温度,并除去 通过挥发产生氧气。 金属粉末优选选自钽,铌,钼,铪,锆,钛,钒,铼和钨。 本发明还涉及通过该方法生产的粉末和在冷喷涂方法中使用这种粉末。

    MOLYBDENUM ALLOY X-RAY TARGETS HAVING UNIFORM GRAIN STRUCTURE
    133.
    发明申请
    MOLYBDENUM ALLOY X-RAY TARGETS HAVING UNIFORM GRAIN STRUCTURE 审中-公开
    具有均匀颗粒结构的莫氏合金X射线靶

    公开(公告)号:WO2004095501A2

    公开(公告)日:2004-11-04

    申请号:PCT/US2004/011554

    申请日:2004-04-15

    Abstract: The invention relates to a process for making a cross-directionally worked molybdenum plate, the process comprising: (a) reducing ammonium molybdate and forming molybdenum metal powder; (b) consolidating a molybdenum component comprised of molybdenum metal powder and an alloying element to a first workpiece, the alloying element being selected from the group consisting of titanium, zirconium, hafnium, carbon, lanthanum oxide, and combinations thereof; (c) thermally treating the first workpiece and subjecting the workpiece to thermo-mechanical forces in a first direction, and thereby forming a second workpiece; (d) thermally treating the second workpiece and subjecting the second workpiece to thermo-mechanical forces in a second direction that is different from the first direction; (e) subjecting the thermomechanically treated second workpiece to a recrystallization heat treatment step, and thereby forming a heat-treated cross-directionally worked workpiece; and (f) subjecting the heat-treated, cross-directionally worked workpiece to a slicing step or a machining step, and thereby forming the cross­directionally worked molybdenum plate. The invention also relates to X-ray targets made from the process.

    Abstract translation: 本发明涉及制造交叉方向加工的钼板的方法,该方法包括:(a)还原钼酸铵并形成钼金属粉末; (b)将由钼金属粉末和合金元素组成的钼组分固结到第一工件上,所述合金元素选自钛,锆,铪,碳,氧化镧及其组合; (c)对第一工件进行热处理并使工件在第一方向上受到热机械力,从而形成第二工件; (d)对所述第二工件进行热处理并使所述第二工件在与所述第一方向不同的第二方向上进行热机械力; (e)对热机械处理的第二工件进行再结晶热处理步骤,从而形成经热处理的交叉方向加工的工件; 和(f)对经热处理的交叉方向加工的工件进行切片步骤或机械加工步骤,从而形成横向加工的钼板。 本发明还涉及由该方法制成的X射线靶。

    REMOVAL OF BINDER FROM Ta PRODUCTS
    135.
    发明申请
    REMOVAL OF BINDER FROM Ta PRODUCTS 审中-公开
    从Ta产品中除去粘合剂

    公开(公告)号:WO1996001163A1

    公开(公告)日:1996-01-18

    申请号:PCT/US1995008283

    申请日:1995-06-29

    CPC classification number: H01G9/15 B22F1/0088 B22F3/1025

    Abstract: Tantalum anode pellets or tantalum powders are treated to remove carbon content (mostly attributable to binders used in pressing the powders to pellet form and/or sintering of the pellets) by an aqueous leach at 50-200 DEG F in lieu of the conventional complex distillation/decomposition methods.

    Abstract translation: 处理钽阳极丸粒或钽粉末以除去常规复合蒸馏中的碳含量(主要归因于用于将粉末压制成颗粒形式和/或烧结颗粒的粘合剂)通过50-200°F的水性浸出 /分解方法。

    Multi-block sputtering target and associated methods and articles

    公开(公告)号:US10727032B2

    公开(公告)日:2020-07-28

    申请号:US16238844

    申请日:2019-01-03

    Abstract: A sputtering target that includes at least two consolidated blocks, each block including an alloy including molybdenum in an amount greater than about 30 percent by weight and at least one additional alloying ingredient; and a joint between the at least two consolidated blocks, the joint being free of any microstructure due to an added bonding agent (e.g., powder, foil or otherwise), and being essentially free of any visible joint line the target that is greater than about 200 μm width (e.g., less than about 50 μm width). A process for making the target includes hot isostatically pressing, below a temperature of 1080° C., consolidated perform blocks that may be surface prepared (e.g., roughened to a predetermined roughness value) prior to pressing.

    HIGH PURITY REFRACTORY METAL POWDERS AND THEIR USE IN SPUTTERING TARGETS WHICH MAY HAVE RANDOM TEXTURE
    139.
    发明申请
    HIGH PURITY REFRACTORY METAL POWDERS AND THEIR USE IN SPUTTERING TARGETS WHICH MAY HAVE RANDOM TEXTURE 有权
    高纯度金属粉末及其在可能具有随机纹理的溅射目标中的应用

    公开(公告)号:US20150292081A1

    公开(公告)日:2015-10-15

    申请号:US14681660

    申请日:2015-04-08

    Abstract: A method for making a sputtering target including steps of encapsulating and hot isostatically pressing at least one mass of metal powder (e.g., tantalum), having a particle size ranging from about 10 to about 1000 μm, with at least about 10 percent by weight of particles having a particle size greater than about 150 μm (for example, about 29 to about 56 percent (e.g., about 35 to about 47 percent) by weight of the particles in the at least one mass of metal powder having a particle size that is larger than 150 microns, but below about 250 μm), for defining at least a portion of a sputtering target body, having an essentially theoretical random and substantially uniform crystallographic texture.

    Abstract translation: 一种用于制造溅射靶的方法,包括以下步骤:将至少一种具有约10至约1000μm的粒度的至少一种金属粉末(例如钽)与至少约10重量%的金属粉末 粒径大于约150μm的颗粒(例如,在至少一种质量的金属粉末中的颗粒的重量比例为约29至约56%(例如约35至约47%),其粒径为 大于150微米,但低于约250μm),用于限定溅射靶体的至少一部分,具有基本上理论上的随机和基本上均匀的晶体织构。

    MOLYBDENUM-CONTAINING TARGETS COMPRISING THREE METAL ELEMENTS
    140.
    发明申请
    MOLYBDENUM-CONTAINING TARGETS COMPRISING THREE METAL ELEMENTS 有权
    包含三元金属元素的包含目标

    公开(公告)号:US20140102880A1

    公开(公告)日:2014-04-17

    申请号:US13856617

    申请日:2013-04-04

    Abstract: The invention relates to sputter targets and methods for depositing a layer from a sputter target. The method preferably includes the steps of: placing a sputter target in a vacuum chamber; placing a substrate having a substrate surface in the vacuum chamber; reducing the pressure in the vacuum chamber to about 100 Torr or less; removing atoms from the surface of the sputter target while the sputter target is in the vacuum chamber (e.g., using a magnetic field and/or an electric field). The deposited layer preferably is a molybdenum containing alloy including about 50 atomic percent or more molybdenum, 0.5 to 45 atomic percent of a second metal element selected from the group consisting of niobium and vanadium; and 0.5 to 45 atomic percent of a third metal element selected from the group consisting of tantalum, chromium, vanadium, niobium, and titanium.

    Abstract translation: 本发明涉及用于从溅射靶沉积层的溅射靶和方法。 该方法优选包括以下步骤:将溅射靶放置在真空室中; 将具有基板表面的基板放置在所述真空室中; 将真空室中的压力降低至约100托或更低; 当溅射靶位于真空室(例如,使用磁场和/或电场)时,从溅射靶的表面去除原子。 沉积层优选是包含约50原子%或更多的钼,0.5至45原子%的选自铌和钒的第二金属元素的含钼合金; 和0.5〜45原子%的选自钽,铬,钒,铌和钛的第三金属元素。

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