公开(公告)号：DE60030204D1

公开(公告)日：2006-10-05

申请号：DE60030204

申请日：2000-06-01

Applicant: ASML NETHERLANDS BV

Inventor： VAN EMPEL TJARKO ADRIAAN RUDOL ,  JANSEN HANS

IPC: G03F7/20 ,  H01L21/027 ,  H01L21/683

Abstract: A lithographic projection apparatus includes, a radiation system for supplying a projection beam of radiation, a mask table provided with a mask holder for holding a mask, a substrate table provided with a substrate holder for holding a substrate, a projection system for imaging an irradiated portion of the mask onto a target portion of the substrate, wherein the substrate holder has a supporting face for supporting a substrate and the supporting face is at least partially coated with a layer of electrically conductive material.