公开(公告)号：KR20100039311A

公开(公告)日：2010-04-15

申请号：KR20100017706

申请日：2010-02-26

Applicant: ASML NETHERLANDS BV

Inventor： DE JONG ANTHONIUS MARTINUS COR ,  STAVENGA MARCO KOERT ,  JANSEN BAUKE ,  BEEREN RAYMOND GERARDUS MARIUS ,  HOEKERD KORNELIS TIJMEN ,  JANSEN HANS ,  WANTEN PETER FRANCISCUS ,  CUIJPERS JOHANNES WILHELMUS JACOBUS LEONARDUS

IPC: H01L21/027 ,  H01L21/02 ,  H01L21/302

CPC classification number: G03F7/70925 ,  B08B3/12 ,  G03F7/70341 ,  G03F9/7096 ,  H01L21/02041

Abstract: PURPOSE: A cleaning device, a lithography device, and a method for cleaning the lithography device are provided to efficiently clean an immersion lithographic projection apparatus using a megasonic wave through liquid. CONSTITUTION: A megasonic transducer(20) cleans the surface of an immersion lithographic projection apparatus. A liquid supply system supplies liquid between the megasonic transducer and the surface to be cleaned. A cleaning solution outlet provides a space for discharging a liquid solution(30) formed on the surface of the megasonic transducer.

Abstract translation: 目的：提供一种清洁装置，光刻装置和用于清洁光刻装置的方法，以有效地清洗使用超声波通过液体的浸没式光刻投影装置。 构成：超声波换能器（20）清洁浸没式光刻投影装置的表面。 液体供应系统在兆声传感器和要清洁的表面之间提供液体。 清洁溶液出口提供用于排出形成在兆声换能器表面上的液体溶液（30）的空间。

公开(公告)号：JP2014017526A

公开(公告)日：2014-01-30

申请号：JP2013222157

申请日：2013-10-25

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： BOB STREEFKERK ,  JOHANNES JACOBS MATEUS BASELMANS ,  BRULS RICHARD JOSEPH ,  DIERICHS MARCLE MATHIJS T M ,  SECHELT NICHOLAS LAMBELDUS DONDERS ,  CHRISTIANE ALEXANDER HOGENDAM ,  JANSEN HANS ,  LOOPSTRA ERIK ROELOF ,  JEROEN JOHANNES SOPHIA MARIA MERTENS ,  MULKENS JOHANNES CATHARINUS HUBERTUS ,  SENGERS TIMOTHEUS FRANCISCUS ,  RONALD WALTER JIIN SEVERYNS ,  SERGEI SHULEPOV ,  BOOM HERMAN

IPC: H01L21/027 ,  B05D3/12 ,  G03F7/20

CPC classification number: G03F7/70341 ,  G03F7/2041 ,  G03F7/70908 ,  G03F7/70958

Abstract: PROBLEM TO BE SOLVED: To provide an immersion lithographic projection apparatus.SOLUTION: An immersion lithographic projection apparatus in which immersion liquid is sealed between a final element of a projection system and a substrate is disclosed. Use of both hydrophobic and hydrophilic layers on various elements of the apparatus is disclosed. The use of the layers helps to prevent formation of bubbles in the immersion liquid and reduce residue on the elements after being immersed in the immersion liquid.

Abstract translation: 要解决的问题：提供一种浸没式光刻投影装置。公开了一种浸没式光刻投影装置，其中浸入液体密封在投影系统的最终元件和基板之间。 公开了在设备的各种元件上使用疏水层和亲水层两者。 使用这些层有助于防止在浸没液中形成气泡，并且在浸入浸液中之后减少元件上的残留物。

公开(公告)号：JP2012147015A

公开(公告)日：2012-08-02

申请号：JP2012083578

申请日：2012-04-02

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： MARCO COELHO STAUFEN ,  JACOBS JOHANNES HENRICUS WILHELMUS ,  JANSEN HANS ,  VERHAGEN MARTINUS CORNELIS MARIA

IPC: H01L21/027 ,  G02B21/26

CPC classification number: G03F7/70341 ,  G03F7/709

Abstract: PROBLEM TO BE SOLVED: To provide various types of pressure regulation means for reducing a pressure gradient in a liquid supply system of a lithographic apparatus.SOLUTION: The liquid supply system has a liquid confinement structure configured to at least partially confine a liquid between a projection system and a substrate table of the lithographic apparatus. A high pressure gradient may cause particulate contamination in the liquid supply system and/or liquid confinement structure. A pressure gradient can be reduced by, for example, the use of slow switching in one or more valves, a bleed flow around or through one or more valves, diversion of liquid to a drain rather than or in addition to switching a valve off, a pressure regulator or flow restrictor to prevent shock waves, and a buffer liquid/damper to compensate for pressure fluctuation.

Abstract translation: 要解决的问题：提供用于降低光刻设备的液体供应系统中的压力梯度的各种类型的压力调节装置。 解决方案：液体供应系统具有液体限制结构，其被配置为至少部分地将液体限制在光刻设备的投影系统和衬底台之间。 高压梯度可能导致液体供应系统和/或液体限制结构中的颗粒污染。 压力梯度可以通过例如在一个或多个阀门中使用缓慢的切换，绕过或通过一个或多个阀门的泄放流量来减少，而不是或者除了切换阀门之外将液体转移到排水管， 压力调节器或限流器，以防止冲击波，以及缓冲液/阻尼器来补偿压力波动。 版权所有（C）2012，JPO＆INPIT

公开(公告)号：JP2012094892A

公开(公告)日：2012-05-17

申请号：JP2011285622

申请日：2011-12-27

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： VERHAGEN MARTINUS CORNELIS MARIA ,  JANSEN HANS ,  MARCO COELHO STAUFEN ,  JACOBUS JOHANNUS LEONARDUS HENDRICUS VERSPAY

IPC: H01L21/027

CPC classification number: G03F7/70341 ,  G03F7/70808

Abstract: PROBLEM TO BE SOLVED: To protect an immersion fluid from an atmospheric environment in an immersion lithographic apparatus.SOLUTION: A lithographic apparatus is disclosed in which a liquid supply system is configured to supply a liquid to a region between a substrate W and a projection system PL of the lithographic apparatus and which has a liquid confinement structure fixed in a plane substantially perpendicular to an optical axis of the projection system PL and configured to hold the substrate W in order to restrict the liquid to a region above an upper surface of a substrate table WT so that a side of the substrate W to be exposed is substantially covered in the liquid during exposure.

Abstract translation: 要解决的问题：为了在浸没式光刻设备中保护浸没液体免受大气环境的影响。 解决方案：公开了一种光刻设备，其中液体供应系统被配置为将液体供应到基板W和光刻设备的投影系统PL之间的区域，并且具有固定在平面中的液体限制结构 垂直于投影系统PL的光轴并被配置为保持衬底W，以便将液体限制在衬底台WT的上表面上方的区域，使得待暴露的衬底W的一侧基本上覆盖在 液体在曝光期间。 版权所有（C）2012，JPO＆INPIT

公开(公告)号：JP2011249854A

公开(公告)日：2011-12-08

申请号：JP2011192774

申请日：2011-09-05

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： ALEKSEY YURIEVICH KOLENSNYCHENKO ,  JOHANNES JACOBS MATEUS BASELMANS ,  SECHELT NICHOLAS LAMBELDUS DONDERS ,  CHRISTIANE ALEXANDER HOGENDAM ,  JANSEN HANS ,  JEROEN JOHANNES SOPHIA MARIA MERTENS ,  JOHANNES CATHARINUS HUBERTUS MULKENS ,  FELIX GOTTFRIED PETER PETERS ,  BOB STREEFKERK ,  FRANCISCUS JOHANNES HERMAN MARIA TEUNISSEN ,  HELMAR VAN SANTEN

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70341 ,  G03F7/70733 ,  G03F7/70866 ,  G03F7/70908

Abstract: PROBLEM TO BE SOLVED: To provide a substrate table of an immersion liquid lithographic apparatus configured to prevent contamination caused by immersion liquid.SOLUTION: A substrate table WT includes a drainage ditch, or a barrier 40 surrounding an outer peripheral edge of a substrate W, and a barrier 100 surrounding other objects 20, such as sensors, positioned on a flat surface which is substantially the same plane as the upper surface of the substrate W. The barriers 40, 100 can collect any liquid which is spilt from a liquid supply system during exposing the substrate W to reduce the risk of contamination of delicate components of a lithographic projection apparatus.

Abstract translation: 要解决的问题：提供一种浸没液体光刻设备的基板台，其被配置为防止浸没液体引起的污染。 解决方案：衬底台WT包括排水沟或围绕衬底W的外围边缘的阻挡层40以及围绕位于平坦表面上的其它物体20（例如传感器）的势垒100，该平面基本上是 与衬底W的上表面相同的平面。阻挡层40,100可以收集在暴露衬底W期间从液体供应系统溢出的任何液体，以降低光刻投影设备的微妙部件污染的风险。 版权所有（C）2012，JPO＆INPIT

公开(公告)号：JP2011142348A

公开(公告)日：2011-07-21

申请号：JP2011089751

申请日：2011-04-14

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： JANSEN HANS ,  STAVENGA MARCO KOERT ,  VERSPAY JACOBUS JOHANNUS LEONARDUS HENDRICUS ,  JANSSEN FRANCISCUS JOHANNES JOSEPH ,  KUIJPER ANTHONIE

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70858 ,  G03F7/2041 ,  G03F7/70341

Abstract: PROBLEM TO BE SOLVED: To provide immersion liquid containing one or more additives which further prevent the problem of a stain. SOLUTION: The immersion liquid contains an ion forming component containing acid or base having, for example, comparatively high vapor pressure. Lithographing method and system using this immersion liquid is also provided. COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：提供含有一种或多种进一步防止污点问题的添加剂的浸液。 解决方案：浸渍液含有含有例如具有较高蒸气压的酸或碱的离子形成组分。 还提供了使用该浸液的石版印刷方法和系统。 版权所有（C）2011，JPO＆INPIT

公开(公告)号：JP2011071545A

公开(公告)日：2011-04-07

申请号：JP2010275375

申请日：2010-12-10

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： JANSEN HANS ,  CORNELISSEN SEBASTIAAN MARIA J ,  LAMBERTUS DONDERS SJOERD NICOLAAS ,  GRAAF ROELOF FREDERICK DE ,  CHRISTIAAN ALEXANDER HOOGENDAM ,  JACOBS HERNES ,  ANTONIUS LEENDERS MARTINUS H ,  MERTENS JEROEN JOHANNES SOPHIA MARIA ,  STREEFKERK BOB ,  VAN DER TOORN JAN-GERARD CORNELIS ,  SMITS PETER ,  JANSSEN FRANCISCUS JOHANNES J ,  RIEPEN MICHEL

IPC: H01L21/027

CPC classification number: G03F7/70341 ,  G03F7/707

Abstract: PROBLEM TO BE SOLVED: To provide a liquid immersion lithographic apparatus that prevents an adverse effect on pattern image quality due to existence of bubbles in immersion liquid.
SOLUTION: The liquid immersion lithographic exposure apparatus minimizes or prevents generation of bubbles in the immersion liquid by reducing a size or a volume of a gap between an object and the top of a substrate table and/or preparing a cover plate covering the gap. Additionally, an actuator for laterally moving the object in a hole in order to reduce the gap between an edge of the object and a side of the hole of the support table when the object and the table are in contact with the liquid, may be prepared.
COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：提供一种液浸光刻设备，其防止由于浸没液体中的气泡的存在而对图案图像质量的不利影响。 解决方案：液浸式光刻曝光装置通过减小物体与基板台顶部之间的间隙的尺寸或体积，和/或制备覆盖该基板台的盖板来最小化或防止在浸液中产生气泡 间隙。 此外，可以准备用于在物体和台面与液体接触的同时横向移动物体在孔中的致动器，以便减小物体的边缘与支撑台的孔的一侧之间的间隙 。 版权所有（C）2011，JPO＆INPIT

公开(公告)号：JP2011029658A

公开(公告)日：2011-02-10

申请号：JP2010220938

申请日：2010-09-30

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： JACOBS HERNES ,  GILISSEN NOUD JAN ,  JANSEN HANS ,  KATE NICOLAAS TEN ,  KEMPER NICOLAAS R ,  ANTONIUS LEENDERS MARTINUS HENDRIKUS ,  LOOPSTRA ERIK R ,  HUBERTUS MULKENS JOHANNES C ,  HARMEN KLAAS VAN DER SCHOOT ,  STAVENGA MARCO KOERT ,  STREEFKERK BOB ,  VERHAGEN MARTINUS CORNELIS MARIA ,  STEIJAART PETER PAUL ,  VERMAELEN MARKUS MARTINUS PETRUS ADRIANUS ,  VAN DER HOEVEN JAN CORNELIS

IPC: H01L21/027

CPC classification number: G03F7/70341

Abstract: PROBLEM TO BE SOLVED: To moderate a defect induced by an immersion liquid in an immersion lithography projection apparatus where a liquid removal system surrounds a liquid supply system for providing liquid to a space between a projection system and a substrate. SOLUTION: The liquid removal system 100 is moveable relative to the liquid supply system (partially shown as a barrier member 12) and is controlled to have substantially zero velocity relative to the moving substrate table. The gap between the liquid supply system (partially shown as the barrier member 12) and the liquid removal system 100 may be covered and the atmosphere between the liquid supply system and the liquid removal system above the substrate table may be maintained so that the vapor pressure of liquid is relatively high. COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：为了缓和浸没光刻投影装置中的浸没液体引起的缺陷，其中液体移除系统围绕用于向投影系统和基板之间的空间提供液体的液体供应系统。 解决方案：液体移除系统100可相对于液体供应系统（部分地示出为阻挡构件12）移动，并且被控制为相对于移动的衬底台具有基本上零的速度。 可以覆盖液体供应系统（部分示为阻挡构件12）和液体移除系统100之间的间隙，并且可以保持液体供应系统和衬底台之上的液体移除系统之间的气氛，使得蒸气压 的液体比较高。 版权所有（C）2011，JPO＆INPIT

公开(公告)号：JP2010183113A

公开(公告)日：2010-08-19

申请号：JP2010116482

申请日：2010-05-20

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： STREEFKERK BOB ,  BASELMANS JOHANNES JACOBUS MATHEUS ,  BRULS RICHARD JOSEPH ,  DIERICHS MARCLE MATHIJS T M ,  DONDERS SJOERD NICOLAAS LAMBERTUS ,  CHRISTIAAN ALEXANDER HOOGENDAM ,  JANSEN HANS ,  LOOPSTRA ERIK ROELOF ,  JEROEN JOHANNES SOPHIA MARIA MERTENS ,  MULKENS JOHANNES CATHARINUS HUBERTUS ,  SENGERS TIMOTHEUS FRANCISCUS ,  RONALD WALTER JIIN SEVERYNS ,  SERGEI SHULEPOV ,  BOOM HERMAN

IPC: H01L21/027 ,  B05D3/12 ,  G03F7/20

CPC classification number: G03F7/70341 ,  G03F7/2041 ,  G03F7/70908 ,  G03F7/70958

Abstract: PROBLEM TO BE SOLVED: To provide an immersion lithographic projection apparatus.
SOLUTION: The immersion lithographic projection apparatus is disclosed in which an immersion liquid is sealed between a final element of a projection system and a substrate. Use of both hydrophobic and hydrophilic layers on various elements of the apparatus is disclosed. The use of the layers helps to prevent formation of bubbles in the immersion liquid and reduce residue on the elements after being immersed in the liquid.
COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：提供浸没式光刻投影装置。 解决方案：浸没式光刻投影装置被公开，其中浸没液被密封在投影系统的最终元件和基底之间。 公开了在设备的各种元件上使用疏水层和亲水层两者。 使用这些层有助于防止在浸没液中形成气泡，并且在浸入液体中之后减少元件上的残留物。 版权所有（C）2010，JPO＆INPIT

公开(公告)号：JP2010171455A

公开(公告)日：2010-08-05

申请号：JP2010096638

申请日：2010-04-20

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： JANSEN HANS ,  CORNELISSEN SEBASTIAAN MARIA J ,  LAMBERTUS DONDERS SJOERD NICOLAAS ,  GRAAF ROELOF FREDERICK DE ,  CHRISTIAAN ALEXANDER HOOGENDAM ,  JACOBS HERNES ,  ANTONIUS LEENDERS MARTINUS H ,  MERTENS JEROEN JOHANNES SOPHIA MARIA ,  STREEFKERK BOB ,  VAN DER TOORN JAN-GERARD CORNELIS ,  SMITS PETER ,  JANSSEN FRANCISCUS JOHANNES J ,  RIEPEN MICHEL

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70341 ,  G03F7/707

Abstract: PROBLEM TO BE SOLVED: To prevent the presence of air bubbles in an immersion liquid to cause an adverse effect on the quality of a pattern image in an immersion lithography apparatus. SOLUTION: In the immersion lithography apparatus, the formation of air bubbles in the immersion liquid can be minimized or prevented by reducing the size of a gap or a gap region between an object and a substrate table and/or providing a cover plate covering the gap. The immersion lithography apparatus may further include an actuator which laterally moves the object in a hole of the support table to reduce a gap between an end of the object and a side of the hole when the object is in contact with a liquid. COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：为了防止浸没液体中的气泡的存在对浸没式光刻设备中的图案图像的质量产生不利影响。 解决方案：在浸没式光刻设备中，通过减小物体和基板台之间的间隙或间隙区域的尺寸和/或提供盖板，可以使浸没液中的气泡形成最小化或防止 弥补差距。 浸没式光刻设备还可以包括致动器，该致动器在物体与液体接触时横向移动物体在支撑台的孔中，以减小物体的端部与孔的一侧之间的间隙。 版权所有（C）2010，JPO＆INPIT