中科微点-全球专利检索

  1. Login
  2. Sign Up

Search Results

325 records (took 0.024 seconds)

    COMPLEX MICROMECHANICAL PART
    133.
    发明申请
    COMPLEX MICROMECHANICAL PART 有权
    复合微生物部分

    公开(公告)号：US20140033848A1

    公开(公告)日：2014-02-06

    申请号：US13983682

    申请日：2012-01-05

    Applicant: Pierre Cusin ,  David Richard ,  Philippe Dubois

    Inventor： Pierre Cusin ,  David Richard ,  Philippe Dubois

    IPC: B81B1/00 ,  B81C1/00

    CPC classification number: B81B1/006 ,  B81B2201/035 ,  B81C1/00634 ,  B81C99/0085 ,  Y10T74/19949

    Abstract: The invention relates to a micromechanical part (11, 21, 31, 41, 51, 61) made of a single-piece material. According to the invention, the part has an elementary section formed of at least two secant and non-aligned segments so that one of the at least two segments forms the height (e3) of the micromechanical part (11, 21, 31, 41, 51, 61), the height being greater than the thickness (e1) of each segment.The invention also concerns the method of fabricating the part.

    Abstract translation: 本发明涉及由单片材料制成的微机械部件（11,21,31,41,51,61）。 根据本发明，该部件具有由至少两个正割线段和非对准部分形成的基本部分，使得至少两个部分中的一个部分形成微机械部件（11,21,31,41,44）的高度（e3） 51,61），高度大于每个段的厚度（e1）。 本发明还涉及制造该部件的方法。

    Method of manufacturing a micromechanical part
    134.
    发明授权
    Method of manufacturing a micromechanical part 有权
    微机械部件的制造方法

    公开(公告)号：US08354032B2

    公开(公告)日：2013-01-15

    申请号：US12500982

    申请日：2009-07-10

    Applicant: Rudolf Dinger ,  Thierry Ravenel

    Inventor： Rudolf Dinger ,  Thierry Ravenel

    IPC: C23F1/00

    CPC classification number: G04D3/0069 ,  B81B2201/035 ,  B81C3/008 ,  B81C99/008 ,  G04B13/02 ,  Y10T29/49579 ,  Y10T29/49581

    Abstract: A method of manufacturing a mechanical part includes providing a substrate of micro-machinable material; etching, using photolithography, a pattern that includes said part through said entire substrate; assembling a clip on said part so that said part is ready to be mounted without the portion made of micro-machinable material having to be touched by a tool other than the clip; releasing the part from the substrate so as to mount said part in a device such as a timepiece movement.

    Abstract translation: 制造机械部件的方法包括提供可微加工材料的基材; 使用光刻法蚀刻通过所述整个基板包括所述部分的图案; 在所述部件上组装夹子，使得所述部件准备安装，而不由微加工材料制成的部分必须被夹具以外的工具接触; 从基板上释放该部件，以便将所述部件安装在诸如钟表运动的装置中。

    DEVICE FOR CONVERTING A FIRST MOTION INTO A SECOND MOTION RESPONSIVE TO THE FIRST MOTION UNDER A DEMAGNIFICATION SCALE
    135.
    发明申请
    DEVICE FOR CONVERTING A FIRST MOTION INTO A SECOND MOTION RESPONSIVE TO THE FIRST MOTION UNDER A DEMAGNIFICATION SCALE 审中-公开
    根据授权规模将第一次运动转换为第一次运动的第二运动的装置

    公开(公告)号：US20100313691A1

    公开(公告)日：2010-12-16

    申请号：US12446243

    申请日：2007-10-09

    Applicant: Simon Henein

    Inventor： Simon Henein

    IPC: B81B3/00

    CPC classification number: B81B3/0027 ,  B81B2201/035 ,  F16H21/04 ,  Y10T74/18992

    Abstract: A device for converting a first movement into a second movement responsive to the first movement under a demagnification scale includes: a) an input portion being drivable in a rectilinear translation in a first direction by an actuator causing the first movement; b) an output portion being movable by a converting blade causing the second movement responsive to the first movement in a second direction substantially perpendicular to the first direction; and c) a converting section connecting the input portion to the output portion. The converting section includes an intermediate spring portion and the converting blade. The intermediate spring portion has at least two parallel flexure blades; and the converting blade is substantially identical in shape to the a least two parallel flexure blades and is offset from its neutral position by a predetermined amount in the first direction as compared to the neutral position of the at least two parallel flexure blades. The device has a flexure-based structure that allows combining the advantages of classical actuators with accuracies in the micrometer range and the advantages of flexures to achieve nanometer accuracy.

    Abstract translation: 一种用于将第一运动转换成响应于缩小标尺处的第一运动的第二运动的装置包括：a）输入部分通过致动器进行第一运动的第一方向在直线平移中被驱动; b）输出部分，其可由转换刀片移动，所述转换刀片在基本上垂直于所述第一方向的第二方向上响应于所述第一运动而引起所述第二运动; 以及c）将输入部分连接到输出部分的转换部分。 转换部分包括中间弹簧部分和转换刀片。 中间弹簧部分具有至少两个平行的弯曲叶片; 并且所述转换刀片的形状与所述至少两个平行的弯曲刀片基本上相同，并且与所述至少两个平行弯曲刀片的中立位置相比，在第一方向上从其中立位置偏移预定量。 该设备具有基于挠性的结构，可以将经典执行器的优点与微米范围的精度相结合，并具有实现纳米精度的挠曲优点。

    COMPOSITE MICROMECHANICAL COMPONENT AND METHOD OF FABRICATING THE SAME
    136.
    发明申请
    COMPOSITE MICROMECHANICAL COMPONENT AND METHOD OF FABRICATING THE SAME 有权
    复合微生物组分及其制备方法

    公开(公告)号：US20100308010A1

    公开(公告)日：2010-12-09

    申请号：US12797389

    申请日：2010-06-09

    Applicant: Pierre Cusin ,  Jean-Philippe Thiebaud

    Inventor： Pierre Cusin ,  Jean-Philippe Thiebaud

    IPC: C23F1/02

    CPC classification number: B81C99/008 ,  B81B3/0075 ,  B81B2201/035 ,  B81C1/00031 ,  B81C1/00087 ,  B81C1/00119 ,  B81C2201/0132 ,  B81C2201/032 ,  C25D1/003 ,  C25D1/20 ,  C25D5/022 ,  G04B13/022 ,  G04B13/026 ,  G04D3/0069

    Abstract: The invention relates to a method (1) of fabricating a composite micromechanical component (41, 41′) including the following steps: a) providing (10) a substrate (9, 9′) that includes a horizontal top layer (21) and a horizontal bottom layer (23) made of electrically conductive, micromachinable material, and secured to each other by an electrically insulating, horizontal, intermediate layer (22); b) etching at least one pattern (26) in the top layer (21) through to the intermediate layer (22), so as to form at least one cavity (25) in the substrate (9, 9′); c) coating (16) the top part of said substrate with an electrically insulating coating (30); d) directionally etching (18) said coating and said intermediate layer so as to limit the presence thereof exclusively at each vertical wall (51, 52) formed in said top layer; e) performing (5) an electrodeposition by connecting the electrode to the conductive bottom layer (23) of the substrate (9, 9′) to form at least one metal part (33, 43, 43′) of said component; f) releasing the composite component (41, 41′) from the substrate (9, 9′). The invention concerns the field of micromechanical components, particularly for timepiece movements.

    Abstract translation: 本发明涉及一种制造复合微机械部件（41,41'）的方法（1），包括以下步骤：a）提供（10）包括水平顶层（21）的衬底（9,9'）和 由导电的可微加工材料制成并由电绝缘的水平中间层（22）彼此固定的水平底层（23）; b）将顶层（21）中的至少一个图案（26）蚀刻到中间层（22），以在衬底（9,9'）中形成至少一个空腔（25）; c）用电绝缘涂层（30）涂覆（16）所述基底的顶部; d）定向地蚀刻（18）所述涂层和所述中间层，以限制其在形成在所述顶层中的每个垂直壁（51,52）处的存在; e）通过将电极连接到基板（9,9'）的导电底层（23）上来执行（5）电沉积，以形成所述部件的至少一个金属部分（33,43,43'）; f）从所述基板（9,9'）释放所述复合部件（41,41'）。 本发明涉及微机械部件的领域，特别是用于钟表运动。

    METHOD OF MANUFACTURING MULTI-LEVEL, SILICON, MICROMECHANICAL PARTS AND PARTS THEREBY OBTAINED
    137.
    发明申请
    METHOD OF MANUFACTURING MULTI-LEVEL, SILICON, MICROMECHANICAL PARTS AND PARTS THEREBY OBTAINED 有权
    制造多层次，硅，微量元件和获得的部件的方法

    公开(公告)号：US20100054092A1

    公开(公告)日：2010-03-04

    申请号：US12514352

    申请日：2007-11-01

    Applicant: Philippe Marmy ,  Jean-Luc Helfer ,  Thierry Conus

    Inventor： Philippe Marmy ,  Jean-Luc Helfer ,  Thierry Conus

    IPC: G04B29/00 ,  G04D3/00

    CPC classification number: B81C99/0095 ,  B81B2201/035 ,  B81C2201/019 ,  B81C2201/056 ,  B81C2203/038 ,  B81C2203/051 ,  G04B31/004 ,  G04D3/0069 ,  Y10T29/49579

    Abstract: The process comprises the following steps:a) a first element (3) or a plurality of said first elements (3) is/are machined in a first silicon wafer (1) keeping said elements (3) joined together via material bridges (5); b) step a) is repeated with a second silicon wafer (2) in order to machine a second element (4), differing in shape from that of the first element (3), or a plurality of said second elements (4); c) the first and second elements (3, 4) or the first and second wafers (1, 2) are applied, face to face, with the aid of positioning means (6, 7); d) the assembly formed in step c) undergoes oxidation; and e) the parts (10) are separated form the wafers (1, 2). Micromechanical timepiece parts obtained according to the process.

    Abstract translation: 该方法包括以下步骤：a）在第一硅晶片（1）中加工第一元件（3）或多个所述第一元件（3），以使所述元件（3）通过材料桥（5）连接在一起 ）; b）用第二硅晶片（2）重复步骤a），以便加工与第一元件（3）的形状不同的第二元件（4）或多个所述第二元件（4）; c）第一和第二元件（3,4）或第一和第二晶片（1,2）通过定位装置（6,7）面对面地施加; d）步骤c）中形成的组件经历氧化; 和e）部件（10）从晶片（1,2）分离。 根据工艺获得的微型钟表零件。

    METHOD OF MANUFACTURING A MICROMECHANICAL PART
    138.
    发明申请
    METHOD OF MANUFACTURING A MICROMECHANICAL PART 有权
    制造微生物部件的方法

    公开(公告)号：US20100006540A1

    公开(公告)日：2010-01-14

    申请号：US12501009

    申请日：2009-07-10

    Applicant: Rudolf Dinger ,  Thierry Ravenel

    Inventor： Rudolf Dinger ,  Thierry Ravenel

    IPC: B44C1/22

    CPC classification number: B81C99/008 ,  B81B2201/035 ,  B81C1/00674 ,  B81C2201/112 ,  G04B13/02 ,  G04D3/0069 ,  Y10T29/49579

    Abstract: The invention relates to a method of manufacturing (1) a mechanical part (51) including the following steps:a) providing (3) a substrate (53) made of micro-machinable material;b) etching (5), with help of photolithography, a pattern (50) that includes said part through said entire substrate;According to the invention, the method further includes the following steps:c) mounting (7) said etched substrate on a support (55′) so as to leave the top and bottom surfaces of said substrate accessible;d) depositing (9, C′) a coating of better tribological quality than said micro-machinable material on the outer surface of said part e) releasing (11) the part from the substrate. The invention concerns the field of timepiece manufacture.

    Abstract translation: 本发明涉及一种制造（1）机械部件（51）的方法，包括以下步骤：a）提供（3）由可微加工材料制成的基底（53）; b）借助于光刻法蚀刻（5）包括通过所述整个基板的所述部分的图案（50）; 根据本发明，该方法还包括以下步骤：c）将所述蚀刻的衬底安装（7）到支撑体（55'）上，以使所述衬底的顶表面和底表面可接近; d）在所述部件的外表面上沉积（9，C'）比所述可微加工材料更好的摩擦质量的涂层（e）将部件从基材上释放（11）。 本发明涉及钟表制造领域。

    Nanomachined mechanical components using nanoplates, methods of fabricating the same and methods of manufacturing nanomachines
    139.
    发明授权
    Nanomachined mechanical components using nanoplates, methods of fabricating the same and methods of manufacturing nanomachines 失效
    使用纳米板的纳米机械部件，其制造方法和制造纳米机械的方法

    公开(公告)号：US07557044B2

    公开(公告)日：2009-07-07

    申请号：US11263476

    申请日：2005-10-31

    Applicant: Yong Ju Yun ,  Chil Seong Ah ,  Dong Han Ha ,  Hyung Ju Park ,  Wan Soo Yun ,  Kwang Cheol Lee ,  Gwang Seo Park

    Inventor： Yong Ju Yun ,  Chil Seong Ah ,  Dong Han Ha ,  Hyung Ju Park ,  Wan Soo Yun ,  Kwang Cheol Lee ,  Gwang Seo Park

    IPC: H01L21/302

    CPC classification number: B81C99/0095 ,  B81B2201/035 ,  B81C2201/0143 ,  Y10S977/883 ,  Y10S977/888

    Abstract: Disclosed herein is a method of fabricating nano-components using nanoplates, including the steps of: printing a grid on a substrate using photolithography and Electron Beam Lithography; spraying an aqueous solution dispersed with nanoplates onto the grid portion to position the nanoplates on the substrate; depositing a protective film of a predetermined thickness on the substrate and the nanoplates positioned on the substrate; ion-etching the nanoplates deposited with the protective film by using a Focused Ion Beam (FIB) or Electron Beam Lithography; and eliminating the protective film remaining on the substrate using a protective film remover after the ion-etching of the nanoplates, and a method of manufacturing nanomachines or nanostructures by transporting such nano-components using a nano probe and assembling with other nano-components. The present invention makes it possible to fabricate the high-quality nano-components in a more simple and easier manner at a lower cost, as compared to other conventional methods. Further, the present invention provides a method of implementing nanomachines through combination of such nano-components and biomolecules, etc.

    Abstract translation: 本文公开了使用纳米板制造纳米组分的方法，包括以下步骤：使用光刻和电子束光刻在衬底上印刷栅格; 将分散有纳米板的水溶液喷射到栅格部分上以将纳米板定位在基底上; 在衬底和位于衬底上的纳米板上沉积预定厚度的保护膜; 通过使用聚焦离子束（FIB）或电子束光刻法离子蚀刻沉积有保护膜的纳米板; 并且在纳米板的离子蚀刻之后使用保护膜去除剂去除残留在基板上的保护膜，以及通过使用纳米探针传输这种纳米成分并与其他纳米成分组装来制造纳米机械或纳米结构的方法。 与其他常规方法相比，本发明可以以更简单和更容易的方式以更低的成本制造高质量的纳米组分。 此外，本发明提供了通过这些纳米组分和生物分子等的组合来实现纳米机器的方法。

Patent Agency Ranking