PECVD method with modulation of power
    132.
    发明公开
    PECVD method with modulation of power 审中-公开
    与功率调制PECVD工艺

    公开(公告)号:EP1780304A3

    公开(公告)日:2009-11-18

    申请号:EP06022262.7

    申请日:2006-10-25

    Abstract: A method of generating a film during a chemical vapor deposition process is disclosed. One embodiment includes generating a first electrical pulse having a first pulse amplitude; using the first electrical pulse to generate a first density of radicalized species; disassociating a feedstock gas using the radicalized species in the first density of radicalized species, thereby creating a first deposition material; depositing the first deposition material on a substrate; generating a second electrical pulse having a second pulse amplitude, wherein the second pulse amplitude is different from the first pulse width; using the second electrical pulse to generate a second density of radicalized species; disassociating a feedstock gas using the radicalized species in the second density of radicalized species, thereby creating a second deposition material; and depositing the second plurality of deposition materials on the first deposition material.

    METHOD AND APPARATUS FOR PRODUCING PLASMA
    134.
    发明公开
    METHOD AND APPARATUS FOR PRODUCING PLASMA 有权
    方法和装置产生等离子体

    公开(公告)号:EP1984975A2

    公开(公告)日:2008-10-29

    申请号:EP07762965.7

    申请日:2007-01-30

    Abstract: A method and apparatus for producing a distributed plasma at atmospheric pressure. A distributed plasma can be produced at atmospheric pressure by using an inexpensive high frequency power source in communication with a waveguide having a plurality particularly configured couplers disposed therein. The plurality of particularly arranged couplers can be configured in the waveguide to enhance the electromagnetic field strength therein. The plurality of couplers have internal portions disposed inside the waveguide and spaced apart by a distance of 1/4 wavelength of the high frequency power source and external portions disposed outside the waveguide and spaced apart by a predetermined distance which is calculated to cause the electromagnetic fields in the external portions of adjacent couplers to couple and thereby further enhance the strength of the electromagnetic field in the waveguide. Plasma can be formed in plasma areas defined by gaps between electrodes disposed on the external portions.

    Solid state microwave generating array material, each element of which is phase controllable, and plasma processing systems
    136.
    发明公开
    Solid state microwave generating array material, each element of which is phase controllable, and plasma processing systems 失效
    固态微波产生阵列材料,各相可控元件和等离子体处理系统

    公开(公告)号:EP0459177A3

    公开(公告)日:1992-04-01

    申请号:EP91107210.6

    申请日:1991-05-03

    CPC classification number: H01J37/32201 H01J37/32192 H01J37/3222

    Abstract: A solid state microwave generator energized phased antenna (10) array is utilized as the excitation source for material/plasma processes. Each antenna element (10) of the array is driven by a separate solid state microwave power source. Very close and precise control of each solid state generator's phase and amplitude is provided to control the amplitude of the composite power node, and electromagnetic field distribution produced by the array which control is not readily possible with vacuum tube devices and systems such as microwave oven magnetrons. Utilizing the concepts of the invention the total power generated by the system may be easily controlled. The phase of the individual elements may be used to control the location of the power node of the plasma within a reaction chamber (12) and to move said power node within the chamber (12) with no mechanical movement or physical alteration of the processing apparatus. Because of the degree of control possible within the overall processes system of the invention plasma processing methods may be performed which were not previously practical because a high power density plasma can be concentrated at any desired location in the reaction chamber (12) or scanned across a desired region. These control features are lacking in currently available vacuum tube microwave devices. It is also probable that the overall cost of such a solid state based microwave power generators systems will be far less than that of comparable tube type microwave generators especially as fabrication and control technology progresses.

    Solid state microwave powered material and plasma processing systems
    137.
    发明公开
    Solid state microwave powered material and plasma processing systems 失效
    Festkörper-MikrowellensystemefürPlasma- und Materialbearbeitung。

    公开(公告)号:EP0432573A2

    公开(公告)日:1991-06-19

    申请号:EP90122701.7

    申请日:1990-11-28

    CPC classification number: H01J37/32201 H01J37/3222 H05H1/46

    Abstract: A solid state microwave generator is utilized as an excitation source for material/plasma processes. The invention provides very close precise control of the solid state device's power levels to control the ultimate power output and frequency which contol is not readily possible with vacuum tube devices. Utilizing the concepts of the invention the total power generated by the system may be easily varied and, further, the power may be easily monitored and used to control other device parameters such as frequency and the like. Because of the degree of control possible within the overall processs system of the invention any measurable physical property of the process such as temperature, power, color (e.g., optical pyrometer), or the like that can be monitored and converted to a control signal can be utililzed by the present system to carefully control the overall process conditions. These control features are lacking in currently available vacuum tube microwave devices. It is also probable that the overall cost of the solid state based microwave power generators systems will be far less than that of comparable tube type microwave generators.

    Abstract translation: 固体微波发生器被用作材料/等离子体工艺的激发源。 本发明提供了对固态装置的功率水平的非常紧密的精确控制,以控制最终的功率输出和频率,这种情况在真空管装置中是不容易的。 利用本发明的概念,可以容易地改变由系统产生的总功率,并且还可以容易地监视功率并用于控制其它设备参数,例如频率等。 由于在本发明的整个过程系统内可能的控制程度,可以被监视并转换成控制信号的过程的诸如温度,功率,颜色(例如,光学高温计)等的任何可测量的物理性质可以 由本系统利用,仔细控制整个工艺条件。 这些控制功能在当前可用的真空管微波设备中是缺乏的。 基于固态的微波发电系统的总体成本也可能远远小于可比管式微波发生器的总体成本。

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