IMAGE PICKUP DEVICE, FORM MEASURING DEVICE, POSITION DETECTING DEVICE, EXPOSING DEVICE USING IT, AND MANUFACTURE OF DEVICE

    公开(公告)号:JPH11194502A

    公开(公告)日:1999-07-21

    申请号:JP35980497

    申请日:1997-12-26

    Applicant: CANON KK

    Abstract: PROBLEM TO BE SOLVED: To precisely measure a form at high speed without requiring the optical axial movability of a large-sized member by including a diffraction optical element in an image focusing optical system for focusing the optical image of an object to be measured illuminated by the light from a light source. SOLUTION: The converging position of a binary optical element(BO element) 7 is largely changed when the central wavelength of a light source 1 is shifted. A sample 2 irradiated with a central wavelength λ0 has an optical conjugate relation with an image pickup element 9. When the wavelength of the light source 1 is scanned from λ0 to λ, the focal distance of the BO element 7 is changed. Since the position of the image pickup element 9 is not changed, the optical conjugate relation on the object side is consequently moved. Namely, this corresponds to the mechanical movement of the sample 2 in the optical axial direction. A cutting plane image perpendicular to the optical axis of the sample 2 is projected on the image pickup element 9. A plurality of images are provided while moving the cutting plane in the optical axial direction, and the resulting images are reconfigured by a signal processing device 10, whereby the three-dimensional form of the sample 2 can be provided.

    SURFACE POSITION DETECTOR AND MANUFACTURE OF DEVICE USING IT

    公开(公告)号:JPH104043A

    公开(公告)日:1998-01-06

    申请号:JP17433596

    申请日:1996-06-13

    Applicant: CANON KK

    Abstract: PROBLEM TO BE SOLVED: To realize a surface position detector which is capable of very accurately detecting the position of a work surface by a method wherein a light volume control member capable of controlling a transmitted light in volume is provided, at least, to either a light source means or a photodetecting means when position data as to the surface of a work are detected through an oblique incidence method. SOLUTION: A slit image projected onto the surface of a wafer 4 by a light source means 5 is detected with a photodetecting means 6, data as to the incident position of the slit image on the photodetector 6a of photodetecting means 6 are detected. When the surface of the wafer 4 is moved in the AX direction of a light axis, the position of the slit image varies on the photodetector 6a. The positional variation Δof the slit image is measured, and the height variation δof the wafer 4 is detected. Furthermore, three or more points in a chip on the wafer 4 are measured to detect the inclination of the water 4, and the inclination of the wafer 4 is calculated from the measured value. The transmitted light of the light bulb 8 of the light source means 5 is regulated in volume so as to enable the peak value of the position data of the slit image detected by the photodetecctor 6b to be set at a proper value.

    SURFACE POSITIONING DETECTION DEVICE AND DEVICE-MANUFACTURING METHOD USING IT

    公开(公告)号:JPH09210629A

    公开(公告)日:1997-08-12

    申请号:JP4046896

    申请日:1996-02-02

    Applicant: CANON KK

    Abstract: PROBLEM TO BE SOLVED: To detect surface position information with high accuracy and ease without inference by nonuniformity of reflection factor or surface shape of a material surface by imaging an image of the first lattice on a to-be-detected material surface onto the second lattice having converging action with a re- imaging element far forcing moire fringe. SOLUTION: With the light flux emitted from a light source 8, a pattern plate (the first lattice) 51 on the incident side on which a converging Fresnel zone plate(FZP) is drawn is irradiated through a collimator lens 9. The image of FZP 41 is projected on an area 21 on a wafer surface 56, acting as a to-be- detected material. Also on a pattern plate (the second lattice) 52 on the emitting side, a converging FZP 42 is drawn. The image of FZP 41 formed on the area 21 is, with a lens system 15, re-imaged on the pattern plate 52 surface as an FZP image 43. On the pattern plate 52, a moire fringe ZP 44 is formed with the projected FZP image 43 of the FZP 41 an the incident side and the FZP 42 on the emitting side. And, base on the displacement on a sensor surface 31 of a light flux spot 26 caused by the moire fringe ZP 44, surface position information of the wafer surface 56 is detected.

    FOREIGN MATTER INSPECTION DEVICE, AND MANUFACTURE OF EXPOSING DEVICE AND DEVICE WITH IT

    公开(公告)号:JPH0792096A

    公开(公告)日:1995-04-07

    申请号:JP11043694

    申请日:1994-04-25

    Applicant: CANON KK

    Abstract: PURPOSE:To precisely detect foreign matter on a photomask surface by providing an optical means, first and second detectors and a correcting means, and correcting the light quantity on the photomask surface. CONSTITUTION:A scattered light 48 is detected by an optical detector (first) 46 through a convergence optical system 47. A beam light 41 is reflected by a beam splitter 39, and made incident on an optical detector (second) 38. A correcting system 35 conducts factor correction to provide a precise foreign matter size. Namely, when the light quantity I38 of the beam 41 is large, the transmissivity of a pelicle 50 is small, the light quantity cast on the foreign matter 44 is small, and the scattered light 48 quantity is thus reduced. Since a dust of a fixed size is precisely judged to the light quantity I46 inputted to the detector 46, the function of changing slice level is imparted to the correcting system 35 to change the slice level according to the signal of an electric amplification processing system 37. The gain of an electric amplification processing system 36 for amplifying the signal obtained by the detector 46 according to the signal output of the light quantity I38 detected by the detector 38 is changed.

    SCHLIEREN MICROSCOPE DEVICE
    147.
    发明专利

    公开(公告)号:JPH075397A

    公开(公告)日:1995-01-10

    申请号:JP14230293

    申请日:1993-06-14

    Applicant: CANON KK

    Abstract: PURPOSE:To attain the schlieren observation of a very small sample. CONSTITUTION:Laser beams emitted from a laser beam source 1 are converged to a front side focal position 11 of a main lens 3 by a condenser lens 2. A position at which the laser beams made parallel by the main lens 3 are converged by a main lens 5 is matched with the front side focal position of a main lens 7, and a knife edge 6 is arranged at the position 12. Then, the image of the sample in an observing part 4 is formed on the image pickup surface of a CCD camera 10 which is movable back and forth by a lens barrel 9.

    THREE-DIMENSIONAL FORM MEASURING DEVICE, AND MEASURING METHOD OF THREE-DIMENSIONAL FORM USING SAME

    公开(公告)号:JPH05332735A

    公开(公告)日:1993-12-14

    申请号:JP16422792

    申请日:1992-05-29

    Applicant: CANON KK

    Abstract: PURPOSE:To perform a highly precise measurement of three-dimensional form by correcting the focusing information obtained by a focusing state judging optical system by the error information by the divergence of an objective lens in the position from optical axis where the reflected light from a material to be measured is entered to the objective lens. CONSTITUTION:Since the focusing information has the influence by the aberration of an objective lens 306, the position where a luminous flux is entered to the lens 306 is determined by an inclination optical system 162, and the focusing information is corrected by the aberration quantity. Specifically, the positions D, E in which reflected lights 172, 173 are transmitted by the lens 306 are determined from the imaging positions D', E' of a spot image on a sensor 111. The lens 306 has the aberration and thus a focusing slippage in the distance L to the surface 331a of a material 331 to be measured. Therefore, in the state where no correction is conducted, automatic focusing is conducted with the information from a focusing state judging optical system 361. Thus, the luminous flux incident position to the lens 306 is determined by use of the detection data of the inclination optical system 162, and the focusing information is corrected according to the aberration and the accompanying focusing slippage quantity.

    DISPLACEMENT DETECTING APPARATUS
    149.
    发明专利

    公开(公告)号:JPH05215515A

    公开(公告)日:1993-08-24

    申请号:JP4626392

    申请日:1992-01-31

    Applicant: CANON KK

    Abstract: PURPOSE:To obtain a displacement detecting apparatus, which can measure the displacement data of a moving body highly accurately. CONSTITUTION:Coherent luminous fluxes are emitted from a semiconductor laser 1 on the surface of a body 101. Two luminous fluxes through the body are made to interfere and detected with a detecting means 5. When the displacement data of the body are obtained by using the signals obtained with the detecting means, the semiconductor laser is arranged so that the surface of the body is approximately in parallel with an active-layer surface 2 of the semiconductor laser. Two luminous fluxes are the luminous fluxes, which are emitted in two directions from the active layer surface of the semiconductor laser. Means for directing the two luminous fluxes on the surface of the body are further provided.

    GRATING INTERFERENCE MEASURING DEVICE

    公开(公告)号:JPH05126603A

    公开(公告)日:1993-05-21

    申请号:JP28862491

    申请日:1991-11-05

    Applicant: CANON KK

    Abstract: PURPOSE:To prevent the deterioration of precision by the fluctuation of the wavelength difference between two-wavelength rays in a grating interference measuring device using the optical heterodyne principle. CONSTITUTION:Two-wavelength rays are once fed into a diffraction grating 9, then individual outgoing diffracted rays are again fed into the diffraction grating 9 in the opposite direction to the outgoing direction by corner cubes 10, 10', they are twice diffracted in the same order, they are merged to interfere with each other, and they are detected by a detector 12 to obtain a beat signal. The outgoing angle of the outgoing rays from the diffraction grating 9 is finally made constant regardless of the fluctuation of the wavelength difference between two-wavelength rays, and the fluctuation in the merging state is suppressed.

Patent Agency Ranking