公开(公告)号：JP2011004592A

公开(公告)日：2011-01-06

申请号：JP2010133470

申请日：2010-06-11

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： MAKAROVIC JURAJ ,  KOOPS RODY ,  VAN ZUTPHEN TOM

IPC: H02K41/02 ,  G03F7/20 ,  H01L21/027 ,  H02K3/26 ,  H02K41/03

CPC classification number: G03F7/70758 ,  H01F5/00 ,  H01F2027/2857 ,  H02K3/04 ,  H02K3/40 ,  H02K9/22 ,  H02K11/01 ,  H02K41/02 ,  H02K41/0354 ,  H02K2201/18

Abstract: PROBLEM TO BE SOLVED: To provide a coil for preventing the occurrence of a peak with a high electric-field strength.SOLUTION: A positioning device includes a planar motor having two sets of stators and translators. One set of the stator and the translator has a periodical magnetic structure, and another set of the stator and translator includes at least one coil applied to carry a current. The coil includes the wound strip of a sheeted conductive material, and the edge of the coil has a round profile.

Abstract translation: 要解决的问题：提供一种用于防止高电场强度发生峰值的线圈。解决方案：定位装置包括具有两组定子和平移器的平面电动机。 一组定子和平移器具有周期性的磁性结构，另外一组定子和转换器包括至少一个用于承载电流的线圈。 线圈包括片状导电材料的缠绕条，线圈的边缘具有圆形轮廓。

公开(公告)号：JP2011003897A

公开(公告)日：2011-01-06

申请号：JP2010134782

申请日：2010-06-14

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： DIREKS DANIEL JOSEPH MARIA ,  KEMPER NICOLAAS R ,  DANNY MARIA HUBERTUS PHILIPS ,  RIEPEN MICHEL ,  CLEMENS JOHANNES GERARDUS VAN DEN DUNGEN ,  MAIKEL ADRIANUS CORNELIS SCHEPERS

IPC: H01L21/027

CPC classification number: G03F7/70341

Abstract: PROBLEM TO BE SOLVED: To reduce or eliminate imaging defects caused by bubbles in an immersion liquid while increasing a table speed.SOLUTION: There is disclosed the immersion lithographic apparatus which includes: a projection system configured to direct a patterned beam of radiation on a substrate supported by a table; a liquid handling system configured to supply and confine the immersion liquid to a space defined between a projection system and the table or a substrate, or both of them; and a controller to control a moving speed of the table relative to liquid handling on the basis of a distance between moving direction switches.

Abstract translation: 要解决的问题：降低或消除浸没液体中由气泡引起的成像缺陷，同时提高台面速度。解决方案：公开了浸没式光刻设备，其包括：投影系统，其配置成将图案化的辐射束引导到基板上 由桌子支持; 液体处理系统，其配置成将浸没液体供应并限制在投影系统与桌子或基板之间或两者之间限定的空间中; 以及控制器，其基于移动方向开关之间的距离来控制工作台相对于液体处理的移动速度。

公开(公告)号：JP2010287892A

公开(公告)日：2010-12-24

申请号：JP2010130589

申请日：2010-06-08

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： DE BOEIJ WILHELMUS PETRUS ,  LEVASIER LEON MARTIN

IPC: H01L21/027

CPC classification number: G03B27/54 ,  G03F7/7025

Abstract: PROBLEM TO BE SOLVED: To provide a radiation beam modification apparatus and method suitable for usage in an EUV lithographic apparatus. SOLUTION: This radiation beam modification apparatus which controls a characteristic of a radiation beam in a lithographic apparatus includes a flexible sheet formed with a plurality of apertures, and a positioning device including a first rotary member and a second rotary member, wherein a first end of the flexible sheet is connected to the first rotary member, a second end of the flexible sheet is connected to the second rotary member, and the central part of the flexible sheet extends between the first rotary member and the second rotary member. The apertures are used for controlling the numerical aperture of a projection system of the lithographic apparatus. COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：提供适用于EUV光刻设备的辐射束修改装置和方法。 解决方案：控制光刻设备中的辐射束特性的该辐射束修改装置包括形成有多个孔的柔性片，以及包括第一旋转构件和第二旋转构件的定位装置，其中， 柔性片的第一端连接到第一旋转构件，柔性片的第二端连接到第二旋转构件，柔性片的中心部分在第一旋转构件和第二旋转构件之间延伸。 孔用于控制光刻设备的投影系统的数值孔径。 版权所有（C）2011，JPO＆INPIT

公开(公告)号：JP2010272878A

公开(公告)日：2010-12-02

申请号：JP2010152489

申请日：2010-07-02

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： BLEEKER ARNO JAN ,  BENSCHOP JOZEF PETRUS HENRICUS

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70358 ,  G03F7/70041 ,  G03F7/70425

Abstract: PROBLEM TO BE SOLVED: To provide a lithographic apparatus having a programmable patterning means capable of reducing errors due to the movement of a substrate during the duration of the pulse of radiation.
SOLUTION: By supplying a means for shifting a patterned projection beam which is incident on a substrate in synchronism with the movement of the substrate during the duration of the pulse of the radiation, movement of the substrate inside is corrected during the duration of the pulse of one-time radiation.
COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：提供一种具有可编程图案形成装置的光刻设备，其能够在辐射脉冲的持续时间期间减少由于基板的移动引起的误差。 解决方案：通过在辐射脉冲的持续期间内提供用于移动入射到衬底上的图案化的投影光束与衬底的运动同步的装置，其中衬底内部的运动在 脉冲一次性辐射。 版权所有（C）2011，JPO＆INPIT

公开(公告)号：JP2010272854A

公开(公告)日：2010-12-02

申请号：JP2010096552

申请日：2010-04-20

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： CADEE THEODORUS PETRUS MARIA ,  GILISSEN NOUD JAN ,  VERMEULEN JOHANNES PETRUS MARTINUS

IPC: H01L21/027

CPC classification number: G03F7/0002 ,  B82Y10/00 ,  B82Y40/00

Abstract: PROBLEM TO BE SOLVED: To achieve a high throughput in the patterning of a medium imprintable on a substrate. SOLUTION: An actuator is disclosed that is equipped with: a body 40 having faces; and a plurality of parallel conduits 44 located in the body 40. Each of the conduits 44 is deformable in response to a proper pressure change in the conduit 44, by increasing the flow of a fluid in the conduit 44 or increasing a static pressure applied to the fluid in the conduit 44. A deformation of the conduit 44 causes a deformation of a face 42. COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：为了在可压印在基板上的介质的图案化中实现高生产率。 解决方案：公开了一种致动器，其配备有：具有面的主体40; 以及位于主体40中的多个平行导管44.每个导管44响应于导管44中适当的压力变化而变形，通过增加导管44中的流体的流动或增加施加到 导管44中的流体。导管44的变形导致面42的变形。版权所有（C）2011，JPO＆INPIT

公开(公告)号：JP2010267963A

公开(公告)日：2010-11-25

申请号：JP2010108166

申请日：2010-05-10

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： BUTLER HANS

IPC: H01L21/027

CPC classification number: G03B27/32 ,  G03F9/70 ,  G03F9/7096

Abstract: PROBLEM TO BE SOLVED: To accurately align a projected image and a substrate. SOLUTION: When the substrate is scanned relative to the image in the lithographic apparatus, a scanning mechanism has coarse accuracy compared with precise patterns of the image to be exposed onto the substrate. In order to ensure that the image and the substrate are aligned at some point in time, an oscillation is imparted to a substrate table or a device that aligns the image, such as a mask table. An oscillation frequency is chosen corresponding to the maximum value of an alignment error. The frequency of a radiation pulse is adjusted so as to most accurately align the image and the substrate. The timing of the radiation pulse of the image may be adjusted so as to achieve accurate alignment when the oscillation is not imparted. COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：准确地对准投影图像和基板。 解决方案：当相对于光刻设备中的图像扫描基板时，扫描机构与要暴露于基板上的图像的精确图案相比具有粗略的精度。 为了确保图像和基板在某个时间点对准，向基板台或对准图像的装置（例如掩模台）施加振荡。 选择对应于对准误差的最大值的振荡频率。 调整辐射脉冲的频率，以最准确地对准图像和基板。 可以调整图像的辐射脉冲的定时，以便在不施加振荡时实现准确的对准。 版权所有（C）2011，JPO＆INPIT

公开(公告)号：JP2010258470A

公开(公告)日：2010-11-11

申请号：JP2010151194

申请日：2010-07-01

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： DE SMIT JOANNES THEODOOR ,  BANINE VADIM YEVGENYEVICH ,  BISSCHOPS THEODORUS HUBERTUS J ,  MODDERMAN THEODORUS MARINUS ,  DIERICHS MARCLE MATHIJS T M

IPC: H01L21/027 ,  B01D19/00 ,  G03F7/20

CPC classification number: G03F7/70341 ,  G03F7/708 ,  G03F7/70858

Abstract: PROBLEM TO BE SOLVED: To improve the lithography performance of an apparatus having a liquid that fills the space between a final element of a projection system and a substrate. SOLUTION: A lithographic apparatus and a device manufacturing method make use of a high-refractive index liquid, confined in a reservoir 13, at least partly filling a lithography field between a final element of a projection lens and the substrate. Bubbles forming in the liquid resulting from dissolved atmospheric gases or the gas discharge from an apparatus element exposed to the liquid are detected and removed so that they do not interfere with the exposure, to cause burning defects on the substrate. The detection can be carried out, by measuring the frequency dependence of ultrasonic attenuation in the liquid and the removal of bubbles can be implemented by: degassing and pressurizing the liquid; isolating the liquid from the atmosphere; supplying a continuous flow of liquid through the lithography field using liquids of low surface tension; and further, phase-shifting the ultrasonic standing-wave nodes. COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：为了提高具有填充投影系统的最终元件和基板之间的空间的液体的装置的光刻性能。 解决方案：光刻设备和器件制造方法利用限制在储存器13中的高折射率液体，至少部分地填充投影透镜的最终元件与基底之间的光刻场。 检测并除去由溶解的大气气体引起的液体中形成的气泡或暴露于液体的装置元件的气体排出，使得它们不干扰曝光，引起基板上的燃烧缺陷。 可以通过测量液体中超声波衰减的频率依赖性进行检测，并且可以通过以下方式实现气泡的去除：对液体进行脱气和加压; 从大气隔离液体; 使用低表面张力的液体通过光刻领域提供连续的液体流; 并且进一步移相超声波驻波节点。 版权所有（C）2011，JPO＆INPIT

公开(公告)号：JP2010258447A

公开(公告)日：2010-11-11

申请号：JP2010093599

申请日：2010-04-15

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： SOER WOUTER ANTHON ,  JAK MARTIN JACOBUS JOHAN

IPC: H01L21/027 ,  H05G2/00

CPC classification number: G21K1/062 ,  B82Y10/00 ,  G02B17/0892 ,  G03B27/54 ,  G03F7/70175 ,  G03F7/702 ,  G03F7/70958 ,  G21K2201/061 ,  G21K2201/064

Abstract: PROBLEM TO BE SOLVED: To provide more effective radiation sources by, improving the efficiency of the collector assembly, to reduce the excitation power used to produce radiation, to extend the life of the radiation sources by, and to improve the efficiency of light collection for the EUV radiation.
SOLUTION: A collector assembly for use in a laser-produced plasma extreme ultraviolet radiation source for use in lithography has a collector body 40 having a collecting mirror 42 and a window 43 in the collector body 40. The window is transmissive to excitation radiation beam, which may be an infrared laser beam in general, so that the beam passes through the window to excite the plasma, and the window has an EUV mirror on its surface, which is also transmissive to the excitation radiation beam but which reflects EUV generated by the plasma to the light collecting site of the collecting mirror. The window may improve the collection efficiency and reduce non-uniformity in the image at the light collecting site. Radiation sources, lithographic apparatus and device manufacturing methods may make use of the collector.
COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：为了提供更有效的辐射源，通过提高收集器组件的效率，减少用于产生辐射的激发功率，以延长辐射源的寿命并提高其效率 轻集合EUV辐射。 解决方案：用于在光刻中使用的激光产生的等离子体极紫外辐射源的集电器组件具有在集电体40内具有集光镜42和窗43的集电体40。 辐射束，其通常可以是红外激光束，使得光束通过窗口以激发等离子体，并且窗口在其表面上具有EUV反射镜，其也对激发辐射束是透射的，但反射EUV 由等离子体产生到收集镜的聚光部位。 该窗口可以提高收集效率并降低光收集位置图像的不均匀性。 辐射源，光刻设备和设备制造方法可以利用收集器。 版权所有（C）2011，JPO＆INPIT

公开(公告)号：JP2010251748A

公开(公告)日：2010-11-04

申请号：JP2010087412

申请日：2010-04-06

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： KNARREN BASTIAAN ANDREAS WILHELMUS HUBERTUS ,  TURK RAYMOND ,  KOOIKER ALLARD EELCO ,  BOONEN NICO ANTONIUS JOHANNES HUBERTUS

IPC: H01L21/027 ,  G03F7/20 ,  H05K7/20

CPC classification number: G03B27/52 ,  G03F7/70825 ,  G03F7/7085 ,  G03F7/70858 ,  H01L21/67109

Abstract: PROBLEM TO BE SOLVED: To enable efficient cooling and stable positioning of an object that is a detector, such as a photodetector, disposed in a vacuum space. SOLUTION: A described cooling arrangement includes a heat sink having a first heat contact surface, an object having a second heat contact surface, and an elastic wall. The first heat contact surface and the second heat contact surface are set facing each other to form a gap. The elastic wall is part of an enclosure enclosing a space at least containing the gap. The cooling arrangement includes equipment that maintains a pressure difference between the space and an environment given by the cooling arrangement. A lithography apparatus includes this cooling arrangement. COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：为了实现设置在真空空间中的作为诸如光电检测器的检测器的物体的有效冷却和稳定的定位。 解决方案：所描述的冷却装置包括具有第一热接触表面的散热器，具有第二热接触表面的物体和弹性壁。 第一热接触表面和第二热接触表面彼此面对设置以形成间隙。 弹性壁是封闭至少包含间隙的空间的外壳的一部分。 冷却装置包括保持空间与由冷却装置给出的环境之间的压力差的设备。 光刻设备包括这种冷却装置。 版权所有（C）2011，JPO＆INPIT

公开(公告)号：JP2010232656A

公开(公告)日：2010-10-14

申请号：JP2010063391

申请日：2010-03-19

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： BIJNEN FRANCISCUS GODEFRIDUS CASPER ,  FRANCISCUS VAN HAREN RICHARD JOHANNES ,  XIUHONG WEI

IPC: H01L21/027 ,  G03F9/00

CPC classification number: G03B27/42 ,  G03F9/7046 ,  G03F9/7088 ,  G03F9/7092

Abstract: PROBLEM TO BE SOLVED: To provide an alignment arrangement and an alignment method which reduce influences of change by marks. SOLUTION: The alignment measurement arrangement includes a light source, an optical system and a detector. The light source generates a radiation beam with a plurality of wavelength ranges. The optical system receives the radiation beam, produces an alignment beam, directs the alignment beam to a mark located on an object, receives alignment radiation back from the mark, and transmits the received radiation. The detector receives the alignment radiation, detects an image of the alignment mark and outputs a plurality of alignment signals (r) each associated with one of the wavelength ranges. A processor, in communication with the detector, receives the alignment signals, determines signal qualities of the alignment signals, determines aligned positions of the alignment signals, and calculates a position of the alignment mark based on the signal qualities, aligned positions, and a model relating the aligned position to the range of wavelengths and mark characteristics, including mark depth and mark asymmetry. COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：提供减少标记变化影响的对准布置和对准方法。 解决方案：对准测量装置包括光源，光学系统和检测器。 光源产生具有多个波长范围的辐射束。 光学系统接收辐射束，产生对准光束，将对准光束引导到位于物体上的标记，从标记接收对准辐射，并发送接收到的辐射。 检测器接收对准辐射，检测对准标记的图像，并输出与波长范围之一相关联的多个对准信号（r）。 与检测器通信的处理器接收对准信号，确定对准信号的信号质量，确定对准信号的对准位置，并根据信号质量，对准位置和模型计算对准标记的位置 将对准位置与波长范围和标记特征相关联，包括标记深度和标记不对称。 版权所有（C）2011，JPO＆INPIT