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    Device and method for manufacturing the same
    151.
    发明授权
    Device and method for manufacturing the same 有权
    装置及其制造方法

    公开(公告)号：US09162224B2

    公开(公告)日：2015-10-20

    申请号：US13693349

    申请日：2012-12-04

    Applicant: CANON KABUSHIKI KAISHA

    Inventor： Tomohiro Saito

    IPC: B23P15/00 ,  B01L3/00 ,  H01L21/28 ,  G01N27/447 ,  B81C1/00 ,  H01L41/00 ,  H01L21/00 ,  H01L41/313 ,  B01L7/00

    CPC classification number: B01L3/502707 ,  B01L3/502715 ,  B01L7/52 ,  B01L2300/0645 ,  B01L2300/0887 ,  B01L2300/12 ,  B01L2300/1805 ,  B01L2300/1827 ,  B23P15/00 ,  B81B2201/051 ,  B81C1/00817 ,  G01N27/44791 ,  H01L21/28 ,  H01L41/313 ,  Y10T29/494

    Abstract: It is an object of this invention to prevent a resistor material and an electrode material from diffusing and suppress variation in electric resistance. In a device including a plurality of metal layers of different compositions on a substrate and a second structure made of a material, such as glass paste, requiring a firing process at the time of formation, an intermediate layer is formed between a first metal layer and a second metal layer forming the first structure. The intermediate layer is of an intermetallic compound including one or more metallic elements in the first metal layer and one or more metallic elements in the second metal layer. The melting point of the intermetallic compound is higher than a firing temperature when the second structure is formed, and the intermetallic compound is produced at a temperature higher than the firing temperature for forming the second structure.

    Abstract translation: 本发明的目的是防止电阻材料和电极材料扩散并抑制电阻的变化。 在包括在基板上具有不同组成的多个金属层的装置和由形成材料的诸如玻璃浆料的第二结构之间需要在形成时进行烧制的装置中，在第一金属层和 形成第一结构的第二金属层。 中间层是包含第一金属层中的一种或多种金属元素和第二金属层中的一种或多种金属元素的金属间化合物。 当形成第二结构时，金属间化合物的熔点高于烧制温度，并且在高于用于形成第二结构的烧成温度的温度下制备金属间化合物。

    DIRECT SEALING OF GLASS MICROSTRUCTURES
    154.
    发明申请
    DIRECT SEALING OF GLASS MICROSTRUCTURES 有权
    直接密封玻璃微结构

    公开(公告)号：US20130243663A1

    公开(公告)日：2013-09-19

    申请号：US13989897

    申请日：2011-11-28

    Applicant: Thierry Luc Alain Dannoux ,  Paulo Gaspar Jorge Marques ,  Ronan Tanguy

    Inventor： Thierry Luc Alain Dannoux ,  Paulo Gaspar Jorge Marques ,  Ronan Tanguy

    IPC: B81C1/00 ,  C03B23/24

    CPC classification number: B81C1/00119 ,  B01L3/502707 ,  B01L2200/12 ,  B01L2300/0887 ,  B81B2201/051 ,  B81C1/00357 ,  B81C2203/036 ,  C03B23/245

    Abstract: Embodiments of methods for sealing a glass microstructure assembly comprise providing one or more side retainer members on a base plate adjacent the glass microstructure assembly, the side retainer members having a height less than an uncompressed height defined by the glass microstructure assembly. The methods also comprise compressing the glass microstructure assembly via a load bearing top plate in intimate contact with the top glass layer while heating the glass microstructure assembly and the top plate to a glass sealing temperature, the glass sealing temperature being a temperature sufficient to make glass viscous, wherein the glass microstructure assembly is compressed until the load bearing top plate contacts the side retainer members, and wherein the lower surface of the top plate maintains adhesion to the upper surface of the top glass layer at the glass sealing temperature while the load bearing plate is supported by the side retainer members.

    Abstract translation: 用于密封玻璃微结构组件的方法的实施例包括在邻近玻璃微结构组件的基板上提供一个或多个侧面保持器构件，侧面保持构件的高度小于由玻璃微结构组件限定的未压缩高度。 所述方法还包括通过与顶部玻璃层紧密接触的承载顶板压缩玻璃微结构组件，同时将玻璃微结构组件和顶板加热至玻璃密封温度，玻璃密封温度为足以制备玻璃的温度 粘性，其中玻璃微结构组件被压缩直到承载顶板接触侧保持器构件，并且其中顶板的下表面在玻璃密封温度下保持与顶部玻璃层的上表面的粘附，而承载 板由侧保持构件支撑。

    Micro rotary machine and methods for using same
    157.
    发明授权
    Micro rotary machine and methods for using same 有权
    微型旋转机及其使用方法

    公开(公告)号：US08159107B2

    公开(公告)日：2012-04-17

    申请号：US11757331

    申请日：2007-06-01

    Applicant: Harold L. Stalford

    Inventor： Harold L. Stalford

    IPC: H01L41/08

    CPC classification number: H02N10/00 ,  B81B3/0024 ,  B81B2201/031 ,  B81B2201/034 ,  B81B2201/037 ,  B81B2201/051 ,  H02K7/00 ,  H02N1/002 ,  H02N11/006

    Abstract: A micro rotary machine may include a micro actuator and a micro shaft coupled to the micro actuator. The micro shaft comprises a horizontal shaft and is operable to be rotated by the micro actuator. A micro tool is coupled to the micro shaft and is operable to perform work in response to motion of the micro shaft.

    Abstract translation: 微型旋转机器可以包括微型致动器和耦合到微型致动器的微型轴。 微型轴包括水平轴，并且可由微型致动器旋转。 微型工具联接到微型轴，并且可操作以响应于微型轴的运动而执行工作。

    METHOD FOR PRODUCING A STAMP FOR HOT EMBOSSING
    159.
    发明申请
    METHOD FOR PRODUCING A STAMP FOR HOT EMBOSSING 审中-公开
    用于生产热烫印花的方法

    公开(公告)号：US20120000379A1

    公开(公告)日：2012-01-05

    申请号：US13147863

    申请日：2010-02-03

    Applicant: Jesse Greener ,  Wei Li ,  Eugenia Kumacheva

    Inventor： Jesse Greener ,  Wei Li ,  Eugenia Kumacheva

    IPC: B41F19/02 ,  B44C1/24

    CPC classification number: B81C99/009 ,  B01L3/502707 ,  B81B2201/051 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002 ,  G03F7/0017

    Abstract: The present invention provides a process for producing a stamp for hot embossing (HE). The stamp can be constructed from any photo-resist epoxy that is stable at temperatures equal to the glass transition temperature (Tg) of the material to be stamped. The stamp can be used repeatedly without significant distortion of features. The stamp benefits from low relative cost, high fidelity of features in all three-dimensions and fast construction. The process for producing a stamp for hot embossing from a resist, comprising the steps of producing a seed layer L1 from a selected photoresist polymer material, soft baking the seed layer L1, exposing said seed layer L1 to initiate cross-linking and then post-exposure bake L1 to fully cross-link it, coating the cross-linked seed layer L1 with a second photoresist polymer layer L2; soft baking the second photoresist polymer layer L2; applying a mask to the top surface of the soft baked layer L2 and illuminating the unmasked portions of the soft baked layer L2 with UV radiation through the mask, wherein the exposed areas form the pattern of the embossing features, washing away un-exposed regions of the photoresist with a developer to leave behind a relief pattern formed in the second photoresist polymer layer L2, which relief pattern corresponds to a pattern in the mask.

    Abstract translation: 本发明提供一种用于生产热压花印花（HE）的印模的方法。 印模可以由任何光刻胶环氧树脂构成，其在等于要冲压的材料的玻璃化转变温度（Tg）的温度下是稳定的。 邮票可以重复使用，而不会出现特征的明显变形。 邮票受益于相对成本低，三维特征的高保真度和快速建设。 用于从抗蚀剂制造用于热压花的印模的方法，包括以下步骤：从所选择的光致抗蚀剂聚合物材料制备种子层L1，软化种子层L1，暴露所述种子层L1以引发交联， 曝光烘烤L1使其完全交联，用第二光致抗蚀剂聚合物层L2涂覆交联的种子层L1; 软烘烤第二光致抗蚀剂聚合物层L2; 对软烘烤层L2的上表面施加掩模，并通过掩模用UV辐射照射软烘烤层L2的未遮蔽部分，其中暴露区域形成压纹特征的图案，冲洗未曝光区域 具有显影剂的光致抗蚀剂留下形成在第二光致抗蚀剂聚合物层L2中的浮雕图案，该凹凸图案对应于掩模中的图案。

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