公开(公告)号：WO2007109103A2

公开(公告)日：2007-09-27

申请号：PCT/US2007/006569

申请日：2007-03-15

Applicant: KLA-TENCOR TECHNOLOGIES CORPORATION ,  ADEL, Michael, E. ,  ROBINSON, John ,  IZIKSON, Pavel ,  EICHELBERGER, Brad ,  WIDMANN, Amir ,  KATO, Atsuhiko

Inventor： ADEL, Michael, E. ,  ROBINSON, John ,  IZIKSON, Pavel ,  EICHELBERGER, Brad ,  WIDMANN, Amir ,  KATO, Atsuhiko

IPC: G01J1/00

CPC classification number: G03F7/70458 ,  G03F7/70525 ,  G03F7/706 ,  G03F9/7046

Abstract: A method for optimizing alignment performance in a fleet of exposure systems involves characterizing each exposure system in a fleet of exposure systems to generate a set of distinctive distortion profiles associated with each exposure system. The set of distinctive distortion profiles are stored in a database. A wafer having reference pattern formed thereon is provided for further pattern fabrication and an exposure system is selected from the fleet to fabricate a next layer on the wafer. Linear and higher order parameters of the selected exposure system are adjusted using the distinctive distortion profiles to model the distortion of the reference pattern. Once the exposure system is adjusted, it is used to form a lithographic pattern on the wafer.

Abstract translation: 用于优化曝光系统队列中的对准性能的方法涉及表征曝光系统中的每个曝光系统，以产生与每个曝光系统相关联的一组独特的失真曲线。 一组有特色的失真简档存储在数据库中。 提供具有形成在其上的参考图案的晶片用于进一步的图案制造，并且从车队中选择曝光系统以在晶片上制造下一层。 使用不同的失真曲线来调整所选曝光系统的线性和高阶参数以对参考图案的失真进行建模。 一旦调整曝光系统，就用于在晶片上形成平版印刷图案。

公开(公告)号：WO2007070475A3

公开(公告)日：2007-06-21

申请号：PCT/US2006/047227

申请日：2006-12-11

Applicant: KLA-TENCOR TECHNOLOGIES CORPORATION ,  ADLER, David L ,  LEVY, Ady ,  RICHARDSON, Neil ,  MCCORD, Mark A

Inventor： ADLER, David L ,  LEVY, Ady ,  RICHARDSON, Neil ,  MCCORD, Mark A

IPC: G01N23/00 ,  G21K7/00

Abstract: One embodiment relates to an apparatus, including a CRT-type gun (for example, 102, or 302, or 510, or 1002, or 1113) and deflectors to generate and scan the electron beam, which utilizes the electron beam for inspection or metrology of a substrate. The apparatus may comprise a portable scanning electron microscope. Another embodiment relates to a method of inspecting a substrate or measuring an aspect of the substrate, where an electron beam is focused using electrostatic lenses formed by metal plates (704) supported by and separated by fused glass beads (706) or other insulating material. Another embodiment relates to a method of obtaining an electron beam image of a surface of a bulk specimen where a portable SEM device is moved to the bulk specimen. Other embodiments and features are also disclosed.

公开(公告)号：WO2007035834A2

公开(公告)日：2007-03-29

申请号：PCT/US2006/036707

申请日：2006-09-20

Applicant: KLA-TENCOR TECHNOLOGIES CORPORATION ,  BOROWICZ, S., Mark ,  NASSER-GHODSI, Mehran ,  KRZECZOWSKI, Kenneth, J.

Inventor： BOROWICZ, S., Mark ,  NASSER-GHODSI, Mehran ,  KRZECZOWSKI, Kenneth, J.

IPC: G01D1/00

CPC classification number: G05B19/41875 ,  G05B2219/31304 ,  G05B2219/37206 ,  G05B2219/37224 ,  G06Q50/04 ,  G06T7/0004 ,  G06T2207/30148 ,  Y02P90/10 ,  Y02P90/20 ,  Y02P90/22 ,  Y02P90/30

Abstract: Methods and systems for creating a recipe for a defect review process are provided. One method includes determining an identity of a specimen on which the defect review process will be performed. The method also includes identifying inspection results for the specimen based on the identity. In addition, the method includes creating the recipe for the defect review process based on the inspection results. One system includes a sensor configured to generate output responsive to an identity of a specimen on which the defect review process will be performed. The system also includes a processor configured to determine the identity of the specimen using the output, to identify inspection results for the specimen based on the identity, and to create the recipe for the defect review process based on the inspection results.

Abstract translation:

提供了用于创建缺陷审查过程的配方的方法和系统。 一种方法包括确定将在其上执行缺陷审查过程的样本的身份。 该方法还包括基于身份识别标本的检查结果。 另外，该方法包括基于检查结果创建缺陷审查过程的配方。 一个系统包括传感器，该传感器被配置为响应于将在其上执行缺陷审查过程的样本的身份产生输出。 该系统还包括处理器，该处理器被配置为使用输出来确定样本的身份，基于身份来识别样本的检查结果，并且基于检查结果来创建用于缺陷审查过程的配方。

公开(公告)号：WO2007027803A2

公开(公告)日：2007-03-08

申请号：PCT/US2006/033905

申请日：2006-08-30

Applicant: KLA-TENCOR TECHNOLOGIES CORPORATION ,  HILL, Andrew, V.

Inventor： HILL, Andrew, V.

IPC: G01N21/88

CPC classification number: G01N21/4738 ,  G01N21/8806 ,  G01N21/9501

Abstract: Systems and methods for providing illumination of a specimen for inspection are provided. One system includes one or more first optical elements configured to illuminate a diffuser with a predetermined pattern of coherent light. The system also includes one or more second optical elements configured to image light exiting the diffuser onto an illumination pupil of the system such that the predetermined pattern is reproduced in the illumination pupil. In addition, the system includes an objective lens configured to focus light from the predetermined pattern in the illumination pupil onto a specimen plane. In one embodiment, the light focused onto the specimen plane is not substantially coherent. In another embodiment, the predetermined pattern is selected based on an illumination mode selected for the inspection of the specimen.

Abstract translation: 提供了用于提供用于检查的样本的照明的系统和方法。 一个系统包括一个或多个第一光学元件，其被配置成以预定相干光图案照射漫射器。 该系统还包括一个或多个第二光学元件，该第二光学元件被配置为将从漫射器出射的光成像到系统的照明光瞳上，使得预定图案在照明光瞳中被再现。 另外，该系统包括配置成将来自照明光瞳中的预定图案的光聚焦到样本平面上的物镜。 在一个实施例中，聚焦到样本平面上的光不是基本上相干的。 在另一个实施例中，基于选择用于检查样本的照射模式来选择预定图案。

公开(公告)号：WO2006133258A2

公开(公告)日：2006-12-14

申请号：PCT/US2006/022059

申请日：2006-06-06

Applicant: KLA-TENCOR TECHNOLOGIES CORPORATION ,  KANDEL, Daniel ,  GROSS, Ken ,  FRIEDMANN, Michael ,  FU, Jiyou ,  KRISHNAN, Shankar ,  GOLOVANEVSKY, Boris

Inventor： KANDEL, Daniel ,  GROSS, Ken ,  FRIEDMANN, Michael ,  FU, Jiyou ,  KRISHNAN, Shankar ,  GOLOVANEVSKY, Boris

IPC: G01J4/00

CPC classification number: G01N21/211 ,  G01N21/9501 ,  G01N21/956 ,  G03F7/70633

Abstract: Systems and methods are disclosed for using ellipsometer configurations to measure the partial Mueller matrix and the complete Jones matrix of a system that may be isotropic or anisotropic. In one embodiment two or more signals, which do not necessarily satisfy any symmetry assumptions individually, are combined into a composite signal which satisfies a symmetry assumption. The individual signals are collected at two or more analyzer angles. Symmetry properties of the composite signals allow easy extraction of overlay information for any relative orientation of the incident light beam with respect to a 1D grating target, as well as for targets comprising general 2D gratings. Signals of a certain symmetry property also allow measurement of profile asymmetry in a very efficient manner. In another embodiment a measurement methodology is defined to measure only signals which satisfy a symmetry assumption. An optional embodiment comprises a single polarization element serving as polarizer and analyzer. Another optional embodiment uses an analyzing prism to simultaneously collect two polarization components of reflected light.

Abstract translation: 公开了使用椭偏仪配置来测量可能是各向同性或各向异性的系统的部分Mueller矩阵和完整琼斯矩阵的系统和方法。 在一个实施例中，不一定满足任何对称假设的两个或更多个信号被组合成满足对称假设的复合信号。 各个信号以两个或更多个分析器角度收集。 复合信号的对称属性允许容易地提取用于入射光束相对于1D光栅靶的任何相对取向以及包括通用2D光栅的目标的覆盖信息。 具有某种对称性质的信号也可以以非常有效的方式测量轮廓不对称。 在另一个实施例中，测量方法被定义为仅测量满足对称假设的信号。 可选实施例包括用作偏振器和分析器的单个偏振元件。 另一个可选实施例使用分析棱镜来同时收集反射光的两个偏振分量。

公开(公告)号：WO2006130432A2

公开(公告)日：2006-12-07

申请号：PCT/US2006/020288

申请日：2006-05-26

Applicant: KLA-TENCOR TECHNOLOGIES CORPORATION ,  CHUANG, Yung-Ho ,  ARMSTRONG, J., Joseph

Inventor： CHUANG, Yung-Ho ,  ARMSTRONG, J., Joseph

CPC classification number: G01N21/9501 ,  G01B11/0625 ,  G01N21/21 ,  G01N21/95607 ,  G01N2021/8809

Abstract: A system and method for inspecting a multi-layer sample, such as a silicon wafer, is disclosed. The design reduces variations in total reflected energy due to thin film interference. The design includes illuminating the sample at two incident angle ranges, where the two incident angle ranges are such that variation in total reflected energy at a first incident angle range may be employed to balance variation in total reflected energy at a second incident angle range. Defects are detected using die-to-die subtraction of the sample illuminated at the two incident angle ranges.

Abstract translation: 公开了一种用于检查诸如硅晶片的多层样品的系统和方法。 该设计减少了由于薄膜干扰导致的总反射能量的变化。 该设计包括以两个入射角度范围照射样品，其中两个入射角范围使得可以采用在第一入射角范围的总反射能量的变化来平衡在第二入射角范围内的总反射能量的变化。 使用在两个入射角度范围照射的样品的模 - 阴相减去检测缺陷。

公开(公告)号：WO2006104748A1

公开(公告)日：2006-10-05

申请号：PCT/US2006/010042

申请日：2006-03-21

Applicant: KLA-TENCOR TECHNOLOGIES CORPORATION ,  LANGE, Steven, R.

Inventor： LANGE, Steven, R.

IPC: G01N21/95 ,  G01N21/88

CPC classification number: G02B17/061 ,  G01N21/9501 ,  G01N2021/9563 ,  G01N2201/0636

Abstract: All-reflective optical systems for broadband wafer inspection are provided. One system configured to inspect a wafer includes an optical subsystem. All light-directing components of the optical subsystem are reflective optical components except for one or more refractive optical components, which are located only in substantially collimated space. The refractive optical component(s) may include, for example, a refractive beamsplitter element that can be used to separate illumination and collection pupils. The optical subsystem may also include one or more reflective optical components located in substantially collimated space. The optical subsystem is configured for inspection of the wafer across a waveband of greater than 20 nm. In some embodiments, the optical subsystem is configured for inspection of the wafer at wavelengths less than and greater than 200 nm.

Abstract translation: 提供了用于宽带晶圆检测的全反射光学系统。 配置为检查晶片的一个系统包括光学子系统。 光学子系统的所有光指向部件都是反射光学部件，除了一个或多个折射光学部件，其仅位于基本准直的空间中。 折射光学部件可以包括例如可用于分离照明和收集瞳孔的折射分束器元件。 光学子系统还可以包括位于基本上准直的空间中的一个或多个反射光学部件。 光学子系统被配置用于跨越超过20nm的波段检查晶片。 在一些实施例中，光学子系统被配置为在小于或大于200nm的波长下检查晶片。

公开(公告)号：WO2006076484A3

公开(公告)日：2006-07-20

申请号：PCT/US2006/001067

申请日：2006-01-11

Applicant: KLA-TENCOR TECHNOLOGIES CORPORATION ,  BAREKET, Noah ,  WACK, Daniel, C. ,  ZHAO, Guoheng

Inventor： BAREKET, Noah ,  WACK, Daniel, C. ,  ZHAO, Guoheng

IPC: G01N21/00

Abstract: To measure the critical dimensions and other parameters of a one- or two-dimensional diffracting structure of a film, the calculation may be simplified by first performing a measurement of the thickness of the film, employing a film model that does not vary the critical dimension or parameters related to other characteristics of the structure. The thickness of the film may be estimated using the film model sufficiently accurately so that such estimate may be employed to simplify the structure model for deriving the critical dimension and other parameters related to the two-dimensional diffracting structure.

公开(公告)号：WO2006041944A3

公开(公告)日：2006-04-20

申请号：PCT/US2005/035867

申请日：2005-10-04

Applicant: KLA-TENCOR TECHNOLOGIES CORPORATION ,  MILLER, Lawrence, Robert ,  VAEZ-IRAVANI, Mehdi

Inventor： MILLER, Lawrence, Robert ,  VAEZ-IRAVANI, Mehdi

IPC: G01N21/95 ,  G01N21/88

Abstract: Pixel intensities indicative of scattered radiation from portions of the inspected surface surrounding a location of a potential anomaly are also stored so that such data is available for quick review of the pixel intensities within a patch on the surface containing the location of the potential anomaly. Where rotational motion is caused between the illumination beam and the inspected surface, signal-to-noise ratio may be improved by comparing the pixel intensities of pixels at corresponding positions on two different surfaces that are inspected, where corresponding pixels at the same relative locations on the two different surfaces are illuminated and scattered radiation therefrom collected and detected under the same optical conditions.

公开(公告)号：WO2006023448A2

公开(公告)日：2006-03-02

申请号：PCT/US2005/028993

申请日：2005-08-16

Applicant: KLA-TENCOR TECHNOLOGIES CORPORATION ,  CHUANG, Yung-Ho ,  ARMSTRONG, Joseph, J.

Inventor： CHUANG, Yung-Ho ,  ARMSTRONG, Joseph, J.

IPC: H01S3/08

CPC classification number: H01S3/2383 ,  G01N21/8806 ,  G01N21/9501 ,  G02B6/02347 ,  G02B6/02366 ,  H01S3/005 ,  H01S3/0057 ,  H01S3/06708 ,  H01S3/06729 ,  H01S3/06741 ,  H01S3/06745 ,  H01S3/06754 ,  H01S3/06791 ,  H01S3/094007 ,  H01S3/094019 ,  H01S3/09415 ,  H01S3/1118

Abstract: A laser illuminator for use in an inspection system, such as a semiconductor wafer inspection system or photomask inspection system is provided. The gain medium in the illuminator comprises optical fiber, and amplification, beam splitting, frequency and/or bandwidth conversion, peak power reduction, and q-switching or mode locking may be employed. Certain constructs including doped fiber, gratings, saturable absorbers, and laser diodes are disclosed to provide enhanced illumination.

Abstract translation: 提供了用于检查系统中的激光照明器，例如半导体晶片检查系统或光掩模检查系统。 照明器中的增益介质包括光纤，并且可以采用放大，分束，频率和/或带宽转换，峰值功率减小和q开关或模式锁定。 公开了某些构造，包括掺杂光纤，光栅，可饱和吸收器和激光二极管以提供增强的照明。