公开(公告)号：US20170088973A1

公开(公告)日：2017-03-30

申请号：US15377963

申请日：2016-12-13

Applicant: SUMCO CORPORATION

Inventor： Toshiaki SUDO ,  Tadahiro SATO ,  Ken KITAHARA ,  Masami OHARA

IPC: C30B15/10 ,  C03B19/09 ,  G01N21/3563 ,  C30B29/06 ,  G01N21/95 ,  G01N21/65

CPC classification number: H01J37/32935 ,  C30B15/00 ,  C30B15/10 ,  C30B15/14 ,  C30B29/06 ,  C30B35/002 ,  G01N21/3563 ,  G01N21/65 ,  G01N21/68 ,  G01N21/95 ,  G01N2021/8477 ,  G01N2201/105 ,  G01N2201/12

Abstract: A method of manufacturing a vitreous silica crucible includes an inspection method comprising: a measurement step of measuring an infrared absorption spectrum or a Raman shift of a measurement point on an inner surface of the vitreous silica crucible; a determining step of predicting whether a surface defect region is generated or not in the measurement point based on an obtained spectrum to determine a quality of the vitreous silica crucible.

公开(公告)号：US09557265B2

公开(公告)日：2017-01-31

申请号：US14373928

申请日：2013-01-24

Applicant: TOMRA SORTING AS

Inventor： Dirk Balthasar ,  Ole Onsrud

IPC: G01N21/55 ,  G01N21/84 ,  G02B26/10

CPC classification number: G01N21/55 ,  G01N21/84 ,  G01N2021/845 ,  G01N2201/105 ,  G02B26/105

Abstract: An apparatus for detecting matter, the apparatus including: a first light source adapted to emit a first light beam; a second light source adapted to emit a second light beam, wherein the apparatus is arranged such that the first and second light beams converge towards a scanning element; the scanning element adapted to redirect the converging first and second light beams towards the matter to be detected; and a detector adapted to receive light reflected by the matter via the scanning element. Also, a system and method of detecting matter.

Abstract translation: 一种用于检测物质的装置，所述装置包括：适于发射第一光束的第一光源; 适于发射第二光束的第二光源，其中所述设备被布置成使得所述第一和第二光束朝向扫描元件会聚; 所述扫描元件适于将所述会聚的第一和第二光束朝向待检测的物体重定向; 以及检测器，适于接收经由扫描元件反射的光。 另外，检测物质的系统和方法。

公开(公告)号：US09518932B2

公开(公告)日：2016-12-13

申请号：US14517751

申请日：2014-10-17

Applicant: KLA-Tencor Corporation

Inventor： Allen Park ,  Craig MacNaughton ,  Ellis Chang

IPC: G01B11/06 ,  G01N21/88 ,  G03F7/00 ,  G01N21/93 ,  G01N21/95 ,  G01N21/956 ,  G03F7/20

CPC classification number: G01N21/93 ,  G01B11/06 ,  G01B11/0675 ,  G01B2210/56 ,  G01N21/9501 ,  G01N21/956 ,  G01N2201/061 ,  G01N2201/105 ,  G01N2201/11 ,  G01N2201/125 ,  G03F7/705 ,  G03F7/70616

Abstract: Methods and systems for determining one or more parameters of a wafer inspection process are provided. One method includes acquiring metrology data for a wafer generated by a wafer metrology system. The method also includes determining one or more parameters of a wafer inspection process for the wafer or another wafer based on the metrology data.

Abstract translation: 提供了用于确定晶片检查过程的一个或多个参数的方法和系统。 一种方法包括获取由晶片计量系统产生的晶片的度量数据。 该方法还包括基于测量数据确定晶片或另一晶片的晶片检查过程的一个或多个参数。

公开(公告)号：US09518930B2

公开(公告)日：2016-12-13

申请号：US13964399

申请日：2013-08-12

Applicant: KLA-Tencor Corporation

Inventor： Neil Judell ,  Ian T. Kohl ,  Songping Gao ,  Richard E. Bills

IPC: G01N21/88 ,  G01N21/21 ,  G01N21/47 ,  G01N21/55 ,  G01N21/95 ,  G01N21/956 ,  G06T7/00

CPC classification number: G01N21/9501 ,  G01N21/21 ,  G01N21/47 ,  G01N21/4738 ,  G01N21/474 ,  G01N21/55 ,  G01N21/88 ,  G01N21/8806 ,  G01N21/95 ,  G01N21/956 ,  G01N2021/4707 ,  G01N2021/4711 ,  G01N2021/4792 ,  G01N2021/556 ,  G01N2021/8809 ,  G01N2021/8848 ,  G01N2021/8864 ,  G01N2021/8877 ,  G01N2021/8896 ,  G01N2201/0612 ,  G01N2201/105 ,  G06T7/0004 ,  G06T2207/30148 ,  Y10T29/49826

Abstract: An optical collection and detection system for use in a surface inspection system for inspecting a surface of a workpiece. The surface inspection system has an incident beam projected through a back quartersphere and toward a desired location on the surface, which is a scanned spot having a known scanned spot size. The incident beam impinges on the surface to create scattered light that is collected by a collector module. The collector module includes collection optics for collecting and focusing the scattered light to form focused scattered light. A collector output slit is positioned at an output of the collector module, through which the collection optics focus the scattered light. The scattered light that is associated with the scanned spot forms an imaged spot at the collector output slit. The collector output slit has a width that is selected to be proportional to the scanned spot size, so as to allow passage of the focused scattered light associated with the scanned spot, and exclude the focused scattered light associated with the workpiece regions other than the desired spot. A collector output varying subsystem varies the collector output slit so as to at least one of minimize passage of Rayleigh light scatter through the collector output slit or optimize a signal to air-scatter-noise ratio.

Abstract translation: 一种用于表面检查系统中用于检查工件表面的光学收集和检测系统。 表面检查系统具有通过背面四分之一球并且朝向表面上的期望位置投射的入射光束，其是具有已知扫描光斑尺寸的扫描点。 入射光束撞击在表面上以产生由收集器模块收集的散射光。 收集器模块包括用于收集和聚焦散射光以形成聚焦散射光的收集光学器件。 收集器输出狭缝位于收集器模块的输出处，收集光学器件通过该收集器模块聚焦散射光。 与扫描点相关联的散射光在收集器输出狭缝处形成成像点。 集电极输出狭缝具有被选择成与扫描光斑尺寸成比例的宽度，以便允许与扫描光点相关联的聚焦散射光的通过，并且排除与除了所需的以外的工件区域相关联的聚焦散射光 点。 集电极输出变化子系统使收集器输出狭缝变化，以便使瑞利光散射通过集电极输出狭缝的最小化通道中的至少一个或将信号优化为空气散射噪声比。

公开(公告)号：US09488591B2

公开(公告)日：2016-11-08

申请号：US14525647

申请日：2014-10-28

Applicant: KLA-Tencor Corporation

Inventor： Richard E. Bills ,  Neil Judell ,  Klaus R. Freischlad ,  James P. McNiven

IPC: G01N21/00 ,  G01N21/88 ,  G01N21/21 ,  G01N21/47 ,  G01N21/55 ,  G01N21/95 ,  G01N21/956 ,  G06T7/00

CPC classification number: G01N21/9501 ,  G01N21/21 ,  G01N21/47 ,  G01N21/4738 ,  G01N21/474 ,  G01N21/55 ,  G01N21/88 ,  G01N21/8806 ,  G01N21/95 ,  G01N21/956 ,  G01N2021/4707 ,  G01N2021/4711 ,  G01N2021/4792 ,  G01N2021/556 ,  G01N2021/8809 ,  G01N2021/8848 ,  G01N2021/8864 ,  G01N2021/8877 ,  G01N2021/8896 ,  G01N2201/0612 ,  G01N2201/105 ,  G06T7/0004 ,  G06T2207/30148 ,  Y10T29/49826

Abstract: A surface inspection system, as well as related components and methods, are provided. The surface inspection system includes a beam source subsystem, a beam scanning subsystem, a workpiece movement subsystem, an optical collection and detection subsystem, and a processing subsystem. The optical collection and detection system features, in the front quartersphere, a light channel assembly for collecting light reflected from the surface of the workpiece, and a front collector and wing collectors for collecting light scattered from the surface, to greatly improve the measurement capabilities of the system. The light channel assembly has a switchable edge exclusion mask and a reflected light detection system for improved detection of the reflected light.

公开(公告)号：US20160265749A1

公开(公告)日：2016-09-15

申请号：US15060583

申请日：2016-03-03

Applicant: Panasonic Intellectual Property Management Co., Ltd.

Inventor： YASUHISA INADA

IPC: F21V9/16 ,  F21V14/00 ,  G01N21/59 ,  G03B21/20

CPC classification number: F21V9/30 ,  F21V9/00 ,  F21V14/02 ,  G01N21/59 ,  G01N2201/105 ,  G03B21/204

Abstract: a light-emitting device including: a photoluminescent layer that contains a photoluminescent material and emits light including first light having a wavelength λa in air; and a light-transmissive layer located on or near the photoluminescent layer. At least one periodic structure is defined on at least one of the photoluminescent layer and the light-transmissive layer. The at least one periodic structure has projections or recesses or both. A distance Dint between two adjacent projections or two adjacent recesses and a refractive index nwav-a of the photoluminescent layer for the first light satisfy λa/nwav-a

Abstract translation: 发光装置，包括：含有光致发光材料并发射包括空气中波长λa的第一光的光的光致发光层; 以及位于光致发光层上或附近的透光层。 在光致发光层和透光层中的至少一个上限定至少一个周期性结构。 所述至少一个周期性结构具有突起或凹槽或两者。 在两个相邻的突起或两个相邻凹部之间的距离Dint和用于第一光的光致发光层的折射率nwav-a满足λa/ nwav-a

公开(公告)号：US09429513B2

公开(公告)日：2016-08-30

申请号：US14454052

申请日：2014-08-07

Applicant: RICOH COMPANY, LTD.

Inventor： Kazuhiko Adachi ,  Yoshihiro Oba ,  Toshihiro Ishii ,  Fumikazu Hoshi ,  Sunao Chubachi ,  Yoshihiro Misaka

IPC: G01J4/00 ,  G03G15/00 ,  G01N21/21 ,  G01B11/06 ,  G01G9/00 ,  G01N21/47 ,  G01N21/59

CPC classification number: G01N21/21 ,  G01B11/06 ,  G01G9/00 ,  G01N21/4738 ,  G01N21/59 ,  G01N2201/06113 ,  G01N2201/062 ,  G01N2201/0691 ,  G01N2201/105 ,  G03G15/5029 ,  G03G2215/00616 ,  G03G2215/00738 ,  G03G2215/00742

Abstract: A sensor apparatus includes an irradiation system with a light source configured to emit linearly polarized light of a first polarization direction onto a sheet-like object, in a direction oblique to a direction orthogonal to a surface of the object, a first photodetector arranged on an optical path of light that is emitted from the irradiation system and then is reflected at the object by regular reflection, a first optical element, arranged on an optical path of light reflected by diffuse reflection from an incidence plane of the object, configured to transmit linearly polarized light of a second polarization direction that is orthogonal to the first polarization direction, a second photodetector configured to receive light that has passed through the first optical element, and a detection unit configured to detect at least one of basis weight and thickness of the object.

Abstract translation: 一种传感器装置，包括具有光源的照射系统，被配置为沿与物体的表面正交的方向倾斜的方向将第一偏振方向的线偏振光发射到片状物体上;第一光电检测器， 从照射系统发射的光的光路，然后通过规则反射在物体处反射;第一光学元件，布置在从物体的入射平面漫反射反射的光的光路上，被配置为线性地透射 与第一偏振方向正交的第二偏振方向的偏振光，被配置为接收通过第一光学元件的光的第二光电检测器，以及检测单元，被配置为检测物体的基重和厚度中的至少一个 。

公开(公告)号：US20160233116A1

公开(公告)日：2016-08-11

申请号：US15093424

申请日：2016-04-07

Applicant: COHERENT LASERSYSTEMS GMBH & CO. KG

Inventor： Paul VAN DER WILT

IPC: H01L21/67 ,  G01N21/21 ,  G01N21/47 ,  G02B21/00 ,  G01N21/95 ,  G01N21/84

CPC classification number: H01L21/67253 ,  C30B1/02 ,  C30B29/06 ,  G01N21/21 ,  G01N21/4788 ,  G01N21/8422 ,  G01N21/8851 ,  G01N21/9501 ,  G01N2021/8461 ,  G01N2021/8477 ,  G01N2201/06113 ,  G01N2201/068 ,  G01N2201/0683 ,  G01N2201/0697 ,  G01N2201/10 ,  G01N2201/105 ,  G02B21/002 ,  G02B21/0092 ,  H01L21/02532 ,  H01L21/02686 ,  H01L21/268 ,  H01L22/12

Abstract: A method is disclosed evaluating a silicon layer crystallized by irradiation with pulses form an excimer-laser. The crystallization produces periodic features on the crystallized layer dependent on the number of and energy density ED in the pulses to which the layer has been exposed. An area of the layer is illuminated with light. A microscope image of the illuminated area is made from light diffracted from the illuminated are by the periodic features. The microscope image includes corresponding periodic features. The ED is determined from a measure of the contrast of the periodic features in the microscope image.

Abstract translation: 公开了评估通过用脉冲照射形成准分子激光而结晶的硅层的方法。 结晶层上产生周期性特征，取决于层暴露于的脉冲中的数量和能量密度ED。 该层的一个区域用光照亮。 照明区域的显微镜图像由从被照明的周期特征衍射的光制成。 显微镜图像包括相应的周期特征。 ED是从显微镜图像中的周期特征的对比度的量度确定的。

公开(公告)号：US09354182B2

公开(公告)日：2016-05-31

申请号：US13777053

申请日：2013-02-26

Applicant: STERIS Inc. ,  INSTITUT NATIONAL D'OPTIQUE / NATIONAL OPTICS INSTITUTE

Inventor： Daniel Rochette ,  Pascal Gallant ,  Ozge Mermut ,  Francois Baribeau ,  Isabelle Noiseux ,  Isabelle Gosselin

IPC: G01N21/76 ,  G01N21/94 ,  G01N21/64 ,  A61L2/28

CPC classification number: G01N21/6428 ,  A61L2/28 ,  A61L2202/24 ,  G01N21/6486 ,  G01N21/94 ,  G01N2021/6417 ,  G01N2021/6439 ,  G01N2201/06113 ,  G01N2201/068 ,  G01N2201/0697 ,  G01N2201/10 ,  G01N2201/105

Abstract: A method and apparatus for optical detection of residual soil on articles (such as medical instruments and equipment), after completion of a washing or a rinsing operation by a washer. A soil detection system provides an indication of soil on the articles by detecting luminescent radiation emanating from the soil in the presence of ambient light.

Abstract translation: 在清洗完成洗涤或冲洗操作之后，用于光学检测物品（例如医疗仪器和设备）上残留土壤的方法和装置。 土壤检测系统通过在环境光的存在下检测从土壤发出的发光辐射来提供物品上的土壤的指示。

公开(公告)号：US09335276B2

公开(公告)日：2016-05-10

申请号：US14195656

申请日：2014-03-03

Applicant: Coherent LaserSystems GmbH & Co. KG

Inventor： Paul Van Der Wilt

IPC: H01L21/268 ,  G01N21/95 ,  H01L21/66 ,  G01N21/84 ,  G01N21/88 ,  G02B21/00 ,  G01N21/47 ,  H01L21/02

CPC classification number: H01L21/67253 ,  C30B1/02 ,  C30B29/06 ,  G01N21/21 ,  G01N21/4788 ,  G01N21/8422 ,  G01N21/8851 ,  G01N21/9501 ,  G01N2021/8461 ,  G01N2021/8477 ,  G01N2201/06113 ,  G01N2201/068 ,  G01N2201/0683 ,  G01N2201/0697 ,  G01N2201/10 ,  G01N2201/105 ,  G02B21/002 ,  G02B21/0092 ,  H01L21/02532 ,  H01L21/02686 ,  H01L21/268 ,  H01L22/12

Abstract: A method is disclosed evaluating a silicon layer crystallized by irradiation with pulses form an excimer-laser. The crystallization produces periodic features on the crystallized layer dependent on the number of and energy density ED in the pulses to which the layer has been exposed. An area of the layer is illuminated with light. A microscope image of the illuminated area is made from light diffracted from the illuminated are by the periodic features. The microscope image includes corresponding periodic features. The ED is determined from a measure of the contrast of the periodic features in the microscope image.

Abstract translation: 公开了评估通过用脉冲照射形成准分子激光而结晶的硅层的方法。 结晶层上产生周期性特征，取决于层暴露于的脉冲中的数量和能量密度ED。 该层的一个区域用光照亮。 照明区域的显微镜图像由从被照明的周期特征衍射的光制成。 显微镜图像包括相应的周期特征。 ED是从显微镜图像中的周期特征的对比度的量度确定的。