公开(公告)号：EP4486739A1

公开(公告)日：2025-01-08

申请号：EP23707976.9

申请日：2023-03-03

Applicant: InterAx Biotech AG ,  Stichting VU

Inventor： RIEMENS, Rick ,  BOSMA, Reggie ,  LEURS, Rob ,  DE ESCH, Iwan ,  WIJTMANS, Maikel ,  VISCHER, Henry ,  NIKOLAEV, Yaroslav ,  KANEV, Georgi ,  ZIMMERMANN, Mirjam ,  RIZK, Aurélien ,  POTENZA, Alessandro ,  STEPNIEWSKI, Tomasz Maciej ,  WIJFFELAARS, Laura

IPC: C07D413/06 ,  A61P35/00

公开(公告)号：EP3964892A1

公开(公告)日：2022-03-09

申请号：EP20193990.7

申请日：2020-09-02

Applicant: Stichting VU ,  ASML Netherlands B.V. ,  Stichting Nederlandse Wetenschappelijk Onderzoek Instituten ,  Universiteit van Amsterdam

Inventor： VAN SCHAIJK, Theodorus, Thomas, Marinus ,  MESSINIS, Christos ,  DEN BOEF, Arie, Jeffrey ,  PANDEY, Nitesh ,  De BOER, Johannes Fitzgerald

IPC: G03F7/20 ,  G03H1/04

Abstract: An illumination arrangement operable to provide at least a first pair of radiation beams is disclosed. The illumination arrangement comprises a first beam path for providing a first beam of the first pair of radiation beams, the first beam path comprising a first optical fiber and a second beam path for providing a second beam of the first pair of radiation beams, the second beam path comprising a second optical fiber. The at least one dispersion compensation arrangement is operable to minimize a wavelength dependent optical path length difference between the first beam path and second beam path, at least over a wavelength range of interest.

公开(公告)号：EP3875633A1

公开(公告)日：2021-09-08

申请号：EP20160615.9

申请日：2020-03-03

Applicant: Stichting Nederlandse Wetenschappelijk Onderzoek Instituten ,  Universiteit van Amsterdam ,  Stichting VU ,  ASML Netherlands B.V.

Inventor： KURGANOVA, Evgenia ,  DE VRIES, Gosse, Charles ,  POLYAKOV, Alexey, Olegovich ,  OVERKAMP, Jim, Vincent ,  COENEN, Teis, Johan ,  DRUZHININA, Tamara ,  CASTELLANOS ORTEGA, Sonia ,  LUGIER, Olivier, Christian, Maurice

IPC: C23C16/04 ,  C23C16/26 ,  C23C16/455 ,  C23C16/48 ,  C23C16/56 ,  C23C14/04 ,  G03F7/20 ,  H01L21/02 ,  H01J37/317 ,  C23C16/46

Abstract: Methods and apparatus for forming a patterned layer of material are disclosed. In one arrangement, a deposition-process material is provided in gaseous form. A layer of the deposition-process material is formed on the substrate by causing condensation or deposition of the gaseous deposition-process material. A selected portion of the layer of deposition-process material is irradiated to modify the deposition-process material in the selected portion.

公开(公告)号：EP3867604A1

公开(公告)日：2021-08-25

申请号：EP19828884.7

申请日：2019-10-18

Applicant: Stichting VU

Inventor： AMITONOVA, Liubov Vladimirovna ,  DE BOER, Johannes Fitzgerald

IPC: G01D5/353 ,  G01D5/34 ,  G01H9/00 ,  G01L1/24 ,  G02B27/48 ,  F21V8/00 ,  A61B1/07 ,  A61B1/00 ,  G02B6/036 ,  G01N21/47

公开(公告)号：EP3773163A1

公开(公告)日：2021-02-17

申请号：EP19720190.8

申请日：2019-03-28

Applicant: Stichting VU

Inventor： FEROLDI, Fabio ,  DE BOER, Johannes, Fitzgerald

IPC: A61B5/00 ,  G02B6/26 ,  A61B1/00

公开(公告)号：EP3533900A1

公开(公告)日：2019-09-04

申请号：EP18159654.5

申请日：2018-03-02

Applicant: Stichting Nederlandse Wetenschappelijk Onderzoek Instituten ,  ASML Netherlands B.V. ,  Universiteit van Amsterdam ,  Stichting VU

Inventor： VERHOEVEN, Jan ,  FRENKEN, Joost, Wilhelmus, Maria ,  ANTONOV, Pavlo ,  TEN KATE, Nicolaas

IPC: C23C16/04 ,  C23C16/26 ,  C23C16/48 ,  C23C16/56

Abstract: Methods and apparatus for forming a patterned layer of carbon are disclosed. In one arrangement, a selected portion of a surface of a solid structure is irradiated with extreme ultraviolet radiation in the presence of a carbon-containing precursor. The radiation interacts with the solid structure in the selected portion to cause formation of a layer of carbon in the selected portion from the carbon-containing precursor. The layer of carbon is formed in a pattern defined by the selected portion.

公开(公告)号：EP2779915B1

公开(公告)日：2019-06-19

申请号：EP12824824.2

申请日：2012-11-16

Applicant: Stichting VU-VUMC

Inventor： VAN LOENEN, Rianne, Irene ,  PAALMAN, Micha, Ilan ,  VEENHOF, Alexander, Arnold, Frederik, Adriaan

IPC: A61B17/04

公开(公告)号：EP3410211A1

公开(公告)日：2018-12-05

申请号：EP17173786.9

申请日：2017-05-31

Applicant: Stichting VU ,  Universiteit van Amsterdam ,  Stichting Nederlandse Wetenschappelijk Onderzoek Instituten ,  ASML Netherlands B.V.

Inventor： WITTE, Stefan, Michiel ,  JANSEN, Gijsbert, Simon, Matthijs ,  FREISEM, Lars, Christian ,  EIKEMA, Kjeld, Sijbrand, Eduard ,  MATHIJSSEN, Simon, Gijsbert, Josephus

IPC: G03F7/20 ,  G01J9/00

CPC classification number: G03F7/70191 ,  G01J9/00 ,  G03F7/70133 ,  G03F7/70141 ,  G03F7/706

Abstract: A metrology apparatus (302) includes a higher harmonic generation (HHG) radiation source for generating (310) EUV radiation. Operation of the HHG source is monitored using a wavefront sensor (420) which comprises an aperture array (424, 702) and an image detector (426). A grating (706) disperses the radiation passing through each aperture so that the image detector captures positions and intensities of higher diffraction orders for different spectral components and different locations across the beam. In this way, the wavefront sensor can be arranged to measure a wavefront tilt for multiple harmonics at each location in said array. In one embodiment, the apertures are divided into two subsets (A) and (B), the gratings (706) of each subset having a different direction of dispersion. The spectrally resolved wavefront information (430) is used in feedback control (432) to stabilize operation of the HGG source, and/or to improve accuracy of metrology results.

公开(公告)号：EP3008506A1

公开(公告)日：2016-04-20

申请号：EP14737025.8

申请日：2014-06-11

Applicant: Stichting VU-VUmc

Inventor： PETERMAN, Erwin Johannes Gerard ,  WUITE, Gijs Jan Lodewijk ,  SITTERS, Gerrit ,  KAMSMA, Douwe

IPC: G02B21/32 ,  B82Y35/00

CPC classification number: C12Q1/6837 ,  G01N29/0681 ,  G02B21/32

Abstract: A molecular manipulation system for investigating molecules,having a sample holder constructed to hold a sample comprising a plurality of molecules attached on one side to a surface in the sample holder and on another side attached to a microbead of a plurality of microbeads. The system having; an acoustic wave generator to generate an acoustic wave exerting a force on the microbeads in the sample; anda detector device to detect a response of the plurality of microbeads in the sample on the force exerted by the acoustic wave to investigate the molecules attached to the microbeads.

公开(公告)号：EP3004848A1

公开(公告)日：2016-04-13

申请号：EP14731835.6

申请日：2014-06-02

Applicant: Stichting VU-VUmc

Inventor： WUITE, Gijs Jan Lodewijk ,  PETERMAN, Erwin Johannes Gerard ,  HELLER, Iddo ,  SITTERS, Gerrit ,  CANDELLI, Andrea ,  HELL, Stefan Walter

IPC: G01N21/64 ,  G02B21/00 ,  G02B21/16 ,  G02B21/32 ,  B01L3/00 ,  C12Q1/68

CPC classification number: G01N21/6428 ,  B01L3/502761 ,  B01L2200/0663 ,  B01L2300/0877 ,  B01L2400/0454 ,  C12Q1/6816 ,  G01N21/6458 ,  G02B21/0048 ,  G02B21/0076 ,  G02B21/16 ,  G02B21/32 ,  C12Q2565/629

Abstract: The present disclosure concerns a method and system for imaging a molecular strand (MS). The method comprises providing a sample volume (SV) comprising the strand (MS); providing an excitation beam (EB) having an excitation focus (EF) in the sample volume (SV); scanning the excitation focus (EF) in the sample volume (SV) along a one dimensional scanning line (SL); trapping an end of the strand (MS) in the sample volume (SV) and extending the strand (MS) along a one-dimensional trapping line (LL) parallel to the scanning line (SL); aligning the trapping line (LL) to coincide with the scanning line (SL) to have the scanning excitation focus (EF) coincide with the strand (MS); and recording the fluorescence response (FR) as a function of a plurality of distinct scanning positions (X0) of the excitation focus (EF) along the scanning line (SL).

Abstract translation: 本公开涉及用于对分子链（MS）进行成像的方法和系统。 该方法包括提供包含链（MS）的样品体积（SV）; 提供在样本体积（SV）中具有激发焦点（EF）的激发光束（EB）; 沿着一维扫描线（SL）扫描样品体积（SV）中的激发聚焦（EF）; 将样品体积（SV）中的股线（MS）的末端捕获并沿着平行于扫描线（SL）的一维捕获线（LL）延伸股线（MS）; 对准捕获线（LL）与扫描线（SL）重合以使扫描激发聚焦（EF）与链（MS）重合; 以及沿着扫描线（SL）记录作为激发焦点（EF）的多个不同扫描位置（X0）的函数的荧光响应（FR）。