182.
    发明专利
    未知

    公开(公告)号:DE4445244B4

    公开(公告)日:2006-11-30

    申请号:DE4445244

    申请日:1994-12-19

    Abstract: The present invention is directed to providing an environmentally stable, ultra-short pulse source. Exemplary embodiments relate to passively modelocked ultra-short fiber lasers which are insensitive to temperature variations and which possess only negligible sensitivity to pressure variations. Further, exemplary embodiments can be implemented in a cost-effective manner which render them commercially practical in unlimited applications. Arbitrary fiber lengths (e.g., on the order of 1 millimeter to 1 kilometer, or greater) can be used to provide an ultra-short pulse with a cost-effective architecture which is commercially practical.

    184.
    发明专利
    未知

    公开(公告)号:DE10205351A1

    公开(公告)日:2002-09-19

    申请号:DE10205351

    申请日:2002-02-08

    Inventor: PATEL RAJESH S

    Abstract: A method for material processing using a pulsed laser includes generating a beam of laser pulses, focusing the beam in a plane above the surface of a workpiece, causing breakdown of matter at a lasing point, and removing or modifying material of the workpiece. Positioning the focal plane of the laser above the workpiece permits the use of higher intensity laser beam pulses and minimizes ill effects of workpiece surface conditions on laser energy absorption. In a second aspect, a method for material processing further includes using vacuum to remove the material removed by the beam, preferably by a push-pull type air vacuum system located slightly above the workpiece surface, thereby providing cleaner workpiece and feature surfaces.

    High power femto-second optical pulse generator

    公开(公告)号:DE19802845A1

    公开(公告)日:1998-07-30

    申请号:DE19802845

    申请日:1998-01-26

    Abstract: A high power optical pulse generator has: (a) a non-linear amplifier (11) with non-linear phase delay for collecting signal light from an optical source (10); and (b) a frequency converter (20) which collects optical pulses emitted from the non-linear amplifier and which emits high power optical pulses. Preferably, the frequency converter (20) has a periodically poled lithium niobate crystal (PPLN). Also claimed are: (1) similar high power optical pulse generators in which: (i) the frequency converter (20), which generates high power optical pulses with a frequency-converted wavelength, has a spectral acceptance band width smaller than the spectrum value of the optical pulses from the optical source (10) and converts energy from a section of the optical source pulse spectrum into the spectral acceptance band width; and (ii) a non-linear compressor receives the optical pulses from the non-linear amplifier (11) and passes them to a periodically poled frequency converter (20) for generating high power optical pulses with a frequency-converted wavelength; and (2) a high power optical pulse generation method involving non-linear amplification of a light signal to produced amplified optical pulses and frequency conversion of the pulses to produce high power optical pulses.

    ULTRA-LOW PHASE NOISE MILLIMETER-WAVE OSCILLATOR AND METHODS TO CHARACTERIZE SAME

    公开(公告)号:WO2021211373A1

    公开(公告)日:2021-10-21

    申请号:PCT/US2021/026568

    申请日:2021-04-09

    Abstract: A tunable millimeter-wave signal oscillator includes two phase coherent optical oscillators, a fiber-ring cavity configured to generate two Stokes waves, and a photosensitive element converting the frequency difference of two optical oscillator into a millimeter-wave radiation. A chip-scale form factor millimeter-wave oscillator includes two continuous wave lasers, a plurality of micro-optical-resonators, an optical frequency division mechanism, two optical tunable bandpass filters, and a photosensitive element converting the pulse train of a frequency comb into a millimeter-wave radiation. A millimeter-wave phase noise analyzer includes an optical interferometer, two photosensitive elements, and a fundamental millimeter-wave frequency mixer. A millimeter-wave frequency counter includes an electro-optic optical frequency comb generator, a microwave voltage controlled oscillator, and an optoelectronic phase locked loop. A millimeter-wave electrical spectrum analyzer includes a millimeter-wave phase noise analyzer, a millimeter-wave amplitude detector, a millimeter-wave frequency counter, and a data processing unit.

    INTEGRATED PHOTONIC MICROWAVE SAMPLING SYSTEM
    189.
    发明申请

    公开(公告)号:WO2021173464A1

    公开(公告)日:2021-09-02

    申请号:PCT/US2021/018976

    申请日:2021-02-22

    Abstract: Examples of systems and methods for integrated photonic broadband microwave receivers and transceivers are disclosed based on integrated coherent dual optical frequency combs. In some cases, when the system is configured as a receiver, the microwave spectrum of the input signal can be sliced into several spectral segments for low-bandwidth detection and analysis. In some cases, when the system is configured as a transmitter, multiple radio frequency (RF) carriers can be generated, which can be coherently added or encoded independently for transmission of individual microwave bands. In some systems, the optics-related functionalities can be achieved via integrated optic technology, for example, based on silicon photonics, providing tremendous possibilities for mass-production with significantly reduced system footprint.

    METHOD FOR PRODUCING SEMICONDUCTOR LIGHT EMITTING ELEMENT

    公开(公告)号:WO2019107320A1

    公开(公告)日:2019-06-06

    申请号:PCT/JP2018/043455

    申请日:2018-11-26

    Abstract: A method includes preparing a wafer including a substrate and a semiconductor structure, and irradiating an inner portion of a substrate at a predetermined depth in a thickness direction a plurality of times with laser pulses at a first time interval and a predetermined distance interval between irradiations. Each irradiation performed at the first time intervals in the step of irradiating the substrate with laser pulses includes irradiating the substrate at a first focal position in the thickness direction with a first laser pulse having a first pulse-energy; and after irradiating with the first laser pulse, irradiating the substrate with a second laser pulse performed after a second time interval, the second time interval being shorter than the first time interval and being in a range of 3 ps to 900 ps, and the second laser pulse having a second pulse-energy 0.5 to 1.5 times the first pulse-energy.

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