公开(公告)号：US20180052099A1

公开(公告)日：2018-02-22

申请号：US15387180

申请日：2016-12-21

Applicant: KLA-Tencor Corporation

Inventor： Andrew V. Hill ,  Amnon Manassen ,  Ohad Bachar

IPC: G01N21/25 ,  G01J3/12 ,  G01J3/10

CPC classification number: G01N21/255 ,  G01J1/0418 ,  G01J1/4257 ,  G01J3/0208 ,  G01J3/021 ,  G01J3/06 ,  G01J3/10 ,  G01J3/12 ,  G01J2001/4247 ,  G01J2003/069 ,  G01J2003/1213 ,  G01J2003/1217 ,  G01J2003/1221 ,  G01J2003/1234 ,  G01N2201/0666 ,  G01N2201/0668 ,  G01N2201/0675 ,  G01N2201/0683 ,  G03F7/70633

Abstract: A metrology system includes an illumination source to generate an illumination beam, a multi-channel spectral filter, a focusing element to direct illumination from the single optical column to a sample, and at least one detector to capture the illumination collected from the sample. The multi-channel spectral filter includes two or more filtering channels having two or more channel beam paths. The two or more filtering channels filter illumination propagating along the two or more channel beam paths based on two or more spectral transmissivity distributions. The multi-channel spectral filter further includes a channel selector to direct at least a portion of the illumination beam into at least one selected filtering channel to filter the illumination beam. The multi-channel spectral filter further includes at least one beam combiner to combine illumination from the two or more filtering channels to a single optical column.

公开(公告)号：US20180045639A1

公开(公告)日：2018-02-15

申请号：US15783969

申请日：2017-10-13

Applicant: SUMCO CORPORATION

Inventor： Toshiaki SUDO ,  Tadahiro SATO ,  Ken KITAHARA ,  Eriko KITAHARA

IPC: G01N21/23 ,  C03C3/04 ,  H04N5/232 ,  C30B29/06 ,  G01L5/00 ,  G01L1/24 ,  C30B15/10

CPC classification number: G01N21/23 ,  C03C3/04 ,  C30B15/10 ,  C30B29/06 ,  G01L1/24 ,  G01L5/0047 ,  G01N2201/062 ,  G01N2201/0683 ,  H04N5/232

Abstract: A vitreous silica crucible used to pull up silicon single crystal includes: a cylindrical straight body portion, a corner portion formed at a lower end of the straight body portion, and a bottom portion connected with the straight body portion via the corner portion, wherein the vitreous silica crucible further comprises: an opaque outer layer enclosing bubbles therein; and a transparent inner layer from which bubbles are removed, wherein the residual distortion's distribution obtained by measuring the silica glass's inner surface in a non-destructed state has an optical path difference which is 130 nm or less, which residual distortion's distribution is measured using a distortion-measuring apparatus which converts a linearly polarized light into circularly polarized light and then irradiates the crucible's wall.

公开(公告)号：US09874526B2

公开(公告)日：2018-01-23

申请号：US15468608

申请日：2017-03-24

Applicant: KLA-Tencor Corporation

Inventor： Sheng Liu ,  Guoheng Zhao

IPC: G01N21/88 ,  G01N21/21 ,  G01N21/95

CPC classification number: G01N21/8806 ,  G01N21/21 ,  G01N21/9501 ,  G01N2021/8848 ,  G01N2201/0683

Abstract: Disclosed are methods and apparatus for inspecting a semiconductor sample. This system comprises an illumination optics subsystem for generating and directing an incident beam towards a defect on a surface of a wafer. The illumination optics subsystem includes a light source for generating the incident beam and one or more polarization components for adjusting a ratio and/or a phase difference for the incident beam's electric field components. The system further includes a collection optics subsystem for collecting scattered light from the defect and/or surface in response to the incident beam, and the collection optics subsystem comprises an adjustable aperture at the pupil plane, followed by a rotatable waveplate for adjusting a phase difference of electric field components of the collected scattered light, followed by a rotatable analyzer. The system also includes a controller that is configured for (i) selecting a polarization of the incident beam, (ii) obtaining a defect scattering map, (iii) obtaining a surface scattering map, and (iv) determining a configuration of the one or more polarization components, aperture mask, and rotatable ¼ waveplate, and analyzer based on analysis of the defect and surface scattering map so as to maximize a defect signal to noise ratio,

公开(公告)号：US20170372924A1

公开(公告)日：2017-12-28

申请号：US15193502

申请日：2016-06-27

Applicant: GLOBALFOUNDRIES Inc.

Inventor： Abner BELLO ,  Stephanie WAITE ,  William J. FOSNIGHT ,  Thomas BEEG

IPC: H01L21/673 ,  G01N21/21 ,  G01J5/00 ,  H01L21/66 ,  G01N21/55 ,  G01J5/08

CPC classification number: G01J5/0096 ,  G01J5/0007 ,  G01J5/025 ,  G01J5/0825 ,  G01J5/0896 ,  G01N21/211 ,  G01N21/55 ,  G01N2201/06113 ,  G01N2201/0683 ,  G01N2201/12 ,  G01R27/00 ,  H01L21/67253 ,  H01L21/6732 ,  H01L21/67353 ,  H01L21/67386 ,  H01L22/12

Abstract: A self-contained metrology wafer carrier systems and methods of measuring one or more characteristics of semiconductor wafers are provided. A wafer carrier system includes, for instance, a housing configured for transport within the automated material handling system, the housing having a support configured to support a semiconductor wafer in the housing, and a metrology system disposed within the housing, the metrology system operable to measure at least one characteristic of the wafer, the metrology system comprising a sensing unit and a computing unit operably connected to the sensing unit. Also provided are methods of measuring one or more characteristics of a semiconductor wafer within the wafer carrier systems of the present disclosure.

公开(公告)号：US20170350811A1

公开(公告)日：2017-12-07

申请号：US15685636

申请日：2017-08-24

Applicant: DEKA Products Limited Partnership

Inventor： Jacob W. Scarpaci

IPC: G01N21/21

CPC classification number: G01N21/21 ,  G01N2201/0683

Abstract: An apparatus and method for determining the concentration of chiral molecules in a fluid includes a first polarizer configure to polarize light in substantially a first plane to provide initially polarized light. A second polarizer is capable of polarizing the initially polarized light in a plurality of planes, at least one of the plurality of planes being different from the first plane, to provide subsequently polarized light. One or more receivers are included for measuring an intensity of the subsequently polarized light in one or more of the plurality of planes.

公开(公告)号：US20170276597A1

公开(公告)日：2017-09-28

申请号：US15505621

申请日：2015-08-11

Applicant: THE DOSHISHA ,  NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY

Inventor： Akira EMOTO ,  Naoki OTANI ,  Takashi FUKUDA

IPC: G01N21/23

CPC classification number: G01N21/23 ,  G01N2201/0683

Abstract: A birefringence measurement device includes a light flux generator for generating light flux, a light flux irradiator for irradiating a measurement target with the light flux in a predetermined polarization state, an imaging optical system for forming an image from light flux transmitted through the measurement target, a polarization/diffraction grating positioned within the imaging optical system, an image pickup for generating a light-dark signal related to brightness of the image, and an output for outputting information regarding a phase difference for the light flux. The phase difference resulting from the transmission through the measurement target is determined on the basis of the light-dark signal. The image pickup generates the light-dark signal for the image based on at least one beam of diffracted light from among a plurality of beams of diffracted light produced by the grating. A two-dimensional distribution of birefringence is obtained in real time without a rotating mechanism.

公开(公告)号：US20170199116A1

公开(公告)日：2017-07-13

申请号：US15315275

申请日：2015-06-03

Applicant: UNIVERSITY OF TSUKUBA

Inventor： Yoshiaki YASUNO ,  Deepa Kamath KASARAGOD

IPC: G01N21/21 ,  G01B9/02

CPC classification number: G01N21/21 ,  A61B3/102 ,  G01B9/02044 ,  G01B9/02083 ,  G01B9/02091 ,  G01B2290/70 ,  G01N21/17 ,  G01N21/4795 ,  G01N2201/0683 ,  G01N2201/12

Abstract: In polarization-sensitive optical image measurement, noise-containing OCT signals obtained by polarization OCT are processed using a birefringence calculation algorithm, to obtain measured birefringence, after which noise is statistically adjusted to simulate a measured birefringence distribution and determine the noise characteristics of the measured birefringence values, and then Monte Carlo calculations are repeated by assuming different values for the noise level and the true birefringence value, respectively, to form three-dimensional histogram of combinations of true birefringence values, SN ratios, and measured birefringence values, after which specified measured birefringence values and SN ratios are assumed from the three-dimensional histogram information to obtain a true birefringence probability density distribution, and true birefringence values are estimated from the true birefringence probability density distribution.

公开(公告)号：US09568439B2

公开(公告)日：2017-02-14

申请号：US15088673

申请日：2016-04-01

Applicant: Hitachi High-Technologies Corporation

Inventor： Toshifumi Honda ,  Yuta Urano ,  Takahiro Jingu ,  Akira Hamamatsu

IPC: G01N21/00 ,  G01N21/95 ,  G01N21/956 ,  G01J1/04

CPC classification number: G01N21/8806 ,  G01J1/0474 ,  G01J1/44 ,  G01N21/9501 ,  G01N21/956 ,  G01N2201/06113 ,  G01N2201/068 ,  G01N2201/0683 ,  G01N2201/0697 ,  G01N2201/10 ,  G01N2201/12

Abstract: To detect an infinitesimal defect, highly precisely measure the dimensions of the detect, a detect inspection device is configured to comprise: a irradiation unit which irradiate light in a linear region on a surface of a sample; a detection unit which detect light from the linear region; and a signal processing unit which processes a signal obtained by detecting light and detecting a defect. The detection unit includes: an optical assembly which diffuses the light from the sample in one direction and forms an image in a direction orthogonal to the one direction; and a detection assembly having an array sensor in which detection pixels are positioned two-dimensionally, which detects the light diffused in the one direction and imaged in the direction orthogonal to the one direction, adds output signals of each of the detection pixels aligned in the direction in which the light is diffused, and outputs same.

Abstract translation: 为了检测无限小的缺陷，高度精确地测量检测器的尺寸，检测检查装置被配置为包括：照射单元，其照射样品表面上的线性区域中的光; 检测单元，其检测来自所述线性区域的光; 以及处理通过检测光而获得的信号并检测缺陷的信号处理单元。 检测单元包括：光学组件，其在一个方向上扩散来自样品的光并在与该一个方向正交的方向上形成图像; 以及检测组件，其具有阵列传感器，其中检测像素被二维地定位，其检测沿与所述一个方向正交的方向成像的沿所述一个方向扩散的光，并将每个所述检测像素的输出信号相加 光漫射的方向，并输出。

公开(公告)号：US20170030824A1

公开(公告)日：2017-02-02

申请号：US15231146

申请日：2016-08-08

Applicant: SONY CORPORATION

Inventor： TAICHI TAKEUCHI ,  SHINGO IMANISHI

IPC: G01N15/14 ,  G01N21/21 ,  G01N21/64 ,  G01N21/53

CPC classification number: G01N15/1436 ,  G01N15/1429 ,  G01N15/1434 ,  G01N15/1459 ,  G01N21/21 ,  G01N21/47 ,  G01N21/49 ,  G01N21/53 ,  G01N21/645 ,  G01N2015/0065 ,  G01N2015/1006 ,  G01N2021/6478 ,  G01N2201/06113 ,  G01N2201/0638 ,  G01N2201/0683

Abstract: A microparticle measuring apparatus for highly accurately detecting the position of a microparticle flowing through a flow channel includes a light irradiation unit for irradiating a microparticle flowing through a flow channel with light, and a scattered light detection unit for detecting scattered light from the microparticle, including an objective lens for collecting light from the microparticle, a light splitting element for dividing the scattered light from the light collected by the objective lens, into first and second scattered light, a first scattered light detector for receiving an S-polarized light component, and an astigmatic element disposed between the light splitting element and the first scattered light detector, and making the first scattered light astigmatic. A relationship between a length L from a rear principal point of the objective lens to a front principal point of the astigmatic element, and a focal length f of the astigmatic element satisfies the following formula I. 1.5f≦L≦2.5f  (I)

Abstract translation: 用于高精度地检测流过流路的微粒的位置的微粒测量装置包括：用于照射流过流路的微粒的光照射单元，以及用于检测来自微粒的散射光的散射光检测单元，包括 用于收集来自微粒的光的物镜，将从物镜收集的光中散射的光分成第一和第二散射光的分光元件，用于接收S偏振光分量的第一散射光检测器，以及 设置在所述分光元件和所述第一散射光检测器之间的散光元件，以及使所述第一散射光散光。 从物镜的后方主点到散光元件的前主点的长度L与散光元件的焦距f之间的关系满足以下公式I. 1.5 ¢‰¤L‰2.5 ¢f

公开(公告)号：US20170020385A1

公开(公告)日：2017-01-26

申请号：US15199241

申请日：2016-06-30

Applicant: FUJI XEROX CO., LTD.

Inventor： Kazuyuki MATSUSHITA ,  Kazutaka TAKEDA ,  Kohei YUKAWA ,  Hideaki OZAWA ,  Taku KINOSHITA ,  Hideo NAKAYAMA

IPC: A61B3/00 ,  A61M5/172

CPC classification number: A61B3/0025 ,  A61B3/0008 ,  A61B3/117 ,  A61B5/14507 ,  A61B5/14532 ,  A61B5/14558 ,  A61B5/6821 ,  A61M5/1723 ,  G01N21/21 ,  G01N2201/06113 ,  G01N2201/062 ,  G01N2201/0683

Abstract: A concentration calculation system of an optically active substance, includes: a calculation unit configured to: acquire an amount of change in a polarization state by allowing light having different wavelengths to pass through a cornea and an aqueous humor; and calculate a concentration of a specific optically active substance contained in the aqueous humor by a least squares method based on a theoretical formula which includes a matrix representing a polarization property of the cornea and a matrix representing a polarization property of the aqueous humor and represents a wavelength dependence of the amount of the change, wherein the matrix representing the polarization property of the aqueous humor is represented by a function of an expression representing the wavelength dependence of an optical rotation degree of the specific substance and the expression includes a concentration value of the specific substance as an unknown quantity or a temporal known quantity.

Abstract translation: 光学活性物质的浓度计算系统包括：计算单元，被配置为：通过允许具有不同波长的光通过角膜和房水来获取偏振状态的变化量; 并且通过基于理论公式的最小二乘法计算房水中含有的特定光学活性物质的浓度，所述理论公式包括表示角膜偏振特性的矩阵和表示房水偏振特性的矩阵， 变化量的波长依赖性，其中表示房水的偏振特性的矩阵由表示特定物质的旋光度的波长依赖性的表达式的函数表示，并且表达式包括 特定物质为未知数量或时间已知数量。