-
公开(公告)号：JP2007199004A
公开(公告)日：2007-08-09
申请号：JP2006020298
申请日：2006-01-30
Inventor： HASHIMOTO DAIKI
IPC: G01N21/956 , H01L21/66
Abstract: PROBLEM TO BE SOLVED: To shorten defect detection time by reducing invalid areas of two-dimensional optical images acquired from samples to be inspected and reducing overlapping imaging operations.
SOLUTION: A pattern inspecting apparatus includes a mounting part for mounting a sample to be inspected; a light irradiation part for irradiating light to the sample to be inspected mounted to the mounting part; a drive unit for relatively scanning the sample to be inspected with irradiating light with a scanning width, in the direction of an X-axis; an optical image light reception part for receiving two-dimensional optical images of a pattern of the sample to be inspected when the sample to be inspected is scanned with irradiating light with a scanning width in the direction of the X-axis; a division processing part for dividing images in the direction of the X-axis into a plurality of rectangular strips; a correction processing part for correcting positional deviations of the two-dimensional optical images in the direction of a Y-axis; and a comparison processing part for comparing the two-dimensional optical images, divided into rectangular strips with a reference image. The pattern inspecting apparatus corrects positional deviations in the direction of the Y-axis before dividing the two-dimensional optical images into rectangular strips in the direction of the X-axis.
COPYRIGHT: (C)2007,JPO&INPITAbstract translation: 要解决的问题：通过减少从要检查的样本获取的二维光学图像的无效区域并减少重叠的成像操作来缩短缺陷检测时间。 解决方案：图案检查装置包括用于安装要检查的样品的安装部件; 光照射部分，用于将光照射到安装在安装部分上的待检查样品; 驱动单元，用于沿着X轴的方向用扫描宽度的照射光相对地扫描待检查的样品; 光学图像光接收部分，用于在用X轴方向扫描宽度的照射光扫描要检查的样品的待检测样品的图案的二维光学图像; 分割处理部分，用于将X轴方向的图像分割成多个矩形条; 校正处理部，用于校正二维光学图像在Y轴方向上的位置偏差; 以及比较处理部，用于将分割成矩形条的二维光学图像与参考图像进行比较。 在将二维光学图像分割成X轴方向的矩形条之前，图案检查装置校正Y轴方向的位置偏差。 版权所有（C）2007，JPO＆INPIT
-
公开(公告)号：JP2007093825A
公开(公告)日：2007-04-12
申请号：JP2005281108
申请日：2005-09-28
Inventor： MATSUKI KAZUTO
CPC classification number: G02F1/3525
Abstract: PROBLEM TO BE SOLVED: To provide a method for operating a laser light source which monitors a damage of nonlinear crystal used for the laser light source with high accuracy to stably supply a laser beam. SOLUTION: The method for operating the laser light source having a wavelength converter which inputs the laser beams with two-wavelength in the nonlinear crystal to output wavelength of sum frequency is characterized by providing steps of: inputting only a laser beam of one wavelength in the nonlinear crystal; measuring intensity of scattered light of the laser beam with one wavelength by a light receiving sensor installed on an optical axis of output light with the wavelength of the sum frequency among the laser beams with two-wavelength to be input and judging a damage state of the nonlinear crystal based on a measurement value obtained by intensity measurement by the light receiving sensor. COPYRIGHT: (C)2007,JPO&INPIT
Abstract translation: 要解决的问题：提供一种操作激光光源的方法，其以高精度监测用于激光光源的非线性晶体的损伤，以稳定地提供激光束。 解决方案：具有波长转换器的激光光源的操作方法的特征在于：仅输入一个激光束，该波长转换器将非线性晶体中具有两个波长的激光束输入和频率的输出波长 波长在非线性晶体中; 通过安装在输入光的光轴上的具有一个波长的激光束的散射光的强度与具有两个波长的激光束之间的和频波长的输入光进行测量，并且判断其损伤状态 基于由光接收传感器的强度测量获得的测量值的非线性晶体。 版权所有（C）2007，JPO＆INPIT
-
13.发明专利Image correction device, pattern test device, image correction method, and pattern defect test method 有权图像校正装置，图案测试装置，图像校正方法和图形缺陷测试方法
公开(公告)号：JP2007087210A
公开(公告)日：2007-04-05
申请号：JP2005276586
申请日：2005-09-22
Inventor： OOAKI JIYUNJI , SUGIHARA SHINJI
IPC: G06T1/00 , G01N21/956 , G03F1/84
CPC classification number: G03F1/84 , G03F7/70625 , G06T7/0004 , G06T2207/30148
Abstract: PROBLEM TO BE SOLVED: To effectively correct an image automatically in compliance with density of a pattern image of a test target specimen. SOLUTION: By means of this image correction device and this pattern test device, a two-dimensional linear model is identified from the pattern image, and using the sum value of identified parameters, a correction pattern image based on a two-dimensional linear prediction model and an interpolation correction image based on bicubic interpolation are switched mutually. COPYRIGHT: (C)2007,JPO&INPIT
Abstract translation: 要解决的问题：根据测试对象样本的图案图像的密度自动有效地校正图像。 解决方案：通过该图像校正装置和该图案测试装置，从图案图像识别二维线性模型，并且使用所识别的参数的和值，基于二维的校正图案图像 线性预测模型和基于双三次插值的插值校正图像被相互切换。 版权所有（C）2007，JPO＆INPIT
-
14.发明专利Optical image acquisition device, optical image acquiring method, and mask inspecting device 有权光学图像获取装置，光学图像获取方法和掩模检测装置
公开(公告)号：JP2006276214A
公开(公告)日：2006-10-12
申请号：JP2005091972
申请日：2005-03-28
Inventor： TSUCHIYA HIDEO
IPC: G01B11/30 , G01N21/956 , G03F1/32 , G03F1/84 , G06T1/00
Abstract: PROBLEM TO BE SOLVED: To provide a means of acquiring an optical image without causing defocusing while improving traceability to a pattern. SOLUTION: An optical image acquisition device is equipped with a mean film thickness arithmetic circuit 250 which inputs design shape data on a pattern and film thickness information on the pattern and calculates a mean film thickness in a designated region based upon the design shape data on the pattern and the film thickness information on the pattern, and an optical image acquisition section 150 which acquires an optical image by adjusting a focusing position to the mean film thickness when an optical image of a region of a mask pattern corresponding to the designated region is acquired by using the mask pattern generated based upon the design shape data on the pattern and the film thickness information on the pattern. COPYRIGHT: (C)2007,JPO&INPIT
Abstract translation: 要解决的问题：提供获取光学图像而不引起散焦同时提高对图案的可追溯性的手段。 解决方案：光学图像采集装置配备有平均膜厚度运算电路250，其输入关于图案的图案和膜厚度信息的设计形状数据，并基于设计形状计算指定区域中的平均膜厚度 关于图案上的图案和胶片厚度信息的数据以及光学图像获取部分150，当与指定的图案对应的掩模图案的区域的光学图像时，通过调整聚焦位置来获得光学图像 通过使用基于图案上的设计形状数据生成的掩模图案和关于图案的膜厚度信息来获取区域。 版权所有（C）2007，JPO＆INPIT
-
公开(公告)号：JP2010237048A
公开(公告)日：2010-10-21
申请号：JP2009085647
申请日：2009-03-31
Inventor： IIDA SUSUMU , OGAWA TSUTOMU , HIRANO RYOICHI
IPC: G01N21/956
Abstract: PROBLEM TO BE SOLVED: To provide a pattern inspection apparatus and pattern inspection method capable of inhibiting air fluctuations in an imaging optical system and improving an inspection accuracy.
SOLUTION: The pattern inspection apparatus inspecting a pattern formed on an inspection sample, includes a chamber having a downflow mechanism, a light source installed in the chamber, an illumination optical system installed in the chamber and irradiating the inspection sample with inspection light to be emitted from the light source, the imaging optical system installed in the chamber, covered with a windbreak cover and imaging the inspection light delivered to the inspection sample as an optical image, and a detection sensor installed in the chamber and acquiring the optical image, and has a stepping motor in the imaging optical system, capable of reducing a quiescent current lower than an operating current in order to move optical components.
COPYRIGHT: (C)2011,JPO&INPITAbstract translation: 要解决的问题：提供一种能够抑制成像光学系统中的空气波动并提高检查精度的图案检查装置和图案检查方法。 解决方案：检查在检查样品上形成的图案的图案检查装置包括具有下流机构的室，安装在室中的光源，安装在室中的照明光学系统，并用检查光照射检查样品 从光源发射的成像光学系统安装在室内，覆盖有防风罩，并将作为光学图像传送到检查样品的检查光成像，以及安装在室中并检测光学图像的检测传感器 并且在成像光学系统中具有步进电机，能够降低低于工作电流的静态电流以移动光学部件。 版权所有（C）2011，JPO＆INPIT
-
Patent Agency Ranking
公开(公告)号：JP2010078735A
公开(公告)日：2010-04-08
申请号：JP2008245089
申请日：2008-09-25
Inventor： HIRONO MASATOSHI
IPC: G01N21/956 , G03F1/84
CPC classification number: G06T7/0004 , G06T2207/10056 , G06T2207/30148
Abstract: PROBLEM TO BE SOLVED: To provide a photomask inspection method which detects a foreign matter such as dust on a photomask with high sensitivity by suppressing erroneous detection due to an influence of noise. SOLUTION: In the photomask inspection method, image data of the photomask having regions with different layer structures on a surface thereof is acquired, and inverted image data is created by subtracting the image data from tone value data of the regions, and offset inverted image data is created by raising pixel values of the inverted image data by a fixed amount, and normalized correlation image data is created by computing a normalized correlation between the offset inverted image data and an offset Gaussian distribution-type kernel, and a foreign matter is detected by comparing the normalized correlation image data with a predetermined threshold. COPYRIGHT: (C)2010,JPO&INPIT
Abstract translation: 要解决的问题：提供一种光掩模检查方法，其通过抑制由于噪声的影响而导致的错误检测，以高灵敏度检测光掩模上的杂质等异物。 解决方案：在光掩模检查方法中，获取具有其表面上具有不同层结构的区域的光掩模的图像数据，并且通过从区域的色调值数据中减去图像数据来产生反转图像数据，并且偏移 通过将反转图像数据的像素值提高固定量来创建反转图像数据，并且通过计算偏移反转图像数据和偏移高斯分布型核心之间的归一化相关性和异物来创建归一化相关图像数据 通过将归一化相关图像数据与预定阈值进行比较来检测。 版权所有（C）2010，JPO＆INPIT
-
公开(公告)号：JP2009222625A
公开(公告)日：2009-10-01
申请号：JP2008068920
申请日：2008-03-18
Inventor： OGAWA TSUTOMU , HIRONO MASATOSHI
IPC: G01N21/956 , G03F1/84 , H01L21/027
Abstract: PROBLEM TO BE SOLVED: To obtain a sample inspection with non-directive high-resolution without increasing inspection time.
SOLUTION: A device for inspecting a pattern includes an illumination optical system in which a polarizer is located between a sample with a pattern and a light source and a region of the sample is illuminated by one of light of which polarization directions being perpendicular and an other region of the sample is illuminated by the other light, a plurality of image formation optical systems for respectively detecting pattern images from different regions of the sample, and a comparator for comparing images respectively detected with a reference image, or a device for inspecting a pattern includes an illumination optical system having a divided type half-wave plate located on the latter stage of the polarizer in which a region of the sample is illuminated by S-polarized light and the other region is illuminated by P-polarized light.
COPYRIGHT: (C)2010,JPO&INPITAbstract translation: 要解决的问题：在不增加检查时间的情况下，以非指令性高分辨率获得样品检查。 解决方案：用于检查图案的装置包括照明光学系统，其中偏振器位于具有图案的样品和光源之间，并且样品的区域被偏振方向垂直的光中的一种照射 并且样品的另一区域被另一个光照射，用于分别从样本的不同区域检测图案图像的多个成像光学系统和用于比较分别用参考图像检测的图像的比较器或用于 检查图案包括照明光学系统，其具有位于偏振器的后级上的分割型半波片，其中样品的区域被S偏振光照射，另一个区域被P偏振光照射。 版权所有（C）2010，JPO＆INPIT
-
公开(公告)号：JP2009222624A
公开(公告)日：2009-10-01
申请号：JP2008068918
申请日：2008-03-18
Inventor： KATAOKA AKIRA , ISOMURA IKUNAO , HIRANO RYOICHI , KIKUIRI NOBUTAKA , IIDA SUSUMU
IPC: G01N21/956 , H01L21/66
CPC classification number: G06K9/209 , G03F1/84 , G06T7/0004 , G06T2207/30121 , G06T2207/30148
Abstract: PROBLEM TO BE SOLVED: To perform pattern inspection for eliminating a false image of a measurement image occurring temporarily. SOLUTION: This sample inspection device includes a measurement image forming section for measuring a pattern of a sample and forming the measurement image, and a comparing section for comparing the measurement image with a reference image. The measurement image forming section includes a light receiver where two or more time delay integral sensors using two or more stages of line sensors each of which consists of 2 or more pixels are interconnected. The measurement image forming section sets, as the measurement image, the average value of pixel values other than an abnormal pixel value of the pixels of respective time delay integral sensors, sets, as the measurement image, the average value of pixel values other than the pixel value exceeding a reference value as the abnormal pixel value, sets, as the measurement image, the average value of pixel values other than the pixel value exceeding a reference value as the abnormal pixel value using the sum of the average value of pixel values and a determined value as the reference value, or sets, as the measurement image, the average value of pixel values other than, as the abnormal pixel value, the pixel value where the absolute value of the difference between the pixel value and the average value of the pixel values of all time delay integral sensors exceeds the reference value. COPYRIGHT: (C)2010,JPO&INPIT
Abstract translation: 要解决的问题：执行模式检查以消除临时发生的测量图像的假图像。 解决方案：该样本检查装置包括用于测量样本的图案并形成测量图像的测量图像形成部分，以及用于将测量图像与参考图像进行比较的比较部分。 测量图像形成部分包括光接收器，其中使用两个或更多个线段传感器的两个或更多个时间延迟积分传感器，每个由两个或更多个像素组成。 测量图像形成部分将作为测量图像的除了各个时间延迟积分传感器的像素的异常像素值之外的像素值的平均值设置为测量图像，将除了 像素值超过参考值作为异常像素值，将使用像素值的平均值和的和的和值作为异常像素值的像素值以外的像素值的平均值设置为测量图像， 作为测量图像的确定值，或将作为异常像素值的像素值的平均值除以像素值与平均值之间的差的绝对值以外的像素值的平均值， 所有时间延迟积分传感器的像素值超过参考值。 版权所有（C）2010，JPO＆INPIT
-
公开(公告)号：JP2009169444A
公开(公告)日：2009-07-30
申请号：JP2009112594
申请日：2009-05-07
Inventor： MATSUKI KAZUTO
IPC: G02F1/37
Abstract: PROBLEM TO BE SOLVED: To provide a method for operating a laser light source which monitors a damage of nonlinear crystal used for the laser light source with high accuracy to stably supply a laser beam.
SOLUTION: The method for operating the laser source includes the nonlinear crystal which is a wavelength conversion element, and a wavelength converter having a heater which holds the nonlinear crystal at fixed temperature, and the method includes a step of measuring supply voltage to the heater; and a step of determining a damage state of the nonlinear crystal by comparing a threshold of the supply power by which it is determined that predetermined crystal is damaged with a measurement value obtained by measurement.
COPYRIGHT: (C)2009,JPO&INPITAbstract translation: 要解决的问题：提供一种操作激光光源的方法，其以高精度监测用于激光光源的非线性晶体的损伤，以稳定地提供激光束。 解决方案：用于操作激光源的方法包括作为波长转换元件的非线性晶体和具有将非线性晶体保持在固定温度的加热器的波长转换器，并且该方法包括以下步骤：将电源电压 加热器 以及通过将确定了预定晶体损坏的供给功率的阈值与通过测量获得的测量值进行比较来确定非线性晶体的损伤状态的步骤。 版权所有（C）2009，JPO＆INPIT
-
公开(公告)号：JP2009080063A
公开(公告)日：2009-04-16
申请号：JP2007250589
申请日：2007-09-27
Inventor： IMAI SHINICHI
IPC: G01N21/84 , G01N21/956 , G03F1/84 , H01L21/027
CPC classification number: G03F1/84 , G01N21/8806 , G01N21/95607
Abstract: PROBLEM TO BE SOLVED: To provide a lighting system with less degradation of an optical component and less attenuation of illumination light. SOLUTION: The lighting system comprises a light source for generating a fundamental wave, a waveform shaping part for shaping the fundamental wave in a predetermined shape, a pattern generation part irradiated with the fundamental wave of a shaped waveform, and converted into illumination light with a shorter wavelength than the fundamental wave, and which generating the illumination light of the predetermined shape, and an image relay part for irradiating the illumination light generated in the pattern generation part on an object to be irradiated. COPYRIGHT: (C)2009,JPO&INPIT
Abstract translation: 要解决的问题：为了提供光学部件的劣化较少并且对照明光的衰减较少的照明系统。 解决方案：照明系统包括用于产生基波的光源，用于使预定形状的基波成形的波形整形部，照射成形波形的基波的图案生成部，并转换为照明 产生具有预定形状的照明光的波长比基波更短的光，以及用于将图案生成部中产生的照明光照射在被照射物上的图像中继部。 版权所有（C）2009，JPO＆INPIT
-
-
-
-
-
-
-
-
-
Search Results
105
records
(took 0.031 seconds)
