公开(公告)号：WO0196962A3

公开(公告)日：2002-04-18

申请号：PCT/US0119126

申请日：2001-06-14

Applicant: 3M INNOVATIVE PROPERTIES CO ,  FLEMING PATRICK R ,  DEVOE ROBERT J ,  STACEY NICHOLAS A ,  LEATHERDALE CATHERINE A ,  DEMASTER ROBERT D ,  BALLEN TODD A ,  FLORCZAK JEFFREY M

Inventor： FLEMING PATRICK R ,  DEVOE ROBERT J ,  STACEY NICHOLAS A ,  LEATHERDALE CATHERINE A ,  DEMASTER ROBERT D ,  BALLEN TODD A ,  FLORCZAK JEFFREY M

IPC: G02B21/06 ,  B81C99/00 ,  G03F7/20 ,  G03H1/02

CPC classification number: G03F7/2051 ,  G03H2001/048 ,  G03H2001/0484

Abstract: Methods for producing a region of at least partially reacted material in a photoreactive composition and apparatus. The methods include: providing a photoreactive composition; providing a source of sufficient light for simultaneous absorption of at least two photons by the photoreactive composition; providing an exposure system capable of inducing image-wise multiphoton absorption; generating a non-random three-dimensional pattern of light by means of the exposure system; and exposing the photoreactive composition to the three-dimensional pattern of light generated by the exposure system to at least partially react a portion of the material in correspondence with the non-random three-dimensional pattern of light incident thereon.

Abstract translation: 在光反应性组合物和装置中制备至少部分反应的材料的区域的方法。 所述方法包括：提供光反应性组合物; 提供足够的光源，由光反应组合物同时吸收至少两个光子; 提供能够诱导图像多光子吸收的曝光系统; 通过曝光系统产生非随意的三维光线图案; 以及将所述光反应性组合物暴露于由所述曝光系统产生的光的三维图案，以使得与入射在其上的光的非随机三维图案对应的材料的一部分至少部分地反应。