Systems, Devices, and/or Methods for Deposition of Metallic and Ceramic Coatings
    12.
    发明申请
    Systems, Devices, and/or Methods for Deposition of Metallic and Ceramic Coatings 审中-公开
    用于沉积金属和陶瓷涂层的系统,装置和/或方法

    公开(公告)号:US20160168698A1

    公开(公告)日:2016-06-16

    申请号:US14969083

    申请日:2015-12-15

    Inventor: Derek Hass

    CPC classification number: C23C14/16 C23C14/228 C23C14/246 C23C14/30 C23C14/32

    Abstract: Certain exemplary embodiments can provide a method, which can comprise depositing a substantially uniform coating on a substrate. The coating is deposited via a coating material stream that emanates from one or more vapor sources. The coating material stream is directed toward the substrate via a carrier gas in a chamber under vacuum.

    Abstract translation: 某些示例性实施例可以提供一种方法,其可以包括在基底上沉积基本均匀的涂层。 涂层通过从一个或多个蒸气源产生的涂层材料流沉积。 涂料材料流通过真空中的室中的载气导向基板。

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