公开(公告)号：WO2009031890A2

公开(公告)日：2009-03-12

申请号：PCT/NL2008/050581

申请日：2008-09-03

Applicant: UNIVERSITEIT UTRECHT HOLDING B.V. ,  KOOLE, Roelof ,  MULDER, Willem Jan Menno ,  VAN SCHOONEVELD, Matti Miriga ,  MEIJERINK, Andries ,  FAYAD, Zahi Adel ,  HILHORST, Jan

Inventor： KOOLE, Roelof ,  MULDER, Willem Jan Menno ,  VAN SCHOONEVELD, Matti Miriga ,  MEIJERINK, Andries ,  FAYAD, Zahi Adel ,  HILHORST, Jan

IPC: A61K49/00 ,  A61K9/50 ,  C08K9/04 ,  C08J3/03

CPC classification number: B82Y5/00 ,  A61K9/5073 ,  A61K49/0067 ,  A61K49/0093 ,  A61K49/1881

Abstract: The invention provides a carrier particle comprising a core of silica and/or alumina which core has a diameter in the range of from 10 nm to 10 µm, a hydrophobic layer enveloping the core, and a layer of amphiphilic molecules enveloping the hydrophobic layer. The invention further relates to processes for preparing said particle and the use of said particle. The particle suitably carries one or more diagnostic and/or one or more therapeutic agents for use in bio-applications.

Abstract translation: 本发明提供了一种载体颗粒，其包含二氧化硅和/或氧化铝的核心，该核心具有10nm至10微米的直径，包封该核心的疏水层和 包围疏水层的两亲分子层。 本发明还涉及制备所述颗粒的方法和所述颗粒的用途。 该颗粒适合携带一种或多种用于生物应用的诊断剂和/或一种或多种治疗剂。

公开(公告)号：WO2013037607A1

公开(公告)日：2013-03-21

申请号：PCT/EP2012/066223

申请日：2012-08-21

Applicant: ASML NETHERLANDS B.V. ,  SCACCABAROZZI, Luigi ,  BANINE, Vadim ,  LUTTIKHUIS, Bernardus ,  KOOLE, Roelof ,  WONDERGEM, Hendrikus ,  GRAAT, Petrus

Inventor： SCACCABAROZZI, Luigi ,  BANINE, Vadim ,  LUTTIKHUIS, Bernardus ,  KOOLE, Roelof ,  WONDERGEM, Hendrikus ,  GRAAT, Petrus

IPC: G01B11/30 ,  G03F1/84 ,  G03F7/20

CPC classification number: G03F7/70783 ,  G01B11/16 ,  G03F1/84 ,  G03F7/70141 ,  G03F7/7085 ,  G03F7/70916

Abstract: A lithographic patterning device deformation monitoring apparatus (38) comprising a radiation source (40), an imaging device (42), and a processor (50). The radiation source being configured to direct a plurality of beams of radiation (41) with a predetermined diameter towards a lithographic patterning device (MA) such that they are reflected by the patterning device. The imaging detector configured to detect spatial positions of the radiation beams (41') after they have been reflected by the patterning device. The processor configured to monitor the spatial positions of the radiation beams and thereby determine the presence of a patterning device deformation. The imaging detector has an collection angle which is smaller than a minimum angle of diffraction of the radiation beams.

Abstract translation: 一种包括辐射源（40），成像装置（42）和处理器（50）的平版印刷图案形成装置变形监测装置（38）。 辐射源被配置为将多个具有预定直径的辐射光束引向平版印刷图案形成装置（MA），使得它们被图案形成装置反射。 该成像检测器被配置为在被图案形成装置反射之后检测辐射束（41'）的空间位置。 处理器被配置为监视辐射束的空间位置，从而确定图案形成装置变形的存在。 成像检测器的收集角度小于辐射束的最小衍射角。

公开(公告)号：WO2012175342A3

公开(公告)日：2013-02-28

申请号：PCT/EP2012060783

申请日：2012-06-07

Applicant: ASML NETHERLANDS BV ,  BRIZARD AURELIE ,  KETELAARS WILHELMUS ,  WUISTER SANDER ,  KOOLE ROELOF ,  PEETERS EMIEL ,  VAN HEESCH CHRIS ,  BOOTS HENRI ,  NGUYEN THANH

Inventor： BRIZARD AURELIE ,  KETELAARS WILHELMUS ,  WUISTER SANDER ,  KOOLE ROELOF ,  PEETERS EMIEL ,  VAN HEESCH CHRIS ,  BOOTS HENRI ,  NGUYEN THANH

IPC: G03F7/00

CPC classification number: G03F7/0002 ,  B82Y10/00 ,  B82Y40/00 ,  C08F299/02 ,  C08F299/04 ,  H01L51/0043

Abstract: A BCP having first block of first monomer and second block of second monomer, adapted to undergo a transition from disordered state to ordered state at a temperature less than T0D, further including a bridging moiety having a functional group to provide hydrogen bonding between bridging moieties of adjacent first and second BCP molecules when in the ordered state and at a temperature in excess of a glass transition temperature Tg for the BCP. Composition including BCP comprising first block of first monomer and second block of second monomer, and a crosslinking compound having first and second terminal groups joined by a central moiety and arranged to crosslink second blocks of adjacent first and second BCP molecules by providing non-covalent bonding between the terminal groups and a functional group of the second monomer of the second blocks when the BCP is in the ordered state.

Abstract translation: BCP具有第一单体的第一嵌段和第二单体的第二嵌段，适于在低于T0D的温度下经历从无序状态转化为有序状态，还包括具有官能团的桥连部分以在桥连部分之间提供氢键 相邻的第一和第二BCP分子处于有序状态并且在超过BCP的玻璃化转变温度Tg的温度下。 包含BCP的组合物包含第一单体的第一嵌段和第二单体的第二嵌段，以及具有通过中心部分连接的第一和第二端基的交联化合物，并且被布置成通过提供非共价键来交联相邻的第一和第二BCP分子的第二嵌段 当BCP处于有序状态时，端子组与第二块的第二单体的官能团之间。

公开(公告)号：WO2012175342A2

公开(公告)日：2012-12-27

申请号：PCT/EP2012/060783

申请日：2012-06-07

Applicant: ASML NETHERLANDS B.V. ,  BRIZARD, Aurelie ,  KETELAARS, Wilhelmus ,  WUISTER, Sander ,  KOOLE, Roelof ,  PEETERS, Emiel ,  VAN HEESCH, Chris ,  BOOTS, Henri ,  NGUYEN, Thanh

Inventor： BRIZARD, Aurelie ,  KETELAARS, Wilhelmus ,  WUISTER, Sander ,  KOOLE, Roelof ,  PEETERS, Emiel ,  VAN HEESCH, Chris ,  BOOTS, Henri ,  NGUYEN, Thanh

IPC: G03F7/00

CPC classification number: G03F7/0002 ,  B82Y10/00 ,  B82Y40/00 ,  C08F299/02 ,  C08F299/04 ,  H01L51/0043

Abstract: A BCP having first block of first monomer and second block of second monomer, adapted to undergo a transition from disordered state to ordered state at a temperature less than T0D, further including a bridging moiety having a functional group to provide hydrogen bonding between bridging moieties of adjacent first and second BCP molecules when in the ordered state and at a temperature in excess of a glass transition temperature T g for the BCP. Composition including BCP comprising first block of first monomer and second block of second monomer, and a crosslinking compound having first and second terminal groups joined by a central moiety and arranged to crosslink second blocks of adjacent first and second BCP molecules by providing non-covalent bonding between the terminal groups and a functional group of the second monomer of the second blocks when the BCP is in the ordered state.

Abstract translation: BCP具有第一单体的第一嵌段和第二单体的第二嵌段，适于在低于T0D的温度下经历从无序状态转化为有序状态，还包括具有官能团的桥连部分以在桥连部分之间提供氢键 相邻的第一和第二BCP分子处于有序状态并且在超过BCP的玻璃化转变温度Tg的温度下。 包含BCP的组合物包含第一单体的第一嵌段和第二单体的第二嵌段，以及具有通过中心部分连接的第一和第二端基的交联化合物，并且被布置成通过提供非共价键来交联相邻的第一和第二BCP分子的第二嵌段 当BCP处于有序状态时，端子组与第二块的第二单体的官能团之间。

公开(公告)号：WO2012025316A1

公开(公告)日：2012-03-01

申请号：PCT/EP2011/062553

申请日：2011-07-21

Applicant: ASML NETHERLANDS B.V. ,  VAN DER MARK, Martinus ,  BANINE, Vadim ,  JEUNINK, Andre ,  DIJKSMAN, Johan ,  WUISTER, Sander ,  KLOOTWIJK, Johan ,  KOOLE, Roelof ,  PEETERS, Emiel ,  VAN HEESCH, Chris ,  MAUCZOK, Ruediger ,  GIESBERS, Jacobus

Inventor： VAN DER MARK, Martinus ,  BANINE, Vadim ,  JEUNINK, Andre ,  DIJKSMAN, Johan ,  WUISTER, Sander ,  KLOOTWIJK, Johan ,  KOOLE, Roelof ,  PEETERS, Emiel ,  VAN HEESCH, Chris ,  MAUCZOK, Ruediger ,  GIESBERS, Jacobus

IPC: G03F7/00

CPC classification number: G03F7/0002 ,  B82Y10/00 ,  B82Y40/00

Abstract: An imprint lithography method is disclosed for reducing a difference between an intended topography and an actual topography arising from a part of a patterned layer of fixed imprintable medium. The method involves imprinting an imprint lithography template into a layer of flowable imprintable medium to form a patterned layer in the imprintable medium, and fixing the imprintable medium to form a patterned layer of fixed imprintable medium. Local excitation is applied to the part of the patterned layer to adjust a chemical reaction in the part of the patterned layer to reduce the difference between the intended topography and the actual topography arising from the part of the fixed patterned layer of imprintable medium when this is subsequently used as a resist for patterning the substrate. An imprint medium suitable for imprint lithography with the method is also disclosed.

Abstract translation: 公开了一种压印光刻方法，用于减少由固定的可打印介质的图案层的一部分产生的预期形貌和实际形貌之间的差异。 该方法包括将压印光刻模板压印到可流动的可压印介质层中以在可压印介质中形成图案化层，并固定可压印介质以形成固定可压印介质的图案化层。 局部激发被施加到图案化层的部分以调整图案化层的部分中的化学反应，以减少所期望的形貌与由可压印介质的固定图案化层的部分产生的实际形貌之间的差异，当这是 随后用作图案化基板的抗蚀剂。 还公开了适用于该方法的压印光刻的压印介质。

公开(公告)号：WO2012022561A1

公开(公告)日：2012-02-23

申请号：PCT/EP2011/062256

申请日：2011-07-18

Applicant: ASML NETHERLANDS B.V. ,  KOOLE, Roelof

Inventor： KOOLE, Roelof

IPC: G03F7/00

CPC classification number: G03F7/70925 ,  B82Y10/00 ,  B82Y40/00 ,  G01N21/94 ,  G01N2021/95676 ,  G03F7/0002 ,  G03F7/70908 ,  G03F7/70958

Abstract: A method is disclosed for inspecting a device imprint lithography template to detect defect particles of imprintable medium remaining on the patterned imprinting surface after an earlier imprint step. The method involves illuminating the patterned surface with radiation of a first wavelength selected to induce fluorescence of the defect particles and not to induce fluorescence of anti-adhesion compound on the patterned surface. The presence of defect particles is indicated by the presence of fluorescence from the patterned surface and can be used to initiate a cleaning step when necessary, speeding processing by eliminating unnecessary cleaning. The elimination of false positives from transferred anti-adhesion compound is reduced or eliminated. Related apparatus is also disclosed.

Abstract translation: 公开了一种用于检查装置压印光刻模板以在较早的压印步骤之后检测残留在图案化压印表面上的可压印介质的缺陷颗粒的方法。 该方法包括用选择的第一波长的辐射照射图案化表面以诱导缺陷颗粒的荧光，并且不在图案化表面上诱导抗粘附化合物的荧光。 缺陷颗粒的存在通过来自图案化表面的荧光的存在来表示，并且可以用于在必要时开始清洁步骤，通过消除不必要的清洁来加速处理。 从转移的抗粘连化合物中消除假阳性被减少或消除。 还公开了相关装置。

公开(公告)号：WO2011104045A1

公开(公告)日：2011-09-01

申请号：PCT/EP2011/050126

申请日：2011-01-06

Applicant: ASML NETHERLANDS B.V. ,  BANINE, Vadim ,  KOOLE, Roelof ,  WUISTER, Sander ,  PEETERS, Emiel

Inventor： BANINE, Vadim ,  KOOLE, Roelof ,  WUISTER, Sander ,  PEETERS, Emiel

IPC: G03F7/00

CPC classification number: G03F7/0002 ,  B82Y10/00 ,  B82Y40/00

Abstract: Treatment of a layer comprising self-assemblable polymer at a surface of a substrate is disclosed. In an embodiment, the treatment includes arranging a zone of temperature change to sweep across the layer, wherein a temperature of the layer within the zone differs from an initial temperature of the layer prior to passage of the zone.

Abstract translation: 公开了在衬底表面处理包含可自组装聚合物的层。 在一个实施方案中，处理包括布置温度变化区域以扫过层，其中该区域内的层的温度与该区域通过之前该层的初始温度不同。