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    EPITAXIAL CHAMBER WITH CROSS FLOW
    11.
    发明申请
    EPITAXIAL CHAMBER WITH CROSS FLOW 审中-公开
    具有交叉流动的外延室

    公开(公告)号：WO2011043961A2

    公开(公告)日：2011-04-14

    申请号：PCT/US2010050593

    申请日：2010-09-28

    Applicant: APPLIED MATERIALS INC ,  RAMACHANDRAN BALASUBRAMANIAN ,  SANCHEZ ERROL ANTONIO C ,  MYO NYI O ,  BAUTISTA KEVIN JOSEPH ,  JUNEJA HARPREET SINGH ,  ZHU ZUOMING

    Inventor： RAMACHANDRAN BALASUBRAMANIAN ,  SANCHEZ ERROL ANTONIO C ,  MYO NYI O ,  BAUTISTA KEVIN JOSEPH ,  JUNEJA HARPREET SINGH ,  ZHU ZUOMING

    IPC: H01L21/205

    CPC classification number: C23C16/455 ,  C23C16/45523 ,  C30B25/14 ,  H01L21/02532 ,  H01L21/02573 ,  H01L21/0262

    Abstract: Methods and apparatus for processing a substrate are provided herein. In some embodiments, an apparatus for processing a substrate includes a process chamber having a substrate support disposed therein to support a processing surface of a substrate at a desired position within the process chamber; a first inlet port to provide a first process gas over the processing surface of the substrate in a first direction; a second inlet port to provide a second process gas over the processing surface of the substrate in a second direction different from the first direction, wherein an azimuthal angle measured between the first direction and the second direction with respect to a central axis of the substrate support is up to about 145 degrees; and an exhaust port disposed opposite the first inlet port to exhaust the first and second process gases from the process chamber.

    Abstract translation: 本文提供了用于处理基板的方法和设备。 在一些实施例中，一种用于处理衬底的装置包括：处理室，其具有设置在其中的衬底支撑件，以在处理室内的期望位置处支撑衬底的处理表面; 第一入口端口，用于在第一方向上在基板的处理表面上提供第一处理气体; 第二入口端口，用于在与所述第一方向不同的第二方向上在所述衬底的所述处理表面上提供第二处理气体，其中在所述第一方向和所述第二方向之间相对于所述衬底支撑件的中心轴线测量的方位角 高达约145度; 以及与第一入口相对设置的排气口，以从处理室排出第一和第二处理气体。

    OPTICAL ENDPOINT DETECTION SYSTEM
    15.
    发明申请
    OPTICAL ENDPOINT DETECTION SYSTEM 审中-公开
    光学端点检测系统

    公开(公告)号：WO2012149331A2

    公开(公告)日：2012-11-01

    申请号：PCT/US2012/035469

    申请日：2012-04-27

    Applicant: APPLIED MATERIALS, INC. ,  RAMACHANDRAN, Balasubramanian ,  ISHII, Masato ,  HUNTER, Aaron Muir

    Inventor： RAMACHANDRAN, Balasubramanian ,  ISHII, Masato ,  HUNTER, Aaron Muir

    IPC: H01L21/66

    CPC classification number: B08B9/46 ,  B08B3/08 ,  B08B3/10 ,  C23C16/4405 ,  C23C16/52 ,  G01N21/94 ,  G01N2021/8416 ,  H01L21/67253

    Abstract: Methods and apparatus for determining an endpoint of a process chamber cleaning process are provided. In some embodiments, a processing system having an endpoint detection system may include a process chamber having internal surfaces requiring periodic cleaning due to processes performed in the process chamber; and an endpoint detection system that includes a light detector positioned to detect light reflected off of a first internal surface of the process chamber; and a controller coupled to the light detector and configured to determine an endpoint of a cleaning process based upon the detected reflected light.

    Abstract translation: 提供了用于确定处理室清洁过程的端点的方法和装置。 在一些实施例中，具有端点检测系统的处理系统可以包括处理室，其具有由于在处理室中执行的处理而需要定期清洁的内表面; 以及端点检测系统，其包括被定位成检测从所述处理室的第一内表面反射的光的光检测器; 以及耦合到光检测器并被配置为基于检测到的反射光来确定清洁处理的端点的控制器。

    LAMP WITH INTERNAL FUSE SYSTEM
    16.
    发明申请
    LAMP WITH INTERNAL FUSE SYSTEM 审中-公开

    公开(公告)号：WO2010115117A3

    公开(公告)日：2010-10-07

    申请号：PCT/US2010/029802

    申请日：2010-04-02

    Applicant: APPLIED MATERIALS, INC. ,  RAMACHANDRAN, Balasubramanian ,  MYO, Nyi Oo ,  RANISH, Joseph M. ,  TAKAHASHI, Akio

    Inventor： RAMACHANDRAN, Balasubramanian ,  MYO, Nyi Oo ,  RANISH, Joseph M. ,  TAKAHASHI, Akio

    IPC: H01K1/66 ,  H01J61/50 ,  H01J61/56

    Abstract: Embodiments of a lamp having an internal fuse system are provided herein. In some embodiments, a lamp may include a transparent housing; a filament disposed in the housing, the filament having a main body disposed between a first end and a second end of the filament; a first conductor coupled to the filament at the first end of the filament; a first interceptor bar disposed in the housing and beneath the main body of the filament, wherein the first interceptor bar is coupled to the second end of the filament; a second conductor disposed proximate the first end of the filament and conductively coupled to the second end of the filament via the first interceptor bar, wherein the first interceptor bar is positioned such that an electrical short forms between the first and second conductors when the main body of the filament contacts the first interceptor bar.

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