Entity monitoring method, process control system and display system
    14.
    发明专利
    Entity monitoring method, process control system and display system 审中-公开
    实体监控方法,过程控制系统和显示系统

    公开(公告)号:JP2013058222A

    公开(公告)日:2013-03-28

    申请号:JP2012231539

    申请日:2012-10-19

    CPC classification number: G05B23/0218

    Abstract: PROBLEM TO BE SOLVED: To enable status information, criticality information and corrective measures information generated or collected in one functional area within a process plant to be used in other functional areas.SOLUTION: A method and system for monitoring an entity within a process plant 10 includes collecting status data pertaining to the status of an entity within the process plant, collecting criticality data pertaining to the importance of the entity within the process plant, and using the entity status data and the criticality data to perform a function within the process plant.

    Abstract translation: 要解决的问题:使得在其他功能区域内使用在过程工厂内的一个功能区域中生成或收集的状态信息,关键性信息和纠正措施信息。 解决方案:用于监测过程工厂10内的实体的方法和系统包括收集与过程工厂内的实体的状态相关的状态数据,收集与过程工厂内的实体的重要性有关的关键性数据,以及 使用实体状态数据和关键数据来执行过程工厂内的功能。 版权所有(C)2013,JPO&INPIT

    Method for displaying performance characteristic of process control apparatus
    15.
    发明专利
    Method for displaying performance characteristic of process control apparatus 审中-公开
    显示过程控制装置性能特征的方法

    公开(公告)号:JP2009104641A

    公开(公告)日:2009-05-14

    申请号:JP2009016331

    申请日:2009-01-28

    CPC classification number: G01F25/0007 G05B23/0272 G06Q30/0641

    Abstract: PROBLEM TO BE SOLVED: To provide methods for comparing and selecting process control apparatus. SOLUTION: The method employs software, executed on a stand-alone computer device, or accessible through the web to retrieve data specific to a given process environment, and calculate the performance characteristics of multiple types of process control equipment capable of meeting the demands of the application. The performance characteristics of each type can be provided in graphical form, at the same time, to enable a potential user to readily discern the advantages and disadvantages of each type of process control equipment. In one embodiment, a purchase of the apparatus may then be made. COPYRIGHT: (C)2009,JPO&INPIT

    Abstract translation: 要解决的问题:提供比较和选择过程控制装置的方法。 解决方案:该方法采用软件,在独立的计算机设备上执行,或通过网络访问以检索特定于给定过程环境的数据,并计算能够满足以下条件的多种过程控制设备的性能特征 要求的应用程序。 每种类型的性能特征可以以图形形式提供,同时,使潜在用户能够容易地辨别每种类型的过程控制设备的优点和缺点。 在一个实施例中,然后可以进行装置的购买。 版权所有(C)2009,JPO&INPIT

    PLATINUM RESISTANCE THERMOMETER, PROTECTIVE COVERING LAYER AND ITS PREPARATION

    公开(公告)号:JPH0917608A

    公开(公告)日:1997-01-17

    申请号:JP4027896

    申请日:1996-02-05

    Applicant: ROSEMOUNT INC

    Abstract: PROBLEM TO BE SOLVED: To provide a platinum resistor thermometer whose electric characteristics are not deteriorated at a high temperature, and its manufacturing method. SOLUTION: A thin film platinum resistor temperature detecting element 14 is coated with a high quality dielectric layer 24 which is covered with a partition layer 26. This partition layer 26 covers the upper part of the dielectric layer 24, and prevents contaminant from diffusion toward the detecting element 14. The partition layer 26 allows diffusion of oxygen, so that the platinum layer is surrounded by an abundant oxygen atmosphere. The high quality dielectric layer 24 is, e.g. a silicon dioxide layer, and the partition layer 26 is composed of titanium dioxide. By this constitution, the temperature detecting element 14 is not contaminated and the temperature coefficient of the resistor is not deteriorated at a high temperature.

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