公开(公告)号：WO1995019637A1

公开(公告)日：1995-07-20

申请号：PCT/AT1995000003

申请日：1995-01-12

Applicant: IMS IONEN MIKROFABRIKATIONS SYSTEME GESELLSCHAFT MBH ,  STENGL, Gerhard ,  CHALUPKA, Alfred ,  VONACH, Herbert

Inventor： IMS IONEN MIKROFABRIKATIONS SYSTEME GESELLSCHAFT MBH

IPC: H01J37/30

CPC classification number: H01J37/3007 ,  H01J37/12 ,  H01J2237/04924 ,  H01J2237/04928 ,  H01J2237/31755

Abstract: A particle beam, in particular an ionic optic reproduction system, preferably for lithographic purposes, has a particle source, in particular an ion source for reproducing on a wafer a structure designed in a masking foil as one or several transparent spots, in particular openings, through at least two electrostatic lenses arranged upstream of the wafer. One of the lenses is a so-called grating lens constituted by one or two tubular electrodes (R1, R2) and by a perforated plate arranged in the path of the beam perpendicularly to the optical axis D. The plate is formed by a masking foil M which forms the central or first electrode of the grating lens, in the direction of propagation of the beam.

Abstract translation: 本发明涉及一种颗粒，尤指离子光学成像系统中，优选用于光刻的目的，包括粒子，尤指离子源用于在一个或位于上形成掩蔽箔更透明体的形式的至少两个在射束方向在晶片的正面成像的结构，特别是开口 在晶片上设置的静电透镜，透镜的其中一个是，R 2和，设置在与一个或两个管电极R1的开口部形成的光束路径板，所述板被布置成垂直于光轴D.所谓的光栅透镜 所述板由掩模膜M，其形成中间或者在光栅透镜的光束方向上的第一电极的形成。