公开(公告)号：WO2012136434A3

公开(公告)日：2012-12-13

申请号：PCT/EP2012053918

申请日：2012-03-07

Applicant: ASML NETHERLANDS BV ,  DE JAGER PIETER ,  BANINE VADIM ,  ONVLEE JOHANNES ,  STEVENS LUCAS ,  WUISTER SANDER ,  IOSAD NIKOLAY

Inventor： DE JAGER PIETER ,  BANINE VADIM ,  ONVLEE JOHANNES ,  STEVENS LUCAS ,  WUISTER SANDER ,  IOSAD NIKOLAY

IPC: G02F1/29 ,  G03F7/20

CPC classification number: G03F7/70191 ,  G02F1/1303 ,  G02F1/29 ,  G03F7/704

Abstract: In an embodiment, a lithographic apparatus is disclosed that includes a modulator configured to expose an exposure area of the substrate to a plurality of beams modulated according to a desired pattern and a projection system configured to project the modulated beams onto the substrate. The modulator includes a deflector to displace the plurality of beams with respect to an exposure area.

Abstract translation: 在一个实施例中，公开了一种光刻设备，其包括调制器，其被配置为将基板的曝光区域暴露于根据期望图案调制的多个光束;以及投影系统，该投影系统配置成将经调制的光束投影到基板上。 调制器包括偏转器，用于相对于曝光区域移位多个光束。

公开(公告)号：WO2009077613A1

公开(公告)日：2009-06-25

申请号：PCT/EP2008/067975

申请日：2008-12-19

Applicant: DSM IP Assets B.V. ,  Plant Research International B.V. ,  STARK, Jacobus ,  VAN RIJN, Ferdinand Theodorus Jozef ,  VAN DER KRIEKEN, Wilhelmus Maria ,  STEVENS, Lucas Henricus

Inventor： STARK, Jacobus ,  VAN RIJN, Ferdinand Theodorus Jozef ,  VAN DER KRIEKEN, Wilhelmus Maria ,  STEVENS, Lucas Henricus

IPC: A01N43/90 ,  A01N57/12 ,  A01N59/06 ,  A01N59/26 ,  A01N63/02 ,  A01P3/00 ,  A23B7/153

CPC classification number: A01N43/90 ,  A01N57/12 ,  A01N59/06 ,  A01N59/26 ,  A01N2300/00

Abstract: The present invention relates to the treatment of banana and potato plants with a composition containing natamycin and at least one phosphite containing compound.

Abstract translation: 本发明涉及用含有游霉素和至少一种含亚磷酸盐化合物的组合物处理香蕉和马铃薯植物。

公开(公告)号：WO2008009657A2

公开(公告)日：2008-01-24

申请号：PCT/EP2007/057330

申请日：2007-07-16

Applicant: DSM IP Assets B.V. ,  Plant Research International B.V. ,  STARK, Jacobus ,  RIJN, VAN, Ferdinand Theodorus Jozef ,  KRIEKEN, VAN DER, Wilhelmus Maria ,  STEVENS, Lucas Henricus

Inventor： STARK, Jacobus ,  RIJN, VAN, Ferdinand Theodorus Jozef ,  KRIEKEN, VAN DER, Wilhelmus Maria ,  STEVENS, Lucas Henricus

IPC: A01N43/90 ,  A01N59/26 ,  A01N63/02

CPC classification number: A01N59/26 ,  A01N43/90 ,  A01N25/30 ,  A01N2300/00

Abstract: The present invention relates to a process for the treatment of an agricultural product which comprises the addition of a composition which comprises phosphite and natamycin to the agricultural product wherein the composition comprises preferably less than 0.1 g lignosulphonate, more preferably less than 0.1 g polyphenol, per gram natamycin and is still more preferably free of lignosulphonate and most preferably free of polyphenol.

Abstract translation: 本发明涉及一种用于处理农产品的方法，其包括向农产品中加入包含亚磷酸酯和游霉素的组合物，其中组合物优选含有少于0.1g木素磺酸盐，更优选小于0.1g多酚 格那那他霉素，更优选不含木素磺酸盐，最优选不含多酚。

公开(公告)号：WO2005064411A2

公开(公告)日：2005-07-14

申请号：PCT/NL2004/000921

申请日：2004-12-29

Applicant: ASML NETHERLANDS B.V. ,  BANINE, Vadim, Yevgenyevich ,  DE KUSTER, Johannes, Peterus, Henricus ,  MOORS, Johannes, Hubertus, Josephina ,  SCHUURMANS, Frank, Jeroen, Pieter ,  STEVENS, Lucas, Henricus, Johannes

Inventor： BANINE, Vadim, Yevgenyevich ,  DE KUSTER, Johannes, Peterus, Henricus ,  MOORS, Johannes, Hubertus, Josephina ,  SCHUURMANS, Frank, Jeroen, Pieter ,  STEVENS, Lucas, Henricus, Johannes

IPC: G03F7/20

CPC classification number: G03F7/70908 ,  G03F7/70916

Abstract: A lithographic apparatus is disclosed. The lithographic apparatus includes a radiation source that produces EUV radiation, an illumination system that provides a beam of the EUV radiation produced by the radiation source, and a support structure that supports a patterning structure. The patterning structure is configured to impart the beam of radiation with a pattern in its cross-section. The apparatus also includes a substrate support that supports a substrate, and a projection system that projects the patterned beam onto a target portion of the substrate. The radiation source includes a debris-mitigation system that mitigates debris particles which are formed during production of EUV radiation. The debris-mitigation system is configured to provide additional particles for interacting with the debris particles.

Abstract translation: 公开了一种光刻设备。 光刻设备包括产生EUV辐射的辐射源，提供由辐射源产生的EUV辐射束的照明系统和支持图案形成结构的支撑结构。 图案形成结构被配置为在其横截面中赋予辐射束图案。 该装置还包括支撑基板的基板支撑件和将图案化的光束投影到基板的目标部分上的投影系统。 辐射源包括减轻在生成EUV辐射期间形成的碎片颗粒的碎片减轻系统。 碎片减轻系统被配置为提供用于与碎屑颗粒相互作用的附加颗粒。

公开(公告)号：WO2004067699A2

公开(公告)日：2004-08-12

申请号：PCT/EP2004000742

申请日：2004-01-27

Applicant: PLANT RES INT BV ,  VAN DER KRIEKEN WILHELMUS MARI ,  KOK CORNELIS JOHANNES ,  STEVENS LUCAS HENRICUS

Inventor： VAN DER KRIEKEN WILHELMUS MARI ,  KOK CORNELIS JOHANNES ,  STEVENS LUCAS HENRICUS

IPC: A01N41/04 ,  A01N59/06 ,  A01N59/16 ,  A01N59/20 ,  A01N65/22 ,  A01N65/28 ,  C09K17/52 ,  C12N

CPC classification number: C09K17/52 ,  A01N41/04 ,  A01N59/16 ,  A01N65/00 ,  A01N59/20 ,  A01N43/90 ,  A01N43/80 ,  A01N43/40 ,  A01N37/10 ,  A01N37/02 ,  A01N31/08 ,  A01N59/06 ,  A01N61/00 ,  A01N35/08 ,  A01N2300/00 ,  A01N25/32 ,  A01N39/04 ,  A01N57/20 ,  A01N65/22 ,  A01N65/28

Abstract: The invention relates to a composition for protecting an agricultural crop against external threats, such as weeds, pathogens, abiotic and biotic stresses and/or for improving the quality of the products produced by the crop, which composition comprises one or more poly-phenols and one or more other active ingredients. The other active ingredients may be natural crop protection compounds, metals, acids, all three optionally combined with each other and/or chemical . antimicrobial agents, or may be small particles of organic material, in particular of fibrous organic material, compounds that induce stress tolerance, compounds that stimulate wound repair and growth, or cellulose containing materials.

Abstract translation: 本发明涉及一种用于保护农作物免受诸如杂草，病原体，非生物和生物胁迫等外部威胁和/或改善由作物产生的产品的质量的组合物，该组合物包含一种或多种多酚和 一种或多种其它活性成分。 其他活性成分可以是天然作物保护化合物，金属，酸，三者任选地彼此结合和/或化学。 或者可以是有机材料的小颗粒，特别是纤维状有机材料的微粒，诱导应力耐受性的化合物，刺激伤口修复和生长的化合物，或含有纤维素的材料。

公开(公告)号：WO2004066730A1

公开(公告)日：2004-08-12

申请号：PCT/EP2003/000840

申请日：2003-01-27

Applicant: PLANT RESEARCH INTERNATIONAL B.V. ,  VAN DER KRIEKEN, Wilhelmus, Maria ,  KOK, Cornelis, Johannes ,  STEVENS, Lucas, Henricus

Inventor： VAN DER KRIEKEN, Wilhelmus, Maria ,  KOK, Cornelis, Johannes ,  STEVENS, Lucas, Henricus

IPC: A01N41/04

CPC classification number: C09K17/52 ,  A01N41/04 ,  A01N59/16 ,  A01N65/00 ,  A01N59/20 ,  A01N43/90 ,  A01N43/80 ,  A01N43/40 ,  A01N37/10 ,  A01N37/02 ,  A01N31/08 ,  A01N59/06 ,  A01N61/00 ,  A01N35/08 ,  A01N2300/00 ,  A01N25/32 ,  A01N39/04 ,  A01N57/20 ,  A01N65/22 ,  A01N65/28

Abstract: The invention relates to a composition for protecting an agricultural crop against external threats, such as weeds, pathogens, abiotic and biotic stresses and/or for improving the quality of the products produced by the crop, which composition comprises one or more poly-phenols and one or more other active ingredients. The other active ingredients may be small particles of organic material, in particular of fibrous organic material, compounds that induce stress tolerance, compounds that stimulate wound repair and growth, natural crop protection compounds, or cellulose containing materials.

Abstract translation: 本发明涉及一种用于保护农作物免受诸如杂草，病原体，非生物和生物胁迫等外部威胁和/或改善由作物产生的产品的质量的组合物，该组合物包含一种或多种多酚和 一种或多种其它活性成分。 其他活性成分可以是有机材料的小颗粒，特别是纤维状有机材料的微粒，诱导耐应力的化合物，刺激伤口修复和生长的化合物，天然作物保护化合物或含纤维素的材料。