公开(公告)号：WO2009123446A1

公开(公告)日：2009-10-08

申请号：PCT/NL2009/050151

申请日：2009-03-27

Applicant: ASML NETHERLANDS B.V. ,  BRUINSMA, Anastasius Jacobus Anicetus ,  MOORS, Johannes Hubertus Josephina ,  STEVENS, Lucas Henricus Johannes ,  VEEFKIND, Abraham ,  BUSSINK, Peter Gerhardus Wilhelmus ,  BROUWER, Egbert Anne Martijn

Inventor： BRUINSMA, Anastasius Jacobus Anicetus ,  MOORS, Johannes Hubertus Josephina ,  STEVENS, Lucas Henricus Johannes ,  VEEFKIND, Abraham ,  BUSSINK, Peter Gerhardus Wilhelmus ,  BROUWER, Egbert Anne Martijn

IPC: G03F7/20 ,  G01N21/00 ,  G01B11/00

CPC classification number: G03F7/70916 ,  G01N21/94 ,  G03F7/70525 ,  G03F7/70566 ,  G03F7/70591 ,  G03F7/70808 ,  G03F7/7085 ,  G03F7/70941

Abstract: A lithographic apparatus (1) includes a vessel (5) that encloses a component (40) with a test surface (4) to be probed for contamination control; and an optical probe configured to transmit and receive an optical probing beam (2). The vessel (5) includes a first optical port (8) configured to transfer the optical probing beam (2) towards the test surface (4), and a second optical port (9) configured to receive a reflected optical probing beam (3). The optical probe includes a light source (10) configured to provide the optical probing beam (2), a polarization conditioner (11) configured to provide a predefined polarization state to the probing beam (2), and a spectral analyzer (12). The polarization conditioner (11) is preset to provide a minimal transmission for a minimal transmission wavelength, and the spectral analyzer (12) is arranged to detect a wavelength shift of the minimal transmission wavelength in response to a polarization change due to the presence of contamination.

Abstract translation: 光刻设备（1）包括容器（5），其包围具有待探测以进行污染控制的测试表面（4）的部件（40）; 以及被配置为发送和接收光学探测光束（2）的光学探针。 容器（5）包括被配置为将光学探测光束（2）传送到测试表面（4）的第一光学端口（8）和被配置为接收反射的光学探测光束（3）的第二光学端口（9） 。 光探头包括被配置为提供光学探测光束（2）的光源（10），被配置为向探测光束（2）提供预定极化状态的偏振调节器（11）和光谱分析器（12）。 偏振调节器（11）被预置为为最小传输波长提供最小传输，并且频谱分析器（12）被布置成响应于由于存在污染而导致的偏振变化来检测最小传输波长的波长漂移 。

公开(公告)号：WO2009129960A1

公开(公告)日：2009-10-29

申请号：PCT/EP2009/002782

申请日：2009-04-16

Applicant: ASML NETHERLANDS B. V., ,  SCACCABAROZZI, Luigi ,  IVANOV, Vladimir, Vitalevitch ,  KOSHELEV, Konstantin, Nikolaevich ,  MOORS, Johannes, Hubertus, Josephina ,  STEVENS, Lucas, Henricus, Johannes ,  ANTSIFEROV, Pavel, Stanislavovich ,  KRIVTSUN, Vladimir, Mihailovitch ,  DOROKHIN, Leonid, Alexandrovich ,  VAN KAMPEN, Maarten

Inventor： SCACCABAROZZI, Luigi ,  IVANOV, Vladimir, Vitalevitch ,  KOSHELEV, Konstantin, Nikolaevich ,  MOORS, Johannes, Hubertus, Josephina ,  STEVENS, Lucas, Henricus, Johannes ,  ANTSIFEROV, Pavel, Stanislavovich ,  KRIVTSUN, Vladimir, Mihailovitch ,  DOROKHIN, Leonid, Alexandrovich ,  VAN KAMPEN, Maarten

IPC: G03F7/20

CPC classification number: G03F7/70925

Abstract: A lithographic apparatus includes an illumination system configured to condition a beam of radiation, and a support structure configured to support a patterning device. The patterning device is configured to impart a pattern to the beam of radiation. The apparatus includes a patterning device cleaning system configured to provide an electrostatic force to contaminant particles that are on the patterning device and that are electrically charged by the beam of radiation, in order to remove the contaminant particles from the patterning device.

Abstract translation: 光刻设备包括被配置为调节辐射束的照明系统和被配置为支撑图案形成装置的支撑结构。 图案形成装置被配置为向辐射束施加图案。 该装置包括图案形成装置清洁系统，该图案形成装置清洁系统被配置为向图案形成装置上的污染物颗粒提供静电力，并且由辐射束对其进行带电，以便从图案形成装置移除污染物颗粒。

公开(公告)号：WO2013023874A1

公开(公告)日：2013-02-21

申请号：PCT/EP2012/064270

申请日：2012-07-20

Applicant: ASML Netherlands B.V. ,  DE JAGER, Pieter ,  BANINE, Vadim ,  BLEEKER, Arno ,  VAN DER SCHOOT, Harmen ,  STEVENS, Lucas ,  VERMEULEN, Johannes ,  WUISTER, Sander

Inventor： DE JAGER, Pieter ,  BANINE, Vadim ,  BLEEKER, Arno ,  VAN DER SCHOOT, Harmen ,  STEVENS, Lucas ,  VERMEULEN, Johannes ,  WUISTER, Sander

IPC: G03F7/20

CPC classification number: B41C1/1091 ,  C23C14/28 ,  G03F7/70375 ,  G03F7/70383

Abstract: In an embodiment, a lithographic apparatus is disclosed that includes a modulator (102, 112) to modulate a plurality of beams according to a desired pattern and a donor structure (208) on to which the modulated beams impinge. The donor structure configured such that the impinging modulated beams cause a donor material to be transferred from the donor structure to a substrate (114).

Abstract translation: 在一个实施例中，公开了一种光刻设备，其包括根据期望的图案调制多个光束的调制器（102,112）和被调制的光束照射到的施主结构（208）。 供体结构被配置成使得入射的调制光束使施主材料从施主结构转移到衬底（114）。

公开(公告)号：WO2012136434A2

公开(公告)日：2012-10-11

申请号：PCT/EP2012/053918

申请日：2012-03-07

Applicant: ASML NETHERLANDS B.V. ,  DE JAGER, Pieter ,  BANINE, Vadim ,  ONVLEE, Johannes ,  STEVENS, Lucas ,  WUISTER, Sander ,  IOSAD, Nikolay

Inventor： DE JAGER, Pieter ,  BANINE, Vadim ,  ONVLEE, Johannes ,  STEVENS, Lucas ,  WUISTER, Sander ,  IOSAD, Nikolay

IPC: G02F1/29

CPC classification number: G03F7/70191 ,  G02F1/1303 ,  G02F1/29 ,  G03F7/704

Abstract: In an embodiment, a lithographic apparatus is disclosed that includes a modulator configured to expose an exposure area of the substrate to a plurality of beams modulated according to a desired pattern and a projection system configured to project the modulated beams onto the substrate. The modulator includes a deflector to displace the plurality of beams with respect to an exposure area.

Abstract translation: 在一个实施例中，公开了一种光刻设备，该光刻设备包括：调制器，被配置为将衬底的曝光区域暴露于根据期望的图案调制的多个束;以及投影系统，配置为将调制的 光束照射到基底上。 调制器包括偏转器，以使多个光束相对于曝光区域移位。

公开(公告)号：WO2008044925A2

公开(公告)日：2008-04-17

申请号：PCT/NL2007/050469

申请日：2007-09-25

Applicant: ASML NETHERLANDS B.V. ,  CARL ZEISS SMT AG ,  VAN HERPEN, Maarten, Marinus, Johannes, Wilhelmus ,  BANINE, Vadim, Yevgenyevich ,  DE KUSTER, Johannes, Peterus, Henricus ,  MOORS, Johannes, Hubertus, Josephina ,  STEVENS, Lucas, Henricus, Johannes ,  WOLSCHRIJN, Bastiaan, Theodoor ,  SIDELNIKOV, Yurii, Victorovitch ,  VAN DER VELDEN, Marc, Hubertus, Lorenz ,  SOER, Wouter, Anthon ,  GIELISSEN, Kurt ,  STEIN, Thomas

Inventor： VAN HERPEN, Maarten, Marinus, Johannes, Wilhelmus ,  BANINE, Vadim, Yevgenyevich ,  DE KUSTER, Johannes, Peterus, Henricus ,  MOORS, Johannes, Hubertus, Josephina ,  STEVENS, Lucas, Henricus, Johannes ,  WOLSCHRIJN, Bastiaan, Theodoor ,  SIDELNIKOV, Yurii, Victorovitch ,  VAN DER VELDEN, Marc, Hubertus, Lorenz ,  SOER, Wouter, Anthon ,  GIELISSEN, Kurt ,  STEIN, Thomas

IPC: G03F7/20

CPC classification number: G03F7/70925 ,  G03F7/7085 ,  G03F7/70908 ,  G03F7/70916

Abstract: A lithographic apparatus configured to project a patterned beam of radiation onto a target portion of a substrate is disclosed. The apparatus includes a first radiation dose detector and a second radiation dose detector, each detector comprising a secondary electron emission surface configured to receive a radiation flux and to emit secondary electrons due to the receipt of the radiation flux, the first radiation dose detector located upstream with respect to the second radiation dose detector viewed with respect to a direction of radiation transmission, and a meter, connected to each detector, to detect a current or voltage resulting from the secondary electron emission from the respective electron emission surface.

Abstract translation: 公开了一种被配置为将图案化的辐射束投影到基板的目标部分上的光刻设备。 该装置包括第一辐射剂量检测器和第二辐射剂量检测器，每个检测器包括被配置为接收辐射通量并由于接收到辐射通量而发射二次电子的二次电子发射表面，位于上游的第一辐射剂量检测器 相对于相对于辐射传播方向观察的第二辐射剂量检测器，以及连接到每个检测器的仪表，以检测由相应的电子发射表面产生的二次电子发射产生的电流或电压。

公开(公告)号：WO2005064411A3

公开(公告)日：2006-01-05

申请号：PCT/NL2004000921

申请日：2004-12-29

Applicant: ASML NETHERLANDS BV ,  BANINE VADIM YEVGENYEVICH ,  DE KUSTER JOHANNES PETERUS HEN ,  MOORS JOHANNES HUBERTUS JOSEPH ,  SCHUURMANS FRANK JEROEN PIETER ,  STEVENS LUCAS HENRICUS JOHANNE

Inventor： BANINE VADIM YEVGENYEVICH ,  DE KUSTER JOHANNES PETERUS HEN ,  MOORS JOHANNES HUBERTUS JOSEPH ,  SCHUURMANS FRANK JEROEN PIETER ,  STEVENS LUCAS HENRICUS JOHANNE

IPC: G03F7/20

CPC classification number: G03F7/70908 ,  G03F7/70916

Abstract: A lithographic apparatus is disclosed. The lithographic apparatus includes a radiation source (SO) that produces EUV radiation, an illumination system (IL) that provides a beam of the EUV radiation produced by the radiation source, and a support structure (MT) that supports a patterning structure (MA). The patterning structure is configured to impart the beam of radiation with a pattern in its cross-section. The apparatus also includes a substrate support (WT) that supports a substrate (W), and a projection system (PL) that projects the patterned beam onto a target portion (C) of the substrate. The radiation source includes a debris-mitigation system (6, 7) that mitigates debris particles which are formed during production of EUV radiation. The debris-mitigation system is configured to provide additional particles (3) for interacting with the debris particles (2).

Abstract translation: 公开了一种光刻设备。 光刻设备包括产生EUV辐射的辐射源（SO），提供辐射源产生的EUV辐射束的照明系统（IL）和支持图形结构（MA）的支撑结构（MT） 。 图案形成结构被配置为在其横截面中赋予辐射束图案。 该装置还包括支撑衬底（W）的衬底支撑件（WT）和将图案化的光束投影到衬底的目标部分（C）上的投影系统（PL）。 辐射源包括减轻在产生EUV辐射期间形成的碎片颗粒的碎片减轻系统（6,7）。 碎片减轻系统被配置为提供用于与碎屑颗粒（2）相互作用的附加颗粒（3）。

公开(公告)号：WO2004067699A3

公开(公告)日：2004-08-12

申请号：PCT/EP2004/000742

申请日：2004-01-27

Applicant: PLANT RESEARCH INTERNATIONAL B.V. ,  VAN DER KRIEKEN, Wilhelmus, Maria ,  KOK, Cornelis, Johannes ,  STEVENS, Lucas, Henricus

Inventor： VAN DER KRIEKEN, Wilhelmus, Maria ,  KOK, Cornelis, Johannes ,  STEVENS, Lucas, Henricus

IPC: A01N41/04

Abstract: The invention relates to a composition for protecting an agricultural crop against external threats, such as weeds, pathogens, abiotic and biotic stresses and/or for improving the quality of the products produced by the crop, which composition comprises one or more poly-phenols and one or more other active ingredients. The other active ingredients may be natural crop protection compounds, metals, acids, all three optionally combined with each other and/or chemical . antimicrobial agents, or may be small particles of organic material, in particular of fibrous organic material, compounds that induce stress tolerance, compounds that stimulate wound repair and growth, or cellulose containing materials.

公开(公告)号：WO2011160861A1

公开(公告)日：2011-12-29

申请号：PCT/EP2011/054057

申请日：2011-03-17

Applicant: ASML NETHERLANDS B.V. ,  YAKUNIN, Andrei ,  BANINE, Vadim ,  LOOPSTRA, Erik ,  VAN DER SCHOOT, Harmen ,  STEVENS, Lucas ,  VAN KAMPEN, Maarten

Inventor： YAKUNIN, Andrei ,  BANINE, Vadim ,  LOOPSTRA, Erik ,  VAN DER SCHOOT, Harmen ,  STEVENS, Lucas ,  VAN KAMPEN, Maarten

IPC: G03F7/20 ,  G21K1/06 ,  G03F1/14 ,  G02B5/20 ,  G02B5/08 ,  C01B31/04

CPC classification number: G03F1/64 ,  B82Y10/00 ,  B82Y40/00 ,  C01B32/20 ,  G02B5/0816 ,  G02B5/0891 ,  G02B5/204 ,  G02B5/208 ,  G02B27/0006 ,  G03B27/54 ,  G03F1/24 ,  G03F1/62 ,  G03F7/70058 ,  G03F7/702 ,  G03F7/70916 ,  G03F7/70958 ,  G03F7/70983 ,  G21K1/062 ,  G21K2201/061 ,  H01B1/04 ,  H01B1/24

Abstract: A lithographic apparatus includes a radiation source configured to produce a radiation beam, and a support configured to support a patterning device. The patterning device is configured to impart the radiation beam with a pattern to form a patterned radiation beam. A chamber is located between the radiation source and patterning device. The chamber contains at least one optical component configured to reflect the radiation beam, and is configured to permit radiation from the radiation source to pass therethrough. A membrane (44) is configured to permit the passage of the radiation beam, and to prevent the passage of contamination particles (54) through the membrane. A particle trapping structure (52) is configured to permit gas to flow along an indirect path from inside the chamber to outside the chamber. The indirect path is configured to substantially prevent the passage of contamination particles (58) from inside the chamber to outside the chamber.

Abstract translation: 光刻设备包括被配置为产生辐射束的辐射源和被配置为支撑图案形成装置的支撑件。 图案形成装置被配置为使辐射束具有图案以形成图案化的辐射束。 腔室位于辐射源和图案形成装置之间。 所述腔室包括被配置为反射辐射束的至少一个光学部件，并且被配置为允许来自辐射源的辐射通过。 膜（44）构造成允许辐射束的通过，并且防止污染颗粒（54）通过膜。 颗粒捕获结构（52）被配置为允许气体沿着室内的间接路径流动到室外。 间接路径构造成基本上防止污染颗粒（58）从腔室内部通过到室外。

公开(公告)号：WO2008044925A3

公开(公告)日：2009-03-05

申请号：PCT/NL2007050469

申请日：2007-09-25

Applicant: ASML NETHERLANDS BV ,  ZEISS CARL SMT AG ,  VAN HERPEN MAARTEN MARINUS JOHANNES WILHELMUS ,  BANINE VADIM YEVGENYEVICH ,  DE KUSTER JOHANNES PETERUS HENRICUS ,  MOORS JOHANNES HUBERTUS JOSEPHINA ,  STEVENS LUCAS HENRICUS JOHANNS ,  WOLSCHRIJN BASTIAAN THEODOOR ,  SIDELNIKOV YURII VICTOROVITCH ,  VAN DER VELDEN MARC HUBERTUS LORENZ ,  SOER WOUTER ANTHON ,  GIELISSEN KURT ,  STEIN THOMAS

Inventor： VAN HERPEN MAARTEN MARINUS JOHANNES WILHELMUS ,  BANINE VADIM YEVGENYEVICH ,  DE KUSTER JOHANNES PETERUS HENRICUS ,  MOORS JOHANNES HUBERTUS JOSEPHINA ,  STEVENS LUCAS HENRICUS JOHANNES ,  WOLSCHRIJN BASTIAAN THEODOOR ,  SIDELNIKOV YURII VICTOROVITCH ,  VAN DER VELDEN MARC HUBERTUS LORENZ ,  SOER WOUTER ANTHON ,  GIELISSEN KURT ,  STEIN THOMAS

IPC: G03F7/20

CPC classification number: G03F7/70925 ,  G03F7/7085 ,  G03F7/70908 ,  G03F7/70916

Abstract: A lithographic apparatus configured to project a patterned beam of radiation onto a target portion of a substrate is disclosed. The apparatus includes a first radiation dose detector (10A) and a second radiation dose detector (10B), each detector comprising a secondary electron emission surface (11) configured to receive a radiation flux and to emit secondary electrons due to the receipt of the radiation flux, the first radiation dose detector located upstream with respect to the second radiation dose detector viewed with respect to a direction of radiation transmission, and a meter (13), connected to each detector, to detect a current or voltage resulting from the secondary electron emission from the respective electron emission surface.

Abstract translation: 公开了一种被配置为将图案化的辐射束投影到基板的目标部分上的光刻设备。 该装置包括第一辐射剂量检测器（10A）和第二辐射剂量检测器（10B），每个检测器包括二次电子发射表面（11），其被配置为接收辐射通量并由于接收到辐射而发射二次电子 通量，相对于辐射传播方向观察到的相对于第二辐射剂量检测器位于上游的第一辐射剂量检测器和连接到每个检测器的仪表（13），以检测由二次电子产生的电流或电压 从各个电子发射表面发射。

公开(公告)号：WO2008009657A3

公开(公告)日：2008-04-17

申请号：PCT/EP2007057330

申请日：2007-07-16

Applicant: DSM IP ASSETS BV ,  PLANT RES INT BV ,  STARK JACOBUS ,  RIJN VAN FERDINAND THEODORUS J ,  KRIEKEN VAN DER WILHELMUS MARI ,  STEVENS LUCAS HENRICUS

Inventor： STARK JACOBUS ,  RIJN VAN FERDINAND THEODORUS J ,  KRIEKEN VAN DER WILHELMUS MARI ,  STEVENS LUCAS HENRICUS

IPC: A01N43/90 ,  A01N59/26 ,  A01N63/02

CPC classification number: A01N59/26 ,  A01N43/90 ,  A01N25/30 ,  A01N2300/00

Abstract: The present invention relates to a process for the treatment of an agricultural product which comprises the addition of a composition which comprises phosphite and natamycin to the agricultural product wherein the composition comprises preferably less than 0.1 g lignosulphonate, more preferably less than 0.1 g polyphenol, per gram natamycin and is still more preferably free of lignosulphonate and most preferably free of polyphenol.

Abstract translation: 本发明涉及一种处理农产品的方法，该方法包括向农产品中加入包含亚磷酸盐和游霉素的组合物，其中所述组合物包含优选小于0.1g木质素磺酸盐，更优选小于0.1g多酚 克游霉素，更优选不含木质素磺酸盐，最优选不含多酚。