기판 가공 장치 및 기판 가공 방법
    11.
    发明公开
    기판 가공 장치 및 기판 가공 방법 有权
    基板制造设备和基板制造方法

    公开(公告)号:KR1020120052442A

    公开(公告)日:2012-05-24

    申请号:KR1020100113324

    申请日:2010-11-15

    Inventor: 원선호 이재헌

    CPC classification number: G02F1/1303 B65G49/06 H01L21/67718 H01L21/6838

    Abstract: PURPOSE: A substrate processing device and a substrate processing method are provided to shorten standby time for a processing work between substrates which are consecutively supplied when a plurality of substrates are processed. CONSTITUTION: A center table set rotates a substrate at a fixed angle. A second side table set(150) supports a second peripheral part of the substrate. The second side table set transfers the substrate. A first processing unit(130) processes one edge pair corresponding to a first peripheral part of the substrate. A second processing unit(170) processes one edge part corresponding to the second peripheral part of the substrate.

    Abstract translation: 目的:提供基板处理装置和基板处理方法,以缩短在处理多个基板时连续供给的基板之间的加工工作的待机时间。 构成:中心台组以一定角度旋转基板。 第二侧台组(150)支撑基板的第二周边部分。 第二台台组传送基板。 第一处理单元(130)处理对应于衬底的第一周边部分的一个边缘对。 第二处理单元(170)处理与基板的第二周边部分相对应的一个边缘部分。

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