公开(公告)号：KR1020130140576A

公开(公告)日：2013-12-24

申请号：KR1020130067777

申请日：2013-06-13

Applicant: 도쿄엘렉트론가부시키가이샤

Inventor： 이케가와히로아키 ,  가미니시마사히코 ,  이세요시노부 ,  오가와준

IPC: H01L21/205

CPC classification number: H01L21/0262 ,  C23C16/40 ,  C23C16/402 ,  C23C16/403 ,  C23C16/405 ,  C23C16/45519 ,  C23C16/45551 ,  H01L21/68764

Abstract: A film manufacturing method comprises a step for rotating a rotation table; separating a first processing area and a second processing area by supplying separation gas from a separation gas supply unit; and supplying second response gas which responds to first response gas to a second processing area from a second gas supply unit while supplying first response gas to the first processing area from a first gas supply unit and a step for rotating the rotation table; separating the first processing area and the second processing area by supplying the separation gas from the separation gas supply unit; and supplying the second response gas from the second gas supply unit to the second processing area for a predetermined period without supplying the response gas from the first gas supply unit. [Reference numerals] (100) Control unit;(101) Memory unit;(102) Medium;(AA,BB,CC,DD) N_2 gas

Abstract translation: 一种薄膜制造方法，包括旋转旋转台的步骤; 通过从分离气体供应单元提供分离气体来分离第一处理区域和第二处理区域; 在从第一气体供给单元向第一处理区域供给第一响应气体的同时，从第二气体供给单元向第二处理区域供给响应于第一响应气体的第二响应气体，以及旋转旋转台的步骤; 通过从分离气体供应单元提供分离气体来分离第一处理区域和第二处理区域; 以及在不从第一气体供应单元供应响应气体的情况下将第二响应气体从第二气体供应单元供应到第二处理区域预定的时间段。 （附图标记）（100）控制单元;（101）存储单元;（102）介质;（AA，BB，CC，DD）N_2气体