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公开(公告)号：KR1020010019259A
公开(公告)日：2001-03-15
申请号：KR1019990035589
申请日：1999-08-26
Applicant: 삼성전자주식회사
Inventor： 김진남
IPC: H01L21/027
Abstract: PURPOSE: An optical system used for a reticle alignment is provided to adjust respectively and separately the focuses of step scopes. CONSTITUTION: An optical system(300) includes an x-step scope(240) and a y-step scope(250) respectively measuring an aligning state of a reticle(210) to an x-axis and a y-axis. The output produced from the step scopes(240,250) is transmitted to an input unit(260) through a unitary focus aligner(262) along an output path(270) where reflecting mirrors(272) are arranged. Particularly, the optical system(300) further includes individual focus aligners(242,252) formed on the output path(270) before gathering the output to separately adjust the focuses of the step scopes(240,250). Therefore, since it is not necessary to disassemble the optical system(300) to adjust relative focus declination, efficiency of work is improved and working time is reduced.
Abstract translation: 目的：提供一种用于光罩对准的光学系统，以分别和分别调节台阶示波器的焦点。 构成：光学系统（300）包括分别测量分划板（210）与x轴和y轴的对准状态的x步骤范围（240）和y步骤范围（250）。 从步进范围（240,250）产生的输出通过布置反射镜（272）的输出路径（270）通过整体聚焦对准器（262）传输到输入单元（260）。 特别地，光学系统（300）还包括形成在输出路径（270）上的各个聚焦对准器（242,252），然后收集输出以单独调节台阶示波器（240,250）的焦点。 因此，由于不需要拆卸光学系统（300）以调节相对聚焦偏角，因此提高了工作效率并降低了工作时间。
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公开(公告)号：KR1020000024865A
公开(公告)日：2000-05-06
申请号：KR1019980041629
申请日：1998-10-02
Applicant: 삼성전자주식회사
IPC: H01L21/027
Abstract: PURPOSE: An exposure device of photoresist is provided to prevent curving phenomena of a wafer due to a local vacuum pressure by using a vacuum ring. CONSTITUTION: An exposure device of photoresist relates to a necessary exposure device when developing selectively a photoresist dispensed to a wafer during a manufacturing process of a semiconductor. In the exposure device, an image of a magnified mask is reduced according to a constant magnifying power by using a reduction projection lens magnifying power. The photoresist dispensed to the wafer is exposed by injecting light toward a wafer(WF) set at a vacuum chuck(22) of the stage. A vacuum ring(24) is installed in the vacuum chuck. A diameter of the vacuum ring is less than the diameter of the wafer.
Abstract translation: 目的：提供光致抗蚀剂的曝光装置，以通过使用真空环来防止由于局部真空压力引起的晶片弯曲现象。 构成：当在半导体的制造过程中选择性地显影剂分配到晶片时，光致抗蚀剂的曝光装置涉及必要的曝光装置。 在曝光装置中，通过使用缩小投影透镜放大倍率，根据恒定的放大倍数来减小放大掩模的图像。 通过向设置在载物台的真空吸盘（22）上的晶片（WF）注入光来将分配到晶片的光致抗蚀剂暴露。 真空吸盘（24）安装在真空吸盘中。 真空环的直径小于晶片的直径。
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公开(公告)号：KR1019900004640B1
公开(公告)日：1990-06-30
申请号：KR1019870004107
申请日：1987-04-28
Applicant: 삼성전자주식회사
Inventor： 김진남
IPC: H04N13/04
Abstract: A system has a modulator (a) for generating modulated signals and a demodulator (b) for reproducing signals on the disk. The modulator includes mixers (12, 22) for combining left/right video signals with a carrier frequency, frequency modulators (13,23) for modulating the output of mixers, and an encoder (30) for generating the modulated signal cutted with a certain level. The modulator includes a pick-up cartridge (40) for reading the signal recorded on the disk and converting the signal into RF signal, a band pass filter (50) for separating video and audio signals from the output of the pick-up cartridge, a switching circuit (70), and video and audio demodulators (80,81,82) for demodulating video and left/right audio signals.
Abstract translation: 系统具有用于产生调制信号的调制器（a）和用于在盘上再现信号的解调器（b）。 调制器包括用于将左/右视频信号与载波频率组合的混频器（12,22），用于调制混频器的输出的调频器（13,23）和用于产生用某一特定频率切割的调制信号的编码器（30） 水平。 调制器包括用于读取记录在盘上的信号并将该信号转换为RF信号的拾取盒（40），用于从拾取盒的输出分离视频和音频信号的带通滤波器（50） 切换电路（70）以及用于解调视频和左/右音频信号的视频和音频解调器（80,81,82）。
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