公开(公告)号：KR1020020006761A

公开(公告)日：2002-01-26

申请号：KR1020000040139

申请日：2000-07-13

Applicant: 삼성전자주식회사

Inventor： 정경수

IPC: H01L21/68

Abstract: PURPOSE: Semiconductor equipment is provided to prevent a damage of an elevator by installing a sensor at a lower portion of the elevator. CONSTITUTION: An auto wafer transfer is connected with a plurality of support shafts for moving an elevator(4) to a horizontal direction. The elevator(4) is moved to an upper or a lower direction along a mobile shaft. A plurality of chucks is installed at both end portions of the elevator. The plural chucks are formed with a vacuum chuck for loading a wafer on a quartz boat when the elevator(4) is moved to the quartz boat. A micro switch(11) is installed on both end portions of the elevator(4), respectively. The micro switch(11) is connected with a sensing bar(12). The sensing bar(4) is used for sensing a falling state of the elevator. The micro switch(11) is used for stopping an operation of the elevator according to a signal of the sensing bar(12).

Abstract translation: 目的：提供半导体设备以通过在电梯的下部安装传感器来防止电梯的损坏。 构成：自动晶片传送与多个用于将电梯（4）移动到水平方向的支撑轴连接。 电梯（4）沿着移动轴被移动到上部或下部方向。 多个卡盘安装在电梯的两端部。 当电梯（4）移动到石英舟时，多个卡盘形成有用于将晶片装载在石英舟皿上的真空卡盘。 微型开关（11）分别安装在电梯（4）的两端部。 微型开关（11）与感测杆（12）连接。 感测杆（4）用于感测电梯的下降状态。 微型开关（11）用于根据感测杆（12）的信号来停止电梯的操作。

公开(公告)号：KR1020010081387A

公开(公告)日：2001-08-29

申请号：KR1020000006784

申请日：2000-02-14

Applicant: 삼성전자주식회사

Inventor： 정경수 ,  윤진철

IPC: H01L21/20

Abstract: PURPOSE: A method for preventing an abnormal reaction using a remaining gas in a film deposition system is provided to performing a film deposition process continuously by preventing an abnormal reaction of the remaining gas due to a trouble of a main pump. CONSTITUTION: An interlock device is operated to check a current value of a pump motor and transfer the checked value to a controller when an electric defect is generated in a pump(60). The interlock device generates a signal indicating a rising current of the pump motor to the controller. The controller senses an abnormal state of the pump(60) and performs a control operation to intercept a main value(32). Simultaneously, an auxiliary main valve(70) is opened and auxiliary pump modules(41,51,61) parallel to main pump modules(40,50,60) are driven by the control operation of the controller. Accordingly, an abnormal reaction due to the remaining gas is prevented by pumping the remaining gas from a furnace(10), continuously.

Abstract translation: 目的：提供一种在成膜系统中使用剩余气体防止异常反应的方法，通过防止主泵故障引起的剩余气体的异常反应，连续进行成膜工序。 构成：当在泵（60）中产生电气缺陷时，操作联锁装置以检查泵电动机的当前值并将检查值传送到控制器。 互锁装置产生指示泵电动机向控制器上升的电流的信号。 控制器检测泵的异常状态（60），并执行控制操作以拦截主值（32）。 同时，辅助主阀（70）打开，并且与主泵模块（40,50,60）平行的辅助泵模块（41,51,61）由控制器的控制操作驱动。 因此，通过连续地将来自炉（10）的剩余气体泵送，可以防止残留气体引起的异常反应。

公开(公告)号：KR200202977Y1

公开(公告)日：2001-01-15

申请号：KR2019950036246

申请日：1995-11-28

Applicant: 삼성전자주식회사

Inventor： 정경수 ,  육근목

IPC: H01L21/68

Abstract: 본 고안은 웨이퍼 케리어 센서 핀에 관한 것으로서, 본 고안은 케리어와의 마찰을 최소화할 수 있는 웨이퍼 케리어 센서 핀을 제공하는데 그 목적을 두고 있다.
상기의 목적을 달성하기 위한 본 고안에 의한 웨이퍼 케리어 센서 핀은 케리어의 하단과 접촉되는 케리어 접촉부와, 상기 케리어 접촉부에 안착된 케리어의 하중으로 하향 이동되어 하부 센서부를 누르는 센서 자극부로 구성된 웨이퍼 케리어 센서 핀에 있어서, 상기 케리어 접촉부는 케리어와의 마찰력을 최소화할 수 있는 버섯 형상으로 구비됨을 특징으로 한다.

公开(公告)号：KR1019980020128A

公开(公告)日：1998-06-25

申请号：KR1019960038482

申请日：1996-09-05

Applicant: 삼성전자주식회사

Inventor： 정경수

IPC: H01L21/66

Abstract: 다수매의 반도체 웨이퍼를 탑재하여 수평형 공정튜브내로 로딩 및 언로딩시키도록 된 반도체 제조 장치의 수평형 석영보트에 관한 것이다.
본 발명은 소프트 랜더에 설치되어 전,후 직선이동하는 소프트 랜더 아암(12)상에 놓여져 공정튜브내로 로딩 및 언로딩되는 반도체 제조 장치의 수평형 석영보트에 있어서, 하부 모서리부(11a)를 가공하여 소프트 랜더 아암(12)의 내측면(12a)과 소정간격 이격되도록 구성한 것이다.
따라서 석영보트와 소프트 랜더 아암 사이의 접촉으로 발생하는 마모 및 마찰이 최소화됨으로써 이로인한 파티클 생성을 감소시켜 웨이퍼의 오염을 최소화할 수 있는 것이고, 이로써 품질향상 및 수율이 증가되는 효과가 있다.

公开(公告)号：KR2019970025847U

公开(公告)日：1997-06-20

申请号：KR2019950036246

申请日：1995-11-28

Applicant: 삼성전자주식회사

Inventor： 정경수 ,  육근목

IPC: H01L21/68

Abstract: 본고안은웨이퍼케리어센서핀에관한것으로서, 본고안은케리어와의마찰을최소화할수 있는웨이퍼케리어센서핀을제공하는데그 목적을두고있다. 상기의목적을달성하기위한본 고안에의한웨이퍼케리어센서핀은케리어의하단과접촉되는케리어접촉부와, 상기케리어접촉부에안착된케리어의하중으로하향이동되어하부센서부를누르는센서자극부로구성된웨이퍼케리어센서핀에있어서, 상기케리어접촉부는케리어와의마찰력을최소화할수 있는버섯형상으로구비됨을특징으로한다.

公开(公告)号：KR1020030078209A

公开(公告)日：2003-10-08

申请号：KR1020020017094

申请日：2002-03-28

Applicant: 삼성전자주식회사

Inventor： 정경수

IPC: H01L21/205

Abstract: PURPOSE: A semiconductor manufacturing equipment having an inner tube is provided to uniformly flow reaction gas into the inner tube. CONSTITUTION: A semiconductor manufacturing equipment is provided with a ring(11) loaded with a wafer(W), a boat(21) for supporting the ring, a cylinder type inner tube(31) installed to enclose the boat, an outer tube(51) installed to enclose the cylinder type inner tube, a heater(71) installed and spaced apart from the outer tube to heat the outer tube, a gas inflow port(9) installed at the lower portion of the inner tube for flowing gas into the inner tube, and a gas exhaust port(111) installed and connected to the lower portion of the outer tube. At this time, ring type protrusions are formed along the inner wall of the cylinder type inner tube and spaced apart from each other.

Abstract translation: 目的：提供具有内管的半导体制造设备，以将反应气体均匀地流入内管。 构成：半导体制造设备设置有装载有晶片（W）的环（11），用于支撑环的船（21），安装成封闭船的气缸型内管（31），外管（ 51），安装用于封闭气缸型内管，与外管安装并隔开的加热器（71），以加热外管;气体流入口（9），安装在内管的下部，用于使气体流入 内管和安装并连接到外管的下部的排气口（111）。 此时，环状突起沿着圆筒型内管的内壁形成并且彼此间隔开。

公开(公告)号：KR1020030005493A

公开(公告)日：2003-01-23

申请号：KR1020010040807

申请日：2001-07-09

Applicant: 삼성전자주식회사

Inventor： 정경수

IPC: H01L21/68

Abstract: PURPOSE: A wafer transferring apparatus having a sensor is provided to prevent an error of fabrication equipment due to an optical point error of a sensor and detect a loading state of a wafer by using an optical sensor or an approach sensor. CONSTITUTION: A wafer boat is used for loading a plurality of wafers into an electric furnace. A wafer transferring apparatus is used for transferring the wafers from a stage to the wafer boat. The wafer transferring apparatus is formed with a transferring portion(100), a fork(110), and a sensor(120). A driving portion operates the transferring portion(100). The transferring portion(100) is formed with five stages. The fork(110) is installed at each stage of the transferring portion(100). The wafers are loaded on the forks(110) installed at each stage of the transferring portion(100). The sensor(130) senses the presence of the wafers loaded on the forks(110).

Abstract translation: 目的：提供具有传感器的晶片传送装置，以防止由于传感器的光点误差引起的制造设备的误差，并且通过使用光学传感器或接近传感器来检测晶片的装载状态。 构成：使用晶片舟将多个晶片装载到电炉中。 晶片转印装置用于将晶片从载物台转移到晶片舟皿。 晶片转印装置形成有转印部分（100），叉子（110）和传感器（120）。 驱动部分操作传送部分（100）。 转印部分（100）形成有五个阶段。 叉（110）安装在转移部分（100）的每个阶段。 将晶片装载在安装在转印部分（100）的每个阶段的叉子（110）上。 传感器（130）感测装在叉子（110）上的晶片的存在。

公开(公告)号：KR1020020044372A

公开(公告)日：2002-06-15

申请号：KR1020000073427

申请日：2000-12-05

Applicant: 삼성전자주식회사

Inventor： 정경수 ,  박춘호

IPC: H01L21/205

Abstract: PURPOSE: A vertical low pressure chemical vapor deposition(LPCVD) apparatus used for fabricating a semiconductor device is provided to improve reliability of the semiconductor device, by minimizing a thickness difference between the center and the edge of a wafer. CONSTITUTION: An outer tube has a predetermined capacity. An inner tube in which a deposition process is performed is installed inside the outer tube. A gas supply unit supplies deposition gas, installed outside the outer tube. A gas nozzle supplies the deposition gas supplied from the gas supply unit to the inside of the inner tube, connected to the gas supply unit. A ring boat(40) is installed inside the inner tube to mount the wafer. A plurality of guide pins(44) are attached to the upper portion of a ring(42) in the peripheral region of the inner circumferential surface of the ring boat, wherein the surface of the ring is processed to be a rough surface.

Abstract translation: 目的：提供用于制造半导体器件的垂直低压化学气相沉积（LPCVD）装置，通过最小化晶片的中心和边缘之间的厚度差来提高半导体器件的可靠性。 构成：外管具有预定的容量。 其中执行沉积工艺的内管安装在外管的内部。 气体供应单元提供安装在外管外部的沉积气体。 气体喷嘴将从气体供给单元供给的沉积气体供给到与气体供给单元连接的内管的内部。 环形船（40）安装在内管的内部以安装晶片。 多个引导销（44）在环形舟的内周面的周边区域中附接到环（42）的上部，其中环的表面被加工成粗糙表面。

公开(公告)号：KR1020000072894A

公开(公告)日：2000-12-05

申请号：KR1019990015836

申请日：1999-05-03

Applicant: 삼성전자주식회사

Inventor： 정경수

IPC: H01L21/66

Abstract: PURPOSE: A vertical-type furnace for manufacturing semiconductor is provided to prevent damage to a wafer and the equipment and to eliminate the need for an operator's manual check, by immediately detecting if the wafer is not properly placed in a boat. CONSTITUTION: A vertical-type furnace for manufacturing semiconductor comprises a tube, a heater wall material, an exhaust port, a gas nozzle, a boat and a load lock chamber. The heater wall material transfers heat to the tube. The gas nozzle supplies a source gas to the tube. The exhaust port exhausts a reaction gas of the tube. The boat mounts a wafer and transfers the wafer to the tube. The load lock chamber is a space where the wafer is supplied from the exterior before the boat is inserted into the tube, and has an apparatus for transferring the wafer.

Abstract translation: 目的：提供一种用于制造半导体的垂直式炉，以便通过立即检测晶片是否不能正确放置在船上，以防止对晶片和设备的损坏，并消除对操作者手动检查的需要。 构成：用于制造半导体的垂直式炉包括管，加热器壁材料，排气口，气体喷嘴，船和装载锁定室。 加热器壁材料将热量传递给管。 气体喷嘴向管提供源气体。 排气口排出管的反应气体。 船安装晶片并将晶片转移到管中。 负载锁定室是在船被插入管之前从外部供给晶片的空间，并且具有用于转移晶片的装置。

公开(公告)号：KR1020000015651A

公开(公告)日：2000-03-15

申请号：KR1019980035687

申请日：1998-08-31

Applicant: 삼성전자주식회사

Inventor： 정경수

IPC: H01L21/304

Abstract: PURPOSE: An automatic cleaning apparatus is provided to improve a facility of observation inside of chamber and saving time and cleaning solution by using a spray cleaner formed at a transparent door. CONSTITUTION: The automatic cleaning apparatus comprises: a chamber(2) include of multi-bath for contained to cleaning solution; a loader(7) for loading or unloading into the water-bath(3); pipe for ventilation of cleaning solution fume; spray-cleaner(9) for transparent door cleaning; and a controller(13) for spray-cleaner, thereby improve a facility of observation inside of chamber and save the time and cleaning solution.

Abstract translation: 目的：提供一种自动清洁装置，通过使用形成在透明门上的喷雾清洁器来改善室内观察设施并节省时间和清洁溶液。 构成：自动清洗装置包括：一个室（2），包括用于容纳到清洁溶液中的多槽; 用于装载或卸载到水浴（3）中的装载机（7）; 清洁液通风管道烟气; 喷雾清洁剂（9），用于透明门清洁; 以及用于喷雾清洁器的控制器（13），从而改善了室内观察的设施并节省了时间和清洁液。