公开(公告)号：KR1020070045517A

公开(公告)日：2007-05-02

申请号：KR1020050101881

申请日：2005-10-27

Applicant: 삼성전자주식회사

Inventor： 이광명 ,  허노현 ,  김일경 ,  정경수 ,  윤기영

IPC: H01L21/66

Abstract: 본 발명은 반도체 제조 장치의 에이징 방법에 관한 것이다. 이 방법은 프로세스 챔버를 가열하는 가열공정과 프로세스 챔버 내의 가스를 진공배기하는 펌핑공정을 포함하되, 상기 가열공정 및 상기 펌핑공정을 반복적으로 실시한다. 본 발명에 의하면, 가열공정과 펌핑공정을 반복적으로 실시함으로써 프로세스 챔버 내에 잔류하는 수분이나 화학 성분 등을 빠른 시간 내에 아웃 개싱시킬 수 있다. 따라서, 반도체 제조 장치의 에이징 시간이 단축된다.
에이징, 가열공정, 펌핑공정

公开(公告)号：KR1020000015107A

公开(公告)日：2000-03-15

申请号：KR1019980034848

申请日：1998-08-27

Applicant: 삼성전자주식회사

Inventor： 정경수

IPC: H01L21/68

Abstract: PURPOSE: The apparatus can suppress the scratch defect in a wafer transfer fork(106) of the wafer transfer apparatus. CONSTITUTION: The apparatus is used in loading and unloading a wafer(108) with a quartz boat in a vertical type furnace or a low pressure chemical vapor deposition facility. The apparatus suppresses the scratch defect and increases the effectiveness of a facility by increasing the number of wafer to process in the quartz boat by reducing the thickness of the wafer transfer fork where the wafer is placed. The apparatus can use the interval between the wafer transfer fork at a maximum by reducing a whole thickness(100) of the wafer transfer fork from 1.82 mm to 1.27 mm by 0.55 mm.

Abstract translation: 目的：该装置可以抑制晶片传送装置的晶片传送叉（106）中的划痕缺陷。 构成：该装置用于在垂直式炉或低压化学气相沉积设备中将具有石英舟的晶片（108）装载和卸载。 该设备通过减小放置晶片的晶片传送叉的厚度来增加石英舟中经过的晶圆数量，从而抑制划痕缺陷并提高设备的有效性。 通过将晶片传送叉的整个厚度（100）从1.82mm减小到1.27mm×0.55mm，该装置可以最大限度地使用晶片传送叉之间的间隔。

公开(公告)号：KR1019990001285A

公开(公告)日：1999-01-15

申请号：KR1019970024546

申请日：1997-06-13

Applicant: 삼성전자주식회사

Inventor： 정경수

IPC: H01L21/205

Abstract: 본 발명은 반도체 화학기상증착 장비의 압력 감지장치에 관한 것으로, 본 발명에서는 배기관 및 센서 사이에 소정의 완충기능을 갖는 완충부를 개재하고 이를 통해 배기관을 흐르는 배기가스가 센서에 미치던 영향력을 적절히 차단함으로써, 센서의 수명을 연장시키고 센서의 감지능력을 향상시킬 수 있다.

公开(公告)号：KR1020030092677A

公开(公告)日：2003-12-06

申请号：KR1020020030418

申请日：2002-05-30

Applicant: 삼성전자주식회사

Inventor： 정경수

IPC: H01L21/00

Abstract: PURPOSE: A gas supply control apparatus in a semiconductor fabricating process is provided to prevent a process defect caused by a malfunction of an electromagnetic valve by checking whether the valve breaks down or operates abnormally. CONSTITUTION: A pneumatic valve(110) is installed in a gas supply line. The electromagnetic valve(120) controls the pneumatic valve. A pneumatic line(130) connects the electromagnetic valve with the pneumatic valve. An interlock apparatus(140) checks the pressure of the pneumatic line to determine whether the electromagnetic valve malfunctions. A pressure sensor(142) detects the pressure of the pneumatic line. A controller(144) receives the data from the pressure sensor and compares the data with a control signal regarding the operation of the electromagnetic valve to determine whether an interlock occurs. The interlock apparatus includes the pressure sensor and the controller.

Abstract translation: 目的：提供一种半导体制造工艺中的气体供应控制装置，用于通过检查阀是否故障或异常操作来防止由电磁阀的故障引起的过程缺陷。 构成：在气体供应管线中安装有气动阀（110）。 电磁阀（120）控制气动阀。 气动管路（130）将电磁阀与气动阀连接。 联锁装置（140）检查气动管线的压力，以确定电磁阀是否发生故障。 压力传感器（142）检测气动管线的压力。 控制器（144）从压力传感器接收数据，并将数据与关于电磁阀的操作的控制信号进行比较，以确定是否发生互锁。 联锁装置包括压力传感器和控制器。

公开(公告)号：KR1020020037132A

公开(公告)日：2002-05-18

申请号：KR1020000067138

申请日：2000-11-13

Applicant: 삼성전자주식회사

Inventor： 김화식 ,  정경수

IPC: H01L21/68

Abstract: PURPOSE: An absorbing device for wafer transfer apparatus is provided to prevent a vacuum error generated from a tweezer by improving a structure of the tweezer. CONSTITUTION: A multitude of tweezer(200,210,220) is inserted among a multitude of block(100,110,120). A multitude of airtight sheet(130) is adhered among the tweezers(200,210,220). The blocks(100,110,120) are formed with rectangular plates. A vacuum absorption tube is connected with a rear direction of the blocks(100,110,120). A connection hole is used for providing a vacuum pressure. A loading groove(102) for loading the tweezer(200) is formed on the lower block(100). A loading groove for loading the tweezer(210) is formed on an upper side of the lower block(100). A multitude of intermediate block(110) has connection holes(111), respectively. A loading groove(122) for loading the tweezer(220) is formed on the upper block(120). The blocks(100,110,120) are combined with a multitude of combination bolt(140).

Abstract translation: 目的：提供一种用于晶片传送装置的吸收装置，通过改进镊子的结构来防止由镊子产生的真空误差。 构成：大量镊子（200,210,220）插入多个块（100,110,120）之间。 镊子（200,210,220）中粘附有多个气密片（130）。 块（100,110,120）形成有矩形板。 真空吸收管与块体（100,110,120）的后方连接。 连接孔用于提供真空压力。 用于装载镊子（200）的装载槽（102）形成在下块体（100）上。 用于装载镊子（210）的装载槽形成在下块（100）的上侧。 多个中间块（110）分别具有连接孔（111）。 用于装载镊子（220）的装载槽（122）形成在上部块（120）上。 块（100,110,120）与多个组合螺栓（140）组合。

公开(公告)号：KR1020000032267A

公开(公告)日：2000-06-05

申请号：KR1019980048671

申请日：1998-11-13

Applicant: 삼성전자주식회사

Inventor： 정경수

IPC: H01L21/20

Abstract: PURPOSE: An apparatus for manufacturing a semiconductor providing an improved gas injection unit is provided to prevent a crack from being generated to the glass tube of a furnace. CONSTITUTION: An apparatus for manufacturing a semiconductor providing an improved gas injection unit includes a furnace(40) comprising a boat(46) able to stack an inner tube(44), an outer tube(42), and loaded between inner tubes a wafer and a gas injection unit(48) for injecting a source gas to form a material film in the boat. The gas injection unit is extended from the low part of the boat to the upper part of the boat to uniformly spray the source gas to the wafer stacked on the boat.

Abstract translation: 目的：提供一种用于制造提供改进的气体注入单元的半导体的装置，以防止对炉的玻璃管产生裂纹。 构成：提供改进的气体注入单元的半导体制造装置包括炉子（40），其包括能够堆叠内管（44）的船（46），外管（42），并且在内管之间装载晶片 以及用于喷射源气体以在船中形成材料膜的气体注入单元（48）。 气体喷射单元从船的低部分延伸到船的上部，以将源气体均匀地喷射到堆叠在船上的晶片上。

公开(公告)号：KR100170888B1

公开(公告)日：1999-03-30

申请号：KR1019950049333

申请日：1995-12-13

Applicant: 삼성전자주식회사

Inventor： 강기호 ,  정경수 ,  이학재 ,  김화식

IPC: H01L21/20

Abstract: 본 발명은 반도체소자 제조설비의 진공 밸브에 관한 것으로, 반도체소자의 제조공정중 저압 화학기상증착(Low Pressure Chemical Vapor Deposition)장비등 여러 가지 저압 공정장비에서 공정후 발생되는 폐기물이 배출되는 배출라인의 통로를 개폐하도록 설치된 반도체소자 제조설비의 진공 밸브에 있어서, 개폐판의 직선 왕복이동에 따라 수축 및 팽창하여 기밀이 지속적으로 유지되도록 구비한 벨로우즈가 완전수축되지 않도록 벨로우즈 수축방향으로의 개폐판 이동거리를 제한하는 스토퍼가 밸브몸체내에 설치된 구성이다.
따라서 벨로우즈의 완전수축이 방지되어 용접부위에서의 균열 및 깨짐현상이 감소되어 이로 인한 공정 폐기물의 누출이 방지되는 것이고, 공정 폐기물의 배출시 벨로우즈의 표면 및 용접부위가 노출되지 않아 벨로우즈의 수명이 연장되는 효과가 있다.

公开(公告)号：KR1020000050772A

公开(公告)日：2000-08-05

申请号：KR1019990000855

申请日：1999-01-14

Applicant: 삼성전자주식회사

Inventor： 정경수

IPC: H01L21/68

Abstract: PURPOSE: A wafer holder of facilities for manufacturing semiconductor is provided to use other holders even if a holder is damaged, by preparing three separate holders, so that the cost for exchanging holders can be reduced and the time for maintenance and repair is shortened. CONSTITUTION: A wafer holder of single-wafer-type facilities for manufacturing a semiconductor comprises: a wafer resting element(311) on one end; at least three holders(310) on the other end. The edge of a wafer(10) is rested on the wafer-resting element. The holders have a screw inserting hole(312) for fixing to a holder supporting bar(30) and the holders are separated from each other.

Abstract translation: 目的：通过制备三个独立的支架，即使保持器损坏，也可以使用半导体制造设备的晶片座，以便减少更换支架的成本，缩短维护和修理的时间。 构成：用于制造半导体的单晶片型设备的晶片架包括：一端的晶片静止元件（311）; 另一端至少有三个支架（310）。 晶片（10）的边缘搁置在晶片静止元件上。 保持器具有用于固定到保持器支撑杆（30）的螺钉插入孔（312），并且保持器彼此分离。

公开(公告)号：KR1020000031252A

公开(公告)日：2000-06-05

申请号：KR1019980047193

申请日：1998-11-04

Applicant: 삼성전자주식회사

Inventor： 정경수

IPC: H01L21/00

Abstract: PURPOSE: A boat exchange apparatus in a chemical vapor deposition equipment is provided to prevent problems according to excessive heat. CONSTITUTION: A boat exchange apparatus in a chemical vapor deposition equipment comprises a pair of fingers(20), a slider(26) and an elevator(30). The pair of fingers(20) is flexibly installed beside a support rod(22) to chuck a boat in which many wafers loaded. The slider(26) flexibly moves the pair of fingers(20). The elevator(30) moves the slider(26) up and down. Here, a heat-reduction device(23) is installed on a side edge of the support rod(22), A driver of a chemical vapor deposition equipment is controlled by an output signal from the heat-reduction device(23).

Abstract translation: 目的：提供化学气相沉积设备中的船交换装置，以防止过热引起的问题。 构成：化学气相沉积设备中的船交换装置包括一对手指（20），滑块（26）和升降机（30）。 一对手指（20）被柔性地安装在支撑杆（22）旁边，以夹紧其中载有许多晶片的船。 滑块26灵活地移动一对手指20。 电梯（30）上下移动滑块（26）。 这里，在支撑杆（22）的侧缘设置有减热装置（23），化学气相沉积设备的驱动器由来自减热装置（23）的输出信号控制。

公开(公告)号：KR1020070066181A

公开(公告)日：2007-06-27

申请号：KR1020050127047

申请日：2005-12-21

Applicant: 삼성전자주식회사

Inventor： 이만석 ,  정경수

IPC: H01L21/324 ,  H01L21/205

CPC classification number: H01L21/67115 ,  H01L21/324

Abstract: An apparatus for fabricating a semiconductor is provided to uniformly transfer heat from an external heat source to the inside of a process chamber by improving the structure of a window through which the light irradiated from the external heat source is transmitted to the inside of the process chamber. A space for performing a substrate treatment process is supplied by a process chamber. A lamp heater unit heats a substrate in the process chamber, disposed outside the process chamber. The light irradiated from the lamp heater unit is transmitted to the inside of the process chamber by a window(300) installed in the sidewall of the process chamber. The light output face(304) of the window has a concave shape. The lamp heater unit includes a plurality of lamps and a reflection plate. The plurality of lamps irradiate light to heat the substrate. The reflection plate reflects the light irradiated from the lamps to the window, installed in the rear part of the lamps.

Abstract translation: 提供一种用于制造半导体的装置，用于通过改善从外部热源照射的光透射到处理室内部的窗口的结构，将热量从外部热源均匀地传递到处理室的内部 。 用于进行基板处理工艺的空间由处理室提供。 灯加热器单元加热设置在处理室外部的处理室中的基板。 从灯加热器单元照射的光通过安装在处理室的侧壁中的窗口（300）传输到处理室的内部。 窗口的光输出面（304）具有凹形。 灯加热器单元包括多个灯和反射板。 多个灯照射光以加热基板。 反射板将从灯照射的光反射到安装在灯后部的窗户。