公开(公告)号：KR2019970050336U

公开(公告)日：1997-08-12

申请号：KR2019960001201

申请日：1996-01-29

Applicant: 삼성전자주식회사

Inventor： 한종우

IPC: H01L21/203

Abstract: 반도체스퍼터(Sputter)장치에서반도체기판을잡는척(Chuck)을제어하는반도체기판흡착용진공시스템에의해서반도체기판을용이하게잡고놓는동작을수행하고척의온도상승을억제하는것에관한것이다. 본고안은반도체기판을척상에진공흡착시킬수 있도록중간에솔레노이드밸브를구비한진공라인과진공상태를해게할수 있는배기라인이형성되어있는반도체기판흡착용진공시스템에있어서, 상기배기라인에외부가스공급라인이연결되며, 상기솔레노이드밸브의폐쇄동작과함께상기척내의진공상태를해제하기위한배기라인의작동시상기배기라인을통하여상기외부가스가상기척을향하여강제주입되는것을특징으로한다. 따라서, 반도체기판을잡고놓는동작을수행하는척의동작불량이발생하는것을방지할수 있다는효과가있다. 그리고척이공정과정에서변형되는것을방지할수 있다는효과가있다.

公开(公告)号：KR1020050022473A

公开(公告)日：2005-03-08

申请号：KR1020030060921

申请日：2003-09-01

Applicant: 삼성전자주식회사

Inventor： 김진복 ,  김효준 ,  한종우

IPC: H01L21/203

Abstract: PURPOSE: Sputtering equipment with an argon-implanted dual bellows is provided to rapidly check the damage of a bellows and avoid an influence upon a process even when the bellows is damaged by installing a leak detecting unit between an internal bellows and an external bellows. CONSTITUTION: A sputtering process is performed in a predetermined space of a chamber. A wafer placement part(13) is installed in the bottom of the chamber. One side of an up-down apparatus(15) is inserted into the chamber and the other side of the up-down apparatus is installed in the outside of the chamber so that the wafer placement part moves up/down. An internal bellows(21) avoids vacuum leak in the chamber according to the driving of the up-down apparatus, installed to surround the up-down apparatus. An external bellows(23) is separated from the internal bellows by a predetermined interval, installed to surround the internal bellows. A gas injection hole(25) injects argon gas to a gap between the internal bellows and the external bellows. A leak detecting unit(27) is installed between the internal bellows and the external bellows.

Abstract translation: 目的：提供带有氩气注射双波纹管的溅射设备，以便即使在内部波纹管和外部波纹管之间安装泄漏检测单元，即使波纹管损坏时，也能快速检查波纹管的损坏情况，并避免对该过程的影响。 构成：在室的预定空间中进行溅射处理。 晶片放置部分（13）安装在腔室的底部。 上下装置（15）的一侧被插入腔室中，并且上下装置的另一侧安装在腔室的外部，使得晶片放置部分上下移动。 内部波纹管（21）根据安装在围绕上下装置的上下装置的驱动，避免了室内的真空泄漏。 外部波纹管（23）与内部波纹管分开预定的间隔，安装以围绕内部波纹管。 气体注入孔（25）将氩气注入内部波纹管和外部波纹管之间的间隙。 泄漏检测单元（27）安装在内部波纹管和外部波纹管之间。

公开(公告)号：KR1020050001164A

公开(公告)日：2005-01-06

申请号：KR1020030042735

申请日：2003-06-27

Applicant: 삼성전자주식회사

Inventor： 김진복 ,  한종우

IPC: H01L21/205

CPC classification number: H01J37/32935 ,  C23C14/54 ,  H01J37/34

Abstract: PURPOSE: An apparatus for inspecting plasma deposition equipment is provided to avoid a process defect by easily detecting introduction of impurity gas caused by a leak even during a process. CONSTITUTION: A semiconductor fabricating process is performed in plasma deposition equipment including a vacuum chamber(300). A current comparator(210) compares detection current with reference current flowing in the vacuum chamber to generate an error signal. A display unit(240) displays that the error signal is generated. A power supply apparatus supplies DC(direct current) power to the vacuum chamber.

Abstract translation: 目的：提供一种用于检查等离子体沉积设备的装置，以便即使在处理过程中也容易检测到由泄漏引起的杂质气体的引入，以避免工艺缺陷。 构成：在包括真空室（300）的等离子体沉积设备中进行半导体制造工艺。 电流比较器（210）将检测电流与在真空室中流动的参考电流进行比较，以产生误差信号。 显示单元（240）显示产生错误信号。 电源装置向真空室提供DC（直流）电力。

公开(公告)号：KR100223971B1

公开(公告)日：1999-10-15

申请号：KR1019970000689

申请日：1997-01-13

Applicant: 삼성전자주식회사

Inventor： 한종우

IPC: H01L21/304

Abstract: 본 발명에 따른 반도체장치 제조용 알미늄 쉴드의 티타늄화합물 세정액은, 순수에 과산화수소와 EDTA(Ethylenediamine Tetraacetic Acid) 및 수산화칼륨을 첨가하여 이루어지는 것을 특징으로 한다.
이러한 세정액을 사용하여 세정공정을 실시할 경우, 종래의 알미늄 쉴드 세정방법에서 발생되는, 과다한 시간이 걸리고, 세정액을 수시로 교체시키야 하며, 알미늄 쉴드가 손상되고, 유해한 화학물질을 사용해야 하는 문제점을 줄이거나 없앨 수 있다는 효과가 있다.