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公开(公告)号:KR1020110081612A
公开(公告)日:2011-07-14
申请号:KR1020100001866
申请日:2010-01-08
Applicant: 성균관대학교산학협력단
CPC classification number: C01B13/14 , B01J19/0086 , C01P2004/64 , C01P2006/12 , C01P2006/16
Abstract: PURPOSE: A producing method of a mesoporous metal oxide is provided to offer meso-pores with various sizes and the wide surface area to the metal oxide. CONSTITUTION: A producing method of a mesoporous metal oxide comprises the following steps: preparing a metal oxide nanoparticle composite; heat processing the metal oxide nanoparticle composite; and removing nanoparticles from the heat processed metal oxide nanoparticle composite. Metals forming the nanoparticles are group 3 or 15 metals, lanthanide series metals, or actinoid metals.
Abstract translation: 目的:提供介孔金属氧化物的制备方法,以提供具有各种尺寸和宽金属氧化物表面积的中孔。 构成:介孔金属氧化物的制备方法包括以下步骤:制备金属氧化物纳米颗粒复合材料; 热处理金属氧化物纳米复合材料; 并从热处理的金属氧化物纳米颗粒复合材料中除去纳米颗粒。 形成纳米颗粒的金属是3或15族金属,镧系金属或锕系金属。
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12.
公开(公告)号:KR1020090080161A
公开(公告)日:2009-07-24
申请号:KR1020080005991
申请日:2008-01-21
Applicant: 성균관대학교산학협력단 , (주)실빅스
CPC classification number: C01B33/12 , A01N59/00 , A01N59/16 , B82Y30/00 , B82Y40/00 , C01G5/02 , C01P2004/64
Abstract: A silver compound-mesoporous silica nanocomposite and a preparation method thereof are provided to coat silver chloride with inorganic oxides in order to improve brightness as well as the antibacterial activity of an antibacterial. A silver compound-mesoporous silica nanocomposite includes silver chloride nanoparticles in meso-pore of mesoporous silica. A method for preparing the silver compound-mesoporous silica nanocomposite comprises the following steps of: infiltrating silver ions into the meso-pores of mesoporous silica particles; drying the obtaining mesoporous silica particles; supplying chlorine gas or hydrochloride gas; and reacting the silver ions included in the meso-pores to the silver chloride nanoparticles.
Abstract translation: 提供了一种银化合物 - 介孔二氧化硅纳米复合材料及其制备方法,以提供无机氧化物的氯化银以提高抗菌剂的亮度和抗菌活性。 银化合物介孔二氧化硅纳米复合材料包括中孔二氧化硅的介孔中的氯化银纳米粒子。 一种制备银化合物 - 介孔二氧化硅纳米复合材料的方法,包括以下步骤:将银离子渗入介孔二氧化硅颗粒的中孔; 干燥获得介孔二氧化硅颗粒; 供应氯气或盐酸气体; 并将包含在中孔中的银离子与氯化银纳米颗粒反应。
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公开(公告)号:KR1020090079537A
公开(公告)日:2009-07-22
申请号:KR1020080005595
申请日:2008-01-18
Applicant: 성균관대학교산학협력단
IPC: H01L27/13
CPC classification number: H01L21/02126 , H01L21/02164 , H01L21/02203 , H01L21/02216 , H01L21/02282 , H01L21/3121 , H01L21/316 , Y10T428/265
Abstract: A thin film nano multilayered structure with low-k dielectric and high hardness is to provide nano multilayered structure pores, which represent an air layer between dense silica layers in order for the silica layers not to be exposed to the outside. A method for fabricating a thin film nano multilayered structure with low-k dielectric and high hardness comprises: a first step of stirring a silica sol solution containing surfactant, silica precursor, solvent and catalyst at the temperature of 20 ~ 30°C in order to induce a self-assembly structure of silica and surfactant; a second step of spin-coating a silicon wafer with the silica sol solution; a third step of aging the silicon wafer in an oven of 50 ~ 100°C for 10 ~ 60 hours; and a fourth step of sintering the silicon wafer at 400°C ~ 500°C for 2 ~ 6 hours and cooling it off.
Abstract translation: 具有低k电介质和高硬度的薄膜纳米多层结构是提供纳米多层结构孔,其表示致密二氧化硅层之间的空气层,以使二氧化硅层不暴露于外部。 制备低k电介质和高硬度的薄膜纳米多层结构的方法包括:在20〜30℃的温度下搅拌含有表面活性剂,二氧化硅前体,溶剂和催化剂的二氧化硅溶胶溶液的第一步骤,以便 诱导二氧化硅和表面活性剂的自组装结构; 用硅溶胶溶液旋涂硅晶片的第二步骤; 在50〜100℃的烘箱中将硅晶片老化10〜60小时的第三步骤; 以及在400℃〜500℃下烧结硅晶片2〜6小时并冷却的第四步骤。
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