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公开(公告)号：KR100399021B1
公开(公告)日：2003-09-19
申请号：KR1020010004667
申请日：2001-01-31
Applicant: 한국과학기술연구원
IPC: G11B7/2585
CPC classification number: G11B7/2585
Abstract: PURPOSE: A high density optical disk using an amorphous reflection film is provided to improve reliability of data by reducing noise of the optical disk by restricting surface roughness due to growth of crystal grain occurring when a thin film is grown, by using reflection film material of an amorphous type. CONSTITUTION: A high density optical disk using an amorphous reflection film includes a substrate(2), a reflection film(4), and a protection cover layer(5). The substrate has pre pit containing information. The reflection film is formed on the substrate and made of amorphous material to minimize noise of reflected beam of incident laser beam by minimizing a surface roughness. The protection cover layer is formed on the reflection film. The laser beam is incident opposed to the surface of the reflection film after piling up of the laser beam.
Abstract translation: 目的：提供使用非晶反射膜的高密度光盘，以通过使用反射膜材料来限制由于在生长薄膜时产生的晶粒的生长而导致的表面粗糙度，从而降低光盘的噪声，从而提高数据的可靠性。 非晶型。 构成：使用非晶反射膜的高密度光盘包括基片（2），反射膜（4）和保护覆盖层（5）。 基板具有含有信息的预置坑。 反射膜形成在基板上并由非晶材料制成，以通过使表面粗糙度最小化来使入射激光束的反射光束的噪声最小化。 保护覆盖层形成在反射膜上。 激光束在激光束堆积之后与反射膜的表面相对入射。
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Patent Agency Ranking
公开(公告)号：KR1020020064065A
公开(公告)日：2002-08-07
申请号：KR1020010004667
申请日：2001-01-31
Applicant: 한국과학기술연구원
IPC: G11B7/2585
CPC classification number: G11B7/2585
Abstract: PURPOSE: A high density optical disk using an amorphous reflection film is provided to improve reliability of data by reducing noise of the optical disk by restricting surface roughness due to growth of crystal grain occurring when a thin film is grown, by using reflection film material of an amorphous type. CONSTITUTION: A high density optical disk using an amorphous reflection film includes a substrate(2), a reflection film(4), and a protection cover layer(5). The substrate has pre pit containing information. The reflection film is formed on the substrate and made of amorphous material to minimize noise of reflected beam of incident laser beam by minimizing a surface roughness. The protection cover layer is formed on the reflection film. The laser beam is incident opposed to the surface of the reflection film after piling up of the laser beam.
Abstract translation: 目的：提供一种使用非晶反射膜的高密度光盘，通过减小由于在生长薄膜时发生的晶粒生长而引起的表面粗糙度，通过使用反射膜材料 非晶型。 构成：使用非晶反射膜的高密度光盘包括基板（2），反射膜（4）和保护覆盖层（5）。 基板具有包含信息的预坑。 反射膜形成在基板上，由非晶材料制成，以通过最小化表面粗糙度来最小化入射激光束的反射光束的噪声。 保护覆盖层形成在反射膜上。 在激光束堆叠之后，激光束入射到反射膜的表面上。
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公开(公告)号：KR1020020064064A
公开(公告)日：2002-08-07
申请号：KR1020010004666
申请日：2001-01-31
Applicant: 한국과학기술연구원
IPC: C23C14/00
CPC classification number: C23C14/28 , H01L21/285
Abstract: PURPOSE: An apparatus and a method for coating and surface treatment using a single source are provided which enable coating and surface treatment on all solid phase metals and insulating materials at ordinary temperature using the single source. CONSTITUTION: The apparatus for coating and surface treatment using a single source comprises a laser(1) generating laser light; a light assembly(2) for focusing and scanning the laser light generated by the laser(1); a target(7) which is an evaporation source of plasma generated by the laser light; a target holder(9) on which the target(7) is mounted; a high voltage pulse generation part(5) supplying high voltage of pulse mode to the target(7); a high voltage feedthrough(6) supplying the high voltage pulse outputted from the high voltage pulse generation part(5) to the target(7); a matrix(8) which is an object for coating and surface reforming using plasma of the target(7) generated by the laser light of the pulse mode that is generated by the laser(1); a matrix holder(10) on which the matrix(8) is mounted; a vacuum chamber(4) maintaining certain degrees of vacuum as containing the target(7), target holder(9), matrix(8) and matrix holder(10) in the vacuum chamber(4); and a vacuum system constantly maintaining a degree of vacuum of the vacuum chamber(4).
Abstract translation: 目的：提供使用单一源进行涂覆和表面处理的设备和方法，其能够使用单一源在常温下对所有固相金属和绝缘材料进行涂层和表面处理。 构成：使用单个源的涂覆和表面处理装置包括产生激光的激光（1） 用于聚焦和扫描由激光器（1）产生的激光的光组件（2）; 作为由激光产生的等离子体的蒸发源的目标（7） 安装有目标（7）的目标支架（9） 向所述目标（7）提供高电压脉冲模式的高电压脉冲发生部（5）; 高压馈通（6），将从高电压脉冲发生部（5）输出的高电压脉冲提供给目标（7）; 使用由激光（1）产生的脉冲模式的激光产生的目标（7）的等离子体进行涂覆和表面改性的对象的矩阵（8）; 矩阵（10），其上安装有矩阵（8）; 真空室（4）在真空室（4）中保持包含靶（7），靶保持器（9），基体（8）和基质保持器（10）的一定程度的真空度; 以及恒定地保持真空室（4）的真空度的真空系统。
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公开(公告)号：KR1019950018637A
公开(公告)日：1995-07-22
申请号：KR1019930026815
申请日：1993-12-08
Applicant: 한국과학기술연구원
IPC: C23C16/30
Abstract: 본 발명은 질소, 또는 질소 함유 불활성 가스의 존재하에 금합금을 사용하여 이온 플레이팅(ion plating)시키는 것으로 이루어진 금/질화물의 복합 미세 구조를 갖는 장식용 금색 피막의 제조 방법에 관한 것이다. 본 발명에 따라 제조된 피막은 내마모성이 우수할 뿐만 아니라, 순금의 피막과 유사한 반사분광 특성을 나타낸다.
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