公开(公告)号：KR1020020082013A

公开(公告)日：2002-10-30

申请号：KR1020010021711

申请日：2001-04-23

Applicant: 한국과학기술연구원

Inventor： 이중기 ,  박달근 ,  조병원 ,  우주만 ,  전법주

IPC: C23C16/44

CPC classification number: H01J37/32192 ,  C23C14/34 ,  C23C16/511 ,  H01J37/32678 ,  H01J37/34

Abstract: PURPOSE: An electron cyclotron resonance and sputter combined chemical vapor deposition system at ordinary temperature is provided which forms a composite metal film at ordinary temperature by combining electron cyclotron resonance with sputter, and a preparation method of the composite metal film using the same is provided. CONSTITUTION: The electron cyclotron resonance and sputter(55) combined chemical vapor deposition system at ordinary temperature comprises a reaction chamber(10) providing reaction environment for depositing metal ions and radical ions on the substrate; a substrate(15) which is installed in the reaction chamber, and on which a sample where metal ions and radical ions are deposited is mounted; an ECR (electron cyclotron resonance) system which is connected to the reaction chamber to plasma formed by an ECR (electron cyclotron resonance); an organic matter supply system for supplying organic materials into the reaction chamber; a sputtering system for supplying metal ions to the reaction chamber(10); an induction voltage supply system for guiding the metal ions and radical ions to the sample mounted on the substrate; a grid which is installed adjacently to the substrate(15), and to which a voltage supplied by the induction voltage supply system is impressed to guide the metal ions and radical ions to the sample; and a vacuum system which is connected to the reaction chamber to adjust internal degree of vacuum.

Abstract translation: 目的：提供常温下的电子回旋共振和溅射组合化学气相沉积系统，通过将电子回旋共振与溅射组合，在常温下形成复合金属膜，并提供了使用其的复合金属膜的制备方法。 构成：电子回旋共振和溅射（55）在常温下组合的化学气相沉积系统包括反应室（10），为基底上沉积金属离子和自由基离子提供反应环境; 安装在反应室中并且其上沉积有金属离子和自由基离子的样品的基底（15）; ECR（电子回旋共振）系统，其通过ECR（电子回旋共振）与反应室连接至等离子体; 用于向反应室供应有机材料的有机物质供给系统; 用于向反应室（10）供应金属离子的溅射系统; 用于将金属离子和自由基离子引导到安装在基板上的样品的感应电压供给系统; 与衬底相邻安装的栅格，并且由感应电压供应系统提供的电压被施加到该栅极以将金属离子和自由基离子引导到样品; 以及连接到反应室以调节内部真空度的真空系统。